SG2013076922A - Cleaning formulations - Google Patents

Cleaning formulations

Info

Publication number
SG2013076922A
SG2013076922A SG2013076922A SG2013076922A SG2013076922A SG 2013076922 A SG2013076922 A SG 2013076922A SG 2013076922 A SG2013076922 A SG 2013076922A SG 2013076922 A SG2013076922 A SG 2013076922A SG 2013076922 A SG2013076922 A SG 2013076922A
Authority
SG
Singapore
Prior art keywords
cleaning formulations
formulations
cleaning
Prior art date
Application number
SG2013076922A
Other languages
English (en)
Inventor
Lee Yi-Chia
Bhaskara Rao Madhukar
Banerjee Gautam
Dar Liu Wen
Wu Aiping
Inaoka Seiji
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of SG2013076922A publication Critical patent/SG2013076922A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/10—Salts
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
SG2013076922A 2012-10-23 2013-10-16 Cleaning formulations SG2013076922A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261717152P 2012-10-23 2012-10-23
US201361817134P 2013-04-29 2013-04-29
US14/010,748 US9536730B2 (en) 2012-10-23 2013-08-27 Cleaning formulations

Publications (1)

Publication Number Publication Date
SG2013076922A true SG2013076922A (en) 2014-05-29

Family

ID=50484217

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2013076922A SG2013076922A (en) 2012-10-23 2013-10-16 Cleaning formulations

Country Status (7)

Country Link
US (1) US9536730B2 (enExample)
JP (3) JP2014084464A (enExample)
KR (1) KR101557979B1 (enExample)
CN (1) CN103777475B (enExample)
MY (1) MY163132A (enExample)
SG (1) SG2013076922A (enExample)
TW (1) TWI563077B (enExample)

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US9957469B2 (en) * 2014-07-14 2018-05-01 Versum Materials Us, Llc Copper corrosion inhibition system
JP6501492B2 (ja) 2014-10-31 2019-04-17 関東化學株式会社 フォトレジスト残渣および／またはポリマー残渣を除去するための組成物
KR102347656B1 (ko) * 2014-12-11 2022-01-07 동우 화인켐 주식회사 포토레지스트 애싱 후 잔류물 제거를 위한 세정제 조성물
CN104570629B (zh) * 2015-02-14 2016-04-13 江阴江化微电子材料股份有限公司 —种液晶面板铜膜光阻水系剥离液
SG11201707787SA (en) * 2015-03-31 2017-10-30 Versum Mat Us Llc Cleaning formulations
TWI819694B (zh) * 2015-07-14 2023-10-21 美商富士軟片電子材料美國股份有限公司 清潔組成物及其使用方法
US10233413B2 (en) * 2015-09-23 2019-03-19 Versum Materials Us, Llc Cleaning formulations
US10400167B2 (en) 2015-11-25 2019-09-03 Versum Materials Us, Llc Etching compositions and methods for using same
US11035044B2 (en) * 2017-01-23 2021-06-15 Versum Materials Us, Llc Etching solution for tungsten and GST films
KR102417180B1 (ko) * 2017-09-29 2022-07-05 삼성전자주식회사 Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법
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CN111902379B (zh) * 2018-03-28 2023-02-17 富士胶片电子材料美国有限公司 清洗组合物
JP2022536971A (ja) * 2019-06-19 2022-08-22 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー 半導体基材のための洗浄組成物
KR102886380B1 (ko) * 2019-07-15 2025-11-13 버슘머트리얼즈 유에스, 엘엘씨 에칭 잔류물 제거용 조성물, 이의 사용 방법 및 용도
JP7541014B2 (ja) * 2019-09-18 2024-08-27 富士フイルム株式会社 洗浄液、洗浄方法
CN114450388B (zh) * 2019-09-27 2025-03-21 弗萨姆材料美国有限责任公司 用于去除蚀刻残留物的组合物及其使用方法和用途
JP7419905B2 (ja) * 2020-03-19 2024-01-23 日油株式会社 回路基板用樹脂膜剥離剤
CN115362246A (zh) * 2020-03-31 2022-11-18 日产化学株式会社 清洗剂组合物以及经加工的半导体基板的制造方法
KR20220012521A (ko) * 2020-07-23 2022-02-04 주식회사 케이씨텍 세정액 조성물 및 이를 이용한 세정 방법
KR102780997B1 (ko) 2020-07-30 2025-03-14 후지필름 가부시키가이샤 처리액, 기판의 세정 방법
KR102782910B1 (ko) * 2020-12-10 2025-03-14 동우 화인켐 주식회사 금속 함유 레지스트용 신너 조성물
TWI800025B (zh) * 2021-10-07 2023-04-21 德揚科技股份有限公司 清洗水溶液
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Also Published As

Publication number Publication date
US9536730B2 (en) 2017-01-03
JP2016040382A (ja) 2016-03-24
CN103777475B (zh) 2018-09-21
JP6546080B2 (ja) 2019-07-17
MY163132A (en) 2017-08-15
KR101557979B1 (ko) 2015-10-06
JP2018164091A (ja) 2018-10-18
TWI563077B (en) 2016-12-21
CN103777475A (zh) 2014-05-07
JP2014084464A (ja) 2014-05-12
US20140109931A1 (en) 2014-04-24
TW201416436A (zh) 2014-05-01
KR20140051796A (ko) 2014-05-02

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