KR100855337B1 - 리소그래피 장치 및 디바이스 제조 방법 - Google Patents

리소그래피 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR100855337B1
KR100855337B1 KR1020067012462A KR20067012462A KR100855337B1 KR 100855337 B1 KR100855337 B1 KR 100855337B1 KR 1020067012462 A KR1020067012462 A KR 1020067012462A KR 20067012462 A KR20067012462 A KR 20067012462A KR 100855337 B1 KR100855337 B1 KR 100855337B1
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South Korea
Prior art keywords
substrate
immersion liquid
barrier member
projection system
space
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Expired - Fee Related
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KR1020067012462A
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English (en)
Korean (ko)
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KR20060103271A (ko
Inventor
헬마르 반 산텐
알렉세이 유리에비치 콜레스니첸코
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067012462A 2003-12-23 2004-12-15 리소그래피 장치 및 디바이스 제조 방법 Expired - Fee Related KR100855337B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/743,271 2003-12-23
US10/743,271 US7394521B2 (en) 2003-12-23 2003-12-23 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20060103271A KR20060103271A (ko) 2006-09-28
KR100855337B1 true KR100855337B1 (ko) 2008-09-04

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ID=34678626

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KR1020067012462A Expired - Fee Related KR100855337B1 (ko) 2003-12-23 2004-12-15 리소그래피 장치 및 디바이스 제조 방법

Country Status (7)

Country Link
US (2) US7394521B2 (https=)
EP (3) EP1697799A2 (https=)
JP (2) JP4157146B2 (https=)
KR (1) KR100855337B1 (https=)
CN (2) CN101872129B (https=)
TW (1) TWI261151B (https=)
WO (1) WO2005064405A2 (https=)

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* Cited by examiner, † Cited by third party
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