JP2009117879A5 - - Google Patents

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Publication number
JP2009117879A5
JP2009117879A5 JP2009048424A JP2009048424A JP2009117879A5 JP 2009117879 A5 JP2009117879 A5 JP 2009117879A5 JP 2009048424 A JP2009048424 A JP 2009048424A JP 2009048424 A JP2009048424 A JP 2009048424A JP 2009117879 A5 JP2009117879 A5 JP 2009117879A5
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substrate
liquid
space
transition zone
polygon
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JP4959737B2 (ja
JP2009117879A (ja
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Priority claimed from US10/986,185 external-priority patent/US7423720B2/en
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JP2009048424A 2004-11-12 2009-03-02 リソグラフィ装置及びデバイス製造方法 Expired - Lifetime JP4959737B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/986,185 US7423720B2 (en) 2004-11-12 2004-11-12 Lithographic apparatus and device manufacturing method
US10/986,185 2004-11-12

Related Parent Applications (1)

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JP2005326781A Division JP4346602B2 (ja) 2004-11-12 2005-11-11 リソグラフィ装置及びデバイス製造方法

Related Child Applications (2)

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JP2011220594A Division JP5193350B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法
JP2011220593A Division JP5193349B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法

Publications (3)

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JP2009117879A JP2009117879A (ja) 2009-05-28
JP2009117879A5 true JP2009117879A5 (enExample) 2009-07-30
JP4959737B2 JP4959737B2 (ja) 2012-06-27

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JP2005326781A Expired - Fee Related JP4346602B2 (ja) 2004-11-12 2005-11-11 リソグラフィ装置及びデバイス製造方法
JP2009048424A Expired - Lifetime JP4959737B2 (ja) 2004-11-12 2009-03-02 リソグラフィ装置及びデバイス製造方法
JP2011220594A Expired - Fee Related JP5193350B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法
JP2011220593A Expired - Fee Related JP5193349B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法

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JP2005326781A Expired - Fee Related JP4346602B2 (ja) 2004-11-12 2005-11-11 リソグラフィ装置及びデバイス製造方法

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JP2011220594A Expired - Fee Related JP5193350B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法
JP2011220593A Expired - Fee Related JP5193349B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法

Country Status (2)

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US (9) US7423720B2 (enExample)
JP (4) JP4346602B2 (enExample)

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