JP5574705B2 - Euvランプおよび/または軟x線ランプおよび対応する装置の変換効率を高める方法 - Google Patents
Euvランプおよび/または軟x線ランプおよび対応する装置の変換効率を高める方法 Download PDFInfo
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- JP5574705B2 JP5574705B2 JP2009510578A JP2009510578A JP5574705B2 JP 5574705 B2 JP5574705 B2 JP 5574705B2 JP 2009510578 A JP2009510578 A JP 2009510578A JP 2009510578 A JP2009510578 A JP 2009510578A JP 5574705 B2 JP5574705 B2 JP 5574705B2
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- liquid material
- soft
- discharge space
- euv
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Description
2 第2電極
3 回転軸線
4 第1容器
5 第2容器
6 溶融錫
7 コンデンサバンク
8 ピンチプラズマ
9 レーザーパルス
10 ガスノズル
11 ガス
Claims (6)
- 放電スペース内の蒸発した液体材料によって形成されるガス状媒体内で、EUV放射線および/または軟X線を放出する放電プラズマが発生され、前記液体材料が、前記放電スペースの少なくとも1つの回転ホイールの表面に供給されエネルギービームによって少なくとも一部が蒸発されるようになっている、EUVランプおよび/または軟X線ランプの変換効率を高める方法において、
前記液体材料の化学元素よりも質量数が小さい化学元素から構成されたガスを、指向された状態で、前記液体材料で覆われた前記回転ホイールの表面へ、少なくとも1つのノズルを介して局所的に供給し、前記放電スペース内の前記蒸発した液体材料の密度を低下させることを特徴とする、EUVランプおよび/または軟X線ランプの変換効率を高める方法。 - 前記液体材料は、少なくとも1つのレーザーパルスによって蒸発されることを特徴とする、請求項1に記載の方法。
- 前記液体材料は、溶融金属であることを特徴とする、請求項1に記載の方法。
- 前記ガスは、酸素であることを特徴とする、請求項3に記載の方法。
- 作動中回転され得る回転自在なホイールとして構成され、少なくとも2つの電極の間に配置された放電スペース内のガス状媒体内でプラズマを発生できるように、互いに所定の距離に配置された少なくとも2つの電極と、前記電極の少なくとも1つの表面に液体材料を供給するためのデバイスと、前記表面にエネルギービームを向け、前記供給された液体材料を少なくとも部分的に蒸発させ、よって前記ガス状媒体を発生するようになっているエネルギービームデバイスと、を備える、電気的に励起される放電によりEUV放射線および/または軟X線を発生するための装置において、
前記液体材料によって覆われている前記電極の少なくとも1つの表面へ、指向された状態で、前記液体材料の化学元素よりも質量数が小さい化学元素から構成されたガスを局所的に供給し、よって前記放電スペース内の蒸発した液体材料の密度を低下させるよう、前記ガスを供給するための少なくとも1つのノズルが前記装置内に配置されていることを特徴とする、EUV放射線および/または軟X線を発生するための装置。 - 前記電極は、回転中、前記液体材料を収容する容器内に浸漬することを特徴とする、請求項5に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06113972 | 2006-05-16 | ||
EP06113972.1 | 2006-05-16 | ||
PCT/IB2007/051716 WO2007135587A2 (en) | 2006-05-16 | 2007-05-08 | A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009537943A JP2009537943A (ja) | 2009-10-29 |
JP2009537943A5 JP2009537943A5 (ja) | 2010-06-24 |
JP5574705B2 true JP5574705B2 (ja) | 2014-08-20 |
Family
ID=38578629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009510578A Active JP5574705B2 (ja) | 2006-05-16 | 2007-05-08 | Euvランプおよび/または軟x線ランプおよび対応する装置の変換効率を高める方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US8040030B2 (ja) |
EP (1) | EP2020165B1 (ja) |
JP (1) | JP5574705B2 (ja) |
KR (1) | KR101396158B1 (ja) |
CN (1) | CN101444148B (ja) |
AT (1) | ATE489839T1 (ja) |
DE (1) | DE602007010765D1 (ja) |
TW (1) | TWI420976B (ja) |
WO (1) | WO2007135587A2 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
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US20080239262A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation |
JP5386799B2 (ja) * | 2007-07-06 | 2014-01-15 | 株式会社ニコン | Euv光源、euv露光装置、euv光放射方法、euv露光方法および電子デバイスの製造方法 |
DE102007060807B4 (de) * | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
EP2236014A1 (en) * | 2007-12-27 | 2010-10-06 | ASML Netherlands B.V. | Extreme ultraviolet radiation source and method for producing extreme ultraviolet radiation |
NL2002890A1 (nl) * | 2008-06-16 | 2009-12-17 | Asml Netherlands Bv | Lithographic apparatus. |
WO2010013167A1 (en) * | 2008-07-28 | 2010-02-04 | Philips Intellectual Property & Standards Gmbh | Method and device for generating euv radiation or soft x-rays |
JP4623192B2 (ja) * | 2008-09-29 | 2011-02-02 | ウシオ電機株式会社 | 極端紫外光光源装置および極端紫外光発生方法 |
WO2010070540A1 (en) | 2008-12-16 | 2010-06-24 | Philips Intellectual Property & Standards Gmbh | Method and device for generating euv radiation or soft x-rays with enhanced efficiency |
JP5245857B2 (ja) * | 2009-01-21 | 2013-07-24 | ウシオ電機株式会社 | 極端紫外光光源装置 |
JP5504673B2 (ja) * | 2009-03-30 | 2014-05-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
CN103281855B (zh) * | 2013-05-16 | 2015-10-14 | 中国科学院光电研究院 | 一种用于激光光源的液态金属靶产生装置 |
CN104394642B (zh) * | 2014-12-07 | 2017-03-08 | 湖南科技大学 | 激光等离子体共振x光源 |
CN105376919B (zh) * | 2015-11-06 | 2017-08-01 | 华中科技大学 | 一种激光诱导液滴靶放电产生等离子体的装置 |
RU2670273C2 (ru) * | 2017-11-24 | 2018-10-22 | Общество с ограниченной ответственностью "РнД-ИСАН" | Устройство и способ для генерации излучения из лазерной плазмы |
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JPS63164199A (ja) * | 1986-12-25 | 1988-07-07 | Shimadzu Corp | X線発生装置用タ−ゲツト装置 |
US6031241A (en) * | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
US5866871A (en) | 1997-04-28 | 1999-02-02 | Birx; Daniel | Plasma gun and methods for the use thereof |
US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
JP2002214400A (ja) | 2001-01-12 | 2002-07-31 | Toyota Macs Inc | レーザープラズマeuv光源装置及びそれに用いられるターゲット |
TW589924B (en) * | 2001-04-06 | 2004-06-01 | Fraunhofer Ges Forschung | Process and device for producing extreme ultraviolet ray/weak x-ray |
WO2002102122A1 (en) * | 2001-06-07 | 2002-12-19 | Plex Llc | Star pinch x-ray and extreme ultraviolet photon source |
DE10219173A1 (de) * | 2002-04-30 | 2003-11-20 | Philips Intellectual Property | Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung |
US7528395B2 (en) * | 2002-09-19 | 2009-05-05 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
EP1401248B1 (en) * | 2002-09-19 | 2012-07-25 | ASML Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
SG129259A1 (en) * | 2002-10-03 | 2007-02-26 | Asml Netherlands Bv | Radiation source lithographic apparatus, and device manufacturing method |
US7002168B2 (en) * | 2002-10-15 | 2006-02-21 | Cymer, Inc. | Dense plasma focus radiation source |
AU2003294600A1 (en) | 2002-12-10 | 2004-06-30 | Digitome Corporation | Volumetric 3d x-ray imaging system for baggage inspection including the detection of explosives |
DE10310623B8 (de) * | 2003-03-10 | 2005-12-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum |
JP4052155B2 (ja) * | 2003-03-17 | 2008-02-27 | ウシオ電機株式会社 | 極端紫外光放射源及び半導体露光装置 |
JP2007515741A (ja) * | 2003-06-27 | 2007-06-14 | イクストリーメ テクノロジース ゲゼルシャフト ミット ベシュレンクテル ハフツング | 極紫外線放射又は軟x線放射を作り出すための方法及び装置 |
DE10342239B4 (de) * | 2003-09-11 | 2018-06-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung |
FR2860385B1 (fr) | 2003-09-26 | 2007-06-01 | Cit Alcatel | Source euv |
JP2005141158A (ja) | 2003-11-10 | 2005-06-02 | Canon Inc | 照明光学系及び露光装置 |
DE10359464A1 (de) | 2003-12-17 | 2005-07-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung |
US7075096B2 (en) * | 2004-02-13 | 2006-07-11 | Plex Llc | Injection pinch discharge extreme ultraviolet source |
-
2007
- 2007-05-08 AT AT07735799T patent/ATE489839T1/de not_active IP Right Cessation
- 2007-05-08 WO PCT/IB2007/051716 patent/WO2007135587A2/en active Application Filing
- 2007-05-08 CN CN200780017732XA patent/CN101444148B/zh active Active
- 2007-05-08 KR KR1020087030546A patent/KR101396158B1/ko active IP Right Grant
- 2007-05-08 EP EP07735799A patent/EP2020165B1/en active Active
- 2007-05-08 DE DE602007010765T patent/DE602007010765D1/de active Active
- 2007-05-08 JP JP2009510578A patent/JP5574705B2/ja active Active
- 2007-05-08 US US12/300,858 patent/US8040030B2/en active Active
- 2007-05-11 TW TW096116896A patent/TWI420976B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN101444148A (zh) | 2009-05-27 |
KR101396158B1 (ko) | 2014-05-19 |
JP2009537943A (ja) | 2009-10-29 |
KR20090021168A (ko) | 2009-02-27 |
WO2007135587A3 (en) | 2008-04-24 |
CN101444148B (zh) | 2013-03-27 |
TW200814858A (en) | 2008-03-16 |
US8040030B2 (en) | 2011-10-18 |
EP2020165B1 (en) | 2010-11-24 |
EP2020165A2 (en) | 2009-02-04 |
ATE489839T1 (de) | 2010-12-15 |
WO2007135587A2 (en) | 2007-11-29 |
DE602007010765D1 (de) | 2011-01-05 |
TWI420976B (zh) | 2013-12-21 |
US20090206268A1 (en) | 2009-08-20 |
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