201212726 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種用以改進電漿放電燈之操作效率之 方法’該電漿放電燈產生極紫外線（extreme ultraVi〇let; EUV)輻射及/或柔和的χ光線，該燈包含至少兩個電極 及構件’該等電極由时溶金屬形成，該構件用於在該燈 之操作期間將液態金屬塗覆至該等電極之至少一個電極 的表面部分。本發明亦關於一種具有經改進之操作效率 之電漿放電燈。 【先前技術】 在例如極紫外線微影蝕刻或計量學領域，需要光源， 該等光源發出極紫外線（extreme ultraviolet; EUV)輻射 及/或柔和的X光線，亦即，在丨nm與20 nm之間的波 長區域内。該等裝置是大功率光源目前最有前景的候選 物，以用於即將出現的半導體工業之微影蝕刻工具。在 該技術中已知如何在13.5 nm之波長下使用經高度離子 化的電漿有效地產生極紫外線光》藉助於大功率雷射光 束（雷射產生電漿（laser produced plasma; LPP))或藉由 電極之間的帶電氣體放電（放電產生電漿（discharge produced Plasma; DPP))，可產生來自發出極紫外線的目 標材料之電漿之激發。 氣體放電光源包含：至少兩個電極（陽極、陰極），該 等電極彼此分離以在電極之間形成間隙。藉助於電容器 201212726 配置可提供該放電燈之脈衝操作所需要之電能，在該電 容器配置中首先將能量保存，隨後經由該等電極將能量 放電。通常在1 Pa至100 Pa的壓力範圍内以放電材料 填充該系統。由於磁壓縮》捏縮電漿（pinchpiasnia)被加 熱至數十eV之溫度，該磁壓縮係歸因於應用通常數十 kA至至多1〇〇 kA之脈衝電流及通常數十ns至數百ns 之脈衝持續時間。 在當前技術現狀之基於DPP之系統中，實現了自氣體 供應至基於液態金屬之放電材料的改變。 W02005/02 5280A2揭示該系統，在該系統中將液態金屬 塗覆於兩個旋轉的圓盤狀電極。脈衝雷射藉由蒸發液態 金屬之至少某部分來觸發放電，特定言之是來自液態金 屬層之錫，該液態金屬層形成於該等電極上。該電容器 組（capacitor bank)經由金屬蒸氣而放電，從而產生強電 流捏縮放電。利用該系統’實現了比基於氣體之系統更 高的轉換效率，因此獲得了更大量的極紫外線光子。 大輕射功率之產生需要相當高的平均電功率，該相當 高的電功率須被饋入該光源。此舉可導致較強的電極腐 钱，並因此縮短電極系統之使用壽命。此外，由於電極 幾何形狀之改變，電漿之空間將變得更大，從而導致以 下效應.僅能利用生成之光之一小部分，因此減少光學 性能。在利用液態金屬進行操作的電漿放電燈中使用 耐熔金屬之電極（例如鎢（w)或鉬（M〇))與該液態金屬 膜會減少電極腐蝕之程度。然而，液態金屬必須顯示出 201212726 適當的湖濕行為及對於電極材料足夠強的黏著力。若液 態金屬膜在局部不能永久很好地黏著於電極表面，則這 可能導致液態金屬膜厚度值不穩定、陰極斑點、電極腐 蝕及更多有害的效應，最终導致電極使用壽命減少。 在操作此種電漿放電燈之前，須執行預備步驟以確保 電極表面上之液態金屬之可靠的潤濕，其中在該電漿放 電燈中該等電極之至少一個電極塗覆了液態金屬。該等 標準原位（in-situ)潤濕程序是複雜、費時的，且阻滯極紫 外線電漿放電燈達大量時間，因為需要若干耗費幾小時 的步驟，且該等步驟必須在極紫外線燈之普通的日常操 作之前一直且重複地發生，因此會降低燈之總體效率。 【發明内容】 本發明之目的是提供一種用以改進基於液態金屬之電 漿放電燈之操作效率及使用壽命之方法，及提供具有増 加的效率之此種電漿放電燈，該電漿放電燈產生極紫外 線賴射及/或柔和的X光線。 利用如請求項1、請求項2、請求項丨丨及請求項i 2 之方法及電漿放電燈達成該目的。該方法及燈之有利的 實施例為附屬請求項之標的，或在隨後的描述及實施例 之部分中描述該方法及燈之有利的實施例。 所提出的方法改進電漿放電燈之操作效率及使用壽 命，該電漿放電燈產生極紫外線輻射及/或柔和的χ光 線，此種燈包含至少兩個電極及構件，該等電極由耐熔 201212726 金屬形成’該構件用於在該燈之操作期間將液態金屬塗 覆至該等電極之至少一個電極的表面部分。在所提出的 方法中’根據第一替代性實施例，該等電極之該至少一 個電極在預處理步驟中進行預處理，在該預處理步驟中 該電極之至少該表面部分與該液態金屬進行接觸，且在 與該液態金屬進行接觸的同時，在^ 800〇c之溫度下將該 電極之至少該表面部分進行熱退火，以在該電極上之具 有爻控冰度之反應區中，使該耐熔金屬與該液態金屬之 間發生反應。若在該燈之操作期間將該液態金屬塗覆於 兩個電極之表面部分，則兩個電極皆在該預處理步驟中 進行預處理。根據第一替代性實施例，在預處理步驟中 一層另外的材料在該電極之該表面部分上沈積，選擇該 另外的材料以改進該表面部分對於該液態金屬之潤濕行 為。在兩個替代性實施例中，將該電極之該表面部分進 行預處理以產生一層（反應區或另外的材料層），該電極 之該表面部分比不具有該層之電極表面具有更好的對於 該液態金屬之潤濕行為。 在較佳實施例中，將該方法應用於電聚放電燈，該電 漿放電燈具有兩個電極輪，該等電極輪在燈之操作期間 旋轉°該等電極輪係安裝在兩個容器上方，該等容器具 有液態金屬，以使得該等電極輪部分地浸入該液態金 屬。因此，在旋轉期間將該液態金屬塗覆於該等電極輪 之周圍表面。為了根據所提出的方法改進該燈之效率， 該等電極輪被拆卸以便執行該預處理步驟，特定言之， 201212726 疋在適合進行進行熱退火的爐中。在該退火步驟期間， 〇等電極輪可元全地浸沒在坩堝中，該坩堝含有液態金 屬為了避免在該等電極輪之中心部分處發生反應，該 等輪子係在該令心部分之處被安裝在該放電燈中，可利 用合適的平板遮蔽該等中心部分。在該預處理步驟之 後’將該等電極輪安裝在該放電燈中，該放電燈可隨後 與該等經預處理的電極輪進行操作。 即使以上實施例顯示應用該方法之一較佳的放電燈， 所提出的方法亦可應用於其他電衆放電燈，在該等電漿 放電燈中該等電極之至少—個電極在操作期間以液態金 屬满濕。該燈之該等電極可具有除了電極輪之外的其他 幾何形式’且該液態金屬亦可以另—方式應用於該至少 一個電極之表面。 利用所提出方法之第一替代性實施例，在該電極之專 用表面部分上形成-薄層’該薄層稱為反應區。該耐熔 金屬與該經塗覆之金眉— 、屬之穩疋化合物之該薄層顯示出經 =调濕行為及對液態金屬的黏著力，以及較強的抗 :性。將相同的方法應用於第二替代性實施例之沈積 ::因此，可大大減少原位潤濕程序（亦即如以上導論 述之初始及日常的潤濕）所耗時間，或甚至跳過 =等2潤濕程序。因此減少了該電燈之阻 :較=短的停機時間之角度來看，此舉意謂著該燈具 有較尚的總體效率1因於較高電阻， 用壽命延長，因此延長燈之#用“ ¥極之使 之使用可°p。考慮到燈或電極 201212726 之使用壽命’該預處理步驟必須僅被執行一次但是亦 可偶爾重複執行。 通常，當電極之材料為諸如臀或“。之耐熔金屬時， 塗覆於該等電極之液態金屬為錫(Sn)。然而，液態仏通 常顯示出對於該等耐溶金屬較差的黏著力該結果主要 歸因於Sn分別與W或M。之間較低的互溶性。利用所 提出的方法，在該等電極之表面上實現一薄的、非臨界 的反應區或層，在該等電極之表面上該反應區或層顯示 出對於該液態金屬之優良的潤濕性及黏著力。根據該方 法形成具有受控深度的反應區，以避免該電極經由該反 應不斷文到腐蝕。較佳地，執行該預處理步驟，以使得 該反應區之厚度（深度）介於⑽咖與5_之間。為 此，必須適當地控制反應參數’如氣體氣氛、退火溫度 及退火時間。較佳地’該退火步驟係在介於與1 C之間的溫度下執行達介於i h與24 h之間的一時間。 可在真空中或在專用的氣體氣氛中（例如，在含有 95%N2/5%H2或H2或Ar之氣體氣氛中）執行該退火步 驟上述氣體之氣流較佳地設置在1 〇〇 sccm與1 5〇〇 sccm 之間。 在另一實施例中，該預處理步驟可包含：兩個子步驟。 f第—子步驟中，在經提高之溫度下，在還原性氣體氣 氛中（例如，在NVH2混合氣中）還原電極之表面以 自電極之表面移除任何氧化物或氧化層。在以下之第二 子步驟中，如上所述，以與液態金屬接觸之方式執行熱 201212726 退火步驟。 在又一貫施例中，藉由以下方式達成該預處理步驟： 藉由專用的原位外（ex_situ)沈積製程及隨後視需要將“ 輸送、k預處理之區域。隱藏於此舉中的想法是：塗覆 「潤濕促進劑」作為該等耐熔電極上的第一層，為隨後 由Sn進行的更加顯著的潤濕做準備。可藉由基於真空 之技術（例如’物理氣相沈積（physicai V叩_〜灿― PVD)(諸如電弧蒸發υ或非真空沈積（諸如電流處理） 來執行該沈積製程，或在兩種組態中皆可行的情況下藉 由銅焊製程來執行該沈積製程。在任何情況下，對於耐 炫金屬具有良好黏著力的（不同種）材料較佳地作為該 電極基底上第-層之材料（「潤濕促進劑」）。例如該等材 料可為Ni、C]或Cu，且該等材料具有數微米之標準的 薄膜厚度值。此層可充當犧牲層，亦即歸因於進—步的 反應及相互擴散，該層可在應用t被消耗掉。除了在耐 溶基底與Sn之間形成穩定的介面相之目的外，此舉穩 固了如先前部分所述之結構。 利用所提出的方法，藉由該等電極之預處理，改進該 潤濕行為’因此改進液態金屬之厚度之控制，從而將； 極退化降至最低’在使用壽命内保持通常的效能，延長 極紫外線燈之可用時間，增加一般的使用壽命，且減少 用於組裝或磨亮光源頭的時間。該方法產生經可靠地潤 濕的電極表面，該電極表面減少用於原位潤濕程序之時 間，因此使得燈之使用的總體效率得以改進。 201212726 【實施方式】 所提出方法可應用於電漿放電燈，該電漿放電燈產生 極紫外線輻射及/或柔和的X光線，如第1圖中闡釋性地 圖示。該氣體放電燈包含：兩個電極輪1、2(陰極、陽 極），該等電極輪彼此分離以在電極輪之間形成間隙。兩 個電極輪1、2在該燈之操作期間進行旋轉，同時部分浸 入容器3’該容器3含有液態金屬，如由於在該液 態金屬中之旋轉，錫膜4在該等電極輪之外圍表面上形 成。該等電極輪經由錫槽電性地連接至電容器組5，電 谷器組5向該等電極輪卜2提供脈衝電流。藉由用雷射 源7之脈衝雷射光束6來蒸發液態錫之部分，來啟動電 示。電漿8發出所要之201212726 VI. Description of the Invention: [Technical Field] The present invention relates to a method for improving the operational efficiency of a plasma discharge lamp, which generates extreme ultraviolet (EUV) radiation and/or Or a soft xenon light comprising at least two electrodes and members 'the electrodes being formed of a time soluble metal for applying liquid metal to the surface of at least one of the electrodes during operation of the lamp section. The invention also relates to a plasma discharge lamp having improved operational efficiency. [Prior Art] In the field of, for example, extreme ultraviolet lithography etching or metrology, light sources are required which emit extreme ultraviolet (EUV) radiation and/or soft X-rays, that is, at 丨nm and 20 nm. Within the wavelength range. These devices are currently the most promising candidates for high power light sources for use in the upcoming lithography tool for the semiconductor industry. It is known in the art how to efficiently generate extreme ultraviolet light using highly ionized plasma at a wavelength of 13.5 nm by means of a high power laser beam (laser produced plasma (LPP)) or Excitation of the plasma from the target material that emits extreme ultraviolet rays can be generated by a charged gas discharge (discharge produced plasma (DPP)) between the electrodes. The gas discharge light source comprises: at least two electrodes (anode, cathode) which are separated from each other to form a gap between the electrodes. The electrical energy required for the pulsed operation of the discharge lamp is provided by means of a capacitor 201212726, in which energy is first stored and subsequently discharged via the electrodes. The system is typically filled with a discharge material over a pressure range of 1 Pa to 100 Pa. Since the magnetic compression "pinchpiasnia" is heated to a temperature of several tens of eV, the magnetic compression is attributed to the application of pulse currents of usually several tens of kA to at most 1 〇〇 kA and usually tens of ns to several hundred ns. Pulse duration. In the DPP-based system of the current state of the art, changes from gas supply to liquid metal based discharge materials are achieved. W02005/02 5280A2 discloses a system in which liquid metal is applied to two rotating disk electrodes. Pulsed lasers trigger discharge by evaporating at least some portion of the liquid metal, specifically tin from a liquid metal layer, which is formed on the electrodes. The capacitor bank is discharged via metal vapor to generate a high current pinch-zoom. The use of this system' achieves a higher conversion efficiency than a gas based system, thus obtaining a greater amount of extreme ultraviolet photons. The generation of large light power requires a relatively high average electrical power that must be fed into the source. This can result in stronger electrode rot and thus shorten the life of the electrode system. In addition, due to changes in the geometry of the electrodes, the space of the plasma will become larger, resulting in the following effects. Only a small portion of the generated light can be utilized, thus reducing optical performance. The use of a refractory metal electrode (e.g., tungsten (w) or molybdenum (M?)) in a plasma discharge lamp operated with liquid metal and the liquid metal film reduces the degree of electrode corrosion. However, liquid metal must exhibit the appropriate lake wet behavior of 201212726 and a sufficiently strong adhesion to the electrode material. If the liquid metal film does not permanently adhere to the electrode surface permanently, this may result in unstable liquid metal film thickness values, cathode spots, electrode corrosion, and more harmful effects, which ultimately leads to a reduction in electrode life. Prior to operating such a plasma discharge lamp, a preliminary step must be performed to ensure reliable wetting of the liquid metal on the electrode surface, wherein at least one of the electrodes of the electrode is coated with liquid metal in the plasma discharge lamp. These standard in-situ wetting procedures are complex, time consuming, and block extreme ultraviolet plasma discharge lamps for a significant amount of time because of the need for several hours of steps that must be performed in extreme ultraviolet lamps. The normal daily operation is repeated and repeated, thus reducing the overall efficiency of the lamp. SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for improving the operational efficiency and service life of a plasma discharge lamp based on liquid metal, and to provide such a plasma discharge lamp having an added efficiency, the plasma discharge lamp Produces extreme UV radiation and/or soft X-rays. This object is achieved by a method such as request item 1, request item 2, request item 丨丨 and request item i 2 and a plasma discharge lamp. Advantageous embodiments of the method and lamp are the subject matter of the dependent claims, or advantageous embodiments of the method and lamp are described in the following description and examples. The proposed method improves the operating efficiency and service life of a plasma discharge lamp that produces extreme ultraviolet radiation and/or soft xenon light, the lamp comprising at least two electrodes and members, the electrodes being refractory 201212726 Metal Formation 'This component is used to apply liquid metal to the surface portion of at least one of the electrodes during operation of the lamp. In the proposed method, 'according to the first alternative embodiment, the at least one electrode of the electrodes is pretreated in a pretreatment step, in which at least the surface portion of the electrode is subjected to the liquid metal Contacting, and while in contact with the liquid metal, at least the surface portion of the electrode is thermally annealed at a temperature of 〇800 〇c to cause a temperature-controlled reaction zone on the electrode The refractory metal reacts with the liquid metal. If the liquid metal is applied to the surface portions of the two electrodes during operation of the lamp, both electrodes are pretreated in the pretreatment step. According to a first alternative embodiment, a layer of additional material is deposited on the surface portion of the electrode during the pre-treating step, the additional material being selected to improve the wetting behavior of the surface portion to the liquid metal. In two alternative embodiments, the surface portion of the electrode is pretreated to produce a layer (reaction zone or layer of additional material) having a surface portion that is better than an electrode surface that does not have the layer. For the wetting behavior of the liquid metal. In a preferred embodiment, the method is applied to an electro-discharge discharge lamp having two electrode wheels that rotate during operation of the lamp. The electrode trains are mounted above the two containers. The containers have a liquid metal such that the electrode wheels are partially immersed in the liquid metal. Therefore, the liquid metal is applied to the peripheral surfaces of the electrode wheels during the rotation. In order to improve the efficiency of the lamp according to the proposed method, the electrode wheels are disassembled to perform the pre-treatment step, in particular, 201212726, in a furnace suitable for performing thermal annealing. During the annealing step, an electrode wheel such as a crucible may be completely immersed in a crucible containing a liquid metal in order to avoid a reaction at a central portion of the electrode wheel, where the wheel is partially in the center of the core Mounted in the discharge lamp, the center portions can be shielded with a suitable flat plate. After the pre-treatment step, the electrode wheels are mounted in the discharge lamp, which can then be operated with the pre-treated electrode wheels. Even though the above embodiments show a preferred discharge lamp using one of the methods, the proposed method can be applied to other battery discharge lamps in which at least one of the electrodes is operated during operation. The liquid metal is full of moisture. The electrodes of the lamp may have other geometric forms than the electrode wheel and the liquid metal may be applied to the surface of the at least one electrode. With a first alternative embodiment of the proposed method, a thin layer is formed on the dedicated surface portion of the electrode. The thin layer is referred to as the reaction zone. The thin layer of the refractory metal and the coated golden eyebrow, which is a stable compound, exhibits a humidity control behavior and adhesion to a liquid metal, and a strong resistance. Applying the same method to the deposition of the second alternative embodiment: Thus, the time spent in the in situ wetting procedure (i.e., the initial and daily wetting as discussed above) can be greatly reduced, or even skip = Wait for 2 wetting procedures. Therefore, the resistance of the electric lamp is reduced: compared with the short downtime, this means that the lamp has a relatively high overall efficiency. 1 Due to the higher resistance, the service life is prolonged, so the extension lamp is used. The use of the pole can be °p. Considering the service life of the lamp or electrode 201212726 'This pre-processing step must be performed only once but can be repeated occasionally. Usually, when the material of the electrode is such as hip or ". In the case of a refractory metal, the liquid metal applied to the electrodes is tin (Sn). However, liquid helium generally exhibits poor adhesion to such poorly soluble metals. This result is primarily due to Sn and W or M, respectively. The lower mutual solubility. Using the proposed method, a thin, non-critical reaction zone or layer is formed on the surface of the electrodes, the reaction zone or layer exhibiting excellent wettability to the liquid metal on the surface of the electrodes And adhesion. A reaction zone having a controlled depth is formed according to the method to prevent the electrode from continuing to corrode via the reaction. Preferably, the pretreatment step is performed such that the thickness (depth) of the reaction zone is between (10) coffee and 5_. For this reason, the reaction parameters such as gas atmosphere, annealing temperature and annealing time must be appropriately controlled. Preferably, the annealing step is performed for a period of time between i h and 24 h at a temperature between 1 C and 1 C. The annealing step may be performed in a vacuum or in a dedicated gas atmosphere (for example, in a gas atmosphere containing 95% N2/5% H2 or H2 or Ar), preferably at 1 〇〇sccm and Between 1 5 〇〇 sccm. In another embodiment, the pre-processing step can include: two sub-steps. In the f-substep, the surface of the electrode is reduced in a reducing gas atmosphere (e.g., in a NVH2 mixture) at an elevated temperature to remove any oxide or oxide layer from the surface of the electrode. In the second sub-step below, the heat 201212726 annealing step is performed in contact with the liquid metal as described above. In a consistent embodiment, the pre-treatment step is achieved by a dedicated in-situ deposition process followed by "transport, k-pretreated regions. The idea of hiding in this context" Yes: A "wetting accelerator" is applied as the first layer on the refractory electrodes in preparation for the subsequent significant wetting by Sn. The deposition process can be performed by vacuum-based techniques such as 'physical vapor deposition (physicai V叩_~can-PVD) such as arc evaporation or non-vacuum deposition (such as current processing), or in both configurations The deposition process is performed by a brazing process in the case where it is feasible. In any case, the (different) material having good adhesion to the refractory metal is preferably used as the material of the first layer on the electrode substrate ( "Wetness Promoter"). For example, the materials may be Ni, C] or Cu, and the materials have a standard film thickness value of a few microns. This layer may serve as a sacrificial layer, that is, due to advancement. The reaction and interdiffusion, the layer can be consumed in the application t. In addition to the purpose of forming a stable interface phase between the solvent-resistant substrate and Sn, this stabilizes the structure as described in the previous section. By the pretreatment of the electrodes, the wetting behavior is improved 'thus improving the control of the thickness of the liquid metal, thereby minimizing the extreme degradation', maintaining the usual performance over the service life, extending the extreme ultraviolet rays The useful time of the lamp, increasing the general service life and reducing the time required to assemble or polish the light source head. This method produces a reliably wetted electrode surface that reduces the time for the in situ wetting procedure, thus The overall efficiency of the use of the lamp is improved. 201212726 [Embodiment] The proposed method can be applied to a plasma discharge lamp, which generates extreme ultraviolet radiation and/or soft X-ray, as illustrated in Fig. 1. The gas discharge lamp comprises: two electrode wheels 1, 2 (cathode, anode), which are separated from each other to form a gap between the electrode wheels. Operation of the two electrode wheels 1, 2 at the lamp During the rotation, while partially immersing in the container 3', the container 3 contains a liquid metal, such as due to the rotation in the liquid metal, the tin film 4 is formed on the peripheral surface of the electrode wheel. The electrode wheels are electrically connected via the tin bath. Connected to the capacitor bank 5, the electric grid group 5 supplies a pulse current to the electrode wheels 2. The electricity is activated by evaporating a portion of the liquid tin with a pulsed laser beam 6 of the laser source 7. . Plasma 8 to be issued by the
將該等電極輪浸沒在含有液態& 液態Sn的掛禍中， 且將該等 聚放電8 ’如該圖中示意性地圖示。 極氣外線輻射及/或柔和的X光線。驾 真空腔室中（該圖中未圖示）。此外， 201212726 電極輪在合適的爐中與該液態Sn進行接觸來進行熱退 火。此舉允許液態材料與固態材料之間的受控反應，該 又控反應導致在該等介面處形成Mo-Sn相。舉例而言， 在3 h之退火時間後，在85(rc之退火溫度下及25〇 sccm 之氣流中形成反應區（Mo_Sn相），該反應區具有 <丨μπι 之深度。必須控制反應時間，以避免對於基底材料（亦 即’電極之材料）之顯著的再結晶產生任何潛在的有害 效應。 亦可以向固體輸送液體之任何其他方式發生該反應， 而非將該專電極輪浸入具有液態金屬之掛禍。舉例而 & ’亦有可能將Sn成份作為氧化物粉末材料而進行輸 送。此舉需要在例如約7 0 0 °C之溫度下，在合適的氣體 氣氛條件下（例如’ N2/H2氣體氣氛），在爐中將該Sn 成份初步還原成金屬態。 第2圖示意性地圖示反應區9，在退火步驟期間，在 反應區9中形成Mo-Sn相。為了避免在電極輪之側面之 中心部分上形成反應區，在將電極輪1浸入具有液態Sn 之掛渦之刖’將（例如）Mo、W、剛玉或石墨之平板固 又在電極輪1之側面。在該退火步驟之後移除該等平 板。隨後將該等電極輪安裝在放電燈中，該放電燈可隨 後以已知方式進行操作。 該反應區為一薄層，該薄層在電極輪之表面部分上形 成。形成該薄層之Mo-Sn相更容易且永久地為sn所潤 濕。因此促使材料系統克服对溶金屬之通常的不足，以 12 201212726 形成堅固的表面錯合物或與Sn連接的金屬鍵，此舉改 進介面區域中的相互擴散及溶解’亦即改進該電極表面 上液態Sn之潤濕性及黏著力。另一優點在於，介面處 具有劇烈的反應之系統中(如本情況)的最終调濕通常對 環境因素的敏感度比難溶解的系統差些m咸少了 電極腐姓。 在另一實施例中，該預處理步驟之第一部分包含以下 步驟：在經提高之溫度7，在還原性氣體氣t (特定言 之疋Nz/H2混合氣）中移除該電極基底材料上之潛在的 氧化物。在Mo作為基底電極材料的情況下，通常需要 在3有H2之環i見下丨000°c以上的溫度以消除所吸附的 雜質層（〇、C)。然後，將該電極基底材料浸入該液態金 屬，以允許裸露電極材料成份與液態金屬物質之間發生 相互作用。如上所述，隨後執行退火步驟。 雖然在前面的描述中之目4中已詳細地說明並描述了 本發明，但該等說明及描述將視為說明性的或示例性的 而非限制性的，本發明不侷限於所揭示的實施例。第2 圖之反應區亦可為另外的材料層所代替，如Ni、心或The electrode wheels are immersed in a liquid containing liquid & liquid Sn, and the isoelectric discharge 8' is schematically illustrated in the figure. Extreme air radiation and/or soft X-rays. Drive into the vacuum chamber (not shown in the figure). In addition, the 201212726 electrode wheel is brought into contact with the liquid Sn in a suitable furnace for thermal annealing. This allows for a controlled reaction between the liquid material and the solid material, which results in the formation of a Mo-Sn phase at the interfaces. For example, after an annealing time of 3 h, a reaction zone (Mo_Sn phase) is formed at 85 rc annealing temperature and 25 〇 sccm gas flow, and the reaction zone has a depth of < 丨μπι. The reaction time must be controlled. To avoid any potentially harmful effects on the significant recrystallization of the substrate material (ie, the material of the electrode). The reaction may also occur in any other way to transport the liquid to the solid, rather than immersing the dedicated electrode wheel in a liquid state. Metal hazards. For example, & 'It is also possible to transport the Sn component as an oxide powder material. This is required, for example, at a temperature of about 700 ° C under suitable gas atmosphere conditions (eg ' N2/H2 gas atmosphere), the Sn component is initially reduced to a metallic state in a furnace. Fig. 2 schematically illustrates a reaction zone 9, in which a Mo-Sn phase is formed in the reaction zone 9. Avoid forming a reaction zone on the central portion of the side of the electrode wheel, immersing the electrode wheel 1 in a vortex with a liquid Sn, and fixing the plate of, for example, Mo, W, corundum or graphite to the side of the electrode wheel 1 The plates are removed after the annealing step. The electrode wheels are then mounted in a discharge lamp, which can then be operated in a known manner. The reaction zone is a thin layer on the electrode wheel Formed on the surface portion. The Mo-Sn phase forming the thin layer is more easily and permanently wetted by sn. This motivates the material system to overcome the usual deficiencies to the molten metal, forming a solid surface complex or 12 201212726 a metal bond connected to Sn, which improves interdiffusion and dissolution in the interface region', that is, improves the wettability and adhesion of liquid Sn on the surface of the electrode. Another advantage is that the interface has a violent reaction in the system. The final conditioning (as in this case) is generally less sensitive to environmental factors than the insoluble system. Salt is less salty. In another embodiment, the first part of the pretreatment step comprises the following steps: After the elevated temperature 7, the potential oxide on the electrode substrate material is removed in the reducing gas gas t (specifically, the Nz/H2 mixture gas). In the case where Mo is used as the substrate electrode material, It is often necessary to eliminate the adsorbed impurity layer (〇, C) at a temperature of 3 H000°c or more in the ring of H2. Then, the electrode substrate material is immersed in the liquid metal to allow the composition of the exposed electrode material to be An interaction occurs between the liquid metal species. As described above, the annealing step is subsequently performed. Although the invention has been illustrated and described in detail in the foregoing description, the description and description are to be regarded as illustrative The invention is not limited to the disclosed embodiments, and the reaction zone of Fig. 2 may be replaced by another layer of material, such as Ni, heart or
Cu，該材料層沈積在該電極表面上。亦可將上述及申請 專利範圍中的；F同實施例進行組合。熟習此項技術者在 研究圖式、揭示内容及隨附申請專利範圍之後，可在實 戔本發月之過程中理解並實現所揭示的實施例之其他變 化。 在申請專利範圍中，用語「包含」不排除其他元件或 13 201212726 步驟，且不定冠詞「一」不排除複數。在相互不同的請 求項中敍述了措施之簡單事實並不表明該等措施之組合 不可有利地使用。S玄等請求項中之元件符號不應視為限 制該等請求項之範疇。 【圖式簡單說明】 在上文中’以舉例而非限制本發明保護範疇之方式描 述了所提出的方法及放電燈，本發明之保護範疇由申請 專利範圍所定義。該等圖式圖示： 第1圖為根據本發明之電漿放電燈之實例之示意圖； 以及 第2圖為根據所提出方法之經預處理之電極輪之示意 圖。 【主要元件符號說明】 1 電極輪 2 電極輪 3 容器 4 錫膜 5 電容器組 6 脈衝雷射光束 7 雷射光源 8 電漿 9 反應區 14Cu, the layer of material is deposited on the surface of the electrode. The above and the scope of the patent application can also be combined with the embodiment. Other variations to the disclosed embodiments can be understood and effected by those skilled in the <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; In the scope of the patent application, the term "comprising" does not exclude other elements or steps 201212,26, and the indefinite article "a" does not exclude the plural. The mere fact that the measures are recited in mutually different claims does not imply that the combination of the measures may not be used. The symbolic symbols in the request items such as S Xuan et al. shall not be construed as limiting the scope of such claims. BRIEF DESCRIPTION OF THE DRAWINGS The proposed method and discharge lamp are described above by way of example and not limitation of the scope of the invention. The scope of the invention is defined by the scope of the claims. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic illustration of an example of a plasma discharge lamp in accordance with the present invention; and Figure 2 is a schematic illustration of a pre-treated electrode wheel in accordance with the proposed method. [Main component symbol description] 1 Electrode wheel 2 Electrode wheel 3 Container 4 Tin film 5 Capacitor group 6 Pulsed laser beam 7 Laser source 8 Plasma 9 Reaction zone 14