JPH10503548A - 架橋結合された粘弾性高分子材料に硬化可能なアクリル系シロップ - Google Patents
架橋結合された粘弾性高分子材料に硬化可能なアクリル系シロップInfo
- Publication number
- JPH10503548A JPH10503548A JP8506654A JP50665496A JPH10503548A JP H10503548 A JPH10503548 A JP H10503548A JP 8506654 A JP8506654 A JP 8506654A JP 50665496 A JP50665496 A JP 50665496A JP H10503548 A JPH10503548 A JP H10503548A
- Authority
- JP
- Japan
- Prior art keywords
- group
- syrup
- radiation
- weight
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006188 syrup Substances 0.000 title claims abstract description 81
- 235000020357 syrup Nutrition 0.000 title claims abstract description 81
- 239000002861 polymer material Substances 0.000 title claims description 24
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title claims description 11
- 239000000178 monomer Substances 0.000 claims abstract description 168
- 230000005855 radiation Effects 0.000 claims abstract description 95
- 229920000642 polymer Polymers 0.000 claims abstract description 62
- 239000000463 material Substances 0.000 claims abstract description 20
- 239000002904 solvent Substances 0.000 claims abstract description 18
- 239000000203 mixture Substances 0.000 claims description 83
- -1 polyethylene Polymers 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 28
- 229920006395 saturated elastomer Polymers 0.000 claims description 23
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 229910052760 oxygen Inorganic materials 0.000 claims description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 17
- 239000003999 initiator Substances 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000003505 polymerization initiator Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 239000004698 Polyethylene Substances 0.000 claims description 9
- 229920000573 polyethylene Polymers 0.000 claims description 9
- 150000003254 radicals Chemical class 0.000 claims description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 8
- 230000036961 partial effect Effects 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 7
- 150000002431 hydrogen Chemical class 0.000 claims description 7
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 230000009477 glass transition Effects 0.000 claims description 5
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical group CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- CUXGDKOCSSIRKK-UHFFFAOYSA-N 7-methyloctyl prop-2-enoate Chemical compound CC(C)CCCCCCOC(=O)C=C CUXGDKOCSSIRKK-UHFFFAOYSA-N 0.000 claims description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 125000002837 carbocyclic group Chemical group 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- FWLDHHJLVGRRHD-UHFFFAOYSA-N decyl prop-2-enoate Chemical compound CCCCCCCCCCOC(=O)C=C FWLDHHJLVGRRHD-UHFFFAOYSA-N 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims description 3
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 claims description 3
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 claims description 3
- AWGZKFQMWZYCHF-UHFFFAOYSA-N n-octylprop-2-enamide Chemical compound CCCCCCCCNC(=O)C=C AWGZKFQMWZYCHF-UHFFFAOYSA-N 0.000 claims description 3
- 150000002978 peroxides Chemical class 0.000 claims description 3
- 238000007363 ring formation reaction Methods 0.000 claims description 3
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 claims description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- 230000003213 activating effect Effects 0.000 claims description 2
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims description 2
- 238000010526 radical polymerization reaction Methods 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- ZRBGYWKZMWPOEK-UHFFFAOYSA-N butanoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCC(O)=O ZRBGYWKZMWPOEK-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 35
- 239000000853 adhesive Substances 0.000 description 15
- 230000001070 adhesive effect Effects 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- 239000010410 layer Substances 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- 238000001994 activation Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 239000012798 spherical particle Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- 230000004913 activation Effects 0.000 description 6
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 5
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 5
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000011065 in-situ storage Methods 0.000 description 4
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000004971 Cross linker Substances 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012943 hotmelt Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000004005 microsphere Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DSTUKHPLWATFCG-UHFFFAOYSA-N (2-benzoylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C(=O)C1=CC=CC=C1 DSTUKHPLWATFCG-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 2
- ROPDSOYFYJCSTC-UHFFFAOYSA-N 2-phenoxyundecyl prop-2-enoate Chemical compound CCCCCCCCCC(COC(=O)C=C)OC1=CC=CC=C1 ROPDSOYFYJCSTC-UHFFFAOYSA-N 0.000 description 2
- RBTZRUFZVIIWFA-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl 4-(4-chlorobenzoyl)benzoate Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(C(=O)OCCOC(=O)C=C)C=C1 RBTZRUFZVIIWFA-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 206010073306 Exposure to radiation Diseases 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 150000008062 acetophenones Chemical class 0.000 description 2
- 150000001266 acyl halides Chemical class 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000002671 adjuvant Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- GHLKSLMMWAKNBM-UHFFFAOYSA-N dodecane-1,12-diol Chemical compound OCCCCCCCCCCCCO GHLKSLMMWAKNBM-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 125000004970 halomethyl group Chemical group 0.000 description 2
- 229920006158 high molecular weight polymer Polymers 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 125000005968 oxazolinyl group Chemical group 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- 230000002165 photosensitisation Effects 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000004053 quinones Chemical class 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- SCMVPOVMOHQFKU-UHFFFAOYSA-N 1-(aziridin-1-yl)prop-2-en-1-one Chemical class C=CC(=O)N1CC1 SCMVPOVMOHQFKU-UHFFFAOYSA-N 0.000 description 1
- IACMYKRFXALMMX-UHFFFAOYSA-N 1-[4-(2-hydroxyethyl)phenyl]-2,2-dimethoxyethanone Chemical compound COC(OC)C(=O)C1=CC=C(CCO)C=C1 IACMYKRFXALMMX-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- YKNKBBMRKMLLJS-UHFFFAOYSA-N 1-phenylaziridine Chemical compound C1CN1C1=CC=CC=C1 YKNKBBMRKMLLJS-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- VSRMDJXITMVPNC-UHFFFAOYSA-N 2,2-dimethoxy-1,2-diphenylethanol Chemical compound C=1C=CC=CC=1C(OC)(OC)C(O)C1=CC=CC=C1 VSRMDJXITMVPNC-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- XAGMYWHUGFNWAO-UHFFFAOYSA-N 2-ethyl-4h-1,3-oxazol-5-one Chemical compound CCC1=NCC(=O)O1 XAGMYWHUGFNWAO-UHFFFAOYSA-N 0.000 description 1
- FHFVUEXQSQXWSP-UHFFFAOYSA-N 2-hydroxy-2,2-dimethoxy-1-phenylethanone Chemical compound COC(O)(OC)C(=O)C1=CC=CC=C1 FHFVUEXQSQXWSP-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- LNARBTSTFCUKML-UHFFFAOYSA-N 4,4-dimethyl-2-phenyl-1,3-oxazol-5-one Chemical compound O1C(=O)C(C)(C)N=C1C1=CC=CC=C1 LNARBTSTFCUKML-UHFFFAOYSA-N 0.000 description 1
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- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
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- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
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- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
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- 230000005484 gravity Effects 0.000 description 1
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- 238000010128 melt processing Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- RJKCKKDSSSRYCB-UHFFFAOYSA-N tebutam Chemical compound CC(C)(C)C(=O)N(C(C)C)CC1=CC=CC=C1 RJKCKKDSSSRYCB-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- 238000007725 thermal activation Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000003190 viscoelastic substance Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.下記成分: a)1)95〜100重量部の少なくとも1種のフリーラジカル性重合可能なエチレ ン性不飽和モノマー、および、 2)0〜5重量部の、(輻射線感応性α−開裂性グループを有するエチレン性 不飽和モノマー、 を含む、約85〜99.9重量部の溶媒モノマー混合物、 b)1)95〜100重量%の1種以上のフリーラジカル性重合可能なエチレン性不 飽和モノマーから誘導された部分単位、および、 2)0〜5重量%の放射線感応性α−開裂性グループを有するエチレン性不飽 和モノマーから誘導された部分単位、 を含む約0.1〜15重量%の溶質ポリマー、 (但し、前記モノマー混合物が、ゼロ重量部の、前記輻射線感応性α−開裂性グ ループを有するエチレン性不飽和モノマーを含むときは、前記ポリマーの第2の 成分の重量パーセントは、0にはなり得ないものとする。) c)0〜5重量部のフリーラジカル性重合可能なポリエチレン性不飽和モノマー 、および d)0〜3重量部の飽和エネルギー活性化重合開始剤、 を含む、架橋結合された粘弾性高分子材料に硬化可能なシロップ。 2.前記モノマー混合物の前記少なくとも1種のフリーラジカル性重合可能な エチレン性不飽和モノマーが、約0℃より低いガラス転移温度を有するポリマー に単独重合することが可能なモノエチレン性不飽和モノマーを含む、請求の範囲 第1項に記載のシロップ。 3.前記(メタ)アクリル酸エステルが、アクリル酸イソオクチル、アクリル 酸2−エチルヘキシル、アクリル酸イソノニル、アク リル酸デシル、アクリル酸ドデシル、アクリル酸ヘキシルおよびアクリル酸ブチ ルからなる群から選ばれる、請求の範囲第2項に記載のシロップ。 4.前記少なくとも1種のフリーラジカル性重合可能なエチレン性不飽和モノ マーが、さらに約50℃より高いガラス転移温度を有するポリマーに単独重合する ことが可能なモノエチレン性不飽和モノマーを含む、請求の範囲第2項に記載の シロップ。 5.前記第2のモノエチレン性不飽和モノマーが、(メタ)アクリル酸、イタ コン酸、N,N−ジメチルアクリルアミド、N−オクチルアクリルアミド、アク リル酸2−ヒドロキシエチル、N−ビニルピロリドン、N−ビニルカプロラクタ ム、アクリロニトリル、アクリル酸テトラヒドロフルフリル、およびアクリル酸 イソボルニルからなる群から選ばれる、請求の範囲第4項に記載のシロップ。 6.前記放射線感応性グループを有するエチレン性不飽和モノマーが下記式: 〔但し、上式中、 RはH又はC1〜C3アルキルグループ、好ましくはH又はメチルグループであ り、 XはO又はNHであり、 nは0又は1であり、 mは0又は1〜5の整数であり、 a,bおよびcは、互いに独立に、0又は1であり、 M1はCH2又はSiR1R2であり、 M2はCR3R4又はSiR1R2であり、 M3はO,NH,C(O),C(O)O,C(O)NH、又はOC(O)NHであり、 R1およびR2は、互いに独立に、H又はC1〜C4アルキルグループであり、 R3およびR4は、互いに独立に、H、1〜14個の炭素原子を有するアルキルグ ループ、3〜14個の炭素原子を有するシクロアルキルグループ、5〜12個の環形成 原子を有するアリールグループ、又は6〜26個の炭素原子並びに0〜3個のS, Nおよび非過酸化物性Oからなる異種原子を有するアレーニルグループであるか 、或いはR3およびR4は、それらが結合している炭素原子とともに4〜12個の環 形成原子を含む炭素環状環を形成しており、 Gは共有結合、(CH2)d、又は(CH2)d O(但し、dは1〜4の、好ましくは1〜2 の整数である)であり、 Zは、下記式の放射線感応性α−開裂性グループ であり、 但し上式中、Arは6〜12炭素原子を有する置換されたアレーンであり、 R5は水素、C1〜C12アルキルグループ、C1〜C12アルコキシグループ、又 はフェニルグループであり、そして、 R9は、下記式のグループ: からなる群から選ばれ、 但し、上式において、R4は水素、C1〜C12アルキルグループ、C1〜C12ア ルコキシグループ、およびフェニルグループからなる群から選ばれ、但し、R3 およびR5がともに、Zのカルボニルグループに対して、オルソ位置にあるとき は、これらは、ともに、 の一つであることができ、そして R6,R7およびR8は互いに独立に、ヒドロキシル、フェニル、C1〜C6アルキ ル、C1〜C6アルコキシ、およびNR10R11グループ(但しR10およびR11は、互 いに独立に、水素、又はC1〜C6アルキルグループである)からなる群から選ば れ、 但し、R9が−CR6R7R8であるときは、下記要件: (1)R6,R7およびR8の少なくとも1つが、ヒドロキシル、アルコキシおよ び−NR10R11からなる群から選ばれること、 (2)R6,R7およびR8のいずれか2つが、ともに−CpH2p−および−OCpH2pO −(但し、pは2および3のいずれかである)の一つであって、それらが結合し ている炭素原子とともに5員環又は6員環を形成していること、および、 (3)R6,R7およびR8のいずれか2つが、ともにカルボニルグループであり R6,R7およびR8の残余の1つがヒドロキシル、アルコキシ、−NR10R11および フェニルグループからなる群から 選ばれることの1つが満たされていなければならない〕 を有する、請求の範囲第1項に記載のシロップ。 7.前記輻射線感応性グループを有するエチレン性不飽和モノマーのR9が である請求の範囲第6項に記載のシロップ。 8.XがOであり、mが0であり、Gが(CH2)dO(但し、dは2である)である 、請求の範囲第6項に記載のシロップ。 9.前記輻射線感応性α−開裂性グループを有するエチレン性不飽和モノマー のArがベンゼングループである、請求の範囲第6項に記載のシロップ。 10.前記エネルギー活性化重合開始剤が、0.001〜1.0重量部の量で存在してい る、請求の範囲第1項に記載のシロップ。 11.前記エネルギーが紫外線照射である、請求の範囲第10項に記載のシロップ 。 12.前記シロップが、塗布可能な粘度を有している、請求の範囲第1項に記載 のシロップ。 13.下記工程: a)1)(a)少なくとも1種のフリーラジカル性重合可能なエチレン性不飽和 モノマー、および、 (b)0〜5重量部の、輻射線感応性グループを有するエチレン性不飽和モノマ ー を含む溶媒モノマー混合物、および 2)0〜3重量部の飽和エネルギー活性化重合開始剤、 を含む組成物を調製し(但し、前記輻射線感応性グループを有する エチレン性不飽和モノマーの量がゼロであるときは、前記飽和開始剤の量はゼロ より大きくなければならない。)、 b)前記組成物をエネルギーに露出して、前記モノマー混合物を部分的に重合し 、それによって塗布可能なシロップを調製し、 c)前記シロップに、前記モノマー混合物に最初に含まれていたモノマーの全量 をもとにして、 1)0〜3重量部の飽和エネルギー活性化重合開始剤、 2)0〜3重量部の、輻射線感応性α−開裂性グループを有するエチレン性不飽 和モノマー、(但し、前記モノマー混合物中の前記輻射線感応性α−開裂性グル ープを有するエチレン性不飽和モノマーの量がゼロであるときは、前記シロップ に添加された前記輻射線感応性α−開裂性グループを有するエチレン性不飽和モ ノマーの量はゼロより大きくなければならない)、および、 3)0〜5重量部のフリーラジカル性重合が可能なポリエチレン性不飽和モノ マー、 を添加し、そして、 d)得られたシロップを、前記開始剤および前記輻射線感応性α−開裂性グルー プを有するエチレン性不飽和モノマーの前記輻射線感応性α−開裂性グループを 活性化するエネルギーに露出して、架橋結合された粘弾性高分子材料を形成する 、 を含む、架橋結合された粘弾性高分子材料を製造する方法。 14.前記輻射線感応性α−開裂性グループを有するエチレン性不飽和モノマー が下記式: 〔但し、上式中、 RはH又はC1〜C3アルキルグループ、好ましくはH又はメチルグループであ り、 XはO又はNHであり、 nは0又は1であり、 mは0又は1〜5の整数であり、 a,bおよびcは、互いに独立に、0又は1であり、 M1はCH2又はSiR1R2であり、 M2はCR3R4又はSiR1R2であり、 M3はO,NH,C(O),C(O)O,C(O)NH、又はOC(O)NHであり、 R1およびR2は、互いに独立に、H又はC1〜C4アルキルグループであり、 R3およびR4は、互いに独立に、H、1〜14個の炭素原子を有するアルキルグ ループ、3〜14個の炭素原子を有するシクロアルキルグループ、5〜12個の環形成 原子を有するアリールグループ、又は6〜26個の炭素原子並びに0〜3個のS, Nおよび非過酸化物性Oからなる異種原子を有するアレーニルグループであるか 、或いはR3およびR4は、それらが結合している炭素原子とともに4〜12個の環 形成原子を含む炭素環状環を形成しており、 Gは共有結合、(CH2)d、又は(CH2)dO(但し、dは1〜4の、好ましくは1〜2の 整数である)であり、 Zは、下記式の輻射線感応性α−開裂性グループ であり、 但し上式中、Arは6〜12炭素原子を有する置換されたアレーンであり、 R5は水素、C1〜C12アルキルグループ、C1〜C12アルコキシグループ、又 はフェニルグループであり、そして、 R9は、下記式のグループ: からなる群から選ばれ、 但し、上式において、R4は水素、C1〜C12アルキルグループ、C1〜C12ア ルコキシグループ、およびフェニルグループからなる群から選ばれ、但し、R3 およびR5がともに、Zのカルボニルグループに対して、オルソ位置にあるとき は、これらは、ともに、 の一つであることができ、そして R6,R7およびR8は互いに独立に、ヒドロキシル、フェニル、C1〜C6アルキ ル、C1〜C6アルコキシ、およびNR10R11グループ(但しR10およびR11は、互 いに独立に、水素、又はC1〜C6アルキルグループである)からなる群から選ば れ、 但し、R9が−CR6R7R8であるときは、下記要件: (1)R6,R7およびR8の少なくとも1つが、ヒドロキシル、アルコキシおよ びNR10R11からなる群から選ばれること、 (2)R6,R7およびR8のいずれか2つが、ともに−CpH2p−および−OCpH2pO −(但し、pは2および3のいずれかである )の一つであって、それらが結合している炭素原子とともに5員環又は6員環を 形成していること、および、 (3)R6,R7およびR8のいずれか2つが、ともにカルボニルグループであり R6,R7およびR8の残余の1つがヒドロキシル、アルコキシ、−NR10R11および フェニルグループからなる群から選ばれることの1つが満たされていなければな らない。〕 を有する、請求の範囲第13項に記載の方法。 15.さらに、 e)前記シロップに照射する前に、前記シロップを基体に塗布する、工程を含む 、請求の範囲第14項に記載の方法。 16.前記基体が、屈曲自在なウェブである、請求の範囲第15項に記載の方法。
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- 1995-07-28 DE DE69520434T patent/DE69520434T2/de not_active Expired - Lifetime
- 1995-07-28 ES ES95928204T patent/ES2142489T3/es not_active Expired - Lifetime
- 1995-07-28 US US08/522,294 patent/US5773485A/en not_active Expired - Lifetime
- 1995-07-28 EP EP95928204A patent/EP0772655B1/en not_active Expired - Lifetime
- 1995-07-28 EP EP95936189A patent/EP0772656B1/en not_active Expired - Lifetime
- 1995-07-28 US US08/505,350 patent/US5902836A/en not_active Expired - Lifetime
- 1995-07-28 CA CA002196169A patent/CA2196169A1/en not_active Abandoned
- 1995-07-28 WO PCT/US1995/009502 patent/WO1996005249A2/en active IP Right Grant
- 1995-07-28 JP JP50665496A patent/JP3548933B2/ja not_active Expired - Fee Related
- 1995-07-28 DE DE69515310T patent/DE69515310T2/de not_active Expired - Lifetime
- 1995-07-28 KR KR1019970700535A patent/KR970704849A/ko not_active Application Discontinuation
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US7589147B2 (en) | 2003-05-19 | 2009-09-15 | Nippon Shokubai Co., Ltd. | Resin composition for thermal conductive material and thermal conductive material |
JP2013528672A (ja) * | 2010-04-05 | 2013-07-11 | スリーエム イノベイティブ プロパティズ カンパニー | アミノアルキル(メタ)アクリロイル溶媒モノマーを有する架橋性シロップコポリマー |
JP2017519849A (ja) * | 2014-04-24 | 2017-07-20 | スリーエム イノベイティブ プロパティズ カンパニー | 開裂型架橋剤を含む組成物及び方法 |
Also Published As
Publication number | Publication date |
---|---|
DE69515310T2 (de) | 2000-07-27 |
ES2142489T3 (es) | 2000-04-16 |
US5773485A (en) | 1998-06-30 |
JPH10503802A (ja) | 1998-04-07 |
DE69520434T2 (de) | 2001-10-18 |
US6245922B1 (en) | 2001-06-12 |
EP0772655A1 (en) | 1997-05-14 |
WO1996004346A1 (en) | 1996-02-15 |
DE69515310D1 (de) | 2000-04-06 |
JP3545414B2 (ja) | 2004-07-21 |
DE69520434D1 (de) | 2001-04-26 |
WO1996005249A2 (en) | 1996-02-22 |
EP0772655B1 (en) | 2000-03-01 |
JP3548933B2 (ja) | 2004-08-04 |
KR970704849A (ko) | 1997-09-06 |
WO1996005249A3 (en) | 1996-03-28 |
EP0772656A2 (en) | 1997-05-14 |
CA2196169A1 (en) | 1996-02-15 |
EP0772656B1 (en) | 2001-03-21 |
US5902836A (en) | 1999-05-11 |
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