DE3889024T2 - Verfahren zum Herstellen einer supraleitenden Dünnschicht. - Google Patents

Verfahren zum Herstellen einer supraleitenden Dünnschicht.

Info

Publication number
DE3889024T2
DE3889024T2 DE3889024T DE3889024T DE3889024T2 DE 3889024 T2 DE3889024 T2 DE 3889024T2 DE 3889024 T DE3889024 T DE 3889024T DE 3889024 T DE3889024 T DE 3889024T DE 3889024 T2 DE3889024 T2 DE 3889024T2
Authority
DE
Germany
Prior art keywords
producing
thin film
superconducting thin
superconducting
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3889024T
Other languages
English (en)
Other versions
DE3889024D1 (de
Inventor
Hideo C O Itami Works Itozaki
Saburo C O Itami Works Tanaka
Nobuhiko C O Itami Work Fujita
Shuji C O Itami Works Of Yazu
Tetsuji C O Itami Works Jodai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE3889024D1 publication Critical patent/DE3889024D1/de
Application granted granted Critical
Publication of DE3889024T2 publication Critical patent/DE3889024T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming superconductor layers
    • H10N60/0408—Processes for depositing or forming superconductor layers by sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—After-treatment, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/731—Sputter coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/732—Evaporative coating with superconducting material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing
DE3889024T 1987-07-13 1988-07-13 Verfahren zum Herstellen einer supraleitenden Dünnschicht. Expired - Fee Related DE3889024T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17445987 1987-07-13
JP23127287 1987-09-16

Publications (2)

Publication Number Publication Date
DE3889024D1 DE3889024D1 (de) 1994-05-19
DE3889024T2 true DE3889024T2 (de) 1994-10-13

Family

ID=26496064

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3889024T Expired - Fee Related DE3889024T2 (de) 1987-07-13 1988-07-13 Verfahren zum Herstellen einer supraleitenden Dünnschicht.

Country Status (4)

Country Link
US (1) US4988670A (de)
EP (1) EP0299870B1 (de)
DE (1) DE3889024T2 (de)
HK (1) HK87496A (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5211987A (en) * 1987-07-10 1993-05-18 Kabushiki Kaisha Toshiba Method and apparatus for forming refractory metal films
US4880771A (en) * 1988-02-12 1989-11-14 American Telephone And Telegraph Company, At&T Bell Laboratories Bismuth-lead-strontium-calcium-cuprate superconductors
DE3805010A1 (de) * 1988-02-18 1989-08-24 Kernforschungsanlage Juelich Verfahren zur herstellung duenner schichten aus oxydischem hochtemperatur-supraleiter
US4870052A (en) * 1988-03-08 1989-09-26 International Business Machines Corporation Tl-Ca-Ba-Cu-O compositions electrically superconducting above 120 degree K and processes for their preparation
JPH01239004A (ja) * 1988-03-17 1989-09-25 Matsushita Electric Ind Co Ltd 酸化物高温超電導体及び薄膜超電導体及びスパッタリング用ターゲット
JPH01305816A (ja) * 1988-06-01 1989-12-11 Agency Of Ind Science & Technol 高温超伝導体
JPH0286014A (ja) * 1988-06-17 1990-03-27 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜と、その成膜方法
KR920006533A (ko) * 1990-09-28 1992-04-27 제임스 조셉 드롱 증착된 박막의 장벽성을 개선하기 위한 플라즈마 어닐링 방법
DE69132972T2 (de) * 1991-01-07 2003-03-13 Ibm Supraleitender Feldeffekttransistor mit inverser MISFET-Struktur und Verfahren zu dessen Herstellung
EP0506582B1 (de) * 1991-03-28 1997-05-28 Sumitomo Electric Industries, Ltd. Verfahren zur Herstellung von mehrlagigen Dünnschichten
US5646095A (en) * 1991-06-18 1997-07-08 International Business Machines Corporation Selective insulation etching for fabricating superconductor microcircuits
FR2712308B1 (fr) * 1993-11-12 1996-01-26 Lagues Michel Jean Robert Procédé de dépôt d'un matériau sous forme de couches monomoléculaires.
US6214772B1 (en) * 1996-10-23 2001-04-10 Fujikura Ltd. Process for preparing polycrystalline thin film, process for preparing oxide superconductor, and apparatus therefor
DE50014931D1 (de) 1999-02-17 2008-03-13 Solvay Infra Bad Hoenningen Gm Supraleitende körper aus zinkdotiertem kupferoxidmaterial
WO2011041765A1 (en) * 2009-10-02 2011-04-07 Ambature L.L.C. High temperature superconducting materials and methods for modifying and creating same
WO2011041763A2 (en) * 2009-10-02 2011-04-07 Ambature L.L.C. Extremely low resistance materials and methods for modifying and creating same
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US9725799B2 (en) * 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
US9869013B2 (en) 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3932315A (en) * 1974-09-24 1976-01-13 E. I. Du Pont De Nemours & Company Superconductive barium-lead-bismuth oxides
JPS5512027A (en) * 1978-07-05 1980-01-28 Sanhausu Shiyokuhin Kk Method and line device for arranging and loading sealeddup and filled packages
US4622918A (en) * 1983-01-31 1986-11-18 Integrated Automation Limited Module for high vacuum processing
JPS60173885A (ja) * 1984-02-18 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> 酸化物超伝導材料およびその製造方法

Also Published As

Publication number Publication date
DE3889024D1 (de) 1994-05-19
EP0299870A2 (de) 1989-01-18
EP0299870B1 (de) 1994-04-13
EP0299870A3 (en) 1989-10-25
HK87496A (en) 1996-05-24
US4988670A (en) 1991-01-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee