JP2005536875A5 - - Google Patents

Download PDF

Info

Publication number
JP2005536875A5
JP2005536875A5 JP2004529893A JP2004529893A JP2005536875A5 JP 2005536875 A5 JP2005536875 A5 JP 2005536875A5 JP 2004529893 A JP2004529893 A JP 2004529893A JP 2004529893 A JP2004529893 A JP 2004529893A JP 2005536875 A5 JP2005536875 A5 JP 2005536875A5
Authority
JP
Japan
Prior art keywords
spatial light
light modulator
substrate
image
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004529893A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005536875A (ja
JP4597675B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2003/026416 external-priority patent/WO2004019079A2/en
Publication of JP2005536875A publication Critical patent/JP2005536875A/ja
Publication of JP2005536875A5 publication Critical patent/JP2005536875A5/ja
Application granted granted Critical
Publication of JP4597675B2 publication Critical patent/JP4597675B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2004529893A 2002-08-24 2003-08-20 連続直接書込み光リソグラフィ Expired - Lifetime JP4597675B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40603002P 2002-08-24 2002-08-24
PCT/US2003/026416 WO2004019079A2 (en) 2002-08-24 2003-08-20 Continuous direct-write optical lithography

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2010114054A Division JP4695711B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ
JP2010114056A Division JP4695712B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ

Publications (3)

Publication Number Publication Date
JP2005536875A JP2005536875A (ja) 2005-12-02
JP2005536875A5 true JP2005536875A5 (enExample) 2008-06-05
JP4597675B2 JP4597675B2 (ja) 2010-12-15

Family

ID=31946958

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2004529893A Expired - Lifetime JP4597675B2 (ja) 2002-08-24 2003-08-20 連続直接書込み光リソグラフィ
JP2010114054A Expired - Fee Related JP4695711B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ
JP2010114056A Expired - Fee Related JP4695712B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2010114054A Expired - Fee Related JP4695711B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ
JP2010114056A Expired - Fee Related JP4695712B2 (ja) 2002-08-24 2010-05-18 連続直接書込み光リソグラフィ

Country Status (8)

Country Link
US (5) US7167296B2 (enExample)
EP (2) EP1573366B1 (enExample)
JP (3) JP4597675B2 (enExample)
KR (4) KR101087930B1 (enExample)
CN (2) CN101487982A (enExample)
AU (1) AU2003265611A1 (enExample)
TW (1) TWI266961B (enExample)
WO (1) WO2004019079A2 (enExample)

Families Citing this family (155)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4057937B2 (ja) * 2003-03-25 2008-03-05 富士フイルム株式会社 露光装置
US20040197672A1 (en) * 2003-04-01 2004-10-07 Numerical Technologies, Inc. Programmable aperture for lithographic imaging systems
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
SG119224A1 (en) * 2003-06-26 2006-02-28 Asml Netherlands Bv Calibration method for a lithographic apparatus and device manufacturing method
US20070019070A1 (en) * 2003-08-27 2007-01-25 Koninklijke Philips Electronics N.V. Method of forming optical images, an array of converging elements and an array of light valves for use in this method, apparatus for carrying out this method and a process for manufacturing a device using this method
US8077998B2 (en) * 2004-01-05 2011-12-13 Production Resource Group, Llc Reduced complexity and blur technique for an electronic lighting system
US7190434B2 (en) * 2004-02-18 2007-03-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6977718B1 (en) * 2004-03-02 2005-12-20 Advanced Micro Devices, Inc. Lithography method and system with adjustable reflector
USRE43515E1 (en) * 2004-03-09 2012-07-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372547B2 (en) * 2004-04-27 2008-05-13 Lsi Corporation Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography
US7438997B2 (en) * 2004-05-14 2008-10-21 Intel Corporation Imaging and devices in lithography
US7142286B2 (en) * 2004-07-27 2006-11-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4601482B2 (ja) * 2004-07-29 2010-12-22 新光電気工業株式会社 描画装置および描画方法
JP4577555B2 (ja) * 2004-08-25 2010-11-10 横河電機株式会社 導光部材及びこれを用いた表示器
US7893948B1 (en) * 2004-10-14 2011-02-22 Daktronics, Inc. Flexible pixel hardware and method
US8344410B2 (en) 2004-10-14 2013-01-01 Daktronics, Inc. Flexible pixel element and signal distribution means
US7868903B2 (en) 2004-10-14 2011-01-11 Daktronics, Inc. Flexible pixel element fabrication and sealing method
US8001455B2 (en) * 2004-10-14 2011-08-16 Daktronics, Inc. Translation table
US7180573B2 (en) * 2004-10-15 2007-02-20 Asml Holding N.V. System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
JP2006113413A (ja) * 2004-10-15 2006-04-27 Fuji Photo Film Co Ltd 描画方法および描画装置
JP2006113412A (ja) * 2004-10-15 2006-04-27 Fuji Photo Film Co Ltd 描画方法および描画装置
US7609362B2 (en) * 2004-11-08 2009-10-27 Asml Netherlands B.V. Scanning lithographic apparatus and device manufacturing method
US7643192B2 (en) * 2004-11-24 2010-01-05 Asml Holding N.V. Pattern generator using a dual phase step element and method of using same
US7333177B2 (en) * 2004-11-30 2008-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100815346B1 (ko) * 2004-12-02 2008-03-19 삼성전기주식회사 픽셀 단위 스캐닝 방식의 디스플레이 장치
US7277158B2 (en) * 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7202939B2 (en) * 2004-12-22 2007-04-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060138349A1 (en) * 2004-12-27 2006-06-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7542013B2 (en) * 2005-01-31 2009-06-02 Asml Holding N.V. System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
US7758799B2 (en) 2005-04-01 2010-07-20 3D Systems, Inc. Edge smoothness with low resolution projected images for use in solid imaging
US7330239B2 (en) * 2005-04-08 2008-02-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device
CN101203808A (zh) * 2005-04-15 2008-06-18 麦克罗尼克激光系统公司 图像增强技术
CN101317133B (zh) 2005-05-02 2013-04-03 拉多韦有限公司 用于将无掩模图形转移到光敏基板上的光刻方法
US7548308B2 (en) * 2005-05-11 2009-06-16 Kla-Tencor Corporation Illumination energy management in surface inspection
KR100815352B1 (ko) * 2005-05-12 2008-03-19 삼성전기주식회사 후단 렌즈계의 개구수가 개선된 광변조기를 이용한디스플레이 장치
JP2007033882A (ja) * 2005-07-27 2007-02-08 Hitachi Via Mechanics Ltd 露光装置及び露光方法並びに配線基板の製造方法
US9234852B2 (en) 2005-07-29 2016-01-12 Mitutoyo Corporation Systems and methods for controlling strobe illumination
US8045002B2 (en) * 2005-07-29 2011-10-25 Mitutoyo Corporation Systems and methods for controlling strobe illumination
KR20080068006A (ko) * 2005-11-15 2008-07-22 가부시키가이샤 니콘 노광 장치와, 노광 방법 및 디바이스 제조 방법
US7728955B2 (en) * 2006-03-21 2010-06-01 Asml Netherlands B.V. Lithographic apparatus, radiation supply and device manufacturing method
JP4495104B2 (ja) * 2006-03-28 2010-06-30 エーエスエムエル ネザーランズ ビー．ブイ． 可変式照明源
DE102006019963B4 (de) * 2006-04-28 2023-12-07 Envisiontec Gmbh Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung
US7936445B2 (en) * 2006-06-19 2011-05-03 Asml Netherlands B.V. Altering pattern data based on measured optical element characteristics
JP2008003163A (ja) * 2006-06-20 2008-01-10 Shinko Electric Ind Co Ltd 描画方法およびそのコンピュータプログラム
US20080002174A1 (en) * 2006-06-30 2008-01-03 Asml Netherlands B.V. Control system for pattern generator in maskless lithography
US9415544B2 (en) * 2006-08-29 2016-08-16 3D Systems, Inc. Wall smoothness, feature accuracy and resolution in projected images via exposure levels in solid imaging
DE102006049169A1 (de) * 2006-10-18 2008-04-30 Punch Graphix Prepress Germany Gmbh Beleuchtungsanordnung
JP4897432B2 (ja) * 2006-10-31 2012-03-14 株式会社ナノシステムソリューションズ 露光方法及び露光装置
US8003039B2 (en) 2007-01-17 2011-08-23 3D Systems, Inc. Method for tilting solid image build platform for reducing air entrainment and for build release
US8420978B2 (en) 2007-01-18 2013-04-16 The Board Of Trustees Of The University Of Illinois High throughput, low cost dual-mode patterning method for large area substrates
US8003300B2 (en) * 2007-04-12 2011-08-23 The Board Of Trustees Of The University Of Illinois Methods for fabricating complex micro and nanoscale structures and electronic devices and components made by the same
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
US8237913B2 (en) * 2007-05-08 2012-08-07 Asml Netherlands B.V. Lithographic apparatus and method
US20080278698A1 (en) * 2007-05-08 2008-11-13 Asml Netherlands B.V. Lithographic apparatus and method
KR100875900B1 (ko) * 2007-06-08 2008-12-26 재단법인서울대학교산학협력재단 마스크를 사용하지 아니하는 광유체적 리소그래피 시스템
US8652763B2 (en) * 2007-07-16 2014-02-18 The Board Of Trustees Of The University Of Illinois Method for fabricating dual damascene profiles using sub pixel-voting lithography and devices made by same
US8111380B2 (en) * 2007-09-14 2012-02-07 Luminescent Technologies, Inc. Write-pattern determination for maskless lithography
US7847938B2 (en) * 2007-10-01 2010-12-07 Maskless Lithography, Inc. Alignment system for optical lithography
US8482732B2 (en) * 2007-10-01 2013-07-09 Maskless Lithography, Inc. Alignment system for various materials and material flows
DE102007051990A1 (de) * 2007-10-31 2009-05-07 Miva Technologies Gmbh Fotoplott-Verfahren und Anordnung zur Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger
US20090153579A1 (en) * 2007-12-13 2009-06-18 Hirotoshi Ichikawa Speckle reduction method
KR101437692B1 (ko) * 2008-02-25 2014-09-03 엘지전자 주식회사 복수의 공간광변조기를 이용한 마스크리스 노광장치 및이를 이용한 패턴 형성 방법
US8546067B2 (en) * 2008-03-21 2013-10-01 The Board Of Trustees Of The University Of Illinois Material assisted laser ablation
US9561622B2 (en) 2008-05-05 2017-02-07 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
DE102008045059B4 (de) 2008-09-01 2012-04-19 Universität Rostock Verfahren zum Belichten eines fotosensitiven Substrats
KR101560617B1 (ko) * 2008-09-10 2015-10-16 삼성전자주식회사 광 발생 장치 및 그 제어 방법
EP2329322B1 (en) * 2008-09-22 2016-09-07 ASML Netherlands BV Lithographic apparatus and lithographic method
US8395752B2 (en) * 2008-09-23 2013-03-12 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US9405203B2 (en) 2008-09-23 2016-08-02 Applied Materials, Inc. Pixel blending for multiple charged-particle beam lithography
US8390786B2 (en) 2008-09-23 2013-03-05 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8253923B1 (en) * 2008-09-23 2012-08-28 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US9025136B2 (en) * 2008-09-23 2015-05-05 Applied Materials, Inc. System and method for manufacturing three dimensional integrated circuits
US8390781B2 (en) * 2008-09-23 2013-03-05 Pinebrook Imaging Technology, Ltd. Optical imaging writer system
US8670106B2 (en) 2008-09-23 2014-03-11 Pinebrook Imaging, Inc. Optical imaging writer system
US8048359B2 (en) 2008-10-20 2011-11-01 3D Systems, Inc. Compensation of actinic radiation intensity profiles for three-dimensional modelers
DE102009020320A1 (de) * 2008-11-19 2010-05-20 Heidelberg Instruments Mikrotechnik Gmbh Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen
TWI394992B (zh) * 2008-12-02 2013-05-01 Univ Nat Central Fabrication device and method for producing high molecular optical waveguide element
US8187795B2 (en) * 2008-12-09 2012-05-29 The Board Of Trustees Of The University Of Illinois Patterning methods for stretchable structures
EP2196855A1 (de) * 2008-12-10 2010-06-16 CST GmbH Belichtungskopf und Verfahren zur Herstellung von Druckformen
US9507271B1 (en) * 2008-12-17 2016-11-29 Applied Materials, Inc. System and method for manufacturing multiple light emitting diodes in parallel
US8529987B2 (en) * 2009-08-04 2013-09-10 The Boeing Company In-process orientation of particles in a direct-write ink to control electrical characteristics of an electrical component being fabricated
US8539395B2 (en) 2010-03-05 2013-09-17 Micronic Laser Systems Ab Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
US8767175B2 (en) 2010-03-05 2014-07-01 Micronic Laser Systems Ab 1.5D SLM for lithography
WO2011107601A1 (en) 2010-03-05 2011-09-09 Micronic Mydata AB 1.5d slm for lithography
US9573385B2 (en) 2010-03-18 2017-02-21 Koninklijke Philips N.V. Printing apparatus and method for controlling a printing apparatus
US8335999B2 (en) 2010-06-11 2012-12-18 Orbotech Ltd. System and method for optical shearing
CN103069436B (zh) * 2010-08-05 2017-02-08 奥博泰克有限公司 照明系统
JP5703069B2 (ja) * 2010-09-30 2015-04-15 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
US20120085919A1 (en) * 2010-10-08 2012-04-12 Shinichi Kojima Apparatus and methods for pattern generation
JP5747303B2 (ja) * 2010-11-12 2015-07-15 株式会社ブイ・テクノロジー 露光装置
JP5793236B2 (ja) 2011-03-29 2015-10-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィにおける放射ビームスポットの位置の測定
TWI481967B (zh) * 2011-05-24 2015-04-21 Applied Materials Inc 光學圖像寫成系統
CN102841507B (zh) * 2011-06-23 2014-06-25 虎尾科技大学 激光直写式纳米周期性结构图案制造设备
US8681413B2 (en) * 2011-06-27 2014-03-25 Kla-Tencor Corporation Illumination control
US9703207B1 (en) * 2011-07-08 2017-07-11 Kla-Tencor Corporation System and method for reducing dynamic range in images of patterned regions of semiconductor wafers
US8653454B2 (en) 2011-07-13 2014-02-18 Luminescent Technologies, Inc. Electron-beam image reconstruction
US8823921B2 (en) * 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US8477403B2 (en) 2011-08-24 2013-07-02 Palo Alto Research Center Incorporated Variable length imaging apparatus using electronically registered and stitched single-pass imaging systems
US8502853B2 (en) 2011-08-24 2013-08-06 Palo Alto Research Center Incorporated Single-pass imaging method with image data scrolling for improved resolution contrast and exposure extent
US8767270B2 (en) 2011-08-24 2014-07-01 Palo Alto Research Center Incorporated Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent
US8670172B2 (en) 2011-08-24 2014-03-11 Palo Alto Research Center Incorporated Variable length imaging method using electronically registered and stitched single-pass imaging
US8405913B2 (en) 2011-08-24 2013-03-26 Palo Alto Research Center Incorporated Anamorphic projection optical system
US8872875B2 (en) 2011-08-24 2014-10-28 Palo Alto Research Center Incorporated Single-pass imaging system with anamorphic optical system
US8390917B1 (en) 2011-08-24 2013-03-05 Palo Alto Research Center Incorporated Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics
US9630424B2 (en) 2011-08-24 2017-04-25 Palo Alto Research Center Incorporated VCSEL-based variable image optical line generator
US8520045B2 (en) 2011-08-24 2013-08-27 Palo Alto Research Center Incorporated Single-pass imaging system with spatial light modulator and catadioptric anamorphic optical system
US8472104B2 (en) 2011-08-24 2013-06-25 Palo Alto Research Center Incorporated Single-pass imaging system using spatial light modulator anamorphic projection optics
US9030515B2 (en) 2011-08-24 2015-05-12 Palo Alto Research Center Incorporated Single-pass imaging method using spatial light modulator and anamorphic projection optics
CN102323726B (zh) * 2011-09-19 2013-11-06 天津芯硕精密机械有限公司 通过扫描实现高精度灰度曝光的方法
US8691476B2 (en) 2011-12-16 2014-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. EUV mask and method for forming the same
JP6137485B2 (ja) * 2012-01-18 2017-05-31 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
US8822106B2 (en) * 2012-04-13 2014-09-02 Taiwan Semiconductor Manufacturing Company, Ltd. Grid refinement method
US8791972B2 (en) 2012-02-13 2014-07-29 Xerox Corporation Reflex-type digital offset printing system with serially arranged single-pass, single-color imaging systems
CN104335117B (zh) 2012-06-04 2016-09-07 应用材料公司 光学投影阵列曝光系统
US9972362B2 (en) * 2012-06-18 2018-05-15 Seagate Technology Llc Controller for controlling the speed of a cooling device via varying speed steps, apparatus and methods
JP6037752B2 (ja) * 2012-09-28 2016-12-07 株式会社Ｓｃｒｅｅｎホールディングス 画像記録装置および画像記録方法
JP6137762B2 (ja) * 2012-10-08 2017-05-31 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ装置を作動させる方法
EP2917012A4 (en) * 2012-11-08 2016-08-10 Ddm Systems Inc SYSTEMS AND METHOD FOR THE PRODUCTION OF THREE-DIMENSIONAL OBJECTS
JP5951451B2 (ja) 2012-11-12 2016-07-13 浜松ホトニクス株式会社 光照射装置、顕微鏡装置及びレーザ加工装置
JP2014120746A (ja) * 2012-12-19 2014-06-30 Canon Inc 描画装置、および物品の製造方法
CN103969956B (zh) * 2013-01-25 2017-02-08 上海微电子装备有限公司 曝光装置
WO2014141272A2 (en) 2013-03-14 2014-09-18 Stratasys Ltd. Enhanced resolution dlp projector apparatus and method of using same
JP6117593B2 (ja) * 2013-03-29 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法
KR102120624B1 (ko) * 2013-04-04 2020-06-10 삼성디스플레이 주식회사 Glv를 이용한 디지털 노광기 및 dmd를 이용한 디지털 노광기
US10012910B2 (en) * 2013-10-22 2018-07-03 Applied Materials, Inc. Pattern generators employing processors to vary delivery dose of writing beams according to photoresist thickness, and associated methods
KR102166879B1 (ko) * 2014-03-10 2020-10-16 어플라이드 머티어리얼스, 인코포레이티드 다중 하전-입자 빔 리소그래피를 위한 픽셀 블렌딩
JP7111466B2 (ja) 2014-08-01 2022-08-02 アプライド マテリアルズ インコーポレイテッド ３ｄパターン形成のためのデジタルグレイトーンリソグラフィ
US9354379B2 (en) 2014-09-29 2016-05-31 Palo Alto Research Center Incorporated Light guide based optical system for laser line generator
EP3779593B1 (en) 2014-12-31 2025-04-02 Dolby Laboratories Licensing Corporation Methods and systems for high dynamic range image projectors
CN104820345B (zh) * 2015-05-23 2017-03-22 南昌航空大学 一种基于亚像素调制提高数字光刻分辨力的方法
US9823573B2 (en) 2015-07-02 2017-11-21 Applied Materials, Inc. Correction of non-uniform patterns using time-shifted exposures
KR102268192B1 (ko) * 2015-07-17 2021-06-24 아이엠에스 나노패브릭케이션 게엠베하 중첩 노출 점을 사용한 선량 불균일성의 보상
US10254112B1 (en) * 2015-10-29 2019-04-09 National Technology & Engineering Solutions Of Sandia, Llc Full-field surface roughness
DE102015221623A1 (de) 2015-11-04 2017-05-04 Eos Gmbh Electro Optical Systems Belichteroptik und Vorrichtung zum Herstellen eines dreidimensionalen Objekts
US10155273B1 (en) * 2016-05-19 2018-12-18 X Development Llc Interactive object fabrication
JP6259491B2 (ja) * 2016-06-08 2018-01-10 浜松ホトニクス株式会社 光照射装置、顕微鏡装置、レーザ加工装置、及び光照射方法
CN114185250B (zh) 2016-12-20 2024-12-06 Ev集团E·索尔纳有限责任公司 将一光敏层曝光之装置及方法
US10852528B2 (en) 2016-12-20 2020-12-01 Ev Group E. Thallner Gmbh Method and device for exposure of photosensitive layer
CN106773550B (zh) * 2017-01-20 2018-12-14 苏州亿拓光电科技有限公司 光学加工系统和方法
US20190022941A1 (en) * 2017-07-21 2019-01-24 Ackuretta Technologies Pvt. Ltd. Digital light processing three-dimensional printing system and method
JP7260959B2 (ja) * 2018-03-16 2023-04-19 キヤノン株式会社 リソグラフィ装置、照明装置及び物品の製造方法
US10503076B1 (en) * 2018-08-29 2019-12-10 Applied Materials, Inc. Reserving spatial light modulator sections to address field non-uniformities
US10474041B1 (en) * 2019-02-04 2019-11-12 Applied Materials, Inc. Digital lithography with extended depth of focus
US10599044B1 (en) 2019-02-04 2020-03-24 Applied Materials, Inc. Digital lithography with extended field size
DE102019001922A1 (de) * 2019-03-15 2020-09-17 Friedrich-Schiller-Universität Jena Verfahren und Vorrichtung zur Projektion von Mustern
CN110780546B (zh) * 2019-10-30 2021-10-15 京东方科技集团股份有限公司 一种数字曝光机及其曝光控制方法
CN112799285B (zh) * 2019-11-14 2022-04-22 苏州苏大维格科技集团股份有限公司 三维微纳结构光刻系统及其方法
CN112799286B (zh) * 2019-11-14 2022-04-22 苏州苏大维格科技集团股份有限公司 三维微纳结构光刻系统及其方法
JP2023030230A (ja) * 2020-02-19 2023-03-08 株式会社ニコン マスクデータ生成方法、およびマスクデータ生成プログラム
CN111367147B (zh) * 2020-02-26 2022-04-01 合肥芯碁微电子装备股份有限公司 控制直写光刻机曝光的方法、装置和光刻机
US11747731B2 (en) * 2020-11-20 2023-09-05 Canon Kabishiki Kaisha Curing a shaped film using multiple images of a spatial light modulator
TW202303301A (zh) * 2021-05-10 2023-01-16 美商應用材料股份有限公司 用於灰階微影術的方法以及設備
EP4163722A1 (en) * 2021-10-06 2023-04-12 Mycronic AB Edge placement with spatial light modulator writing
JP2024060420A (ja) * 2022-10-19 2024-05-02 キヤノン株式会社 画像取得装置、画像取得方法、及びプログラム
KR20240136505A (ko) * 2023-03-06 2024-09-19 삼성디스플레이 주식회사 멀티빔 노광기의 보정 방법

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571603A (en) 1981-11-03 1986-02-18 Texas Instruments Incorporated Deformable mirror electrostatic printer
US4879605A (en) 1988-02-29 1989-11-07 Ateq Corporation Rasterization system utilizing an overlay of bit-mapped low address resolution databases
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5049901A (en) 1990-07-02 1991-09-17 Creo Products Inc. Light modulator using large area light sources
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
US5132723A (en) 1991-09-05 1992-07-21 Creo Products, Inc. Method and apparatus for exposure control in light valves
US5455602A (en) 1993-03-29 1995-10-03 Texas Instruments Incorporated Combined modulation schemes for spatial light modulators
US5461411A (en) 1993-03-29 1995-10-24 Texas Instruments Incorporated Process and architecture for digital micromirror printer
US5459492A (en) 1993-08-30 1995-10-17 Texas Instruments Incorporated Method and apparatus for printing stroke and contone data together
KR100220673B1 (ko) * 1994-01-18 1999-09-15 전주범 투사형 화상 표시장치
US6229649B1 (en) * 1994-10-04 2001-05-08 The United States Of America As Represented By The Secretary Of The Air Force Pseudo deconvolution method of recovering a distorted optical image
US5490009A (en) 1994-10-31 1996-02-06 Texas Instruments Incorporated Enhanced resolution for digital micro-mirror displays
JPH09292657A (ja) 1996-02-27 1997-11-11 Fuji Photo Film Co Ltd 画像露光装置並びにミラーアレイデバイスおよび液晶パネル
US5805290A (en) * 1996-05-02 1998-09-08 International Business Machines Corporation Method of optical metrology of unresolved pattern arrays
US5691541A (en) 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
US5870176A (en) 1996-06-19 1999-02-09 Sandia Corporation Maskless lithography
US6098082A (en) 1996-07-15 2000-08-01 At&T Corp Method for automatically providing a compressed rendition of a video program in a format suitable for electronic searching and retrieval
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
US6411366B2 (en) 1996-12-31 2002-06-25 Friedrich Luellau Exposure device for printing plates including digitally controlled micromirror picture-generating unit and method of triggering same
US5834238A (en) 1997-04-08 1998-11-10 Incyte Pharmaceuticals, Inc. Human GTP binding protein
CA2321070C (en) 1998-02-23 2010-04-06 Wisconsin Alumni Research Foundation Method and apparatus for synthesis of arrays of dna probes
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JPH11320968A (ja) 1998-05-13 1999-11-24 Ricoh Microelectronics Co Ltd 光像形成方法及びその装置、画像形成装置並びにリソグラフィ用露光装置
US6271957B1 (en) 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
AU4333799A (en) 1998-06-04 1999-12-20 Board Of Regents, The University Of Texas System Digital optical chemistry micromirror imager
US6251550B1 (en) 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data
US6204875B1 (en) 1998-10-07 2001-03-20 Barco Graphics, Nv Method and apparatus for light modulation and exposure at high exposure levels with high resolution
US6567205B1 (en) 1998-12-11 2003-05-20 Basys Print Systeme Fuer Die Druckindustrie Exposure device
US6421573B1 (en) 1999-05-27 2002-07-16 Spectra Physics Lasers, Inc. Quasi-continuous wave lithography apparatus and method
CA2277656C (en) 1999-07-19 2010-04-27 Imax Corporation Image projection system
CA2314513A1 (en) * 1999-07-26 2001-01-26 Gust H. Bardy System and method for providing normalized voice feedback from an individual patient in an automated collection and analysis patient care system
DE19944760A1 (de) * 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Vorrichtung und Verfahren zur Kompensation von Inhomogenitäten bei Abbildungssystemen
JP2001135562A (ja) 1999-11-05 2001-05-18 Hitachi Ltd リソグラフィ装置
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system
US6425669B1 (en) 2000-05-24 2002-07-30 Ball Semiconductor, Inc. Maskless exposure system
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
US6552779B2 (en) 2000-05-25 2003-04-22 Ball Semiconductor, Inc. Flying image of a maskless exposure system
US6537738B1 (en) 2000-08-08 2003-03-25 Ball Semiconductor, Inc. System and method for making smooth diagonal components with a digital photolithography system
US6493867B1 (en) 2000-08-08 2002-12-10 Ball Semiconductor, Inc. Digital photolithography system for making smooth diagonal components
JP2002120400A (ja) 2000-10-17 2002-04-23 Fuji Photo Film Co Ltd 画像記録方法及び装置
US6473237B2 (en) * 2000-11-14 2002-10-29 Ball Semiconductor, Inc. Point array maskless lithography
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
US6637329B1 (en) 2001-05-15 2003-10-28 Creo Products Inc. Method for improving registration of images on opposing sides of a printing medium
JP5144863B2 (ja) * 2001-06-29 2013-02-13 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
US6665121B2 (en) 2001-11-06 2003-12-16 Creo Il. Ltd. Multi-channel image recording apparatus
SE0104238D0 (sv) 2001-12-14 2001-12-14 Micronic Laser Systems Ab Method and apparatus for patterning a workpiece
US7756305B2 (en) * 2002-01-23 2010-07-13 The Regents Of The University Of California Fast 3D cytometry for information in tissue engineering
US6717650B2 (en) 2002-05-01 2004-04-06 Anvik Corporation Maskless lithography with sub-pixel resolution

Similar Documents

Publication Publication Date Title
JP2005536875A5 (enExample)
KR101087862B1 (ko) 연속적인 직접-기록 광 리쏘그래피 장치 및 방법
JP6086267B2 (ja) 照明光学系、照明方法、露光装置、およびデバイス製造方法
TWI574118B (zh) 使用光學投影之基板調諧系統及方法
JP2004363590A (ja) リソグラフィ装置及びデバイス製造方法
KR100756504B1 (ko) 리소그래피 장치 및 디바이스 제조방법
KR20100030999A (ko) 마스크리스 노광 장치 및 이를 이용한 정렬 오차의 보상 방법
JP2007194607A (ja) マスクレスの干渉露光ユニットを用いる露光装置及びデバイス製造方法
KR20060074870A (ko) 리소그래피 장치 및 디바이스 제조 방법
JP4463244B2 (ja) リソグラフィ装置、デバイス製造方法、および、この方法により製造されて焦点深さの増したデバイス
JP2008306186A (ja) 光学的マスクレスリソグラフィにおけるドーズ量制御
JP2008003607A (ja) 光学ズーム組立体における光学素子の軸外トランスレーションの補正
US9977334B2 (en) Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
CN101317133A (zh) 用于将无掩模图形转移到光敏基板上的光刻方法
JP4554556B2 (ja) センサーで結像システムを較正するリソグラフィ装置及びデバイス製造方法並びにそれによって製造されたデバイス
JP4354431B2 (ja) リソグラフィシステム
JP2017507359A5 (enExample)
TW201730688A (zh) 使用光學投影之基板調整系統及方法
JP2006343750A (ja) デジタル画像を書き込むためのリソグラフィ装置及びデバイス製造方法
JP5689539B2 (ja) リソグラフィ装置においてパターニングデバイスを制御する方法、デバイス製造方法、及びリソグラフィ装置
JP2007503613A (ja) 光学像を形成する方法、この方法を実行する機器、及びこの方法を使用するデバイスを製造する方法
JP2001267205A (ja) 露光装置