CN102323726B - 通过扫描实现高精度灰度曝光的方法 - Google Patents
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Families Citing this family (7)
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CN102621816B (zh) * | 2012-02-29 | 2013-11-27 | 天津芯硕精密机械有限公司 | 直写式光刻系统中采用灰度方式提高曝光图形质量的方法 |
CN102902164B (zh) * | 2012-09-19 | 2015-04-22 | 天津芯硕精密机械有限公司 | 直写式光刻机在步进式曝光时的二维拼接处理方法 |
CN103499912A (zh) * | 2013-10-14 | 2014-01-08 | 天津芯硕精密机械有限公司 | 一种利用灰度测试曝光能量的方法及系统 |
CN103969693A (zh) * | 2014-04-30 | 2014-08-06 | 中国科学院长春光学精密机械与物理研究所 | 光电探测成像系统及其成像方法 |
CN104184955B (zh) * | 2014-07-29 | 2017-04-05 | 中国科学院长春光学精密机械与物理研究所 | 微镜阵列dmd在高动态范围成像中的控制方法 |
CN104298077B (zh) * | 2014-09-26 | 2016-07-06 | 中国科学院长春光学精密机械与物理研究所 | 滚动灰度光刻的dmd动作方法 |
CN111999985B (zh) * | 2020-08-07 | 2023-01-31 | 深圳清溢光电股份有限公司 | 一种提升光刻速度的方法、装置、存储介质及终端设备 |
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CN101487982A (zh) * | 2002-08-24 | 2009-07-22 | 无掩模平版印刷公司 | 连续地直接写的光刻技术 |
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JP4250052B2 (ja) * | 2003-10-14 | 2009-04-08 | 財団法人国際科学振興財団 | パターン描画方法、及びパターン描画装置 |
US6831768B1 (en) * | 2003-07-31 | 2004-12-14 | Asml Holding N.V. | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
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CN101487982A (zh) * | 2002-08-24 | 2009-07-22 | 无掩模平版印刷公司 | 连续地直接写的光刻技术 |
Non-Patent Citations (3)
Title |
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JP特开2005-123234A 2005.05.12 |
刘驰.《DMD用于数字光刻成像研究》.《中国优秀博硕士学位论文全文数据库(硕士) 工程科技I辑》.2006,全文. * |
方亮等.《多光电扫描数字光刻制作DOE的方法研究》.《四川大学学报(自然科学版)》.2007,第44卷(第6期),第1315-1320页. * |
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