ATE489839T1 - Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät - Google Patents

Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät

Info

Publication number
ATE489839T1
ATE489839T1 AT07735799T AT07735799T ATE489839T1 AT E489839 T1 ATE489839 T1 AT E489839T1 AT 07735799 T AT07735799 T AT 07735799T AT 07735799 T AT07735799 T AT 07735799T AT E489839 T1 ATE489839 T1 AT E489839T1
Authority
AT
Austria
Prior art keywords
soft
liquid material
discharge space
conversion efficiency
corresponding apparatus
Prior art date
Application number
AT07735799T
Other languages
English (en)
Inventor
Jeroen Jonkers
Dominik Vaudrevange
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE489839T1 publication Critical patent/ATE489839T1/de

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
AT07735799T 2006-05-16 2007-05-08 Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät ATE489839T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06113972 2006-05-16
PCT/IB2007/051716 WO2007135587A2 (en) 2006-05-16 2007-05-08 A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus

Publications (1)

Publication Number Publication Date
ATE489839T1 true ATE489839T1 (de) 2010-12-15

Family

ID=38578629

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07735799T ATE489839T1 (de) 2006-05-16 2007-05-08 Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät

Country Status (9)

Country Link
US (1) US8040030B2 (de)
EP (1) EP2020165B1 (de)
JP (1) JP5574705B2 (de)
KR (1) KR101396158B1 (de)
CN (1) CN101444148B (de)
AT (1) ATE489839T1 (de)
DE (1) DE602007010765D1 (de)
TW (1) TWI420976B (de)
WO (1) WO2007135587A2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
JP5386799B2 (ja) * 2007-07-06 2014-01-15 株式会社ニコン Ｅｕｖ光源、ｅｕｖ露光装置、ｅｕｖ光放射方法、ｅｕｖ露光方法および電子デバイスの製造方法
DE102007060807B4 (de) * 2007-12-18 2009-11-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungsquelle, insbesondere für EUV-Strahlung
WO2009083175A1 (en) * 2007-12-27 2009-07-09 Asml Netherlands B.V. Extreme ultraviolet radiation source and method for producing extreme ultraviolet radiation
NL2002890A1 (nl) * 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
EP2308272B1 (de) * 2008-07-28 2012-09-19 Philips Intellectual Property & Standards GmbH Verfahren und vorrichtung zur erzeugung von euv-strahlung oder weichen röntgenstrahlen
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
KR101622272B1 (ko) 2008-12-16 2016-05-18 코닌클리케 필립스 엔.브이. 향상된 효율로 ｅｕｖ 방사선 또는 소프트 ｘ선을 생성하기 위한 방법 및 장치
JP5245857B2 (ja) * 2009-01-21 2013-07-24 ウシオ電機株式会社 極端紫外光光源装置
JP5504673B2 (ja) * 2009-03-30 2014-05-28 ウシオ電機株式会社 極端紫外光光源装置
CN103281855B (zh) * 2013-05-16 2015-10-14 中国科学院光电研究院 一种用于激光光源的液态金属靶产生装置
CN104394642B (zh) * 2014-12-07 2017-03-08 湖南科技大学 激光等离子体共振x光源
CN105376919B (zh) * 2015-11-06 2017-08-01 华中科技大学 一种激光诱导液滴靶放电产生等离子体的装置
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы

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JPS63164199A (ja) * 1986-12-25 1988-07-07 Shimadzu Corp Ｘ線発生装置用タ−ゲツト装置
US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5866871A (en) 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002214400A (ja) 2001-01-12 2002-07-31 Toyota Macs Inc レーザープラズマｅｕｖ光源装置及びそれに用いられるターゲット
TW589924B (en) * 2001-04-06 2004-06-01 Fraunhofer Ges Forschung Process and device for producing extreme ultraviolet ray/weak x-ray
CN1314300C (zh) * 2001-06-07 2007-05-02 普莱克斯有限责任公司 星形箍缩的x射线和远紫外线光子源
DE10219173A1 (de) * 2002-04-30 2003-11-20 Philips Intellectual Property Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung
EP1401248B1 (de) 2002-09-19 2012-07-25 ASML Netherlands B.V. Strahlungsquelle, Lithographiegerät und Methode zur Herstellung von Bauelementen
SG153664A1 (en) * 2002-09-19 2009-07-29 Asml Netherlands Bv Radiation source, lithographic apparatus, and device manufacturing method
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DE10310623B8 (de) * 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
JP4052155B2 (ja) 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
EP1642482B1 (de) * 2003-06-27 2013-10-02 Bruker Advanced Supercon GmbH Vorrichtung und verfahren zur erzeugung von extrem ultravioletter strahlung oder weicher röntgenstrahlung
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
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JP2005141158A (ja) 2003-11-10 2005-06-02 Canon Inc 照明光学系及び露光装置
DE10359464A1 (de) 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
US7075096B2 (en) 2004-02-13 2006-07-11 Plex Llc Injection pinch discharge extreme ultraviolet source

Also Published As

Publication number Publication date
KR101396158B1 (ko) 2014-05-19
WO2007135587A2 (en) 2007-11-29
US8040030B2 (en) 2011-10-18
JP2009537943A (ja) 2009-10-29
CN101444148B (zh) 2013-03-27
JP5574705B2 (ja) 2014-08-20
US20090206268A1 (en) 2009-08-20
TWI420976B (zh) 2013-12-21
KR20090021168A (ko) 2009-02-27
WO2007135587A3 (en) 2008-04-24
TW200814858A (en) 2008-03-16
DE602007010765D1 (de) 2011-01-05
EP2020165A2 (de) 2009-02-04
EP2020165B1 (de) 2010-11-24
CN101444148A (zh) 2009-05-27

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