JP2008053596A - ロードポート装置 - Google Patents
ロードポート装置 Download PDFInfo
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- JP2008053596A JP2008053596A JP2006230357A JP2006230357A JP2008053596A JP 2008053596 A JP2008053596 A JP 2008053596A JP 2006230357 A JP2006230357 A JP 2006230357A JP 2006230357 A JP2006230357 A JP 2006230357A JP 2008053596 A JP2008053596 A JP 2008053596A
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- 238000004519 manufacturing process Methods 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 44
- 238000012545 processing Methods 0.000 claims abstract description 39
- 239000004065 semiconductor Substances 0.000 claims abstract description 13
- 238000012546 transfer Methods 0.000 claims description 137
- 235000012431 wafers Nutrition 0.000 claims description 117
- 238000003780 insertion Methods 0.000 claims description 30
- 230000037431 insertion Effects 0.000 claims description 30
- 238000013507 mapping Methods 0.000 claims description 23
- 230000001965 increasing effect Effects 0.000 description 7
- 239000000969 carrier Substances 0.000 description 5
- 230000002452 interceptive effect Effects 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 230000003028 elevating effect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 240000006829 Ficus sundaica Species 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B66—HOISTING; LIFTING; HAULING
- B66F—HOISTING, LIFTING, HAULING OR PUSHING, NOT OTHERWISE PROVIDED FOR, e.g. DEVICES WHICH APPLY A LIFTING OR PUSHING FORCE DIRECTLY TO THE SURFACE OF A LOAD
- B66F11/00—Lifting devices specially adapted for particular uses not otherwise provided for
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Mechanical Engineering (AREA)
- Structural Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
【解決手段】製造過程にあるウェハを収納したウェハキャリア30を一時保管するための半導体製造装置におけるストックヤードと、前記ウェハを処理するためのプロセス処理装置とを隔絶する壁体の手前側に装着されて、前記プロセス処理装置との間で受渡しを行うウェハを収納したウェハキャリア30を載置するキャリアステージCを備えたロードポート装置Fであって、前記キャリアステージCの直下にバッファプレート21を水平に配置して、前記ウェハキャリア30を一時保管するためのバッファステージBが形成されている。
【選択図】 図1
Description
C :キャリアステージ
E :半導体製造装置(製造装置)
F :ロードポート装置
P :壁体
R1 :ストックヤード
R3 :プロセス処理装置
T1 :キャリア移載装置
W :ウェハ
X :プロセス処理装置に対するキャリアプレートの進退方向
1 :装着盤
2 :ウェハ移載窓
3 :カバー体
11:キャリアプレート
13:キャリアプレートの位置決めピン
14:キャリアプレートのハンド挿入空間部
18:テーブル
21:バッファプレート
23:バッファプレートの位置決めピン
24:バッファプレートのハンド挿入空間部
30:ウェハキャリア(キャリア)
31:位置決め台座
32:蓋体
71:移載アーム
72:移載ハンド
Claims (4)
- 製造過程にあるウェハを収納したウェハキャリアを一時保管するための半導体製造装置におけるストックヤードと、前記ウェハを処理するためのプロセス処理装置とを隔絶する壁体の手前側に装着されて、前記プロセス処理装置との間で受渡しを行うウェハを収納したウェハキャリアを載置するキャリアステージを備え、
前記キャリアステージは、前記壁体に固定される装着盤と、当該装着盤に設けられたウェハ移載窓の下端縁に手前側に向けて水平に設けられたテーブルと、当該テーブルの上面に配設されて、前記ウェハキャリアを載置した状態で前記プロセス処理装置に対して進退するキャリアプレートと、を備えたロードポート装置であって、
前記テーブルの直下にバッファプレートを水平に配置して、前記ウェハキャリアを一時保管するためのバッファステージを形成したことを特徴とするロードポート装置。 - 前記キャリアプレートには、当該キャリアプレートに対するウェハキャリアの位置決めを行う複数の位置決めピンと、下方からウェハキャリアを支持して前記キャリアプレートに対してウェハキャリアを着脱させて移載するキャリア移載装置の移載ハンドとの干渉を回避するハンド挿入空間部とが形成され、
前記バッファプレートには、前記キャリアプレートの後退位置において平面視で同一配置となるように前記位置決めピン、及びハンド挿入空間部が設けられていることを特徴とする請求項1に記載のロードポート装置。 - 前記半導体製造装置の最前面のロードポートに載置されたウェハキャリアは、キャリア移載装置の移載アームを前記プロセス処理装置に対する進退方向に沿って作動させるのみで前記バッファステージに移載可能なように、前記ロードポートとバッファプレートは、ほぼ同一高さに配置されていることを特徴とする請求項1又は2に記載のロードポート装置。
- 前記装着盤において、前記キャリアステージより下方部分に、マッピング装置の昇降装置を覆うカバー体が装着されていることを特徴とする請求項1ないし3のいずれかに記載のロードポート装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006230357A JP4904995B2 (ja) | 2006-08-28 | 2006-08-28 | ロードポート装置 |
KR1020070086155A KR101408294B1 (ko) | 2006-08-28 | 2007-08-27 | 로드 포트 장치 |
US11/892,830 US7887276B2 (en) | 2006-08-28 | 2007-08-28 | Load port device |
TW096131760A TWI390661B (zh) | 2006-08-28 | 2007-08-28 | 承載介面裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006230357A JP4904995B2 (ja) | 2006-08-28 | 2006-08-28 | ロードポート装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008053596A true JP2008053596A (ja) | 2008-03-06 |
JP4904995B2 JP4904995B2 (ja) | 2012-03-28 |
Family
ID=39151771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006230357A Active JP4904995B2 (ja) | 2006-08-28 | 2006-08-28 | ロードポート装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7887276B2 (ja) |
JP (1) | JP4904995B2 (ja) |
KR (1) | KR101408294B1 (ja) |
TW (1) | TWI390661B (ja) |
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US8814488B2 (en) | 2007-04-02 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and semiconductor device manufacturing method |
US8875866B2 (en) | 2012-01-27 | 2014-11-04 | Daifuku Co., Ltd. | Article transport facility |
JP2015076432A (ja) * | 2013-10-07 | 2015-04-20 | 東京エレクトロン株式会社 | 基板搬送室及び容器接続機構 |
JP2019536272A (ja) * | 2016-11-10 | 2019-12-12 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 改善されたロードポートバックプレーンのためのシステム、装置、及び方法 |
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Also Published As
Publication number | Publication date |
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KR101408294B1 (ko) | 2014-06-17 |
US20080056860A1 (en) | 2008-03-06 |
JP4904995B2 (ja) | 2012-03-28 |
TW200820368A (en) | 2008-05-01 |
TWI390661B (zh) | 2013-03-21 |
KR20080019562A (ko) | 2008-03-04 |
US7887276B2 (en) | 2011-02-15 |
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