DE102007020742B8 - Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung - Google Patents

Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung Download PDF

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Publication number
DE102007020742B8
DE102007020742B8 DE102007020742A DE102007020742A DE102007020742B8 DE 102007020742 B8 DE102007020742 B8 DE 102007020742B8 DE 102007020742 A DE102007020742 A DE 102007020742A DE 102007020742 A DE102007020742 A DE 102007020742A DE 102007020742 B8 DE102007020742 B8 DE 102007020742B8
Authority
DE
Germany
Prior art keywords
arrangement
gas discharge
electrical currents
large electrical
currents via
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102007020742A
Other languages
English (en)
Other versions
DE102007020742B3 (de
Inventor
Vladimir Dr. Korobochko
Alexander Keller
Jürgen Dr. Kleinschmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Xtreme Technologies GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Technologies GmbH filed Critical Xtreme Technologies GmbH
Priority to DE102007020742A priority Critical patent/DE102007020742B8/de
Priority to US12/041,121 priority patent/US7595594B2/en
Priority to JP2008061128A priority patent/JP4314309B2/ja
Priority to NL2001452A priority patent/NL2001452C2/nl
Application granted granted Critical
Publication of DE102007020742B3 publication Critical patent/DE102007020742B3/de
Publication of DE102007020742B8 publication Critical patent/DE102007020742B8/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/52—Generating plasma using exploding wires or spark gaps
DE102007020742A 2007-04-28 2007-04-28 Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung Expired - Fee Related DE102007020742B8 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102007020742A DE102007020742B8 (de) 2007-04-28 2007-04-28 Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung
US12/041,121 US7595594B2 (en) 2007-04-28 2008-03-03 Arrangement for switching high electric currents by a gas discharge
JP2008061128A JP4314309B2 (ja) 2007-04-28 2008-03-11 ガス放電による高電流切り換え装置
NL2001452A NL2001452C2 (nl) 2007-04-28 2008-04-07 Inrichting voor het schakelen van grote elektrische stromen over een gasontlading.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007020742A DE102007020742B8 (de) 2007-04-28 2007-04-28 Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung

Publications (2)

Publication Number Publication Date
DE102007020742B3 DE102007020742B3 (de) 2009-01-02
DE102007020742B8 true DE102007020742B8 (de) 2009-06-18

Family

ID=39886110

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102007020742A Expired - Fee Related DE102007020742B8 (de) 2007-04-28 2007-04-28 Anordnung zum Schalten großer elektrischer Ströme über eine Gasentladung

Country Status (4)

Country Link
US (1) US7595594B2 (de)
JP (1) JP4314309B2 (de)
DE (1) DE102007020742B8 (de)
NL (1) NL2001452C2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8464899B2 (en) * 2007-12-27 2013-06-18 Talyst Inc. Zero cross-contamination collector
US8409459B2 (en) * 2008-02-28 2013-04-02 Tokyo Electron Limited Hollow cathode device and method for using the device to control the uniformity of a plasma process
JP6126466B2 (ja) * 2013-06-03 2017-05-10 株式会社Ihi プラズマ光源
CN113126454B (zh) * 2021-04-28 2023-03-28 上饶市广丰时代科技有限公司 一种半导体光刻机及其使用方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) * 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
US20030183787A1 (en) * 2002-03-27 2003-10-02 Mitsuru Ikeuchi EUV radiation source
EP1406124A1 (de) * 2002-10-03 2004-04-07 ASML Netherlands B.V. Strahlungsquelle, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US6728337B2 (en) * 2001-06-07 2004-04-27 Plex Llc Star pinch plasma source of photons or neutrons
DE102005025624A1 (de) * 2005-06-01 2006-12-07 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3699384A (en) * 1971-09-07 1972-10-17 Hughes Aircraft Co Offswitching of liquid metal arc switching device by internal current diversion to an auxiliary electrode
US5126638A (en) * 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5399941A (en) * 1993-05-03 1995-03-21 The United States Of America As Represented By The Secretary Of The Navy Optical pseudospark switch
US5502356A (en) * 1994-05-02 1996-03-26 Plex Corporation Stabilized radial pseudospark switch
DE59710868D1 (de) * 1996-12-12 2003-11-20 Siemens Ag Niederdruck-gasentladungsschalter
US5973447A (en) * 1997-07-25 1999-10-26 Monsanto Company Gridless ion source for the vacuum processing of materials
CN1350698A (zh) * 1999-05-12 2002-05-22 熔化照明股份有限公司 高亮度微波灯
JP4246401B2 (ja) * 2001-01-18 2009-04-02 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム偏向装置
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE10336273A1 (de) * 2003-08-07 2005-03-10 Fraunhofer Ges Forschung Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung
DE10342239B4 (de) * 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) * 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6728337B2 (en) * 2001-06-07 2004-04-27 Plex Llc Star pinch plasma source of photons or neutrons
US20030183787A1 (en) * 2002-03-27 2003-10-02 Mitsuru Ikeuchi EUV radiation source
EP1406124A1 (de) * 2002-10-03 2004-04-07 ASML Netherlands B.V. Strahlungsquelle, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
DE102005025624A1 (de) * 2005-06-01 2006-12-07 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas

Also Published As

Publication number Publication date
NL2001452C2 (nl) 2010-07-13
US20080265779A1 (en) 2008-10-30
US7595594B2 (en) 2009-09-29
JP4314309B2 (ja) 2009-08-12
NL2001452A1 (nl) 2008-10-30
JP2008277266A (ja) 2008-11-13
DE102007020742B3 (de) 2009-01-02

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Legal Events

Date Code Title Description
8396 Reprint of erroneous front page
8364 No opposition during term of opposition
R081 Change of applicant/patentee

Owner name: USHIO DENKI KABUSHIKI KAISHA, JP

Free format text: FORMER OWNER: XTREME TECHNOLOGIES GMBH, 07745 JENA, DE

Effective date: 20110712

R081 Change of applicant/patentee

Owner name: USHIO DENKI KABUSHIKI KAISHA, JP

Free format text: FORMER OWNER: XTREME TECHNOLOGIES GMBH, 52074 AACHEN, DE

Effective date: 20131114

R082 Change of representative

Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, DE

Effective date: 20131114

R082 Change of representative

Representative=s name: PATENTANWAELTE OEHMKE UND KOLLEGEN, DE

Representative=s name: GLEIM PETRI OEHMKE PATENT- UND RECHTSANWALTSPA, DE

R082 Change of representative

Representative=s name: GLEIM PETRI PATENT- UND RECHTSANWALTSPARTNERSC, DE

Representative=s name: GLEIM PETRI OEHMKE PATENT- UND RECHTSANWALTSPA, DE

R082 Change of representative

Representative=s name: GLEIM PETRI PATENT- UND RECHTSANWALTSPARTNERSC, DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee