JP6987783B2 - 半導体レンズの製造の最適化 - Google Patents

半導体レンズの製造の最適化 Download PDF

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Publication number
JP6987783B2
JP6987783B2 JP2018554755A JP2018554755A JP6987783B2 JP 6987783 B2 JP6987783 B2 JP 6987783B2 JP 2018554755 A JP2018554755 A JP 2018554755A JP 2018554755 A JP2018554755 A JP 2018554755A JP 6987783 B2 JP6987783 B2 JP 6987783B2
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Prior art keywords
lens
substrate
array
laser
lens set
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JP2018554755A
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Japanese (ja)
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JP2019514073A (ja
JP2019514073A5 (enExample
Inventor
リチャード・エフ・カーソン
ジョン・アール・ジョセフ
マイアル・イー・ウォーレン
トーマス・エイ・ウィルコックス
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Lumentum Operations LLC
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Lumentum Operations LLC
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0043—Inhomogeneous or irregular arrays, e.g. varying shape, size, height
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42—Arrays of surface emitting lasers
    • H01S5/423—Arrays of surface emitting lasers having a vertical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laser Beam Processing (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Couplings Of Light Guides (AREA)
JP2018554755A 2016-04-19 2017-04-14 半導体レンズの製造の最適化 Active JP6987783B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021195716A JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/133,094 2016-04-19
US15/133,094 US9927558B2 (en) 2016-04-19 2016-04-19 Semiconductor lens optimization of fabrication
PCT/US2017/027674 WO2017184455A1 (en) 2016-04-19 2017-04-14 Semiconductor lens optimization of fabrication

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021195716A Division JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

Publications (3)

Publication Number Publication Date
JP2019514073A JP2019514073A (ja) 2019-05-30
JP2019514073A5 JP2019514073A5 (enExample) 2019-07-04
JP6987783B2 true JP6987783B2 (ja) 2022-01-05

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Family Applications (2)

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JP2018554755A Active JP6987783B2 (ja) 2016-04-19 2017-04-14 半導体レンズの製造の最適化
JP2021195716A Active JP7402855B2 (ja) 2016-04-19 2021-12-01 半導体レンズの製造の最適化

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US (3) US9927558B2 (enExample)
EP (2) EP4224220A1 (enExample)
JP (2) JP6987783B2 (enExample)
CN (2) CN109416417A (enExample)
CA (1) CA3018888A1 (enExample)
TW (1) TWI650583B (enExample)
WO (1) WO2017184455A1 (enExample)

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US20130223846A1 (en) 2009-02-17 2013-08-29 Trilumina Corporation High speed free-space optical communications
US11095365B2 (en) 2011-08-26 2021-08-17 Lumentum Operations Llc Wide-angle illuminator module
US10630053B2 (en) 2015-07-30 2020-04-21 Optipulse Inc. High power laser grid structure
US10630055B2 (en) * 2017-06-16 2020-04-21 Optipulse Inc. Graphene lens structures for use with light engine and grid laser structures
AU2016298390B2 (en) 2015-07-30 2021-09-02 Optipulse Inc. Rigid high power and high speed lasing grid structures
US9927558B2 (en) 2016-04-19 2018-03-27 Trilumina Corp. Semiconductor lens optimization of fabrication
WO2019033111A1 (en) 2017-08-11 2019-02-14 Optipulse Inc. LASER GRID STRUCTURES FOR HIGH-SPEED WIRELESS DATA TRANSFERS
US10374705B2 (en) 2017-09-06 2019-08-06 Optipulse Inc. Method and apparatus for alignment of a line-of-sight communications link
JP2020149032A (ja) * 2018-10-05 2020-09-17 株式会社リコー 光学素子、表示装置、表示システムおよび移動体
CN111381334B (zh) * 2018-12-28 2021-06-15 中国科学院长春光学精密机械与物理研究所 一种用于光学系统中光路组件的对准方法
EP4073585A1 (en) 2019-12-10 2022-10-19 TRUMPF Photonic Components GmbH Method of lithographically forming an optical structure in a semiconductor substrate

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Also Published As

Publication number Publication date
US20170299781A1 (en) 2017-10-19
TW201802497A (zh) 2018-01-16
JP2019514073A (ja) 2019-05-30
EP3446160A1 (en) 2019-02-27
JP2022043095A (ja) 2022-03-15
CN118169788A (zh) 2024-06-11
WO2017184455A1 (en) 2017-10-26
EP3446160B1 (en) 2023-11-08
US11187831B2 (en) 2021-11-30
CN109416417A (zh) 2019-03-01
US20180172885A1 (en) 2018-06-21
US9927558B2 (en) 2018-03-27
US20220082733A1 (en) 2022-03-17
TWI650583B (zh) 2019-02-11
EP4224220A1 (en) 2023-08-09
JP7402855B2 (ja) 2023-12-21
EP3446160A4 (en) 2019-12-18
CA3018888A1 (en) 2017-10-26

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