JP5113054B2 - デバイスの酸素および水分劣化を抑制する方法および得られるデバイス - Google Patents

デバイスの酸素および水分劣化を抑制する方法および得られるデバイス Download PDF

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Publication number
JP5113054B2
JP5113054B2 JP2008526984A JP2008526984A JP5113054B2 JP 5113054 B2 JP5113054 B2 JP 5113054B2 JP 2008526984 A JP2008526984 A JP 2008526984A JP 2008526984 A JP2008526984 A JP 2008526984A JP 5113054 B2 JP5113054 B2 JP 5113054B2
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weight
llt
glass
tin fluorophosphate
layer
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Expired - Fee Related
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JP2008526984A
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JP2009505371A5 (enExample
JP2009505371A (ja
Inventor
ジー エイトケン，ブルース
エイ ルイス，マーク
エイ クエサダ，マーク
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Corning Inc
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Corning Inc
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Publication of JP2009505371A5 publication Critical patent/JP2009505371A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/122—Silica-free oxide glass compositions containing oxides of As, Sb, Bi, Mo, W, V, Te as glass formers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/14—Silica-free oxide glass compositions containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
    • C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Glass Compositions (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
JP2008526984A 2005-08-18 2006-08-09 デバイスの酸素および水分劣化を抑制する方法および得られるデバイス Expired - Fee Related JP5113054B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/207,691 2005-08-18
US11/207,691 US20070040501A1 (en) 2005-08-18 2005-08-18 Method for inhibiting oxygen and moisture degradation of a device and the resulting device
PCT/US2006/030670 WO2007021627A1 (en) 2005-08-18 2006-08-09 Method for inhibiting oxygen and moisture degradation of a device and the resulting device

Publications (3)

Publication Number Publication Date
JP2009505371A JP2009505371A (ja) 2009-02-05
JP2009505371A5 JP2009505371A5 (enExample) 2009-09-24
JP5113054B2 true JP5113054B2 (ja) 2013-01-09

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JP2008526984A Expired - Fee Related JP5113054B2 (ja) 2005-08-18 2006-08-09 デバイスの酸素および水分劣化を抑制する方法および得られるデバイス

Country Status (7)

Country Link
US (2) US20070040501A1 (enExample)
EP (1) EP1929559B1 (enExample)
JP (1) JP5113054B2 (enExample)
KR (1) KR101353226B1 (enExample)
CN (1) CN101243562A (enExample)
TW (1) TWI360904B (enExample)
WO (1) WO2007021627A1 (enExample)

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