JP2010171451A5 - - Google Patents

Download PDF

Info

Publication number
JP2010171451A5
JP2010171451A5 JP2010087342A JP2010087342A JP2010171451A5 JP 2010171451 A5 JP2010171451 A5 JP 2010171451A5 JP 2010087342 A JP2010087342 A JP 2010087342A JP 2010087342 A JP2010087342 A JP 2010087342A JP 2010171451 A5 JP2010171451 A5 JP 2010171451A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
liquid
exposure
substrate
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010087342A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010171451A (ja
JP5295165B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010087342A priority Critical patent/JP5295165B2/ja
Priority claimed from JP2010087342A external-priority patent/JP5295165B2/ja
Publication of JP2010171451A publication Critical patent/JP2010171451A/ja
Publication of JP2010171451A5 publication Critical patent/JP2010171451A5/ja
Application granted granted Critical
Publication of JP5295165B2 publication Critical patent/JP5295165B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2010087342A 2004-06-10 2010-04-05 露光装置、露光方法及びデバイス製造方法 Expired - Fee Related JP5295165B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010087342A JP5295165B2 (ja) 2004-06-10 2010-04-05 露光装置、露光方法及びデバイス製造方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2004172569 2004-06-10
JP2004172569 2004-06-10
JP2004245260 2004-08-25
JP2004245260 2004-08-25
JP2004330582 2004-11-15
JP2004330582 2004-11-15
JP2010087342A JP5295165B2 (ja) 2004-06-10 2010-04-05 露光装置、露光方法及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005169549A Division JP4515335B2 (ja) 2004-06-10 2005-06-09 露光装置、ノズル部材、及びデバイス製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2011129492A Division JP5634332B2 (ja) 2004-06-10 2011-06-09 露光装置、ノズル部材、露光方法、及びデバイス製造方法
JP2012081348A Division JP5671491B2 (ja) 2004-06-10 2012-03-30 露光装置、露光方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2010171451A JP2010171451A (ja) 2010-08-05
JP2010171451A5 true JP2010171451A5 (cg-RX-API-DMAC10.html) 2011-08-18
JP5295165B2 JP5295165B2 (ja) 2013-09-18

Family

ID=35503358

Family Applications (10)

Application Number Title Priority Date Filing Date
JP2010087342A Expired - Fee Related JP5295165B2 (ja) 2004-06-10 2010-04-05 露光装置、露光方法及びデバイス製造方法
JP2011129492A Expired - Fee Related JP5634332B2 (ja) 2004-06-10 2011-06-09 露光装置、ノズル部材、露光方法、及びデバイス製造方法
JP2012081348A Expired - Fee Related JP5671491B2 (ja) 2004-06-10 2012-03-30 露光装置、露光方法及びデバイス製造方法
JP2013148020A Expired - Fee Related JP5671584B2 (ja) 2004-06-10 2013-07-16 露光装置、液体回収方法
JP2013148021A Expired - Fee Related JP5671585B2 (ja) 2004-06-10 2013-07-16 露光装置、露光方法及びデバイス製造方法
JP2014018538A Expired - Fee Related JP5911898B2 (ja) 2004-06-10 2014-02-03 露光装置、露光方法及びデバイス製造方法
JP2015026344A Expired - Lifetime JP6125551B2 (ja) 2004-06-10 2015-02-13 露光装置、露光方法及びデバイス製造方法
JP2015237577A Expired - Fee Related JP6154881B2 (ja) 2004-06-10 2015-12-04 露光装置、露光方法及びデバイス製造方法
JP2016217602A Expired - Fee Related JP6381609B2 (ja) 2004-06-10 2016-11-07 露光装置及びデバイス製造方法
JP2018001582A Pending JP2018063450A (ja) 2004-06-10 2018-01-10 露光装置、露光方法及びデバイス製造方法

Family Applications After (9)

Application Number Title Priority Date Filing Date
JP2011129492A Expired - Fee Related JP5634332B2 (ja) 2004-06-10 2011-06-09 露光装置、ノズル部材、露光方法、及びデバイス製造方法
JP2012081348A Expired - Fee Related JP5671491B2 (ja) 2004-06-10 2012-03-30 露光装置、露光方法及びデバイス製造方法
JP2013148020A Expired - Fee Related JP5671584B2 (ja) 2004-06-10 2013-07-16 露光装置、液体回収方法
JP2013148021A Expired - Fee Related JP5671585B2 (ja) 2004-06-10 2013-07-16 露光装置、露光方法及びデバイス製造方法
JP2014018538A Expired - Fee Related JP5911898B2 (ja) 2004-06-10 2014-02-03 露光装置、露光方法及びデバイス製造方法
JP2015026344A Expired - Lifetime JP6125551B2 (ja) 2004-06-10 2015-02-13 露光装置、露光方法及びデバイス製造方法
JP2015237577A Expired - Fee Related JP6154881B2 (ja) 2004-06-10 2015-12-04 露光装置、露光方法及びデバイス製造方法
JP2016217602A Expired - Fee Related JP6381609B2 (ja) 2004-06-10 2016-11-07 露光装置及びデバイス製造方法
JP2018001582A Pending JP2018063450A (ja) 2004-06-10 2018-01-10 露光装置、露光方法及びデバイス製造方法

Country Status (9)

Country Link
US (7) US8482716B2 (cg-RX-API-DMAC10.html)
EP (4) EP1768170A4 (cg-RX-API-DMAC10.html)
JP (10) JP5295165B2 (cg-RX-API-DMAC10.html)
KR (8) KR101612656B1 (cg-RX-API-DMAC10.html)
CN (1) CN102736446B (cg-RX-API-DMAC10.html)
IL (4) IL179787A (cg-RX-API-DMAC10.html)
SG (3) SG188877A1 (cg-RX-API-DMAC10.html)
TW (6) TWI531868B (cg-RX-API-DMAC10.html)
WO (1) WO2005122221A1 (cg-RX-API-DMAC10.html)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101523180B1 (ko) * 2003-09-03 2015-05-26 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4973754B2 (ja) * 2004-03-04 2012-07-11 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
SG188877A1 (en) * 2004-06-10 2013-04-30 Nikon Corp Exposure equipment, exposure method and device manufacturing method
US7481867B2 (en) 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200644079A (en) * 2005-03-31 2006-12-16 Nikon Corp Exposure apparatus, exposure method, and device production method
JP4872916B2 (ja) 2005-04-18 2012-02-08 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI397945B (zh) 2005-11-14 2013-06-01 尼康股份有限公司 A liquid recovery member, an exposure apparatus, an exposure method, and an element manufacturing method
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US7532309B2 (en) * 2006-06-06 2009-05-12 Nikon Corporation Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
US7567338B2 (en) * 2006-08-30 2009-07-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
KR100843709B1 (ko) * 2007-02-05 2008-07-04 삼성전자주식회사 액체 실링 유니트 및 이를 갖는 이멀젼 포토리소그래피장치
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8681308B2 (en) * 2007-09-13 2014-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036253A1 (nl) * 2007-12-10 2009-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
EP2249205B1 (en) * 2008-05-08 2012-03-07 ASML Netherlands BV Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
EP2131241B1 (en) * 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
NL2004362A (en) * 2009-04-10 2010-10-12 Asml Netherlands Bv A fluid handling device, an immersion lithographic apparatus and a device manufacturing method.
TWI603155B (zh) 2009-11-09 2017-10-21 尼康股份有限公司 曝光裝置、曝光方法、曝光裝置之維修方法、曝光裝置之調整方法、以及元件製造方法
US20110134400A1 (en) 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
CN103135365A (zh) 2009-12-28 2013-06-05 株式会社尼康 液浸构件、液浸构件的制造方法、曝光装置、及元件制造方法
US9223225B2 (en) * 2010-01-08 2015-12-29 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
NL2007439A (en) 2010-10-19 2012-04-23 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
US9329496B2 (en) 2011-07-21 2016-05-03 Nikon Corporation Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
US9256137B2 (en) 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
KR102050822B1 (ko) * 2012-12-27 2019-12-02 세메스 주식회사 기판 처리 장치
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
JP5979302B2 (ja) 2013-02-28 2016-08-24 株式会社ニコン 摺動膜、摺動膜が形成された部材、及びその製造方法
KR101639774B1 (ko) * 2015-01-27 2016-07-15 한국생산기술연구원 노즐 헤드 조립체 및 노즐 헤드 조립체를 포함하는 액체공급장치
EP3510446B1 (en) * 2016-09-12 2022-10-05 ASML Netherlands B.V. Fluid handling structure for lithographic apparatus
CN110716391B (zh) * 2018-07-11 2025-02-11 上海微电子装备（集团）股份有限公司 大尺寸基板曝光机
JP7194076B2 (ja) * 2019-05-27 2022-12-21 株式会社日立産機システム 油入変圧器
JP7536571B2 (ja) * 2020-09-15 2024-08-20 キオクシア株式会社 位置計測装置及び計測方法
JP7731837B2 (ja) * 2022-03-22 2025-09-01 キオクシア株式会社 基板処理装置、基板処理方法および半導体装置の製造方法
CN116699947B (zh) * 2023-06-02 2025-03-11 浙江大学 光刻设备检测系统及其检测方法

Family Cites Families (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE221563C (cg-RX-API-DMAC10.html)
NL302731A (cg-RX-API-DMAC10.html) 1963-11-21
US3314219A (en) * 1965-03-10 1967-04-18 Bass Brothers Entpr Inc Drilling mud degassers for oil wells
US3675395A (en) * 1970-10-09 1972-07-11 Keene Corp Apparatus for the purification of oils and the like
US6420721B1 (en) * 1975-01-20 2002-07-16 Bae Systems Information And Electronic Systems Integration, Inc. Modulated infrared source
US4315760A (en) * 1980-01-17 1982-02-16 Bij De Leij Jan D Method and apparatus for degasing, during transportation, a confined volume of liquid to be measured
US4346164A (en) * 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
JPS58202448A (ja) 1982-05-21 1983-11-25 Hitachi Ltd 露光装置
JPS5919912A (ja) 1982-07-26 1984-02-01 Hitachi Ltd 液浸距離保持装置
US4466253A (en) * 1982-12-23 1984-08-21 General Electric Company Flow control at flash tank of open cycle vapor compression heat pumps
DD221563A1 (de) 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
DD224448A1 (de) 1984-03-01 1985-07-03 Zeiss Jena Veb Carl Einrichtung zur fotolithografischen strukturuebertragung
FI73950C (fi) * 1985-02-15 1987-12-10 Hackman Ab Oy Foerfarande och anordning vid pumpning och volymmaetning av livsmedelsvaetskor.
CN85104763B (zh) * 1985-06-13 1988-08-24 沈汉石 液压系统中消除气穴的方法和装置
JPS6265326A (ja) 1985-09-18 1987-03-24 Hitachi Ltd 露光装置
US4730634A (en) * 1986-06-19 1988-03-15 Amoco Corporation Method and apparatus for controlling production of fluids from a well
JPS63157419A (ja) 1986-12-22 1988-06-30 Toshiba Corp 微細パタ−ン転写装置
JPH04305917A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JPH04305915A (ja) 1991-04-02 1992-10-28 Nikon Corp 密着型露光装置
JPH0562877A (ja) 1991-09-02 1993-03-12 Yasuko Shinohara 光によるｌｓｉ製造縮小投影露光装置の光学系
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH06188169A (ja) 1992-08-24 1994-07-08 Canon Inc 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5312552A (en) * 1993-02-02 1994-05-17 Norman J M Method and apparatus for removing BTX-type gases from a liquid
JPH06232036A (ja) * 1993-02-04 1994-08-19 Tokyo Ohka Kogyo Co Ltd 液体回収装置及び回収方法
JPH07220990A (ja) 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US5545072A (en) * 1994-07-27 1996-08-13 Toy Biz, Inc. Image projective toy
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JP3260624B2 (ja) * 1995-04-19 2002-02-25 東京エレクトロン株式会社 塗布装置およびその制御方法
TW306011B (cg-RX-API-DMAC10.html) 1995-04-19 1997-05-21 Tokyo Electron Co Ltd
JPH08316125A (ja) 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JP4029183B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 投影露光装置及び投影露光方法
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
CN1244018C (zh) * 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
KR100512450B1 (ko) 1996-12-24 2006-01-27 에이에스엠엘 네델란즈 비.브이. 두개의물체홀더를가진이차원적으로안정화된위치설정장치와이런위치설정장치를구비한리소그래픽장치
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP3817836B2 (ja) 1997-06-10 2006-09-06 株式会社ニコン 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
JP4210871B2 (ja) 1997-10-31 2009-01-21 株式会社ニコン 露光装置
JPH11176727A (ja) 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2000058436A (ja) 1998-08-11 2000-02-25 Nikon Corp 投影露光装置及び露光方法
TW490596B (en) * 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
WO2001053649A2 (en) * 2000-01-17 2001-07-26 Lattice Intellectual Property Ltd Slugging control
DE10011130A1 (de) 2000-03-10 2001-09-13 Mannesmann Vdo Ag Entlüftungseinrichtung für einen Kraftstoffbehälter
TW591653B (en) * 2000-08-08 2004-06-11 Koninkl Philips Electronics Nv Method of manufacturing an optically scannable information carrier
SE517821C2 (sv) * 2000-09-29 2002-07-16 Tetra Laval Holdings & Finance Metod och anordning för att kontinuerligt avlufta en vätska
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US20040154641A1 (en) * 2002-05-17 2004-08-12 P.C.T. Systems, Inc. Substrate processing apparatus and method
WO2004019128A2 (en) 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
EP1420298B1 (en) * 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
CN100568101C (zh) * 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
DE60335595D1 (de) * 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101470360B (zh) * 2002-11-12 2013-07-24 Asml荷兰有限公司 光刻装置和器件制造方法
EP1420299B1 (en) * 2002-11-12 2011-01-05 ASML Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
SG131766A1 (en) * 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4171886B2 (ja) * 2002-11-29 2008-10-29 セイコーエプソン株式会社 キャリッジ速度制御装置、該キャリッジ速度制御装置を備えた液体噴射装置、キャリッジ速度制御プログラム
JP4168325B2 (ja) 2002-12-10 2008-10-22 ソニー株式会社 高分子アクチュエータ
CN101872135B (zh) 2002-12-10 2013-07-31 株式会社尼康 曝光设备和器件制造法
KR20120127755A (ko) 2002-12-10 2012-11-23 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
EP1573730B1 (en) 2002-12-13 2009-02-25 Koninklijke Philips Electronics N.V. Liquid removal in a method and device for irradiating spots on a layer
DE60314668T2 (de) 2002-12-19 2008-03-06 Koninklijke Philips Electronics N.V. Verfahren und anordnung zum bestrahlen einer schicht mittels eines lichtpunkts
US7399978B2 (en) 2002-12-19 2008-07-15 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
KR101921572B1 (ko) * 2003-02-26 2018-11-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP2004310016A (ja) * 2003-03-25 2004-11-04 Tokai Rubber Ind Ltd 半導電性シームレスベルト
KR101177330B1 (ko) 2003-04-10 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 장치
SG2014015184A (en) 2003-04-10 2015-06-29 Nippon Kogaku Kk Environmental system including vacuum scavange for an immersion lithography apparatus
JP4428115B2 (ja) * 2003-04-11 2010-03-10 株式会社ニコン 液浸リソグラフィシステム
WO2004092917A2 (en) 2003-04-11 2004-10-28 United States Postal Service Methods and systems for providing an alternative delivery point code
JP2004320016A (ja) * 2003-04-11 2004-11-11 Nikon Corp 液浸リソグラフィシステム
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004356205A (ja) * 2003-05-27 2004-12-16 Tadahiro Omi スキャン型露光装置および露光方法
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261742A3 (en) 2003-06-11 2011-05-25 ASML Netherlands BV Lithographic apparatus and device manufacturing method.
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US6809794B1 (en) 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
EP1498778A1 (en) 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
ATE513309T1 (de) 2003-07-09 2011-07-15 Nikon Corp Belichtungsvorrichtung und verfahren zur bauelementeherstellung
KR101642670B1 (ko) * 2003-07-28 2016-07-25 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7779781B2 (en) * 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4405208B2 (ja) 2003-08-25 2010-01-27 株式会社ルネサステクノロジ 固体撮像装置の製造方法
KR101523180B1 (ko) 2003-09-03 2015-05-26 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
JP4378136B2 (ja) * 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
JP4444920B2 (ja) * 2003-09-19 2010-03-31 株式会社ニコン 露光装置及びデバイス製造方法
US7369217B2 (en) * 2003-10-03 2008-05-06 Micronic Laser Systems Ab Method and device for immersion lithography
JP2005123258A (ja) * 2003-10-14 2005-05-12 Canon Inc 液浸露光装置
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
EP2267536B1 (en) 2003-10-28 2017-04-19 ASML Netherlands B.V. Lithographic apparatus
JP2005175176A (ja) 2003-12-11 2005-06-30 Nikon Corp 露光方法及びデバイス製造方法
KR101911681B1 (ko) 2004-01-05 2018-10-25 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
WO2005081294A1 (ja) * 2004-02-20 2005-09-01 Nikon Corporation 露光装置、液体処理方法、露光方法、及びデバイス製造方法
JP4510494B2 (ja) 2004-03-29 2010-07-21 キヤノン株式会社 露光装置
US7295283B2 (en) * 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101330370B1 (ko) 2004-04-19 2013-11-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7271878B2 (en) * 2004-04-22 2007-09-18 International Business Machines Corporation Wafer cell for immersion lithography
US8054448B2 (en) * 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
KR101264936B1 (ko) 2004-06-04 2013-05-15 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8373843B2 (en) * 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
SG188877A1 (en) * 2004-06-10 2013-04-30 Nikon Corp Exposure equipment, exposure method and device manufacturing method
JP4515335B2 (ja) * 2004-06-10 2010-07-28 株式会社ニコン 露光装置、ノズル部材、及びデバイス製造方法
US7481867B2 (en) * 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7180572B2 (en) * 2004-06-23 2007-02-20 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion optical projection system
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) * 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7474379B2 (en) * 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Similar Documents

Publication Publication Date Title
ES2526543T3 (es) Dispositivo de descontaminación de un líquido, sistema de enfriamiento de aire mediante nebulización dotado de dicho dispositivo, procedimiento de enfriamiento, y vehículo automóvil asociado
JP2008501531A5 (cg-RX-API-DMAC10.html)
JP2010251808A5 (ja) 流路形成部材、露光装置、露光方法、及びデバイス製造方法
JP2012080137A5 (cg-RX-API-DMAC10.html)
CN110116268B (zh) 激光切割装置及吸入单元
JP2012134555A5 (ja) 液浸部材、液浸露光装置、液浸露光方法、及びデバイス製造方法
JP2011049607A5 (cg-RX-API-DMAC10.html)
JP2014078748A5 (cg-RX-API-DMAC10.html)
JP6936969B2 (ja) 光照射装置
JP2010118680A5 (cg-RX-API-DMAC10.html)
JP2011124606A5 (cg-RX-API-DMAC10.html)
CN104070798B (zh) 液体喷出装置
KR20120016946A (ko) 레이저 가공용 스테이지
JP2012514315A5 (cg-RX-API-DMAC10.html)
JP2010528449A5 (ja) 露光装置、及びデバイス製造方法
DE602007013877D1 (de) Filtervorrichtung
CN103802493B (zh) 输送装置以及记录装置
JP2010103560A5 (cg-RX-API-DMAC10.html)
CN101920398A (zh) 工件底面浸入液面的激光切割装置
EP2498037A3 (en) Hybrid fan cooling tower
JP2014069238A (ja) 板材辺縁の研削加工装置
JP2008209649A5 (cg-RX-API-DMAC10.html)
CN206258345U (zh) 一种激光发生模块及其粒子检测装置
CN113945072B (zh) 一种干燥系统及干燥方法
JP2014524668A5 (ja) 露光装置、液体保持方法、及びデバイス製造方法