JP2016533636A - 空気圧エンドエフェクタ装置、基板搬送システム、及び基板搬送方法 - Google Patents
空気圧エンドエフェクタ装置、基板搬送システム、及び基板搬送方法 Download PDFInfo
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- JP2016533636A JP2016533636A JP2016517529A JP2016517529A JP2016533636A JP 2016533636 A JP2016533636 A JP 2016533636A JP 2016517529 A JP2016517529 A JP 2016517529A JP 2016517529 A JP2016517529 A JP 2016517529A JP 2016533636 A JP2016533636 A JP 2016533636A
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- 239000012636 effector Substances 0.000 title claims abstract description 77
- 239000000758 substrate Substances 0.000 title claims abstract description 72
- 238000000034 method Methods 0.000 title claims abstract description 24
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- 238000004519 manufacturing process Methods 0.000 claims abstract description 17
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- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000000712 assembly Effects 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
- 238000005219 brazing Methods 0.000 description 3
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- 239000002243 precursor Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
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- 239000000919 ceramic Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
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- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0052—Gripping heads and other end effectors multiple gripper units or multiple end effectors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
[0001]本出願は、2013年9月26日に、「PNEUMATIC END EFFECTOR APPARATUS,SYSTEMS,AND METHODS FOR TRANSPORTING SUSBTRATES」(代理人整理番号21232/L)の名称で出願された米国特許仮出願第61/882,787号に基づく優先権を主張し、ここに引用により全ての目的のため本出願に組み入れられる。
Claims (15)
- ロボット構成要素に接続されるように適合されたベースと、
前記ベース上に配置された空気圧吸引要素と、
を備えるエンドエフェクタ装置。 - 前記ベース上に配置された複数の空気圧吸引要素を備える、請求項1に記載のエンドエフェクタ装置。
- 前記エンドエフェクタが、少なくとも1lb.の合計吸引力を発生させるように適合されている、請求項1に記載のエンドエフェクタ装置。
- 前記ベースが、第一の層と第二の層を含み、空気圧通路が、前記第一の層と前記第二の層の間に形成されている、請求項1に記載のエンドエフェクタ装置。
- 少なくとも部分的に前記ベースの内部に形成された空気圧通路を備える、請求項1に記載のエンドエフェクタ装置。
- 前記ベースが、第一の層と第二の層を更に含み、少なくとも一つの空気圧通路が、前記層間に形成され、前記空気圧吸引要素に延びる、請求項1に記載のエンドエフェクタ装置。
- 前記空気圧吸引要素が、前記ベースに連結するように適合された本体と、前記本体に連結されたコンタクトパッドと、を備える、請求項1に記載のエンドエフェクタ装置。
- 前記空気圧吸引要素が、
案内部と、
内側凹部と、
前記内側凹部と交差する1つ以上のフローポートと、
を有する本体を備える、請求項1に記載のエンドエフェクタ装置。 - 前記空気圧吸引要素が、前記ベースに連結するように適合された本体と、前記本体と前記ベースとの間に形成され、空気圧通路を相互連結する環状フローチャネルと、を備える、請求項1に記載のエンドエフェクタ装置。
- 前記空気圧吸引要素が、前記ベースに連結するように適合された本体と、前記本体の中の内側凹部と、前記内側凹部の中へ通る1つ以上のフローポートと、を備える、請求項1に記載のエンドエフェクタ装置。
- 前記1つ以上のフローポートが、前記内側凹部の外壁に実質的に接して、前記内側凹部の中へ通る、請求項10に記載のエンドエフェクタ装置。
- 前記空気圧吸引要素が、前記ベースに連結された本体であって、前記本体の空洞の中に受け入れられる案内部と、前記案内部と前記空洞との間の環状フローチャネルと、を含む本体を備える、請求項1に記載のエンドエフェクタ装置。
- 電子デバイス製造システム構成要素間で基板を搬送する基板搬送システムであって、
ロボット構成要素と、
前記ロボット構成要素に連結されたエンドエフェクタであって、
ロボット構成要素に接続されるように適合されたベースと、
前記ベース上に配置された空気圧吸引要素と、
を含むエンドエフェクタと、
を備える、基板搬送システム。 - 前記ベースの中に少なくとも部分的に形成された一つ以上の空気圧通路と、前記一つ以上の空気圧通路に連結された空気圧供給システムと、を備える、請求項13に記載の基板搬送システム。
- 電子デバイス製造システムの構成要素間で基板を搬送する方法であって、
ロボット構成要素に連結され、1つ以上の空気圧吸引要素と、3つ以上のコンタクトパッドと、を有するエンドエフェクタを用意することと、
前記3つ以上のコンタクトパッドの上に基板を支持することと、
前記1つ以上の空気圧吸引要素の作用によって吸引力を発生させ、前記基板を引き寄せて、前記少なくとも3つのコンタクトパッドとの接触を、重力によって与えられる接触を超えて増加させることと、
を含む方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201361882787P | 2013-09-26 | 2013-09-26 | |
US61/882,787 | 2013-09-26 | ||
PCT/US2014/057479 WO2015048303A1 (en) | 2013-09-26 | 2014-09-25 | Pneumatic end effector apparatus, substrate transportation systems, and methods for transporting substrates |
Publications (3)
Publication Number | Publication Date |
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JP2016533636A true JP2016533636A (ja) | 2016-10-27 |
JP2016533636A5 JP2016533636A5 (ja) | 2017-11-02 |
JP6362681B2 JP6362681B2 (ja) | 2018-07-25 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2016517529A Expired - Fee Related JP6362681B2 (ja) | 2013-09-26 | 2014-09-25 | 空気圧エンドエフェクタ装置、基板搬送システム、及び基板搬送方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9202738B2 (ja) |
JP (1) | JP6362681B2 (ja) |
KR (1) | KR20160062095A (ja) |
CN (1) | CN105556654B (ja) |
TW (1) | TWI611997B (ja) |
WO (1) | WO2015048303A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20200065089A (ko) * | 2017-10-27 | 2020-06-08 | 케이엘에이 코포레이션 | 극도로 뒤틀린 웨이퍼를 위한 기판 처리 장치 |
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WO2015048303A1 (en) | 2015-04-02 |
US9202738B2 (en) | 2015-12-01 |
US20150086316A1 (en) | 2015-03-26 |
TWI611997B (zh) | 2018-01-21 |
TW201515977A (zh) | 2015-05-01 |
JP6362681B2 (ja) | 2018-07-25 |
KR20160062095A (ko) | 2016-06-01 |
CN105556654A (zh) | 2016-05-04 |
CN105556654B (zh) | 2019-07-26 |
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