JP2013529381A - 基板処理システムの流量制御装置を較正する方法及び装置 - Google Patents
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Abstract
Description
Claims (15)
- 基板処理システムであって、
中央真空搬送チャンバに結合している第1処理チャンバ及び第2処理チャンバを備えたクラスタツールと、
前記第1処理チャンバに処理ガスを供給する第1流量制御装置と、
前記第2処理チャンバに処理ガスを提供する第2流量制御装置と、
前記第1及び第2流量制御装置の各々からの流量を検証する質量流量検証器と、
前記第1流量制御装置を前記質量流量検証器に選択的に結合する第1導管と、
前記第2流量制御装置を前記質量流量検証器に選択的に結合する第2導管を備える、基板処理システム。 - 前記第1導管と第2導管とのフローコンダクタンスは同一である、請求項7記載の基板処理システム。
- 前記処理ガスを前記第1及び第2流量制御装置に供給する共有ガスパネルをさらに備える、請求項7記載の基板処理システム。
- 前記処理ガスを前記第1チャンバに供給する第3流量制御装置と、
前記第3流量制御装置からの流量を検証するために、前記第3流量制御装置を前記質量流量検証器に選択的に結合する第3導管をさらに備え、
前記第1、第2、第3流量制御装置のうちいずれか1つが前記質量流量検証器によって検証されている間に、前記第1、第2、第3流量制御装置のうちいずれか2つは、前記処理ガスを前記第1又は第2処理チャンバのうちの対応する1つに流すことができる、請求項7記載の基板処理システム。 - 前記質量流量検証器はさらに、
臨界ノズルを備え、前記臨界ノズルを通って流れる前記第1ガスの流量は、前記第1導管内の前記フローコンダクタンスとは無関係であり、前記臨界ノズルを通って流れる前記第2ガスの流量は、前記第2導管内の前記フローコンダクタンスとは無関係である、請求項1〜4のいずれか1項記載の基板処理システム。 - 基板処理システムであって、
処理ガスを第1処理チャンバの第1範囲に供給する第1流量制御装置と、
処理ガスを前記第1処理チャンバの第2範囲に供給する第2流量制御装置と、
前記第1及び第2流量制御装置の各々からの流量を検証する質量流量検証器と、
前記第1流量制御装置を前記質量流量検証器に選択的に結合する第1導管と、
前記第2流量制御装置を前記質量流量検証器に選択的に結合する第2導管を備える、基板処理システム。 - 中央真空搬送チャンバに結合されている第1処理チャンバ及び第2処理チャンバを備えた基板処理システムにおいて複数の流量制御装置を較正する方法であって、前記方法は、
第1ガスを、第1処理チャンバに結合された第1流量制御装置からの第1流量にて供給するステップと、
前記第1ガスを第1導管を介して質量流量検証器へ迂回させるステップと、
前記質量流量検証器を使用して第1流量を決定するステップと、
第2ガスを、第2処理チャンバに結合された第2流量制御装置からの第2流量にて供給するステップと、
前記第2ガスを、第2導管を介して前記質量流量検証器へ迂回させるステップと、
前記質量流量検証器を使用して前記第2流量を決定するステップを備える方法。 - 前記質量流量検証器が決定した前記第1流量に基づいて、前記第1流量制御装置を較正するステップと、
前記質量流量検証器が決定した前記第2流量に基づいて、前記第2流量制御装置を較正するステップをさらに備える、請求項7記載の方法。 - 前記第1流量制御装置を前記質量流量検証器に結合する第1導管と、前記第2流量制御装置を前記質量流量検証器に結合する第2導管とは、実質的に同一のフローコンダクタンスを有する、請求項7記載の方法。
- 前記第1流量制御装置を前記質量流量検証器に結合する第1導管と、前記第2流量制御装置を前記質量流量検証器に結合する第2導管とは異なるフローコンダクタンスを有し、前記質量流量検証器はさらに、前記第1導管から前記質量流量検証器に入る前記第1ガスの流量は前記第1導管内のフローコンダクタンスとは無関係であり、また、前記第2導管を通って前記質量流量検証器に入る前記第2ガスの流量は前記第2導管内のフローコンダクタンスとは無関係であるように構造されているか、又は、
前記第1流量制御装置を前記質量流量検証器に結合する第1導管と、前記第2流量制御装置を前記質量流量検証器に結合する第2導管とは異なる容量を有し、前記質量流量検証器はさらに、前記第1導管から前記質量流量検証器に入る前記第1ガスの流量が前記第1導管内の前記容量とは無関係であり、また、前記第2導管を通って前記質量流量検証器に入る前記第2ガスの流量は前記第2導管内の容量とは無関係であるように構造されているかのいずれかである、請求項7記載の方法。 - 前記第1ガスを第1ガスパネルから前記第1流量制御装置に流すステップと、
前記第2ガスを第2ガスパネルから前記第2流量制御装置に流すステップをさらに備える、請求項7記載の方法。 - 前記第1ガス及び第2ガスは同一のガスであり、前記第1ガスと前記第2ガスは、前記第1処理チャンバと前記第2処理チャンバが共有する共通のガスパネルから前記第1流量制御装置と第2流量制御装置に供給される、請求項7記載の方法。
- 前記第1流量制御装置の前記第1流量の決定が完了した後に、前記第1質量流量制御装置による前記第1ガスの前記第1処理チャンバへの流れを再び開始するステップと、
前記第2流量制御装置の前記第2流量を決定する間、前記第1流量制御装置による前記第1処理チャンバへの前記第1ガスの流れを維持するステップをさらに備える、請求項7記載の方法。 - 前記第1ガスを、前記第1処理チャンバに結合している第3流量制御装置からの第3流量にて供給するステップと、
前記第1ガスを、第3導管によって前記質量流量検証器へ迂回させるステップと、
前記質量流量検証器を使用して前記第3流量を決定するステップをさらに備え、前記第1流量制御装置は、前記第1ガスを前記第1処理チャンバの第1ガス入口に供給し、前記第3流量制御装置は、前記第1ガスを前記第1処理チャンバの第2ガス入口に供給する、請求項7記載の方法。 - 流量比を決定するために、前記決定された第1及び第3流量を比較するステップと、
前記決定された流量比に基づいて、前記第1流量制御装置と第3流量制御装置を較正するステップとをさらに備える、請求項14記載の方法。
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US33005610P | 2010-04-30 | 2010-04-30 | |
US61/330,056 | 2010-04-30 | ||
US12/915,345 US8707754B2 (en) | 2010-04-30 | 2010-10-29 | Methods and apparatus for calibrating flow controllers in substrate processing systems |
US12/915,345 | 2010-10-29 | ||
PCT/US2011/033780 WO2011137071A2 (en) | 2010-04-30 | 2011-04-25 | Methods and apparatus for calibrating flow controllers in substrate processing systems |
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KR (1) | KR101451091B1 (ja) |
CN (1) | CN103038867B (ja) |
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CN103038867A (zh) | 2013-04-10 |
KR20130025863A (ko) | 2013-03-12 |
WO2011137071A2 (en) | 2011-11-03 |
TWI483306B (zh) | 2015-05-01 |
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WO2011137071A3 (en) | 2012-03-01 |
US8707754B2 (en) | 2014-04-29 |
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