JP2013179295A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2013179295A JP2013179295A JP2013022808A JP2013022808A JP2013179295A JP 2013179295 A JP2013179295 A JP 2013179295A JP 2013022808 A JP2013022808 A JP 2013022808A JP 2013022808 A JP2013022808 A JP 2013022808A JP 2013179295 A JP2013179295 A JP 2013179295A
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- Prior art keywords
- electrode
- oxide semiconductor
- transistor
- insulating layer
- layer
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- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 238000004151 rapid thermal annealing Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
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- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 238000004772 slater type orbital Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
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- 239000003929 acidic solution Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
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- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
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- 229910001385 heavy metal Inorganic materials 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000006213 oxygenation reaction Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
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- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
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- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
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- 238000004439 roughness measurement Methods 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
- H01L29/41733—Source or drain electrodes for field effect devices for thin film transistors with insulated gate
-
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42384—Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
-
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
Abstract
【解決手段】平面視において、トランジスタのソース電極またはドレイン電極の一方を環状のゲート電極で囲む構成とする。または、平面視において、トランジスタのソース電極またはドレイン電極の一方をチャネル形成領域で囲む構成とする。これにより、ソース電極とドレイン電極が、島状の酸化物半導体層の端部に生じた寄生チャネルを介して電気的に接続されない構成とする。
【選択図】図1
Description
本実施の形態の半導体装置の構造例について図面を参照して説明する。図1(A)は、本実施の形態のトランジスタ110及び容量素子111の上面図であり、図1(B)は、図1(A)に示す上面図中のA1−A2線における断面図である。図1(C)は、図1(A)に示す上面図中のB1−B2線における断面図である。図1(D)は、図1(A)に示す上面図中のC1−C2線における断面図である。
(a―A)2+(b―B)2+(c―C)2≦r2
を満たすことを言い、rは、例えば、0.05とすればよい。他の酸化物でも同様である。
本実施の形態では、上記実施の形態で開示したトランジスタとは異なる構造を有するトランジスタについて説明する。
本実施の形態では、上記実施の形態で開示したトランジスタと異なる構成を有するトランジスタ250と、トランジスタ250と同時に作製可能な容量素子の構成及び作製方法について説明する。
また、上記加熱処理と酸素ドープ処理を、交互に複数回繰り返して行ってもよい。
本実施の形態では、実施の形態3で開示したトランジスタ250及びトランジスタ260と異なる構成を有するトランジスタについて、図15及び図16を用いて説明する。図15(A1)は、チャネルが形成される半導体層に酸化物半導体を用いたトランジスタ270の平面視を示す図(上面図)であり、図15(B1)は、図15(A1)中でW1−W2の鎖線で示した部位の断面視を示す図(断面図)である。また、図15(A2)は、チャネルが形成される半導体層に酸化物半導体を用いたトランジスタ280の平面視を示す図(上面図)であり、図15(B2)は、図15(A2)中でZ1−Z2の鎖線で示した部位の断面視を示す図(断面図)である。なお、図面をわかりやすくするため、図15(A1)および図15(A2)において一部の構成要素の記載を省略している。
本実施の形態では、上記実施の形態で開示したトランジスタと異なる構成を有するトランジスタと、トランジスタと同時に作製可能な容量素子の構成及び作製方法について説明する。
本実施の形態では、上記実施の形態で開示したトランジスタと異なる構成を有するトランジスタと、トランジスタと同時に作製可能な容量素子の構成及び作製方法について説明する。
本実施の形態では、本明細書に示すトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置の一例を、図面を用いて説明する。
本実施の形態においては、本明細書に示すトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置について、実施の形態7に示した構成と異なる構成について説明を行う。
本実施の形態では、本明細書に示すトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置の一例を、図面を用いて説明する。
本実施の形態では、上記実施の形態に示すトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置について、実施の形態9に示した構成と異なる構成について、図35及び図36を用いて説明を行う。
本実施の形態では、本発明の一態様であるトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置(記憶装置)の一例を、図面を用いて説明する。
本実施の形態では、実施の形態5に示すトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置について、実施の形態11に示した構成と異なる半導体装置の説明を行う。
本実施の形態では、本発明の一態様であるトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い半導体装置(記憶装置)の一例を、図41及び図42を用いて説明する。
次いで、上述の記憶装置と異なる構成の記憶装置について図44及び図45を参照して説明する。なお、以下に示す記憶装置も上述の記憶装置と同様に、上述したトランジスタを使用し、電力が供給されない状況でも記憶内容の保持が可能で、かつ、書き込み回数にも制限が無い記憶装置である。
上記実施の形態に開示したトランジスタを少なくとも一部に用いてCPU(Central Processing Unit)を構成することができる。
本実施の形態では、上記実施の形態で示した半導体装置を電気機器に応用した場合の例について説明する。より具体的には、上記実施の形態で示した半導体装置を携帯電話、スマートフォン、電子書籍などの携帯機器に応用した場合の例を図47乃至図50を用いて説明する。
本明細書に開示する半導体装置は、さまざまな電子機器(遊技機も含む)に適用することができる。電子機器としては、テレビ、モニタ等の表示装置、照明装置、デスクトップ型或いはノート型のパーソナルコンピュータ、ワードプロセッサ、DVD(Digital Versatile Disc)などの記録媒体に記憶された静止画又は動画を再生する画像再生装置、ポータブルCDプレイヤー、ラジオ、テープレコーダ、ヘッドホンステレオ、ステレオ、コードレス電話子機、トランシーバ、携帯無線機、携帯電話、自動車電話、携帯型ゲーム機、電卓、携帯情報端末、電子手帳、電子書籍、電子翻訳機、音声入力機器、ビデオカメラ、デジタルスチルカメラ、電気シェーバ、電子レンジ等の高周波加熱装置、電気炊飯器、電気洗濯機、電気掃除機、エアコンディショナーなどの空調設備、食器洗い器、食器乾燥器、衣類乾燥器、布団乾燥器、電気冷蔵庫、電気冷凍庫、電気冷凍冷蔵庫、DNA保存用冷凍庫、煙感知器、放射線測定器、透析装置等の医療機器、などが挙げられる。さらに、誘導灯、信号機、ベルトコンベア、エレベータ、エスカレータ、産業用ロボット、電力貯蔵システム等の産業機器も挙げられる。また、石油を用いたエンジンや、非水系二次電池からの電力を用いて電動機により推進する移動体なども、電気機器の範疇に含まれるものとする。上記移動体として、例えば、電気自動車(EV)、内燃機関と電動機を併せ持ったハイブリッド車(HEV)、プラグインハイブリッド車(PHEV)、これらのタイヤ車輪を無限軌道に変えた装軌車両、電動アシスト自転車を含む原動機付自転車、自動二輪車、電動車椅子、ゴルフ用カート、小型又は大型船舶、潜水艦、ヘリコプター、航空機、ロケット、人工衛星、宇宙探査機や惑星探査機、宇宙船が挙げられる。これらの電子機器の具体例を図51乃至図53に示す。
CAAC−OS膜の側面から酸素が脱離しやすい点について詳述しておく。一例として、三元系金属の酸化物であるIn−Ga−Zn系酸化物(IGZO)における、過剰酸素(化学量論的組成を越えて存在している酸素原子)及び酸素欠損の動きやすさについて、科学技術計算結果を参照して説明する。
(1)過剰酸素の第1の遷移 Z=1においてT=206K(−67℃)
(2)過剰酸素の第2の遷移 Z=1においてT=923K(650℃)
(3)酸素欠損の第1の遷移 Z=1においてT=701K(428℃)
(4)酸素欠損の第2の遷移 Z=1においてT=1590K(1317℃)
(1)過剰酸素の第1の遷移 T=300KにおいてZ=1.2×104(/秒)
(2)過剰酸素の第2の遷移 T=300KにおいてZ=1.0×10−27(/秒)
(3)酸素欠損の第1の遷移 T=300KにおいてZ=4.3×10−18(/秒)
(4)酸素欠損の第2の遷移 T=300KにおいてZ=1.4×10−56(/秒)
(1)過剰酸素の第1の遷移 T=723KにおいてZ=2.0×109(/秒)
(2)過剰酸素の第2の遷移 T=723KにおいてZ=2.5×10−4(/秒)
(3)酸素欠損の第1の遷移 T=723KにおいてZ=2.5(/秒)
(4)酸素欠損の第2の遷移 T=723KにおいてZ=2.5×10−16(/秒)
102 酸化物半導体層
103 ゲート絶縁層
104 電極
105 ゲート電極
106 電極
107 絶縁層
108 電極
109 絶縁層
110 トランジスタ
111 容量素子
112 トランジスタ
114 電極
115 電極
116 導電膜
117 導電膜
120 トランジスタ
121 トランジスタ
124 電極
125 ゲート電極
135 ゲート電極
Claims (7)
- 島状の酸化物半導体層上にソース電極及びドレイン電極を有し、
前記島状の酸化物半導体層、前記ソース電極、及び前記ドレイン電極上に絶縁層を有し、
前記絶縁層上にゲート電極を有し、
平面視において、
前記ソース電極または前記ドレイン電極の一方が、
前記ゲート電極で囲まれていることを特徴とする半導体装置。 - 島状の酸化物半導体層上にソース電極及びドレイン電極を有し、
前記島状の酸化物半導体層、前記ソース電極、及び前記ドレイン電極上に絶縁層を有し、
前記絶縁層上にゲート電極を有し、
前記島状の酸化物半導体層は、前記ゲート電極と重畳する領域にチャネル形成領域を有し、
平面視において、
前記ソース電極または前記ドレイン電極の一方が、
前記チャネル形成領域で囲まれていることを特徴とする半導体装置。 - 第1の配線上に第1の絶縁層を有し、
前記第1の絶縁層上に島状の酸化物半導体層を有し、
前記島状の酸化物半導体層上にソース電極及びドレイン電極を有し、
前記ソース電極または前記ドレイン電極の一方は、
前記島状の酸化物半導体層と前記第1の絶縁層に形成された開口を介して前記第1の配線と電気的に接続され、
前記島状の酸化物半導体層、前記ソース電極、及び前記ドレイン電極上に第2の絶縁層を有し、
前記第2の絶縁層上にゲート電極を有し、
平面視において、
前記ソース電極または前記ドレイン電極の一方が、
前記ゲート電極で囲まれていることを特徴とする半導体装置。 - 第1の配線上に第1の絶縁層を有し、
前記第1の絶縁層上に島状の酸化物半導体層を有し、
前記島状の酸化物半導体層上にソース電極及びドレイン電極を有し、
前記ソース電極または前記ドレイン電極の一方は、
前記島状の酸化物半導体層と前記第1の絶縁層に形成された開口を介して前記第1の配線と電気的に接続され、
前記島状の酸化物半導体層、前記ソース電極、及び前記ドレイン電極上に第2の絶縁層を有し、
前記第2の絶縁層上にゲート電極を有し、
前記島状の酸化物半導体層は、前記ゲート電極と重畳する領域にチャネル形成領域を有し、
平面視において、
前記ソース電極または前記レイン電極の一方が、
前記チャネル形成領域で囲まれていることを特徴とする半導体装置。 - 請求項3または請求項4において、
前記ゲート電極は、前記ソース電極または前記ドレイン電極の少なくとも一方と重畳することを特徴とする半導体装置。 - 請求項1乃至請求項5において、
前記ソース電極または前記ドレイン電極の少なくとも一方が、
前記島状の酸化物半導体層の端部を覆うことを特徴とする半導体装置。 - 請求項1乃至請求項6において、
前記ゲート電極、前記ソース電極または前記ドレイン電極は、
銅を含むことを特徴とする半導体装置。
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JP6865255B2 (ja) | 2021-04-28 |
US20130207101A1 (en) | 2013-08-15 |
JP6173706B2 (ja) | 2017-08-02 |
JP6580763B2 (ja) | 2019-09-25 |
JP6383841B2 (ja) | 2018-08-29 |
US9112037B2 (en) | 2015-08-18 |
JP2024036394A (ja) | 2024-03-15 |
US9899533B2 (en) | 2018-02-20 |
JP2017175168A (ja) | 2017-09-28 |
US20150318402A1 (en) | 2015-11-05 |
JP2020004993A (ja) | 2020-01-09 |
JP2022162029A (ja) | 2022-10-21 |
JP2021106290A (ja) | 2021-07-26 |
JP2018198323A (ja) | 2018-12-13 |
JP7427054B2 (ja) | 2024-02-02 |
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