JP4157146B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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Publication number
JP4157146B2
JP4157146B2 JP2006545996A JP2006545996A JP4157146B2 JP 4157146 B2 JP4157146 B2 JP 4157146B2 JP 2006545996 A JP2006545996 A JP 2006545996A JP 2006545996 A JP2006545996 A JP 2006545996A JP 4157146 B2 JP4157146 B2 JP 4157146B2
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Prior art keywords
substrate
immersion liquid
barrier member
projection system
space
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Expired - Fee Related
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JP2006545996A
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Japanese (ja)
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JP2007515798A5 (https=
JP2007515798A (ja
Inventor
サンテン、ヘルマー ファン
コレスニーチェンコ、アレクセイ、ユーリービッチ
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006545996A 2003-12-23 2004-12-15 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4157146B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method
PCT/EP2004/014282 WO2005064405A2 (en) 2003-12-23 2004-12-15 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008062774A Division JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

Publications (3)

Publication Number Publication Date
JP2007515798A JP2007515798A (ja) 2007-06-14
JP2007515798A5 JP2007515798A5 (https=) 2007-08-02
JP4157146B2 true JP4157146B2 (ja) 2008-09-24

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JP2006545996A Expired - Fee Related JP4157146B2 (ja) 2003-12-23 2004-12-15 リソグラフィ装置及びデバイス製造方法
JP2008062774A Expired - Fee Related JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

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JP2008062774A Expired - Fee Related JP4526572B2 (ja) 2003-12-23 2008-03-12 リソグラフィ装置

Country Status (7)

Country Link
US (2) US7394521B2 (https=)
EP (3) EP3287848B1 (https=)
JP (2) JP4157146B2 (https=)
KR (1) KR100855337B1 (https=)
CN (2) CN101872129B (https=)
TW (1) TWI261151B (https=)
WO (1) WO2005064405A2 (https=)

Families Citing this family (218)

* Cited by examiner, † Cited by third party
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EP3287848B1 (en) 2018-11-07
CN100507721C (zh) 2009-07-01
CN1898606A (zh) 2007-01-17
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US7710541B2 (en) 2010-05-04
US7394521B2 (en) 2008-07-01
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