JP2017507359A5 - - Google Patents

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Publication number
JP2017507359A5
JP2017507359A5 JP2016553429A JP2016553429A JP2017507359A5 JP 2017507359 A5 JP2017507359 A5 JP 2017507359A5 JP 2016553429 A JP2016553429 A JP 2016553429A JP 2016553429 A JP2016553429 A JP 2016553429A JP 2017507359 A5 JP2017507359 A5 JP 2017507359A5
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JP
Japan
Prior art keywords
light
array
target surface
micromirror
illumination system
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Application number
JP2016553429A
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English (en)
Japanese (ja)
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JP6338685B2 (ja
JP2017507359A (ja
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Priority claimed from DE102014203040.4A external-priority patent/DE102014203040A1/de
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Publication of JP2017507359A publication Critical patent/JP2017507359A/ja
Publication of JP2017507359A5 publication Critical patent/JP2017507359A5/ja
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Publication of JP6338685B2 publication Critical patent/JP6338685B2/ja
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JP2016553429A 2014-02-19 2015-02-05 マイクロリソグラフィ投影露光系の照明系及びそのような照明系を操作する方法 Active JP6338685B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203040.4A DE102014203040A1 (de) 2014-02-19 2014-02-19 Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen
DE102014203040.4 2014-02-19
PCT/EP2015/000222 WO2015124262A1 (de) 2014-02-19 2015-02-05 Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage und verfahren zum betreiben eines solchen

Publications (3)

Publication Number Publication Date
JP2017507359A JP2017507359A (ja) 2017-03-16
JP2017507359A5 true JP2017507359A5 (enExample) 2018-04-12
JP6338685B2 JP6338685B2 (ja) 2018-06-06

Family

ID=52737044

Family Applications (1)

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JP2016553429A Active JP6338685B2 (ja) 2014-02-19 2015-02-05 マイクロリソグラフィ投影露光系の照明系及びそのような照明系を操作する方法

Country Status (4)

Country Link
US (1) US9977334B2 (enExample)
JP (1) JP6338685B2 (enExample)
DE (1) DE102014203040A1 (enExample)
WO (1) WO2015124262A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016211511A1 (de) 2016-06-27 2017-12-28 Carl Zeiss Smt Gmbh Beleuchtungseinheit für die Mikrolithographie
CN110609453A (zh) * 2019-09-23 2019-12-24 安徽工程大学 一种用于无掩模直写光刻的曝光光源控制系统及其工作方法
CN111505911A (zh) * 2020-05-13 2020-08-07 河南百合特种光学研究院有限公司 一种时分复用曝光光源

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SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6624880B2 (en) 2001-01-18 2003-09-23 Micronic Laser Systems Ab Method and apparatus for microlithography
JP4401060B2 (ja) * 2001-06-01 2010-01-20 エーエスエムエル ネザーランズ ビー．ブイ． リトグラフ装置、およびデバイス製造方法
KR100480620B1 (ko) 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
US7663734B2 (en) * 2003-04-11 2010-02-16 Tadahiro Ohmi Pattern writing system and pattern writing method
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
JP2006128194A (ja) * 2004-10-26 2006-05-18 Canon Inc 露光装置及びデバイス製造方法
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
US7626181B2 (en) * 2005-12-09 2009-12-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI456267B (zh) 2006-02-17 2014-10-11 Zeiss Carl Smt Gmbh 用於微影投射曝光設備之照明系統
DE102006032810A1 (de) * 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
JP2008085266A (ja) * 2006-09-29 2008-04-10 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP5345132B2 (ja) * 2007-04-25 2013-11-20 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置においてマスクを照明するための照明系
KR20180072841A (ko) * 2007-11-06 2018-06-29 가부시키가이샤 니콘 조명 광학계, 노광 장치 및 노광 방법
NL1036786A1 (nl) * 2008-05-08 2009-11-11 Asml Netherlands Bv Lithographic apparatus and method.
EP2141159A1 (en) 2008-07-03 2010-01-06 Sandoz AG A Crystalline form of posaconazole
EP2146248B1 (en) 2008-07-16 2012-08-29 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
EP2202580B1 (en) * 2008-12-23 2011-06-22 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
KR101692265B1 (ko) 2009-12-08 2017-01-04 삼성전자 주식회사 마스크리스 노광 장치와 이를 이용한 패턴 보정 방법
DE102010001388A1 (de) 2010-01-29 2011-08-04 Carl Zeiss SMT GmbH, 73447 Facettenspiegel zum Einsatz in der Mikrolithografie
US8743165B2 (en) 2010-03-05 2014-06-03 Micronic Laser Systems Ab Methods and device for laser processing
JP6016169B2 (ja) * 2011-01-29 2016-10-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
KR102171301B1 (ko) * 2013-07-09 2020-10-29 삼성디스플레이 주식회사 Dmd를 이용한 디지털 노광기 및 그 제어 방법
EP2876499B1 (en) 2013-11-22 2017-05-24 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
DE102014203041A1 (de) * 2014-02-19 2015-08-20 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen

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