JP2019514073A5 - - Google Patents

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Publication number
JP2019514073A5
JP2019514073A5 JP2018554755A JP2018554755A JP2019514073A5 JP 2019514073 A5 JP2019514073 A5 JP 2019514073A5 JP 2018554755 A JP2018554755 A JP 2018554755A JP 2018554755 A JP2018554755 A JP 2018554755A JP 2019514073 A5 JP2019514073 A5 JP 2019514073A5
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JP
Japan
Prior art keywords
lens
lens set
substrate
lenses
laser
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JP2018554755A
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English (en)
Japanese (ja)
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JP2019514073A (ja
JP6987783B2 (ja
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Priority claimed from US15/133,094 external-priority patent/US9927558B2/en
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Publication of JP2019514073A publication Critical patent/JP2019514073A/ja
Publication of JP2019514073A5 publication Critical patent/JP2019514073A5/ja
Priority to JP2021195716A priority Critical patent/JP7402855B2/ja
Application granted granted Critical
Publication of JP6987783B2 publication Critical patent/JP6987783B2/ja
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JP2018554755A 2016-04-19 2017-04-14 半導体レンズの製造の最適化 Active JP6987783B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021195716A JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/133,094 US9927558B2 (en) 2016-04-19 2016-04-19 Semiconductor lens optimization of fabrication
US15/133,094 2016-04-19
PCT/US2017/027674 WO2017184455A1 (en) 2016-04-19 2017-04-14 Semiconductor lens optimization of fabrication

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021195716A Division JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Publications (3)

Publication Number Publication Date
JP2019514073A JP2019514073A (ja) 2019-05-30
JP2019514073A5 true JP2019514073A5 (enExample) 2019-07-04
JP6987783B2 JP6987783B2 (ja) 2022-01-05

Family

ID=60038117

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018554755A Active JP6987783B2 (ja) 2016-04-19 2017-04-14 半導体レンズの製造の最適化
JP2021195716A Active JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2021195716A Active JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Country Status (7)

Country Link
US (3) US9927558B2 (enExample)
EP (2) EP3446160B1 (enExample)
JP (2) JP6987783B2 (enExample)
CN (2) CN109416417A (enExample)
CA (1) CA3018888A1 (enExample)
TW (1) TWI650583B (enExample)
WO (1) WO2017184455A1 (enExample)

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US20130223846A1 (en) 2009-02-17 2013-08-29 Trilumina Corporation High speed free-space optical communications
US11095365B2 (en) 2011-08-26 2021-08-17 Lumentum Operations Llc Wide-angle illuminator module
EP3329562B1 (en) 2015-07-30 2024-03-13 Optipulse Inc. Rigid high power and high speed lasing grid structures
US10630055B2 (en) * 2017-06-16 2020-04-21 Optipulse Inc. Graphene lens structures for use with light engine and grid laser structures
US10630053B2 (en) 2015-07-30 2020-04-21 Optipulse Inc. High power laser grid structure
US9927558B2 (en) 2016-04-19 2018-03-27 Trilumina Corp. Semiconductor lens optimization of fabrication
AU2018316346B2 (en) 2017-08-11 2024-01-25 Optipulse Inc. Laser grid structures for wireless high speed data transfers
US10374705B2 (en) 2017-09-06 2019-08-06 Optipulse Inc. Method and apparatus for alignment of a line-of-sight communications link
JP2020149032A (ja) * 2018-10-05 2020-09-17 株式会社リコー 光学素子、表示装置、表示システムおよび移動体
CN111381334B (zh) * 2018-12-28 2021-06-15 中国科学院长春光学精密机械与物理研究所 一种用于光学系统中光路组件的对准方法
EP4073585A1 (en) * 2019-12-10 2022-10-19 TRUMPF Photonic Components GmbH Method of lithographically forming an optical structure in a semiconductor substrate

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US5316640A (en) * 1991-06-19 1994-05-31 Matsushita Electric Industrial Co., Ltd. Fabricating method of micro lens
JP3251150B2 (ja) * 1994-12-29 2002-01-28 日本板硝子株式会社 平板マイクロレンズアレイおよびその製造方法
JP3570194B2 (ja) * 1998-01-19 2004-09-29 セイコーエプソン株式会社 液晶装置、それを用いた電子機器及び液晶装置の製造方法
US6835535B2 (en) * 2000-07-31 2004-12-28 Corning Incorporated Microlens arrays having high focusing efficiency
KR20050005357A (ko) 2003-07-01 2005-01-13 삼성전자주식회사 마이크로렌즈 제작방법 및 이를 이용한 광모듈 제작방법
US7307788B2 (en) * 2004-12-03 2007-12-11 Micron Technology, Inc. Gapless microlens array and method of fabrication
US7333267B2 (en) 2003-11-26 2008-02-19 Micron Technology, Inc. Micro-lenses for CMOS imagers
WO2007002796A2 (en) * 2005-06-29 2007-01-04 Reflexite Corporation Collimating microlens array
KR20070055764A (ko) * 2005-11-28 2007-05-31 광주과학기술원 화합물 반도체의 선택적 식각을 이용한 마이크로렌즈 및마이크로 렌즈가 집적된 광전소자 제조 방법
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US8995493B2 (en) * 2009-02-17 2015-03-31 Trilumina Corp. Microlenses for multibeam arrays of optoelectronic devices for high frequency operation
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WO2014175901A1 (en) * 2013-04-22 2014-10-30 Joseph John R Microlenses for multibeam arrays of optoelectronic devices for high frequency operation
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US10249661B2 (en) * 2014-08-22 2019-04-02 Visera Technologies Company Limited Imaging devices with dummy patterns
US9927558B2 (en) 2016-04-19 2018-03-27 Trilumina Corp. Semiconductor lens optimization of fabrication
TWI886529B (zh) * 2023-08-01 2025-06-11 友達光電股份有限公司 顯示面板

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