JP2011515833A - 薄膜のためのフラッシュ光アニーリング - Google Patents
薄膜のためのフラッシュ光アニーリング Download PDFInfo
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Abstract
Description
Claims (37)
- 結晶膜を作製する方法であって、
実質的に一様の結晶表面配向のシード粒を含む膜を基板上に設けるステップと、
前記膜のパルス溶融前記膜の厚さ全体を通じて延びる複数の固体部分および液体部分を提供する条件下で、パルス光源を用いて前記膜を照射して前記膜のパルス溶融を提供し、前記シード粒のうち1つ以上を含む混合液/固相を生成するステップと、
前記シード粒の前記結晶表面配向を有するテクスチャ多結晶層を提供するように、前記混合固/液相を前記シード粒から凝固させるステップと、
を含む、方法。 - 膜を提供するステップは、
アモルファス膜を設けるステップと、
前記実質的に一様の結晶表面配向のシード粒を含む膜が得られるように、前記アモルファス膜を多結晶シリコンへと放射誘導型変換した後に混合液/固相を生成するステップと、
を含む、請求項1に記載の方法。 - 前記混合液/固相は、臨界固体−液体共存長(λls)に近づく周期性を有する、請求項1に記載の方法。
- 前記選択された表面配向は{100}面である、請求項1に記載の方法。
- 前記得られたテクスチャ多結晶層は、前記{100}極の少なくとも約15°、前記{100}極の約10°および前記{100}極の約5°内の{100}表面配向を有する前記膜の表面積の約90%を含む、請求項1に記載の方法。
- 前記照射条件は、λlsに近づく前記液体−固相の周期性が得られるような入射光の強度を得るように選択される、請求項1に記載の方法。
- 前記パルス光源は発散光源である、請求項1に記載の方法。
- 前記パルス発散光源は、フラッシュランプおよびレーザーダイオードのうち少なくとも1つを含む、請求項7に記載の方法。
- 前記膜はシリコンを含む。請求項1に記載の方法。
- 前記混合固/液相の液体量は、約50vol%〜100vol%未満および約80vol%〜約99volのうち少なくとも1つの範囲内である、請求項1に記載の方法。
- 前記発散光源パルスの強度は、混合固/液相が得られるように選択される、請求項1に記載の方法。
- 前記膜厚さは、約50nm〜約1μmおよび約150nm〜約500nmのうち少なくとも1つの範囲内である、請求項1に記載の方法。
- 前記膜は、単一のフラッシュランプパルスおよび複数の光パルスのうち少なくとも1つに晒される、請求項1に記載の方法。
- 第2のパルスおよび後続パルスは、前記第1の光パルスよりもより高いエネルギーを有する、請求項13に記載の方法。
- 第2のパルスおよび後続パルスは、前記第1の光パルスと比べて20%よりも高いエネルギー密度を有する、請求項13に記載の方法。
- 前記層は、2〜10個の光パルスおよび2〜4個の光パルスのうち少なくとも1つに晒される、請求項13に記載の方法。
- 前記光源パルスは、少なくとも約50vol%の液体を有する液体/固体混合物を提供する、請求項1に記載の方法。
- 前記入射光のエネルギー強度は約2J/cm2〜約150J/cm2である、請求項1に記載の方法。
- 前記混合液/固相は、前記膜に入射する前記光のエネルギー密度、パルス形状、ドウェル時間および波長の選択により達成される、請求項1に記載の方法。
- フラッシュランプ照射の前に前記基板を事前加熱するステップをさらに含む、請求項1に記載の方法。
- 前記光源は、400〜900nmの範囲の波長を少なくとも含む、請求項21に記載の方法。
- 前記光源は、下層の熱吸収層および前記膜のうち1つ以上による吸収が得られるように選択された波長の光を含む、請求項21に記載の方法。
- 前記光源は白色光を含む、請求項1に記載の方法。
- 前記膜のための金属下層を設けるステップをさらに含み、前記光源の前記熱は、前記金属層によって少なくとも部分的に吸収される、請求項1に記載の方法。
- 前記膜と前記金属層との相互作用を低減するように、前記膜と前記金属層との間にバリア層が設けられる、請求項24に記載の方法。
- 前記金属層は、選択された領域における熱吸収が得られるようにパターニングされる、請求項24に記載の方法。
- 前記混合液/固相を前記パルス光源で照射するステップ、
をさらに含む、請求項1に記載の方法。 - 前記薄膜は、1つ以上の隔離部分に分割される、請求項1に記載の方法。
- 前記基板は、前記隔離部分のうち1つ以上に隣接する1つ以上のトレンチを含む、請求項28に記載の方法。
- 結晶膜を作製する方法であって、
実質的に一様の結晶表面配向のシード粒を含む膜を基板上に設けるステップと、
前記膜の厚さ全体を通じて延びる複数の液体部分および固体部分が得られる条件下で、前記膜のパルス溶融が得られるようにパルス光源を用いて前記膜を照射し、周期性が前記固体−液体共存長(λls)よりも短くかつ前記シード粒のうち1つ以上を含む混合液/固相を生成するステップと、
前記選択された表面配向を有するテクスチャ多結晶層が得られる条件下で前記混合固/液相を前記シード粒から凝固させるステップと、
前記膜の厚さ全体を通じて延びる複数の固体部分および液体部分が得られる条件下で前記膜のパルス溶融を得るように、第2のパルス光源を用いて前記膜を照射し、周期性が前記第1のパルス内に形成される周期性よりも長い混合液/固相を生成するステップと、
前記選択された表面配向を有するテクスチャ多結晶層が得られる条件下で前記混合固/液相を凝固させるステップであって、前記表面テクスチャ、粒径および欠陥率のうち少なくとも1つが前記第2のパルス照射において向上する、ステップと、
を含む、方法。 - 前記選択された表面配向と異なる前記第1のパルス照射後に少なくとも1つの粒が前記膜内に残留し、前記異なる粒の数は、前記第2の照射パルス後に前記膜内で低減する、請求項30に記載の方法。
- 前記第1のパルス光源および前記第2のパルス光源はそれぞれ、発散光源を含む、請求項30に記載の方法。
- 太陽電池を形成する方法であって、
(a)テクスチャシード層を設けるステップであって、
{100}表面配向のシード粒を含むシリコン膜を基板上に設けるステップと、
前記膜の厚さ全体を通じて延びる複数の固体部分および液体部分が得られる条件下で、前記膜のパルス溶融を得るようにパルス発散光源を用いて前記膜を照射し、臨界固体−液体共存長(λls)の周期性を有する混合液/固相を生成するステップと、
前記{100}表面配向を有するテクスチャ多結晶層が得られる条件下で前記混合固/液相を凝固させるステップと、
により行われるステップと、
(b)テクスチャ膜を形成するように、前記テクスチャシード層上に多結晶シリコン層をエピタキシャルに成長させるステップと、
を含む、方法。 - ガラス基板上に配置されたテクスチャ多結晶膜であって、前記膜は、前記{100}極の約15°内に配向されたガラス基板上の前記膜の表面積の少なくとも90%を有する、多結晶膜。
- 請求項1に記載の方法によって製造される結晶膜。
- 請求項30に記載の方法によって製造される結晶膜。
- 請求項33に記載の方法によって製造される太陽電池。
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JP2013251403A (ja) * | 2012-05-31 | 2013-12-12 | Sekisui Chem Co Ltd | 光電変換層の製造方法 |
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Also Published As
Publication number | Publication date |
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EP2248155A4 (en) | 2011-10-05 |
CN101971293A (zh) | 2011-02-09 |
WO2009111326A3 (en) | 2010-01-07 |
EP2248155A2 (en) | 2010-11-10 |
TW200947523A (en) | 2009-11-16 |
WO2009111326A2 (en) | 2009-09-11 |
US20110108108A1 (en) | 2011-05-12 |
CN101971293B (zh) | 2014-04-16 |
KR101413370B1 (ko) | 2014-06-30 |
KR20100136450A (ko) | 2010-12-28 |
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