JP6956774B2 - 希土類酸化物のイオンアシスト蒸着トップコート - Google Patents
希土類酸化物のイオンアシスト蒸着トップコート Download PDFInfo
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- JP6956774B2 JP6956774B2 JP2019220830A JP2019220830A JP6956774B2 JP 6956774 B2 JP6956774 B2 JP 6956774B2 JP 2019220830 A JP2019220830 A JP 2019220830A JP 2019220830 A JP2019220830 A JP 2019220830A JP 6956774 B2 JP6956774 B2 JP 6956774B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/046—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with at least one amorphous inorganic material layer, e.g. DLC, a-C:H, a-C:Me, the layer being doped or not
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
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- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
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- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
- B32B2250/44—Number of layers variable across the laminate
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B2255/00—Coating on the layer surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- B32B2255/20—Inorganic coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B2307/00—Properties of the layers or laminate
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- B32B2307/702—Amorphous
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- B32B2307/70—Other properties
- B32B2307/704—Crystalline
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- B32B2307/70—Other properties
- B32B2307/752—Corrosion inhibitor
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- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
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- Y10T428/24331—Composite web or sheet including nonapertured component
- Y10T428/24339—Keyed
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/24992—Density or compression of components
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Description
Claims (20)
- 本体と、
本体の少なくとも1つの表面上の第1保護層であって、
第1保護層は耐プラズマ性セラミックスを含み、
第1保護層は複数の亀裂及び細孔を含んでいる第1保護層と、
第1保護層の少なくとも一部を覆う保護層スタックであって、保護層スタックは、
コンフォーマルな第2保護層であって、
コンフォーマルな第2保護層は、アモルファスの耐プラズマ性希土類酸化物を含み、
コンフォーマルな第2保護層は、1%未満の空孔率を有して、第1保護層の複数の亀裂及び細孔を封止している第2保護層と、
コンフォーマルな第2保護層上の第3保護層であって、
第3保護層は第2耐プラズマ性セラミックスを含み、
第3保護層は結晶構造を有し、
第3保護層は、コンフォーマルな第2保護層とは異なる組成を有している第3保護層とを含んでいる保護層スタックとを含むチャンバコンポーネント。 - 第1保護層は、約50ミクロンを超える厚さを有し、
コンフォーマルな第2保護層は50ミクロン未満の厚さを有し、
第3保護層は50ミクロン未満の厚さを有し、
第1保護層の表面粗さは0.5〜180マイクロインチである、請求項1に記載のチャンバコンポーネント。 - 第1保護層は、Al2O3、Y2O3、SiO2、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含むプラズマ溶射層である、請求項1に記載のチャンバコンポーネント。
- コンフォーマルな第2保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、Nd2O3、YF3、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、YF3、Nd2O3、Er4Al2O9、ErAlO3、Gd4Al2O9、GdAlO3、Nd3Al5O12、Nd4Al2O9、NdAlO3、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含むイオンアシスト蒸着(IAD)堆積層である、請求項1に記載のチャンバコンポーネント。
- 第3保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含んでいる、請求項1に記載のチャンバコンポーネント。
- コンフォーマルな第2保護層はEr3Al5O12を含んでいる、請求項1に記載のチャンバコンポーネント。
- 第3保護層はEr2O3を含んでいる、請求項1に記載のチャンバコンポーネント。
- 前記結晶構造はナノ結晶構造である、請求項7に記載のチャンバコンポーネント。
- コンフォーマルな第2保護層は、第1保護層を、本体の少なくとも1つの表面上の1つ以上の第1位置で覆っているが、1つ以上の第2位置では覆っていない、請求項8に記載のチャンバコンポーネント。
- 本体は、金属、金属合金、又は金属不純物を有するセラミックスのうちの1つ以上を含み、
コンフォーマルな第2保護層は、処理ガスが第1保護層の複数の亀裂及び細孔を貫通し、本体内の金属との反応を防止するためのバリアとしての役割を果たしている、請求項1に記載のチャンバコンポーネント。 - 第1保護層に接触するコンフォーマルな第2保護層の底部は第1酸素濃度を有し、
コンフォーマルな第2保護層の上部はより高い第2酸素濃度を有している、請求項1に記載のチャンバコンポーネント。 - プラズマ溶射プロセスを実行して、物品の少なくとも1つの表面に第1保護層を堆積させる工程であって、
第1保護層は第1耐プラズマ性セラミックスを含み、
第1保護層は複数の亀裂及び細孔を有している工程と、
イオンアシスト蒸着(IAD)を実行して、第1保護層の少なくとも一部にコンフォーマルな第2保護層を堆積させる工程であって、
コンフォーマルな第2保護層は、アモルファスの耐プラズマ性希土類酸化物を含み、
コンフォーマルな第2保護層は、1%未満の空孔率を有して、第1保護層の複数の亀裂及び細孔を封止している工程と、
IADを実行して、コンフォーマルな第2保護層上に第3保護層を堆積させる工程であって、
第3保護層は第2耐プラズマ性セラミックスを含み、
第3保護層は結晶構造を有し、
第3保護層は、コンフォーマルな第2保護層とは異なる組成を有している工程とを含む方法。 - 第1保護層は、約50ミクロンを超える厚さを有し、
コンフォーマルな第2保護層は50ミクロン未満の厚さを有し、
第3保護層は50ミクロン未満の厚さを有し、
第1保護層の表面粗さは0.5〜180マイクロインチである、請求項12に記載の方法。 - コンフォーマルな第2保護層の堆積中に前記物品を冷却して、前記物品を約150℃以下の温度に維持する工程をさらに含む、請求項12に記載の方法。
- 前記物品はエッチングリアクタのチャンバライナーであり、
チャンバライナーは中空円筒形状を有し
IADを実行して、コンフォーマルな第2保護層を堆積させる工程は、
前記物品の第1開口部にターゲットを配置する工程と、
前記物品の内部の第1部分をコーティングする工程と、
その後、前記物品の第2開口部にターゲットを配置する工程と、
前記物品の内部の第2部分をコーティングする工程とを含んでいる、請求項12に記載の方法。 - コンフォーマルな第2保護層を堆積させる前に、
前記物品の他の領域よりも高い浸食速度を示す前記物品の1つ以上の領域を特定する工程と、
前記物品をマスクでマスキングする工程であって、
前記物品の1つ以上の特定された領域はマスクから露出され、
コンフォーマルな第2保護層は、前記物品の1つ以上の特定された領域を被覆していく工程とを実行する工程をさらに含む、請求項12に記載の方法。 - 第1保護層は、Al2O3、Y2O3、SiO2、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含み、
コンフォーマルな第2保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、Nd2O3、YF3、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、YF3、Nd2O3、Er4Al2O9、ErAlO3、Gd4Al2O9、GdAlO3、Nd3Al5O12、Nd4Al2O9、NdAlO3、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含み、
第3保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含んでいる、請求項12に記載の方法。 - コンフォーマルな第2保護層はEr3Al5O12を含み、
第3保護層はEr2O3を含んでいる、請求項12に記載の方法。 - IADを実行しながら、窒素イオン又は酸素イオンのうちの1つを前記物品に衝突させる工程であって、第1耐プラズマ性セラミックスが窒化物である場合は窒素イオンが使用され、第1耐プラズマ性セラミックスが酸化物である場合は酸素イオンが使用される工程と、
IADを実行しながら、窒素イオン又は酸素イオンの流量を徐々に増加させる工程であって、コンフォーマルな第2保護層は、
コンフォーマルな第2保護層の底部に第1の酸素又は窒素の含有量と、
コンフォーマルな第2保護層の上部により高い第2の酸素又は窒素の含有量とを含んでいる工程とをさらに含む、請求項12に記載の方法。 - 本体と、
本体の少なくとも1つの表面上の第1保護層であって、
第1保護層は、Al2O3、Y2O3、SiO2、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含む第1耐プラズマ性セラミックスを含み、
第1保護層は複数の亀裂及び細孔を含んでいる第1保護層と、
第1保護層の少なくとも一部を覆う保護層スタックであって、保護層スタックは、
コンフォーマルな第2保護層であって、
コンフォーマルな第2保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、Nd2O3、YF3、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、YF3、Nd2O3、Er4Al2O9、ErAlO3、Gd4Al2O9、GdAlO3、Nd3Al5O12、Nd4Al2O9、NdAlO3、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含むアモルファスの耐プラズマ性希土類酸化物を含み、
コンフォーマルな第2保護層は、1%未満の空孔率を有して、第1保護層の複数の亀裂及び細孔を封止している第2保護層と、
コンフォーマルな第2保護層上の第3保護層であって、
第3保護層は、Y3Al5O12、Y4Al2O9、Er2O3、Gd2O3、Er3Al5O12、Gd3Al5O12、又はY4Al2O9とY2O3−ZrO2の固溶体とを含むセラミックス化合物のうちの1つ以上を含む第2耐プラズマ性セラミックスを含み、
第3保護層は結晶構造を有し、
第3保護層は、コンフォーマルな第2保護層とは異なる組成を有している第3保護層とを含んでいる保護層スタックとを含むチャンバコンポーネント。
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CN107916399A (zh) | 2018-04-17 |
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WO2015164263A1 (en) | 2015-10-29 |
CN111640643A (zh) | 2020-09-08 |
US20150311044A1 (en) | 2015-10-29 |
JP6630345B2 (ja) | 2020-01-15 |
US10563297B2 (en) | 2020-02-18 |
CN107916399B (zh) | 2020-05-12 |
JP6522724B2 (ja) | 2019-05-29 |
TWI665322B (zh) | 2019-07-11 |
TWI706047B (zh) | 2020-10-01 |
US10544500B2 (en) | 2020-01-28 |
US20180080116A1 (en) | 2018-03-22 |
KR20170141277A (ko) | 2017-12-22 |
JP2017520126A (ja) | 2017-07-20 |
CN105408987A (zh) | 2016-03-16 |
CN105408987B (zh) | 2020-06-23 |
US9869013B2 (en) | 2018-01-16 |
TW201606105A (zh) | 2016-02-16 |
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