JP4667378B2 - 極紫外放射又は軟x線放射を生成する方法及び装置 - Google Patents
極紫外放射又は軟x線放射を生成する方法及び装置 Download PDFInfo
- Publication number
- JP4667378B2 JP4667378B2 JP2006525971A JP2006525971A JP4667378B2 JP 4667378 B2 JP4667378 B2 JP 4667378B2 JP 2006525971 A JP2006525971 A JP 2006525971A JP 2006525971 A JP2006525971 A JP 2006525971A JP 4667378 B2 JP4667378 B2 JP 4667378B2
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- metal
- metal melt
- radiation
- energy beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 62
- 238000000034 method Methods 0.000 title claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims abstract description 132
- 239000002184 metal Substances 0.000 claims abstract description 132
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 239000003365 glass fiber Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 abstract description 5
- 239000007789 gas Substances 0.000 description 36
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 23
- 239000010408 film Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 16
- 239000003990 capacitor Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 12
- 238000001816 cooling Methods 0.000 description 9
- 229910001338 liquidmetal Inorganic materials 0.000 description 9
- 238000009826 distribution Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005058 metal casting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000006833 reintegration Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- -1 tin Chemical class 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Description
10 装置
12 放電空間
14 第一電極
16 第二電極
18 領域
20 レーザビーム
22 プラズマ
24 金属溶融物
26 装置、容器
28 装置、ストリッパー
30 手段、加熱装置、冷却装置
34 鏡
36 金属スクリーン
38 構造
40 源地点
42 金属シート
44 スクリーン
46 回転軸
48 コンデンサーバンク
50 給電線
52 金属ピン
54 基板
56 別個の容器
Claims (24)
- プラズマが放電空間内の少なくとも2つの電極の間のガス状媒体内で点火され、前記プラズマは生成されるべき放射線を放射する、電気式放電を用いて極紫外放射又は軟X線放射を生成する方法であって、
前記ガス状媒体は、金属溶融物から生成され、該金属溶融物は、前記放電空間内の前記少なくとも2つの電極の表面及び/又は前記少なくとも2つの電極の間に配置される金属スクリーンの表面に塗布され、エネルギービームによって少なくとも部分的に蒸発させられる、
方法。 - 前記少なくとも2つの電極及び/又は前記金属スクリーンは、動作中に回転される、請求項1に記載の方法。
- 前記少なくとも2つの電極は、それらの回転軸の周りで回転され、該回転軸は、互いに傾斜する、請求項2に記載の方法。
- 前記少なくとも2つの電極及び/又は前記金属スクリーンは、回転中に、前記金属溶融物を受け取るために、前記金属溶融物を収容する容器内にディップする、請求項2又は3に記載の方法。
- 前記少なくとも2つの電極は、前記金属溶融物を介して電力供給される、請求項4に記載の方法。
- 前記金属溶融物は、前記エネルギービームによって、前記少なくとも2つの電極の前記表面の少なくとも1つの上で蒸発させられる、請求項2乃至5のうちいずれか1項に記載の方法。
- 前記金属溶融物は、前記エネルギービームによって、前記金属スクリーンの前記表面の上で蒸発させられる、請求項2乃至5のうちいずれか1項に記載の方法。
- 前記エネルギービームは、ガラス繊維によって送られるレーザビームである、請求項1乃至7のうちいずれか1項に記載の方法。
- 前記エネルギービームは、前記金属溶融物の蒸発のために、前記表面上の円形リング又は多数の地点に亘って分配される、請求項1乃至8のうちいずれか1項に記載の方法。
- 生成される前記放射は、検出器によって検出され、その出力値は、前記放射の生成を制御し或いはスイッチオフする、請求項1乃至9のうちいずれか1項に記載の方法。
- 互いに離間して放電空間内に配置される少なくとも2つの電極を含み、前記放電空間は前記電極間のガス状媒体内でプラズマの点火を可能にする、電気式放電を用いて極紫外放射又は軟X線放射を生成するための装置であって、
前記放電空間内の前記少なくとも2つの電極の表面及び/又は前記少なくとも2つの電極の間に配置される金属スクリーンの表面に金属溶融物を塗布するための装置と、
エネルギービームを前記表面に向け、前記塗布される金属溶融物を少なくとも部分的に蒸発させ、それによって、前記ガス状媒体を生成するよう構成されるエネルギービーム装置とを更に含む、
装置。 - 前記少なくとも2つの電極及び/又は金属スクリーンを動作中に回転し得る、請求項11に記載の装置。
- 前記少なくとも2つの電極をそれらの回転軸の周りで回転可能であり、前記回転軸は、互いに傾斜する、請求項12に記載の装置。
- 前記少なくとも2つの電極及び/又は前記金属スクリーンは、回転中に、前記金属溶融物を受け取るために、前記金属溶融物を収容する容器内にディップする、請求項12又は13に記載の装置。
- 前記少なくとも2つの電極は、前記金属溶融物を介して、電源に電気的に接続される、請求項14に記載の装置。
- 前記少なくとも2つの電極及び/又は前記金属スクリーンに塗布される前記金属溶融物の層厚を設定するための装置を更に含む、請求項14に記載の装置。
- 前記層厚を設定するための装置は、前記少なくとも2つの電極及び/又は前記金属スクリーンのそれぞれの外縁まで到達するストリッパーである、請求項16に記載の装置。
- 前記少なくとも2つの電極は、熱伝導的な材料から成る少なくとも1つのコアを有する、請求項11乃至17のうちいずれか1項に記載の装置。
- 前記少なくとも2つの電極は、耐高温シースを具備する少なくとも1つの銅コアを有する、請求項11乃至17のうちいずれか1項に記載の装置。
- 金属蒸気が逃げ出すのを防止する手段を更に含む、請求項11乃至19のうちいずれか1項に記載の装置。
- 前記金属蒸気が逃げ出すのを防止する手段は、薄壁の蜂の巣構造及び/又は電位を有する薄い金属シート及び/又は電位を有する針金ゲージによって形成される、請求項20に記載の装置。
- 前記エネルギービーム装置は、前記レーザビームを送るガラス繊維を含むレーザビーム装置である、請求項11乃至21のうちいずれか1項に記載の装置。
- 前記塗布される金属溶融物を蒸発するために、前記エネルギービームを前記表面上の円形リング又は多数の地点に亘って分配するための手段が設けられる、請求項11乃至22のうちいずれか1項に記載の装置。
- 金属スクリーンが前記少なくとも2つの電極の間に配置される、請求項11に記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10342239.0A DE10342239B4 (de) | 2003-09-11 | 2003-09-11 | Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung |
PCT/IB2004/051651 WO2005025280A2 (en) | 2003-09-11 | 2004-09-01 | Method and apparatus for producing extreme ultraviolett radiation or soft x-ray radiation |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007505460A JP2007505460A (ja) | 2007-03-08 |
JP4667378B2 true JP4667378B2 (ja) | 2011-04-13 |
Family
ID=34258623
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006525971A Active JP4667378B2 (ja) | 2003-09-11 | 2004-09-01 | 極紫外放射又は軟x線放射を生成する方法及び装置 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7427766B2 (ja) |
EP (1) | EP1665907B1 (ja) |
JP (1) | JP4667378B2 (ja) |
KR (1) | KR101058067B1 (ja) |
CN (1) | CN100420352C (ja) |
AT (1) | ATE356531T1 (ja) |
DE (2) | DE10342239B4 (ja) |
TW (1) | TWI382789B (ja) |
WO (1) | WO2005025280A2 (ja) |
Families Citing this family (92)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003066516A2 (en) * | 2001-11-14 | 2003-08-14 | Blacklight Power, Inc. | Hydrogen power, plasma, and reactor for lasing, and power conversion |
DE10359464A1 (de) * | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
RU2278483C2 (ru) * | 2004-04-14 | 2006-06-20 | Владимир Михайлович Борисов | Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы |
JP4704788B2 (ja) * | 2005-03-31 | 2011-06-22 | 株式会社日立エンジニアリング・アンド・サービス | 二次荷電粒子発生装置 |
DE102005023060B4 (de) * | 2005-05-19 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung |
DE102005045568A1 (de) | 2005-05-31 | 2006-12-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Schutz einer optischen Komponente, insbesondere in einer EUV-Quelle |
JP2008544448A (ja) * | 2005-06-14 | 2008-12-04 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euv放射線及び/又は軟x線を発生させる放射線源を短絡から保護する方法 |
DE102005030304B4 (de) | 2005-06-27 | 2008-06-26 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung |
DE102005039849B4 (de) * | 2005-08-19 | 2011-01-27 | Xtreme Technologies Gmbh | Vorrichtung zur Strahlungserzeugung mittels einer Gasentladung |
JP5176052B2 (ja) * | 2005-10-05 | 2013-04-03 | 国立大学法人大阪大学 | 放射線源用ターゲット生成供給装置 |
JP4904809B2 (ja) * | 2005-12-28 | 2012-03-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US7501642B2 (en) | 2005-12-29 | 2009-03-10 | Asml Netherlands B.V. | Radiation source |
DE102006015640B3 (de) | 2006-03-31 | 2007-10-04 | Xtreme Technologies Gmbh | Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung auf Basis einer elektrisch betriebenen Gasentladung |
DE102006015641B4 (de) | 2006-03-31 | 2017-02-23 | Ushio Denki Kabushiki Kaisha | Vorrichtung zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung |
US7557366B2 (en) * | 2006-05-04 | 2009-07-07 | Asml Netherlands B.V. | Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
ATE489839T1 (de) | 2006-05-16 | 2010-12-15 | Koninkl Philips Electronics Nv | Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät |
DE102006027856B3 (de) * | 2006-06-13 | 2007-11-22 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden |
US8766212B2 (en) * | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
TW200808134A (en) * | 2006-07-28 | 2008-02-01 | Ushio Electric Inc | Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation |
JP2008053696A (ja) * | 2006-07-28 | 2008-03-06 | Ushio Inc | 極端紫外光光源装置および極端紫外光発生方法 |
US7897948B2 (en) | 2006-09-06 | 2011-03-01 | Koninklijke Philips Electronics N.V. | EUV plasma discharge lamp with conveyor belt electrodes |
JP4888046B2 (ja) | 2006-10-26 | 2012-02-29 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US7518134B2 (en) * | 2006-12-06 | 2009-04-14 | Asml Netherlands B.V. | Plasma radiation source for a lithographic apparatus |
US7759663B1 (en) * | 2006-12-06 | 2010-07-20 | Asml Netherlands B.V. | Self-shading electrodes for debris suppression in an EUV source |
US7696493B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
US7696492B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
US7838853B2 (en) * | 2006-12-14 | 2010-11-23 | Asml Netherlands B.V. | Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method |
DE102006060998B4 (de) * | 2006-12-20 | 2011-06-09 | Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - | Verfahren und Vorrichtungen zum Erzeugen von Röntgenstrahlung |
DE102007004440B4 (de) | 2007-01-25 | 2011-05-12 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung |
JP5149514B2 (ja) * | 2007-02-20 | 2013-02-20 | ギガフォトン株式会社 | 極端紫外光源装置 |
EP1976344B1 (en) | 2007-03-28 | 2011-04-20 | Tokyo Institute Of Technology | Extreme ultraviolet light source device and extreme ultraviolet radiation generating method |
US20080239262A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation |
DE102007020742B8 (de) * | 2007-04-28 | 2009-06-18 | Xtreme Technologies Gmbh | Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung |
JP2008311465A (ja) * | 2007-06-15 | 2008-12-25 | Nikon Corp | Euv光源、euv露光装置および半導体デバイスの製造方法 |
US7629593B2 (en) * | 2007-06-28 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method |
US8227771B2 (en) * | 2007-07-23 | 2012-07-24 | Asml Netherlands B.V. | Debris prevention system and lithographic apparatus |
US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN101796893B (zh) * | 2007-09-07 | 2013-02-06 | 皇家飞利浦电子股份有限公司 | 用于气体放电源的电极设备以及操作具有电极设备的气体放电源的方法 |
EP2198674B1 (en) * | 2007-09-07 | 2012-03-28 | Philips Intellectual Property & Standards GmbH | Rotating wheel electrode device for gas discharge sources comprising wheel cover for high power operation |
US20100194313A1 (en) | 2007-10-01 | 2010-08-05 | Koninklijke Philips Electronics N.V. | High voltage electrical connection line |
JP2009087807A (ja) | 2007-10-01 | 2009-04-23 | Tokyo Institute Of Technology | 極端紫外光発生方法及び極端紫外光光源装置 |
US20090095924A1 (en) * | 2007-10-12 | 2009-04-16 | International Business Machines Corporation | Electrode design for euv discharge plasma source |
JP2009099390A (ja) * | 2007-10-17 | 2009-05-07 | Tokyo Institute Of Technology | 極端紫外光光源装置および極端紫外光発生方法 |
JP4952513B2 (ja) * | 2007-10-31 | 2012-06-13 | ウシオ電機株式会社 | 極端紫外光光源装置 |
DE102007060807B4 (de) | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
NL1036272A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Radiation source, lithographic apparatus and device manufacturing method. |
NL1036595A1 (nl) * | 2008-02-28 | 2009-08-31 | Asml Netherlands Bv | Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method. |
TWI448209B (zh) * | 2008-05-02 | 2014-08-01 | Hon Hai Prec Ind Co Ltd | X射線成像設備 |
EP2298041B1 (en) | 2008-07-07 | 2015-09-09 | Philips Deutschland GmbH | Extreme uv radiation generating device comprising a corrosion-resistant material |
EP2300879B1 (en) | 2008-07-18 | 2011-10-12 | Philips Intellectual Property & Standards GmbH | Extreme uv radiation generating device comprising a contamination captor and method of purifying tin in said device |
WO2010013167A1 (en) * | 2008-07-28 | 2010-02-04 | Philips Intellectual Property & Standards Gmbh | Method and device for generating euv radiation or soft x-rays |
JP4623192B2 (ja) | 2008-09-29 | 2011-02-02 | ウシオ電機株式会社 | 極端紫外光光源装置および極端紫外光発生方法 |
WO2010070540A1 (en) | 2008-12-16 | 2010-06-24 | Philips Intellectual Property & Standards Gmbh | Method and device for generating euv radiation or soft x-rays with enhanced efficiency |
JP5245857B2 (ja) * | 2009-01-21 | 2013-07-24 | ウシオ電機株式会社 | 極端紫外光光源装置 |
JP5455661B2 (ja) | 2009-01-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置 |
US8881526B2 (en) * | 2009-03-10 | 2014-11-11 | Bastian Family Holdings, Inc. | Laser for steam turbine system |
JP5504673B2 (ja) * | 2009-03-30 | 2014-05-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US8749178B2 (en) | 2009-10-29 | 2014-06-10 | Koninklijke Philips N.V. | Electrode system, in particular for gas discharge light sources |
US8559599B2 (en) * | 2010-02-04 | 2013-10-15 | Energy Resources International Co., Ltd. | X-ray generation device and cathode thereof |
JP5802410B2 (ja) * | 2010-03-29 | 2015-10-28 | ギガフォトン株式会社 | 極端紫外光生成装置 |
US9072153B2 (en) | 2010-03-29 | 2015-06-30 | Gigaphoton Inc. | Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target |
US9072152B2 (en) | 2010-03-29 | 2015-06-30 | Gigaphoton Inc. | Extreme ultraviolet light generation system utilizing a variation value formula for the intensity |
TW201212726A (en) | 2010-07-15 | 2012-03-16 | Fraunhofer Ges Forschung | Method of improving the operation efficiency of a EUV plasma discharge lamp |
JP5659711B2 (ja) | 2010-11-10 | 2015-01-28 | ウシオ電機株式会社 | 極端紫外光光源装置における照度分布の検出方法および極端紫外光光源装置 |
TWI580316B (zh) * | 2011-03-16 | 2017-04-21 | Gigaphoton Inc | Extreme UV light generation device |
EP2555598A1 (en) | 2011-08-05 | 2013-02-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for generating optical radiation by means of electrically operated pulsed discharges |
TWI596384B (zh) | 2012-01-18 | 2017-08-21 | Asml荷蘭公司 | 光源收集器元件、微影裝置及元件製造方法 |
US9659738B2 (en) | 2012-06-15 | 2017-05-23 | Siemens Aktiengesellschaft | X-ray source and the use thereof and method for producing X-rays |
JP5724986B2 (ja) * | 2012-10-30 | 2015-05-27 | ウシオ電機株式会社 | 放電電極 |
DE102013000407B4 (de) | 2013-01-11 | 2020-03-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Verbesserung der Benetzbarkeit einer rotierenden Elektrode in einer Gasentladungslampe |
DE102013103668B4 (de) | 2013-04-11 | 2016-02-25 | Ushio Denki Kabushiki Kaisha | Anordnung zum Handhaben eines flüssigen Metalls zur Kühlung von umlaufenden Komponenten einer Strahlungsquelle auf Basis eines strahlungsemittierenden Plasmas |
JP6241062B2 (ja) | 2013-04-30 | 2017-12-06 | ウシオ電機株式会社 | 極端紫外光光源装置 |
EP2816876B1 (en) | 2013-06-21 | 2016-02-03 | Ushio Denki Kabushiki Kaisha | EUV discharge lamp with moving protective component |
DE102013109048A1 (de) | 2013-08-21 | 2015-02-26 | Ushio Denki Kabushiki Kaisha | Verfahren und Vorrichtung zur Kühlung von Strahlungsquellen auf Basis eines Plasmas |
JP6135410B2 (ja) | 2013-09-06 | 2017-05-31 | ウシオ電機株式会社 | ホイルトラップ及びこのホイルトラップを用いた光源装置 |
DE102013110760B4 (de) * | 2013-09-27 | 2017-01-12 | Ushio Denki Kabushiki Kaisha | Strahlungsquelle zur Erzeugung von kurzwelliger Strahlung aus einem Plasma |
DE102013017655B4 (de) | 2013-10-18 | 2017-01-05 | Ushio Denki Kabushiki Kaisha | Anordnung und Verfahren zum Kühlen einer plasmabasierten Strahlungsquelle |
JP5983594B2 (ja) | 2013-12-25 | 2016-08-31 | ウシオ電機株式会社 | 光源装置 |
DE102014102720B4 (de) * | 2014-02-28 | 2017-03-23 | Ushio Denki Kabushiki Kaisha | Anordnung zum Kühlen einer plasmabasierten Strahlungsquelle mit einer metallischen Kühlflüssigkeit und Verfahren zur Inbetriebnahme einer solchen Kühlanordnung |
JP5962699B2 (ja) | 2014-04-15 | 2016-08-03 | ウシオ電機株式会社 | エネルギービームの位置合わせ装置および位置合わせ方法 |
JP6036785B2 (ja) * | 2014-10-15 | 2016-11-30 | ウシオ電機株式会社 | ホイルトラップ及びマスク検査用極端紫外光光源装置 |
WO2016121040A1 (ja) * | 2015-01-28 | 2016-08-04 | ギガフォトン株式会社 | ターゲット供給装置、その処理装置および処理方法 |
JP6477179B2 (ja) * | 2015-04-07 | 2019-03-06 | ウシオ電機株式会社 | 放電電極及び極端紫外光光源装置 |
CN105376919B (zh) * | 2015-11-06 | 2017-08-01 | 华中科技大学 | 一种激光诱导液滴靶放电产生等离子体的装置 |
DE102015224534B4 (de) | 2015-12-08 | 2017-06-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von extremer Ultraviolett- und/ oder weicher Röntgenstrahlung |
DE102016204407A1 (de) | 2016-03-17 | 2017-09-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von extremer Ultraviolett- und/oder weicher Röntgenstrahlung |
JP6237825B2 (ja) * | 2016-05-27 | 2017-11-29 | ウシオ電機株式会社 | 高温プラズマ原料供給装置および極端紫外光光源装置 |
US11259394B2 (en) | 2019-11-01 | 2022-02-22 | Kla Corporation | Laser produced plasma illuminator with liquid sheet jet target |
US11272607B2 (en) | 2019-11-01 | 2022-03-08 | Kla Corporation | Laser produced plasma illuminator with low atomic number cryogenic target |
JP7156331B2 (ja) * | 2020-05-15 | 2022-10-19 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US11862922B2 (en) * | 2020-12-21 | 2024-01-02 | Energetiq Technology, Inc. | Light emitting sealed body and light source device |
WO2023135322A1 (en) | 2022-01-17 | 2023-07-20 | Isteq B.V. | Target material, high-brightness euv source and method for generating euv radiation |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61250948A (ja) * | 1985-04-30 | 1986-11-08 | Nippon Telegr & Teleph Corp <Ntt> | X線発生装置およびx線露光法 |
JPH04110800A (ja) * | 1990-08-31 | 1992-04-13 | Shimadzu Corp | 標的物質の供給装置 |
JPH1164598A (ja) * | 1997-08-26 | 1999-03-05 | Shimadzu Corp | レーザプラズマx線源 |
JP2001021697A (ja) * | 1999-07-06 | 2001-01-26 | Shimadzu Corp | レーザープラズマx線源 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2614457B2 (ja) * | 1986-09-11 | 1997-05-28 | ホーヤ 株式会社 | レーザープラズマx線発生装置及びx線射出口開閉機構 |
DE3927089C1 (ja) * | 1989-08-17 | 1991-04-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
US5317574A (en) * | 1992-12-31 | 1994-05-31 | Hui Wang | Method and apparatus for generating x-ray and/or extreme ultraviolet laser |
DE19743311A1 (de) * | 1996-09-30 | 1998-04-02 | Fraunhofer Ges Forschung | Target für die Erzeugung gepulster Röntgen- und Extrem-UV-Strahlung (EUV), Verfahren zur Erzeugung eines solchen Targets sowie seine Verwendung |
US5963616A (en) * | 1997-03-11 | 1999-10-05 | University Of Central Florida | Configurations, materials and wavelengths for EUV lithium plasma discharge lamps |
US6586757B2 (en) | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
US6566667B1 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
DE19753696A1 (de) | 1997-12-03 | 1999-06-17 | Fraunhofer Ges Forschung | Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung |
DE19962160C2 (de) | 1999-06-29 | 2003-11-13 | Fraunhofer Ges Forschung | Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung |
JP2001108799A (ja) * | 1999-10-08 | 2001-04-20 | Nikon Corp | X線発生装置、x線露光装置及び半導体デバイスの製造方法 |
TW508980B (en) * | 1999-12-23 | 2002-11-01 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
TW502559B (en) * | 1999-12-24 | 2002-09-11 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
US6320937B1 (en) * | 2000-04-24 | 2001-11-20 | Takayasu Mochizuki | Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target |
TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
TW519574B (en) * | 2000-10-20 | 2003-02-01 | Nikon Corp | Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same |
US6673524B2 (en) * | 2000-11-17 | 2004-01-06 | Kouros Ghandehari | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method |
US6804327B2 (en) * | 2001-04-03 | 2004-10-12 | Lambda Physik Ag | Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays |
EP1401248B1 (en) | 2002-09-19 | 2012-07-25 | ASML Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
-
2003
- 2003-09-11 DE DE10342239.0A patent/DE10342239B4/de not_active Expired - Lifetime
-
2004
- 2004-09-01 WO PCT/IB2004/051651 patent/WO2005025280A2/en active IP Right Grant
- 2004-09-01 JP JP2006525971A patent/JP4667378B2/ja active Active
- 2004-09-01 DE DE602004005225T patent/DE602004005225D1/de active Active
- 2004-09-01 EP EP04769907A patent/EP1665907B1/en active Active
- 2004-09-01 AT AT04769907T patent/ATE356531T1/de not_active IP Right Cessation
- 2004-09-01 CN CNB2004800262831A patent/CN100420352C/zh active Active
- 2004-09-01 US US10/570,535 patent/US7427766B2/en active Active
- 2004-09-01 KR KR1020067004980A patent/KR101058067B1/ko active IP Right Grant
- 2004-09-08 TW TW093127205A patent/TWI382789B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61250948A (ja) * | 1985-04-30 | 1986-11-08 | Nippon Telegr & Teleph Corp <Ntt> | X線発生装置およびx線露光法 |
JPH04110800A (ja) * | 1990-08-31 | 1992-04-13 | Shimadzu Corp | 標的物質の供給装置 |
JPH1164598A (ja) * | 1997-08-26 | 1999-03-05 | Shimadzu Corp | レーザプラズマx線源 |
JP2001021697A (ja) * | 1999-07-06 | 2001-01-26 | Shimadzu Corp | レーザープラズマx線源 |
Also Published As
Publication number | Publication date |
---|---|
WO2005025280A3 (en) | 2005-06-16 |
DE10342239A1 (de) | 2005-06-16 |
TW200511900A (en) | 2005-03-16 |
EP1665907A2 (en) | 2006-06-07 |
ATE356531T1 (de) | 2007-03-15 |
DE10342239B4 (de) | 2018-06-07 |
DE602004005225D1 (de) | 2007-04-19 |
CN100420352C (zh) | 2008-09-17 |
CN1849850A (zh) | 2006-10-18 |
TWI382789B (zh) | 2013-01-11 |
EP1665907B1 (en) | 2007-03-07 |
US20070090304A1 (en) | 2007-04-26 |
US7427766B2 (en) | 2008-09-23 |
KR20060119962A (ko) | 2006-11-24 |
KR101058067B1 (ko) | 2011-08-24 |
JP2007505460A (ja) | 2007-03-08 |
WO2005025280A2 (en) | 2005-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4667378B2 (ja) | 極紫外放射又は軟x線放射を生成する方法及び装置 | |
JP4288290B2 (ja) | 再生できる電極における放電によって極紫外線を発生するための装置 | |
KR101214136B1 (ko) | Euv 방사용 가스 방전원 | |
Borisov et al. | EUV sources using Xe and Sn discharge plasmas | |
JP5216772B2 (ja) | コンベアベルトターゲットを備えたeuvプラズマ放電ランプ | |
EP2020165B1 (en) | A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus | |
JP2007053099A (ja) | ガス放電による放射線発生装置 | |
JP5566302B2 (ja) | 特にeuv放射のためのガス放電光源 | |
JP2007200919A (ja) | 極端紫外光光源装置 | |
EP2380411B1 (en) | Method and device for generating euv radiation or soft x-rays with enhanced efficiency | |
TW201010517A (en) | Method and device for generating EUV radiation or soft x-rays | |
US7446329B2 (en) | Erosion resistance of EUV source electrodes | |
RU170782U1 (ru) | Вакуумный разрядник | |
JP2017219680A (ja) | プラズマ光源 | |
JP4627693B2 (ja) | 薄膜形成装置 | |
JP2019020615A (ja) | プラズマ光源システム |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070830 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100706 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101001 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101214 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140121 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4667378 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |