JPS4836281A - - Google Patents

Info

Publication number
JPS4836281A
JPS4836281A JP47088304A JP8830472A JPS4836281A JP S4836281 A JPS4836281 A JP S4836281A JP 47088304 A JP47088304 A JP 47088304A JP 8830472 A JP8830472 A JP 8830472A JP S4836281 A JPS4836281 A JP S4836281A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP47088304A
Other versions
JPS591281B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4836281A publication Critical patent/JPS4836281A/ja
Publication of JPS591281B2 publication Critical patent/JPS591281B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/0091—Methine or polymethine dyes, e.g. cyanine dyes having only one heterocyclic ring at one end of the methine chain, e.g. hemicyamines, hemioxonol
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/06—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups three >CH- groups, e.g. carbocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/14—Styryl dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/14—Styryl dyes
    • C09B23/145—Styryl dyes the ethylene chain carrying an heterocyclic residue, e.g. heterocycle-CH=CH-C6H5
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
JP47088304A 1971-09-03 1972-09-02 ヒカリジユウゴウカイシザイ Expired JPS591281B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/177,851 US3987037A (en) 1971-09-03 1971-09-03 Chromophore-substituted vinyl-halomethyl-s-triazines

Publications (2)

Publication Number Publication Date
JPS4836281A true JPS4836281A (ja) 1973-05-28
JPS591281B2 JPS591281B2 (ja) 1984-01-11

Family

ID=22650203

Family Applications (2)

Application Number Title Priority Date Filing Date
JP47088304A Expired JPS591281B2 (ja) 1971-09-03 1972-09-02 ヒカリジユウゴウカイシザイ
JP14424380A Granted JPS5685746A (en) 1971-09-03 1980-10-15 Image forming composition

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP14424380A Granted JPS5685746A (en) 1971-09-03 1980-10-15 Image forming composition

Country Status (12)

Country Link
US (1) US3987037A (ja)
JP (2) JPS591281B2 (ja)
BE (1) BE788295A (ja)
BR (1) BR7206066D0 (ja)
CA (1) CA986512A (ja)
CH (1) CH576967A5 (ja)
DE (1) DE2243621A1 (ja)
FR (1) FR2152039A5 (ja)
GB (1) GB1388492A (ja)
IT (1) IT965195B (ja)
NL (1) NL172155C (ja)
SU (1) SU618064A3 (ja)

Cited By (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5336223A (en) * 1976-09-13 1978-04-04 Hoechst Ag Photosensitive composition
JPS5363506A (en) * 1976-11-19 1978-06-07 Toyo Electric Mfg Co Ltd Method of manufacturing vvshaped insulation of commutator
JPS55126235A (en) * 1979-03-22 1980-09-29 Fuji Photo Film Co Ltd Photosensitive composition
JPS60105667A (ja) * 1983-10-12 1985-06-11 ヘキスト・アクチエンゲゼルシヤフト トリクロルメチル基を有する感光性化合物及びその製法
JPS62115150A (ja) * 1985-07-02 1987-05-26 Fuji Photo Film Co Ltd 感光性組成物
JPH023686A (ja) * 1988-03-07 1990-01-09 Hoechst Ag 複素環式化合物、感光性組成物、および該化合物の製造法
JPH0248665A (ja) * 1988-08-11 1990-02-19 Fuji Photo Film Co Ltd 水または弱アルカリ水で現像するための平版印刷版
JPH0263054A (ja) * 1988-05-11 1990-03-02 Fuji Photo Film Co Ltd 感光性組成物
EP0690074A1 (en) 1994-06-28 1996-01-03 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
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Families Citing this family (213)

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US4212970A (en) * 1977-11-28 1980-07-15 Fuji Photo Film Co., Ltd. 2-Halomethyl-5-vinyl-1,3,4-oxadiazole compounds
JPS5474728A (en) * 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
CA1116915A (en) * 1977-12-28 1982-01-26 Anthony Adin Inhibition of image formation utilizing cobalt(iii) complexes
JPS5495687A (en) * 1978-01-11 1979-07-28 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
JPS5555335A (en) * 1978-10-19 1980-04-23 Fuji Photo Film Co Ltd Photosensitive composition
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
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DE2243621A1 (de) 1973-03-08
BR7206066D0 (pt) 1973-07-24
JPS571819B2 (ja) 1982-01-13
GB1388492A (en) 1975-03-26
IT965195B (it) 1974-01-31
NL172155C (nl) 1983-07-18
US3987037A (en) 1976-10-19
CA986512A (en) 1976-03-30
FR2152039A5 (ja) 1973-04-20
NL7211076A (ja) 1973-03-06
JPS5685746A (en) 1981-07-13
NL172155B (nl) 1983-02-16
BE788295A (fr) 1973-03-01
JPS591281B2 (ja) 1984-01-11
CH576967A5 (ja) 1976-06-30
DE2243621C2 (ja) 1987-08-20
SU618064A3 (ru) 1978-07-30

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