KR101353226B1 - 장치에 대한 산소 및 습기 분해의 억제방법 및 이에 따른장치 - Google Patents

장치에 대한 산소 및 습기 분해의 억제방법 및 이에 따른장치 Download PDF

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Publication number
KR101353226B1
KR101353226B1 KR1020087006506A KR20087006506A KR101353226B1 KR 101353226 B1 KR101353226 B1 KR 101353226B1 KR 1020087006506 A KR1020087006506 A KR 1020087006506A KR 20087006506 A KR20087006506 A KR 20087006506A KR 101353226 B1 KR101353226 B1 KR 101353226B1
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South Korea
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glass
llt
delete delete
liquidus temperature
low
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Expired - Fee Related
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KR1020087006506A
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Korean (ko)
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KR20080045217A (ko
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부르스 가드너 에이킨
마크 앨런 루이스
마크 알레한드로 퀘세다
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코닝 인코포레이티드
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/122—Silica-free oxide glass compositions containing oxides of As, Sb, Bi, Mo, W, V, Te as glass formers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/14—Silica-free oxide glass compositions containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
    • C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Glass Compositions (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
KR1020087006506A 2005-08-18 2006-08-09 장치에 대한 산소 및 습기 분해의 억제방법 및 이에 따른장치 Expired - Fee Related KR101353226B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/207,691 2005-08-18
US11/207,691 US20070040501A1 (en) 2005-08-18 2005-08-18 Method for inhibiting oxygen and moisture degradation of a device and the resulting device
PCT/US2006/030670 WO2007021627A1 (en) 2005-08-18 2006-08-09 Method for inhibiting oxygen and moisture degradation of a device and the resulting device

Publications (2)

Publication Number Publication Date
KR20080045217A KR20080045217A (ko) 2008-05-22
KR101353226B1 true KR101353226B1 (ko) 2014-01-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087006506A Expired - Fee Related KR101353226B1 (ko) 2005-08-18 2006-08-09 장치에 대한 산소 및 습기 분해의 억제방법 및 이에 따른장치

Country Status (7)

Country Link
US (2) US20070040501A1 (enExample)
EP (1) EP1929559B1 (enExample)
JP (1) JP5113054B2 (enExample)
KR (1) KR101353226B1 (enExample)
CN (1) CN101243562A (enExample)
TW (1) TWI360904B (enExample)
WO (1) WO2007021627A1 (enExample)

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KR102000709B1 (ko) * 2012-08-31 2019-09-30 삼성디스플레이 주식회사 디스플레이 패널의 제조방법
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KR102072805B1 (ko) 2013-04-15 2020-02-04 삼성디스플레이 주식회사 유기발광표시장치 및 그의 제조방법
KR102072806B1 (ko) 2013-04-18 2020-03-03 삼성디스플레이 주식회사 유기 발광 디스플레이 장치 및 이의 제조 방법
KR101444065B1 (ko) 2013-04-26 2014-09-26 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR101563203B1 (ko) 2013-04-30 2015-10-27 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
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KR102093391B1 (ko) 2013-07-12 2020-03-26 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR20150007865A (ko) 2013-07-12 2015-01-21 삼성디스플레이 주식회사 스퍼터링 타겟의 제조 방법, 그 방법으로 제조된 스퍼터링 타겟 및 그 스퍼터링 타겟을 이용하여 유기 발광 표시 장치를 제조하는 방법
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KR102085319B1 (ko) * 2013-07-30 2020-03-06 삼성디스플레이 주식회사 유기 발광 디스플레이 장치 및 이의 제조 방법
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