JPS52105775A - Fine position matching method - Google Patents

Fine position matching method

Info

Publication number
JPS52105775A
JPS52105775A JP2244176A JP2244176A JPS52105775A JP S52105775 A JPS52105775 A JP S52105775A JP 2244176 A JP2244176 A JP 2244176A JP 2244176 A JP2244176 A JP 2244176A JP S52105775 A JPS52105775 A JP S52105775A
Authority
JP
Japan
Prior art keywords
position matching
fine position
matching method
equipping
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2244176A
Other languages
Japanese (ja)
Inventor
Shinichiro Takasu
Tetsunori Wada
Shusuke Kotake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2244176A priority Critical patent/JPS52105775A/en
Publication of JPS52105775A publication Critical patent/JPS52105775A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To conduct fine position matching by utilizing diffraction effect of electromagnetic wave after equipping the mask and the printed object with the diffraction gratings of the same frequency.
COPYRIGHT: (C)1977,JPO&Japio
JP2244176A 1976-03-02 1976-03-02 Fine position matching method Pending JPS52105775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2244176A JPS52105775A (en) 1976-03-02 1976-03-02 Fine position matching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2244176A JPS52105775A (en) 1976-03-02 1976-03-02 Fine position matching method

Publications (1)

Publication Number Publication Date
JPS52105775A true JPS52105775A (en) 1977-09-05

Family

ID=12082783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2244176A Pending JPS52105775A (en) 1976-03-02 1976-03-02 Fine position matching method

Country Status (1)

Country Link
JP (1) JPS52105775A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137673A (en) * 1977-05-03 1978-12-01 Massachusetts Inst Technology Device for and method of matching plate position
JPS54101676A (en) * 1978-01-16 1979-08-10 Rca Corp Method of and device for aligning photo mask
JPS55117240A (en) * 1979-02-27 1980-09-09 Thomson Csf Two motif array optical system and photo repeater using same system
JPH0476837A (en) * 1990-07-18 1992-03-11 Photonics:Kk Feature aligner

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137673A (en) * 1977-05-03 1978-12-01 Massachusetts Inst Technology Device for and method of matching plate position
JPS6228576B2 (en) * 1977-05-03 1987-06-22 Masachuusetsutsu Inst Obu Tekunorojii
JPS54101676A (en) * 1978-01-16 1979-08-10 Rca Corp Method of and device for aligning photo mask
JPS6255699B2 (en) * 1978-01-16 1987-11-20 Rca Corp
JPS55117240A (en) * 1979-02-27 1980-09-09 Thomson Csf Two motif array optical system and photo repeater using same system
JPH0140491B2 (en) * 1979-02-27 1989-08-29 Thomson Csf
JPH0476837A (en) * 1990-07-18 1992-03-11 Photonics:Kk Feature aligner

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