JPH1078593A5 - - Google Patents

Info

Publication number
JPH1078593A5
JPH1078593A5 JP1996253817A JP25381796A JPH1078593A5 JP H1078593 A5 JPH1078593 A5 JP H1078593A5 JP 1996253817 A JP1996253817 A JP 1996253817A JP 25381796 A JP25381796 A JP 25381796A JP H1078593 A5 JPH1078593 A5 JP H1078593A5
Authority
JP
Japan
Prior art keywords
interlayer insulating
insulating film
source
display device
source line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996253817A
Other languages
English (en)
Japanese (ja)
Other versions
JP3634089B2 (ja
JPH1078593A (ja
Filing date
Publication date
Priority claimed from JP25381796A external-priority patent/JP3634089B2/ja
Priority to JP25381796A priority Critical patent/JP3634089B2/ja
Application filed filed Critical
Priority to US08/922,951 priority patent/US6115088A/en
Priority to KR1019970045637A priority patent/KR100538181B1/ko
Publication of JPH1078593A publication Critical patent/JPH1078593A/ja
Priority to US09/546,636 priority patent/US6421101B1/en
Priority to US10/196,878 priority patent/US7046313B2/en
Publication of JPH1078593A5 publication Critical patent/JPH1078593A5/ja
Priority to KR1020050008463A priority patent/KR100653409B1/ko
Priority to US11/069,982 priority patent/US7023502B2/en
Publication of JP3634089B2 publication Critical patent/JP3634089B2/ja
Application granted granted Critical
Priority to KR1020050053385A priority patent/KR100700485B1/ko
Priority to US11/382,412 priority patent/US7646022B2/en
Priority to US12/610,450 priority patent/US7863618B2/en
Priority to US12/982,255 priority patent/US8586985B2/en
Priority to US13/587,958 priority patent/US8536577B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP25381796A 1996-09-04 1996-09-04 表示装置 Expired - Fee Related JP3634089B2 (ja)

Priority Applications (12)

Application Number Priority Date Filing Date Title
JP25381796A JP3634089B2 (ja) 1996-09-04 1996-09-04 表示装置
US08/922,951 US6115088A (en) 1996-09-04 1997-09-03 Display device
KR1019970045637A KR100538181B1 (ko) 1996-09-04 1997-09-03 액티브매트릭스형표시장치,반도체장치및반도체표시장치
US09/546,636 US6421101B1 (en) 1996-09-04 2000-04-07 Display device including a transparent electrode pattern covering and extending along gate & source lines
US10/196,878 US7046313B2 (en) 1996-09-04 2002-07-15 Semiconductor device including a source line formed on interlayer insulating film having flattened surface
KR1020050008463A KR100653409B1 (ko) 1996-09-04 2005-01-31 반도체장치
US11/069,982 US7023502B2 (en) 1996-09-04 2005-03-03 Semiconductor device having light-shielded thin film transistor
KR1020050053385A KR100700485B1 (ko) 1996-09-04 2005-06-21 반도체장치
US11/382,412 US7646022B2 (en) 1996-09-04 2006-05-09 Display device
US12/610,450 US7863618B2 (en) 1996-09-04 2009-11-02 Display device
US12/982,255 US8586985B2 (en) 1996-09-04 2010-12-30 Display device
US13/587,958 US8536577B2 (en) 1996-09-04 2012-08-17 Display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25381796A JP3634089B2 (ja) 1996-09-04 1996-09-04 表示装置

Publications (3)

Publication Number Publication Date
JPH1078593A JPH1078593A (ja) 1998-03-24
JPH1078593A5 true JPH1078593A5 (enExample) 2004-09-09
JP3634089B2 JP3634089B2 (ja) 2005-03-30

Family

ID=17256555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25381796A Expired - Fee Related JP3634089B2 (ja) 1996-09-04 1996-09-04 表示装置

Country Status (3)

Country Link
US (8) US6115088A (enExample)
JP (1) JP3634089B2 (enExample)
KR (3) KR100538181B1 (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3634089B2 (ja) * 1996-09-04 2005-03-30 株式会社半導体エネルギー研究所 表示装置
US6088070A (en) 1997-01-17 2000-07-11 Semiconductor Energy Laboratory Co., Ltd. Active matrix liquid crystal with capacitor between light blocking film and pixel connecting electrode
JP3784491B2 (ja) 1997-03-28 2006-06-14 株式会社半導体エネルギー研究所 アクティブマトリクス型の表示装置
KR100322965B1 (ko) * 1998-03-27 2002-06-20 주식회사 현대 디스플레이 테크놀로지 액정표시소자의 제조방법
JP3980167B2 (ja) * 1998-04-07 2007-09-26 株式会社日立製作所 Tft電極基板
US6493048B1 (en) * 1998-10-21 2002-12-10 Samsung Electronics Co., Ltd. Thin film transistor array panel for a liquid crystal display and a method for manufacturing the same
US6617644B1 (en) * 1998-11-09 2003-09-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the same
KR100474003B1 (ko) * 1998-11-27 2005-09-16 엘지.필립스 엘시디 주식회사 액정표시장치
US6576926B1 (en) 1999-02-23 2003-06-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
TW478014B (en) 1999-08-31 2002-03-01 Semiconductor Energy Lab Semiconductor device and method of manufacturing thereof
US6646287B1 (en) 1999-11-19 2003-11-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device with tapered gate and insulating film
JP2001228457A (ja) * 1999-12-08 2001-08-24 Sharp Corp 液晶表示装置
US7023021B2 (en) 2000-02-22 2006-04-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the same
US6789910B2 (en) 2000-04-12 2004-09-14 Semiconductor Energy Laboratory, Co., Ltd. Illumination apparatus
JP4689851B2 (ja) * 2001-02-23 2011-05-25 Nec液晶テクノロジー株式会社 アクティブマトリクス型液晶表示装置
JP2002258320A (ja) 2001-02-28 2002-09-11 Nec Corp 液晶表示装置
KR100620847B1 (ko) * 2001-06-05 2006-09-13 엘지.필립스 엘시디 주식회사 액정표시장치의 어레이기판 및 그의 제조방법
KR100807582B1 (ko) * 2001-07-30 2008-02-28 엘지.필립스 엘시디 주식회사 스토리지 커패시터 및 이를 구비한 액정 표시장치
CN1549983B (zh) * 2001-11-13 2010-04-28 国际商业机器公司 用于从物理文档选择电子文档并将所述电子文档显示在所述物理文档上面的系统和方法
US7079210B2 (en) * 2001-11-22 2006-07-18 Samsung Electronics Co., Ltd. Liquid crystal display and thin film transistor array panel
KR20030042221A (ko) * 2001-11-22 2003-05-28 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 기판
KR100857132B1 (ko) * 2001-12-06 2008-09-05 엘지디스플레이 주식회사 액정 표시 장치 및 그의 제조 방법
US20030117378A1 (en) 2001-12-21 2003-06-26 International Business Machines Corporation Device and system for retrieving and displaying handwritten annotations
JP2003207794A (ja) * 2002-01-11 2003-07-25 Sanyo Electric Co Ltd アクティブマトリクス型表示装置
JP4216092B2 (ja) * 2002-03-08 2009-01-28 株式会社半導体エネルギー研究所 液晶表示装置
KR100498544B1 (ko) * 2002-11-27 2005-07-01 엘지.필립스 엘시디 주식회사 액정표시장치 및 그 제조방법
US7310779B2 (en) 2003-06-26 2007-12-18 International Business Machines Corporation Method for creating and selecting active regions on physical documents
KR100527195B1 (ko) * 2003-07-25 2005-11-08 삼성에스디아이 주식회사 유기전계 발광표시장치
TWI226712B (en) * 2003-12-05 2005-01-11 Au Optronics Corp Pixel structure and fabricating method thereof
CN100399168C (zh) * 2003-12-16 2008-07-02 友达光电股份有限公司 画素结构及其制造方法
US7532899B2 (en) * 2004-04-15 2009-05-12 At&T Mobility Ii Llc System for providing location-based services in a wireless network, such as locating sets of desired locations
US7540451B2 (en) * 2006-09-05 2009-06-02 Se-Kure Controls, Inc. System for securing a cable to a portable article
JP5042662B2 (ja) * 2007-02-21 2012-10-03 三菱電機株式会社 液晶表示装置及びその製造方法
JP2009226115A (ja) * 2008-03-25 2009-10-08 Sri Sports Ltd ゴルフボール
KR101515382B1 (ko) 2008-08-26 2015-04-27 삼성디스플레이 주식회사 박막 트랜지스터 표시판
JP5347412B2 (ja) * 2008-10-01 2013-11-20 セイコーエプソン株式会社 電気光学装置及び電子機器
JP5589359B2 (ja) * 2009-01-05 2014-09-17 セイコーエプソン株式会社 電気光学装置及び電子機器
WO2011004755A1 (en) 2009-07-10 2011-01-13 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
WO2011043216A1 (en) 2009-10-09 2011-04-14 Semiconductor Energy Laboratory Co., Ltd. Light-emitting display device and electronic device including the same
US20130088660A1 (en) * 2010-06-15 2013-04-11 Sharp Kabushiki Kaisha Thin film transistor substrate and liquid crystal display device
CN103137616B (zh) 2011-11-25 2017-04-26 上海天马微电子有限公司 Tft阵列基板及其形成方法、显示面板
CN108054175A (zh) 2012-08-03 2018-05-18 株式会社半导体能源研究所 半导体装置
DE102013216824B4 (de) 2012-08-28 2024-10-17 Semiconductor Energy Laboratory Co., Ltd. Halbleitervorrichtung
TWI575663B (zh) 2012-08-31 2017-03-21 半導體能源研究所股份有限公司 半導體裝置
US20140063419A1 (en) * 2012-09-04 2014-03-06 Shenzhen China Star Optoelectronics Technology Co. Ltd. Display Panel and Liquid Crystal Display Device
KR102400509B1 (ko) 2012-09-13 2022-05-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치
KR20220145922A (ko) 2012-12-25 2022-10-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US9905585B2 (en) 2012-12-25 2018-02-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising capacitor
US9231002B2 (en) 2013-05-03 2016-01-05 Semiconductor Energy Laboratory Co., Ltd. Display device and electronic device
TW202414844A (zh) 2013-05-16 2024-04-01 日商半導體能源研究所股份有限公司 半導體裝置
JP6577224B2 (ja) 2015-04-23 2019-09-18 株式会社ジャパンディスプレイ 表示装置
CN205789971U (zh) * 2016-05-16 2016-12-07 京东方科技集团股份有限公司 薄膜晶体管阵列基板及应用其的显示装置
CN112740309B (zh) * 2018-09-21 2022-09-06 夏普株式会社 显示装置

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3307150B2 (ja) 1995-03-20 2002-07-24 ソニー株式会社 アクティブマトリクス型表示装置
FR2284984A1 (fr) * 1974-09-13 1976-04-09 Commissariat Energie Atomique Procede de realisation de transistors m.o.s. sur isolant pour la detection de rayonnements
US4239346A (en) * 1979-05-23 1980-12-16 Hughes Aircraft Company Compact liquid crystal display system
JPS6045219A (ja) * 1983-08-23 1985-03-11 Toshiba Corp アクテイブマトリクス型表示装置
JPS60213062A (ja) 1984-04-09 1985-10-25 Hosiden Electronics Co Ltd 薄膜トランジスタの製造方法
US4598305A (en) * 1984-06-18 1986-07-01 Xerox Corporation Depletion mode thin film semiconductor photodetectors
JPS6329924A (ja) * 1986-07-23 1988-02-08 Komatsu Ltd 半導体装置の製造方法
JP2702117B2 (ja) 1987-01-28 1998-01-21 日本電気株式会社 音声二重通信装置
US5327001A (en) 1987-09-09 1994-07-05 Casio Computer Co., Ltd. Thin film transistor array having single light shield layer over transistors and gate and drain lines
JPH01183628A (ja) 1988-01-18 1989-07-21 Matsushita Electric Ind Co Ltd アクティブマトリックスアレイ
JPH0210877A (ja) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd 光学的パターン検出装置の製造方法
JPH02181419A (ja) * 1989-01-06 1990-07-16 Hitachi Ltd レーザアニール方法
US5051570A (en) * 1989-01-20 1991-09-24 Nec Corporation Liquid crystal light valve showing an improved display contrast
JPH02245742A (ja) * 1989-03-17 1990-10-01 Matsushita Electric Ind Co Ltd 反射型液晶表示デバイス
JPH039562A (ja) * 1989-06-07 1991-01-17 Sharp Corp 半導体装置
JPH0323671A (ja) * 1989-06-21 1991-01-31 Nippon Sheet Glass Co Ltd 集積化機能デバイス及びその製造方法並びにこのデバイスを用いた機能モジュール
JP2538086B2 (ja) * 1990-01-11 1996-09-25 松下電器産業株式会社 液晶表示デバイスおよびその製造方法
JP2622183B2 (ja) * 1990-04-05 1997-06-18 シャープ株式会社 アクティブマトリクス表示装置
US5162933A (en) * 1990-05-16 1992-11-10 Nippon Telegraph And Telephone Corporation Active matrix structure for liquid crystal display elements wherein each of the gate/data lines includes at least a molybdenum-base alloy layer containing 0.5 to 10 wt. % of chromium
DE69125886T2 (de) * 1990-05-29 1997-11-20 Semiconductor Energy Lab Dünnfilmtransistoren
US5273910A (en) * 1990-08-08 1993-12-28 Minnesota Mining And Manufacturing Company Method of making a solid state electromagnetic radiation detector
US5221365A (en) * 1990-10-22 1993-06-22 Sanyo Electric Co., Ltd. Photovoltaic cell and method of manufacturing polycrystalline semiconductive film
JP2772405B2 (ja) 1990-11-22 1998-07-02 株式会社日立製作所 液晶表示装置
KR960010723B1 (ko) * 1990-12-20 1996-08-07 가부시끼가이샤 한도오따이 에네루기 겐큐쇼 전기광학장치
US5289030A (en) * 1991-03-06 1994-02-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device with oxide layer
JP2625267B2 (ja) * 1991-03-07 1997-07-02 シャープ株式会社 アクティブマトリクス表示装置
JP3277548B2 (ja) * 1991-05-08 2002-04-22 セイコーエプソン株式会社 ディスプレイ基板
US6849872B1 (en) * 1991-08-26 2005-02-01 Semiconductor Energy Laboratory Co., Ltd. Thin film transistor
US5191832A (en) * 1991-09-05 1993-03-09 Tsay Shih C Tubular stuffing apparatus
KR940004322B1 (ko) 1991-09-05 1994-05-19 삼성전자 주식회사 액정표시장치 및 그 제조방법
JPH05142570A (ja) * 1991-11-20 1993-06-11 Sharp Corp アクテイブマトリクス基板
US5317433A (en) * 1991-12-02 1994-05-31 Canon Kabushiki Kaisha Image display device with a transistor on one side of insulating layer and liquid crystal on the other side
JPH05249478A (ja) * 1991-12-25 1993-09-28 Toshiba Corp 液晶表示装置
US5459595A (en) * 1992-02-07 1995-10-17 Sharp Kabushiki Kaisha Active matrix liquid crystal display
US5254480A (en) * 1992-02-20 1993-10-19 Minnesota Mining And Manufacturing Company Process for producing a large area solid state radiation detector
NL194848C (nl) * 1992-06-01 2003-04-03 Samsung Electronics Co Ltd Vloeibaar-kristalindicatorinrichting.
EP0592063A3 (en) * 1992-09-14 1994-07-13 Toshiba Kk Active matrix liquid crystal display device
JP3127619B2 (ja) * 1992-10-21 2001-01-29 セイコーエプソン株式会社 アクティブマトリクス基板
JP2924506B2 (ja) * 1992-10-27 1999-07-26 日本電気株式会社 アクティブマトリックス型液晶表示装置の画素構造
JP2950061B2 (ja) 1992-11-13 1999-09-20 日本電気株式会社 液晶表示素子
CN1088002A (zh) * 1992-11-16 1994-06-15 东京电子株式会社 制造液晶显示器基板及评价半导体晶体的方法与装置
KR960001847B1 (ko) 1992-12-21 1996-02-06 주식회사유공 에틸렌-알파올레핀계 공중합체 고무의 제조방법
EP0603866B1 (en) * 1992-12-25 2002-07-24 Sony Corporation Active matrix substrate
EP0642179B1 (en) * 1993-03-23 1999-02-03 TDK Corporation Solid state imaging device and process for production thereof
US5719065A (en) * 1993-10-01 1998-02-17 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device with removable spacers
JP3298109B2 (ja) * 1994-02-17 2002-07-02 セイコーエプソン株式会社 アクティブマトリクス基板及びカラー液晶表示装置
US5822026A (en) * 1994-02-17 1998-10-13 Seiko Epson Corporation Active matrix substrate and color liquid crystal display
JPH07302912A (ja) 1994-04-29 1995-11-14 Semiconductor Energy Lab Co Ltd 半導体装置
CN100477247C (zh) 1994-06-02 2009-04-08 株式会社半导体能源研究所 有源矩阵显示器和电光元件
TW289097B (enExample) * 1994-08-24 1996-10-21 Hitachi Ltd
JP3238020B2 (ja) 1994-09-16 2001-12-10 株式会社東芝 アクティブマトリクス表示装置の製造方法
JPH08122768A (ja) 1994-10-19 1996-05-17 Sony Corp 表示装置
JP3081474B2 (ja) * 1994-11-11 2000-08-28 三洋電機株式会社 液晶表示装置
GB9424598D0 (en) * 1994-12-06 1995-01-25 Philips Electronics Uk Ltd Semiconductor memory with non-volatile memory transistor
KR0169385B1 (ko) 1995-03-10 1999-03-20 김광호 블랙 매트릭스 구조가 가능한 액정용 박막 트랜지스터 기판 및 그 제조방법
JPH08306926A (ja) 1995-05-07 1996-11-22 Semiconductor Energy Lab Co Ltd 液晶電気光学装置
JPH0926603A (ja) * 1995-05-08 1997-01-28 Semiconductor Energy Lab Co Ltd 表示装置
US6372534B1 (en) * 1995-06-06 2002-04-16 Lg. Philips Lcd Co., Ltd Method of making a TFT array with photo-imageable insulating layer over address lines
JP3200552B2 (ja) 1995-10-26 2001-08-20 株式会社日立製作所 アクティブマトリクス型液晶表示装置
KR0158260B1 (ko) * 1995-11-25 1998-12-15 구자홍 엑티브 매트릭스 액정표시장치의 매트릭스 어레이 및 제조방법
TW309633B (enExample) * 1995-12-14 1997-07-01 Handotai Energy Kenkyusho Kk
JPH09298305A (ja) * 1996-05-08 1997-11-18 Semiconductor Energy Lab Co Ltd 薄膜トランジスタおよびかかる薄膜トランジスタを有する液晶表示装置
JP3433779B2 (ja) 1996-06-19 2003-08-04 シャープ株式会社 アクティブマトリクス基板およびその製造方法
JP3126661B2 (ja) * 1996-06-25 2001-01-22 株式会社半導体エネルギー研究所 液晶表示装置
JPH1039333A (ja) * 1996-07-19 1998-02-13 Sharp Corp アクティブマトリクス型表示装置およびその欠陥修正方法
KR100209620B1 (ko) * 1996-08-31 1999-07-15 구자홍 액정 표시 장치 및 그 제조방법
JP3634089B2 (ja) * 1996-09-04 2005-03-30 株式会社半導体エネルギー研究所 表示装置
JP3813280B2 (ja) 1997-01-08 2006-08-23 エルジー フィリップス エルシーディー カンパニー リミテッド 液晶表示装置および電子機器
JP3784491B2 (ja) 1997-03-28 2006-06-14 株式会社半導体エネルギー研究所 アクティブマトリクス型の表示装置
JPH1123671A (ja) 1997-06-30 1999-01-29 Ando Electric Co Ltd 半導体検査装置の冷却方式
CN1139837C (zh) * 1998-10-01 2004-02-25 三星电子株式会社 液晶显示器用薄膜晶体管阵列基板及其制造方法
KR100961847B1 (ko) 2008-02-11 2010-06-08 이승균 에어 컴프레서

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