GB2273101B - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
GB2273101B
GB2273101B GB9322792A GB9322792A GB2273101B GB 2273101 B GB2273101 B GB 2273101B GB 9322792 A GB9322792 A GB 9322792A GB 9322792 A GB9322792 A GB 9322792A GB 2273101 B GB2273101 B GB 2273101B
Authority
GB
United Kingdom
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9322792A
Other versions
GB2273101A (en
GB9322792D0 (en
Inventor
Hiroshi Komano
Takeshi Iwai
Katsuyuki Ohta
Toshimi Aoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP32479992A external-priority patent/JP3187569B2/en
Priority claimed from JP7703793A external-priority patent/JP3263172B2/en
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of GB9322792D0 publication Critical patent/GB9322792D0/en
Publication of GB2273101A publication Critical patent/GB2273101A/en
Application granted granted Critical
Publication of GB2273101B publication Critical patent/GB2273101B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
GB9322792A 1992-11-10 1993-11-05 Photosensitive resin composition Expired - Fee Related GB2273101B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32479992A JP3187569B2 (en) 1992-11-10 1992-11-10 Photosensitive resin composition and PS plate using the same
JP7703793A JP3263172B2 (en) 1993-04-02 1993-04-02 Photopolymerizable composition

Publications (3)

Publication Number Publication Date
GB9322792D0 GB9322792D0 (en) 1993-12-22
GB2273101A GB2273101A (en) 1994-06-08
GB2273101B true GB2273101B (en) 1997-03-05

Family

ID=26418133

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9322792A Expired - Fee Related GB2273101B (en) 1992-11-10 1993-11-05 Photosensitive resin composition

Country Status (2)

Country Link
DE (1) DE4338437C2 (en)
GB (1) GB2273101B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
US5885746A (en) * 1994-12-29 1999-03-23 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
EP0723167A3 (en) * 1995-01-17 1997-04-02 Mitsubishi Chem Corp Photopolymerizable composition for a color filter
JPH1026834A (en) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd Image forming method
JP3394938B2 (en) * 1999-03-25 2003-04-07 株式会社村田製作所 Photosensitive conductor paste
JP2005122113A (en) * 2003-08-28 2005-05-12 Fuji Photo Film Co Ltd Photopolymerizable composition and image recording material
KR100633235B1 (en) * 2004-07-05 2006-10-11 주식회사 엘지화학 Display panel including patterned spacer

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1388492A (en) * 1971-09-03 1975-03-26 Minnesota Mining & Mfg Chromophore-substituted halomethyl-s-triazines
GB2029428A (en) * 1978-08-29 1980-03-19 Fuji Photo Film Co Ltd Photosensitive resin composition giving print-out images
WO1981002262A1 (en) * 1980-02-14 1981-08-20 Minnesota Mining & Mfg Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-striazine
GB2195121A (en) * 1986-08-08 1988-03-30 Fuji Photo Film Co Ltd Light-sensitive composition
EP0313007A2 (en) * 1987-10-23 1989-04-26 Hoechst Celanese Corporation Mixture polymerised by visible light
EP0379200A2 (en) * 1989-01-19 1990-07-25 Mitsubishi Kasei Corporation Photopolymerizable composition
EP0503674A1 (en) * 1991-03-15 1992-09-16 Fuji Photo Film Co., Ltd. Light-sensitive bistrihalomethyl-S-triazine compound and photopolymerizable composition containing same
US5219709A (en) * 1992-02-26 1993-06-15 Mitsubishi Kasei Corporation Photopolymerizable composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120036B2 (en) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 Photopolymerizable composition
DE4007428A1 (en) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisable mixt. sensitive to near UV and visible light
DE4013358A1 (en) * 1990-04-26 1991-10-31 Hoechst Ag METHOD FOR THE PRODUCTION OF PRINTING FORMS OR PHOTORESISTS BY IMPROPER IRRADIATION OF A PHOTOPOLYMERIZABLE RECORDING MATERIAL
DE4204949A1 (en) * 1992-02-19 1993-09-09 Hoechst Ag METHOD FOR PRODUCING A MULTICOLORED IMAGE AND LIGHT-SENSITIVE MATERIAL FOR CARRYING OUT THIS PROCESS

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1388492A (en) * 1971-09-03 1975-03-26 Minnesota Mining & Mfg Chromophore-substituted halomethyl-s-triazines
GB2029428A (en) * 1978-08-29 1980-03-19 Fuji Photo Film Co Ltd Photosensitive resin composition giving print-out images
WO1981002262A1 (en) * 1980-02-14 1981-08-20 Minnesota Mining & Mfg Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-striazine
GB2195121A (en) * 1986-08-08 1988-03-30 Fuji Photo Film Co Ltd Light-sensitive composition
EP0313007A2 (en) * 1987-10-23 1989-04-26 Hoechst Celanese Corporation Mixture polymerised by visible light
US4845011A (en) * 1987-10-23 1989-07-04 Hoechst Celanese Corporation Visible light photoinitiation compositions
EP0379200A2 (en) * 1989-01-19 1990-07-25 Mitsubishi Kasei Corporation Photopolymerizable composition
EP0503674A1 (en) * 1991-03-15 1992-09-16 Fuji Photo Film Co., Ltd. Light-sensitive bistrihalomethyl-S-triazine compound and photopolymerizable composition containing same
US5219709A (en) * 1992-02-26 1993-06-15 Mitsubishi Kasei Corporation Photopolymerizable composition

Also Published As

Publication number Publication date
DE4338437C2 (en) 1998-11-05
GB2273101A (en) 1994-06-08
GB9322792D0 (en) 1993-12-22
DE4338437A1 (en) 1994-05-11

Similar Documents

Publication Publication Date Title
EP0591786A3 (en) Photosensitive composition
EP0713144A3 (en) Photosensitive resin composition
AU1217092A (en) Photosensitive resin composition
EP0459395A3 (en) Positive photo-sensitive resin composition
EP0443820A3 (en) Radiation-sensitive resin composition
EP0508409A3 (en) Photocurable resin composition
SG46999A1 (en) Photosensitive resin composition
EP0473379A3 (en) Resin compositions
GB2278845B (en) Resin composition
EP0454334A3 (en) Photoresist composition
EP0476942A3 (en) Resin compositions
EP0430221A3 (en) Photosensitive resin composition
EP0506076A3 (en) Resin composition
EP0499435A3 (en) Photo-curable resin composition
EP0462785A3 (en) Resin composition for toners
KR0146485B1 (en) Photosensitive resin composition
EP0561629A3 (en) Polycarbonate resin compositions
EP0571918A3 (en) Methacrylate resin composition
EP0686877A4 (en) Colored photosensitive resin composition
EP0470557A3 (en) Resin composition
GB2323367B (en) Photosensitive resin composition
KR0121750B1 (en) Polyphenyene ether resin composition
GB2275475B (en) Photosensitive resin composition
GB2273101B (en) Photosensitive resin composition
EP0440444A3 (en) Photosensitive resin composition

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20071105