JP2016040382A5 - - Google Patents
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- JP2016040382A5 JP2016040382A5 JP2015237884A JP2015237884A JP2016040382A5 JP 2016040382 A5 JP2016040382 A5 JP 2016040382A5 JP 2015237884 A JP2015237884 A JP 2015237884A JP 2015237884 A JP2015237884 A JP 2015237884A JP 2016040382 A5 JP2016040382 A5 JP 2016040382A5
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- JP
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- Prior art keywords
- composition
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- water
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- miscible organic
- Prior art date
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- 239000000203 mixture Substances 0.000 claims 53
- -1 amine compound Chemical class 0.000 claims 16
- 239000003960 organic solvent Substances 0.000 claims 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 12
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 12
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims 12
- 239000004065 semiconductor Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 238000004140 cleaning Methods 0.000 claims 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 10
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 6
- UIKUBYKUYUSRSM-UHFFFAOYSA-N 3-morpholinopropylamine Chemical compound NCCCN1CCOCC1 UIKUBYKUYUSRSM-UHFFFAOYSA-N 0.000 claims 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 6
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims 6
- 239000003989 dielectric material Substances 0.000 claims 6
- 229920001174 Diethylhydroxylamine Polymers 0.000 claims 5
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 claims 4
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 claims 4
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims 4
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims 4
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 claims 4
- 238000001035 drying Methods 0.000 claims 4
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 claims 4
- 150000007524 organic acids Chemical class 0.000 claims 4
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims 4
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims 4
- 239000013589 supplement Substances 0.000 claims 3
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims 2
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 claims 2
- HHPDFYDITNAMAM-UHFFFAOYSA-N 2-[cyclohexyl(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)C1CCCCC1 HHPDFYDITNAMAM-UHFFFAOYSA-N 0.000 claims 2
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 claims 2
- ZDWPBMJZDNXTPG-UHFFFAOYSA-N 2h-benzotriazol-4-amine Chemical compound NC1=CC=CC2=C1NN=N2 ZDWPBMJZDNXTPG-UHFFFAOYSA-N 0.000 claims 2
- 239000002211 L-ascorbic acid Substances 0.000 claims 2
- 235000000069 L-ascorbic acid Nutrition 0.000 claims 2
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 claims 2
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 claims 2
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 claims 2
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 claims 2
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 claims 2
- 229960005070 ascorbic acid Drugs 0.000 claims 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims 2
- 239000012964 benzotriazole Substances 0.000 claims 2
- 238000005260 corrosion Methods 0.000 claims 2
- 230000007797 corrosion Effects 0.000 claims 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 2
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 claims 2
- 229940043276 diisopropanolamine Drugs 0.000 claims 2
- 229940074391 gallic acid Drugs 0.000 claims 2
- 235000004515 gallic acid Nutrition 0.000 claims 2
- 229940051250 hexylene glycol Drugs 0.000 claims 2
- 239000003112 inhibitor Substances 0.000 claims 2
- MOVBJUGHBJJKOW-UHFFFAOYSA-N methyl 2-amino-5-methoxybenzoate Chemical compound COC(=O)C1=CC(OC)=CC=C1N MOVBJUGHBJJKOW-UHFFFAOYSA-N 0.000 claims 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims 2
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 claims 2
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 claims 2
- 235000012141 vanillin Nutrition 0.000 claims 2
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 claims 2
- 229940117960 vanillin Drugs 0.000 claims 2
- 238000005406 washing Methods 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 235000021384 green leafy vegetables Nutrition 0.000 claims 1
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261717152P | 2012-10-23 | 2012-10-23 | |
| US61/717,152 | 2012-10-23 | ||
| US201361817134P | 2013-04-29 | 2013-04-29 | |
| US61/817,134 | 2013-04-29 | ||
| US14/010,748 | 2013-08-27 | ||
| US14/010,748 US9536730B2 (en) | 2012-10-23 | 2013-08-27 | Cleaning formulations |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013219489A Division JP2014084464A (ja) | 2012-10-23 | 2013-10-22 | クリーニング用組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018098635A Division JP2018164091A (ja) | 2012-10-23 | 2018-05-23 | クリーニング用組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016040382A JP2016040382A (ja) | 2016-03-24 |
| JP2016040382A5 true JP2016040382A5 (enExample) | 2016-10-06 |
| JP6546080B2 JP6546080B2 (ja) | 2019-07-17 |
Family
ID=50484217
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013219489A Pending JP2014084464A (ja) | 2012-10-23 | 2013-10-22 | クリーニング用組成物 |
| JP2015237884A Expired - Fee Related JP6546080B2 (ja) | 2012-10-23 | 2015-12-04 | クリーニング用組成物 |
| JP2018098635A Pending JP2018164091A (ja) | 2012-10-23 | 2018-05-23 | クリーニング用組成物 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013219489A Pending JP2014084464A (ja) | 2012-10-23 | 2013-10-22 | クリーニング用組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018098635A Pending JP2018164091A (ja) | 2012-10-23 | 2018-05-23 | クリーニング用組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9536730B2 (enExample) |
| JP (3) | JP2014084464A (enExample) |
| KR (1) | KR101557979B1 (enExample) |
| CN (1) | CN103777475B (enExample) |
| MY (1) | MY163132A (enExample) |
| SG (1) | SG2013076922A (enExample) |
| TW (1) | TWI563077B (enExample) |
Families Citing this family (31)
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| US20150045277A1 (en) * | 2012-03-18 | 2015-02-12 | Entegris, Inc. | Post-cmp formulation having improved barrier layer compatibility and cleaning performance |
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| JP6599322B2 (ja) * | 2013-10-21 | 2019-10-30 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | 表面の残留物を除去するための洗浄配合物 |
| CN108485840B (zh) | 2013-12-06 | 2020-12-29 | 富士胶片电子材料美国有限公司 | 用于去除表面上的残余物的清洗调配物 |
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| KR102347656B1 (ko) * | 2014-12-11 | 2022-01-07 | 동우 화인켐 주식회사 | 포토레지스트 애싱 후 잔류물 제거를 위한 세정제 조성물 |
| CN104570629B (zh) * | 2015-02-14 | 2016-04-13 | 江阴江化微电子材料股份有限公司 | —种液晶面板铜膜光阻水系剥离液 |
| SG11201707787SA (en) * | 2015-03-31 | 2017-10-30 | Versum Mat Us Llc | Cleaning formulations |
| TWI819694B (zh) * | 2015-07-14 | 2023-10-21 | 美商富士軟片電子材料美國股份有限公司 | 清潔組成物及其使用方法 |
| US10233413B2 (en) * | 2015-09-23 | 2019-03-19 | Versum Materials Us, Llc | Cleaning formulations |
| US10400167B2 (en) | 2015-11-25 | 2019-09-03 | Versum Materials Us, Llc | Etching compositions and methods for using same |
| US11035044B2 (en) * | 2017-01-23 | 2021-06-15 | Versum Materials Us, Llc | Etching solution for tungsten and GST films |
| KR102417180B1 (ko) * | 2017-09-29 | 2022-07-05 | 삼성전자주식회사 | Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법 |
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| JP7330972B2 (ja) * | 2017-12-08 | 2023-08-22 | ビーエーエスエフ ソシエタス・ヨーロピア | 半導体基板からエッチング後または灰化後の残留物を除去するための洗浄剤組成物、およびそれに対応する製造方法 |
| CN109976108A (zh) * | 2017-12-27 | 2019-07-05 | 安集微电子（上海）有限公司 | 一种用于半导体的清洗液 |
| TWI838356B (zh) * | 2018-01-25 | 2024-04-11 | 德商馬克專利公司 | 光阻移除劑組合物 |
| JP7311229B2 (ja) * | 2018-03-28 | 2023-07-19 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | 洗浄用組成物 |
| EP3986997A4 (en) * | 2019-06-19 | 2023-07-19 | Versum Materials US, LLC | Cleaning composition for semiconductor substrates |
| CN114127230A (zh) * | 2019-07-15 | 2022-03-01 | 弗萨姆材料美国有限责任公司 | 用于去除蚀刻残留物的组合物、其使用方法及用途 |
| JP7541014B2 (ja) * | 2019-09-18 | 2024-08-27 | 富士フイルム株式会社 | 洗浄液、洗浄方法 |
| WO2021061922A1 (en) * | 2019-09-27 | 2021-04-01 | Versum Materials Us, Llc | Compositions for removing etch residues, methods of using and use thereof |
| JP7419905B2 (ja) * | 2020-03-19 | 2024-01-23 | 日油株式会社 | 回路基板用樹脂膜剥離剤 |
| CN115362246A (zh) * | 2020-03-31 | 2022-11-18 | 日产化学株式会社 | 清洗剂组合物以及经加工的半导体基板的制造方法 |
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| WO2022024609A1 (ja) | 2020-07-30 | 2022-02-03 | 富士フイルム株式会社 | 処理液、基板の洗浄方法 |
| KR102782910B1 (ko) * | 2020-12-10 | 2025-03-14 | 동우 화인켐 주식회사 | 금속 함유 레지스트용 신너 조성물 |
| TWI800025B (zh) * | 2021-10-07 | 2023-04-21 | 德揚科技股份有限公司 | 清洗水溶液 |
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-
2013
- 2013-08-27 US US14/010,748 patent/US9536730B2/en not_active Expired - Fee Related
- 2013-10-16 SG SG2013076922A patent/SG2013076922A/en unknown
- 2013-10-18 TW TW102137823A patent/TWI563077B/zh not_active IP Right Cessation
- 2013-10-21 MY MYPI2013701982A patent/MY163132A/en unknown
- 2013-10-22 JP JP2013219489A patent/JP2014084464A/ja active Pending
- 2013-10-22 KR KR1020130125968A patent/KR101557979B1/ko not_active Expired - Fee Related
- 2013-10-23 CN CN201310504991.2A patent/CN103777475B/zh not_active Expired - Fee Related
-
2015
- 2015-12-04 JP JP2015237884A patent/JP6546080B2/ja not_active Expired - Fee Related
-
2018
- 2018-05-23 JP JP2018098635A patent/JP2018164091A/ja active Pending
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