JP2004339605A5 - - Google Patents
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- Publication number
- JP2004339605A5 JP2004339605A5 JP2004094941A JP2004094941A JP2004339605A5 JP 2004339605 A5 JP2004339605 A5 JP 2004339605A5 JP 2004094941 A JP2004094941 A JP 2004094941A JP 2004094941 A JP2004094941 A JP 2004094941A JP 2004339605 A5 JP2004339605 A5 JP 2004339605A5
- Authority
- JP
- Japan
- Prior art keywords
- metal alloy
- photoresist
- alloy substrate
- coating
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 7
- 229910001092 metal group alloy Inorganic materials 0.000 claims 6
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 239000010949 copper Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 229910001128 Sn alloy Inorganic materials 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0310722A GB0310722D0 (en) | 2003-05-12 | 2003-05-12 | Improved tin plating method |
| GB0311074A GB0311074D0 (en) | 2003-05-14 | 2003-05-14 | Improved tin plating method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004339605A JP2004339605A (ja) | 2004-12-02 |
| JP2004339605A5 true JP2004339605A5 (enExample) | 2007-05-10 |
| JP4603812B2 JP4603812B2 (ja) | 2010-12-22 |
Family
ID=33031418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004094941A Expired - Fee Related JP4603812B2 (ja) | 2003-05-12 | 2004-03-29 | 改良されたスズめっき方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7695605B2 (enExample) |
| EP (1) | EP1477587A3 (enExample) |
| JP (1) | JP4603812B2 (enExample) |
| KR (1) | KR20040097895A (enExample) |
| CN (1) | CN1550577A (enExample) |
| TW (1) | TW200506105A (enExample) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004003784B4 (de) | 2004-01-23 | 2011-01-13 | Ormecon Gmbh | Dispersion intrinsisch leitfähigen Polyanilins und deren Verwendung |
| DE102004030388A1 (de) | 2004-06-23 | 2006-01-26 | Ormecon Gmbh | Artikel mit einer Beschichtung von elektrisch leitfähigem Polymer und Verfahren zu deren Herstellung |
| DE102004030930A1 (de) * | 2004-06-25 | 2006-02-23 | Ormecon Gmbh | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung |
| US7736802B1 (en) | 2004-11-12 | 2010-06-15 | Greatbatch Ltd. | Electrochemical cell current collector comprising solid area for coated film measurements |
| DE102005010162B4 (de) | 2005-03-02 | 2007-06-14 | Ormecon Gmbh | Leitfähige Polymere aus Teilchen mit anisotroper Morphologie |
| JP4712439B2 (ja) * | 2005-05-17 | 2011-06-29 | 学校法人早稲田大学 | めっき液、めっき膜及びその作製方法 |
| WO2007002424A1 (en) * | 2005-06-24 | 2007-01-04 | Technic, Inc. | Silver barrier layer to minimize whisker growth in tin electrodeposits |
| DE102005039608A1 (de) | 2005-08-19 | 2007-03-01 | Ormecon Gmbh | Zusammensetzung mit intrinsisch leitfähigem Polymer |
| JP2007103586A (ja) * | 2005-10-03 | 2007-04-19 | Nitto Denko Corp | 配線回路基板の製造方法 |
| JP4811880B2 (ja) * | 2006-01-06 | 2011-11-09 | エントン インコーポレイテッド | 艶消し金属層を堆積するための電解液および工程 |
| WO2007082112A2 (en) * | 2006-01-06 | 2007-07-19 | Faraday Technology, Inc. | Tin and tin alloy electroplating method with controlled internal stress and grain size of the resulting deposit |
| US20070287022A1 (en) * | 2006-06-07 | 2007-12-13 | Honeywell International, Inc. | Intumescent paint coatings for inhibiting tin whisker growth and methods of making and using the same |
| US20070284700A1 (en) * | 2006-06-07 | 2007-12-13 | Honeywell International, Inc. | Coatings and methods for inhibiting tin whisker growth |
| US20070287023A1 (en) * | 2006-06-07 | 2007-12-13 | Honeywell International, Inc. | Multi-phase coatings for inhibiting tin whisker growth and methods of making and using the same |
| US20070295530A1 (en) * | 2006-06-07 | 2007-12-27 | Honeywell International, Inc. | Coatings and methods for inhibiting tin whisker growth |
| EP2062467B1 (en) | 2006-09-13 | 2012-02-15 | Enthone, Inc. | Article with a coating of electrically conductive polymer and precious/semiprecious metal and process for production thereof |
| US10231344B2 (en) | 2007-05-18 | 2019-03-12 | Applied Nanotech Holdings, Inc. | Metallic ink |
| US8404160B2 (en) | 2007-05-18 | 2013-03-26 | Applied Nanotech Holdings, Inc. | Metallic ink |
| DE202007018616U1 (de) * | 2007-09-14 | 2008-12-24 | Zollern Bhw Gleitlager Gmbh & Co. Kg | Gleitelement |
| KR100973007B1 (ko) * | 2008-01-29 | 2010-07-30 | 삼성전기주식회사 | 금속제품의 무전해 주석 환원 도금용 도금액 및 이를이용한 금속제품의 무전해 주석 환원 도금방법 |
| US8506849B2 (en) | 2008-03-05 | 2013-08-13 | Applied Nanotech Holdings, Inc. | Additives and modifiers for solvent- and water-based metallic conductive inks |
| KR100933091B1 (ko) | 2008-04-01 | 2009-12-21 | (주) 하정인더스트리 | 버스 플레이트 제조 방법 |
| US9730333B2 (en) | 2008-05-15 | 2017-08-08 | Applied Nanotech Holdings, Inc. | Photo-curing process for metallic inks |
| CN102027569B (zh) * | 2008-06-30 | 2013-03-13 | 艾格瑞系统有限公司 | 防止或减缓在金属膜上生长形成物 |
| ES2615337T3 (es) * | 2008-07-08 | 2017-06-06 | Enthone, Inc. | Electrolito y método para depositar una capa metálica mate |
| KR100940537B1 (ko) * | 2008-07-11 | 2010-02-11 | (주)대동아이텍 | 금속 패턴 형성 방법 |
| TW201012970A (en) * | 2008-08-08 | 2010-04-01 | Uyemura C & Co Ltd | Etchant for copper or copper alloy material, pre-plating treatment method, and method for forming member for electronic component |
| JP5740389B2 (ja) | 2009-03-27 | 2015-06-24 | アプライド・ナノテック・ホールディングス・インコーポレーテッド | 光焼結及び/またはレーザー焼結を強化するためのバッファ層 |
| US8262894B2 (en) * | 2009-04-30 | 2012-09-11 | Moses Lake Industries, Inc. | High speed copper plating bath |
| US8440065B1 (en) * | 2009-06-07 | 2013-05-14 | Technic, Inc. | Electrolyte composition, method, and improved apparatus for high speed tin-silver electroplating |
| WO2011001847A1 (ja) * | 2009-07-01 | 2011-01-06 | Jx日鉱日石金属株式会社 | Ulsi微細銅配線埋め込み用電気銅めっき液 |
| US8422197B2 (en) | 2009-07-15 | 2013-04-16 | Applied Nanotech Holdings, Inc. | Applying optical energy to nanoparticles to produce a specified nanostructure |
| DE102010011269B4 (de) * | 2009-11-10 | 2014-02-13 | Ami Doduco Gmbh | Verfahren zum Abscheiden einer für das Drahtbonden geeigneten Palladiumschicht auf Leiterbahnen einer Schaltungsträgerplatte und Verwendung eines Palladiumbades in dem Verfahren |
| EP2476779B1 (en) * | 2011-01-13 | 2013-03-20 | Atotech Deutschland GmbH | Immersion tin or tin alloy plating bath with improved removal of cupurous ions |
| EP2594662B1 (en) * | 2011-11-21 | 2014-04-09 | Atotech Deutschland GmbH | Aqueous composition for etching of copper and copper alloys |
| TW201419315A (zh) | 2012-07-09 | 2014-05-16 | Applied Nanotech Holdings Inc | 微米尺寸銅粒子的光燒結法 |
| CN103882484B (zh) * | 2014-04-04 | 2016-06-29 | 哈尔滨工业大学 | 高速电镀锡用镀液 |
| JP6618241B2 (ja) * | 2014-06-11 | 2019-12-11 | 上村工業株式会社 | 錫電気めっき浴および錫めっき皮膜 |
| US9604316B2 (en) | 2014-09-23 | 2017-03-28 | Globalfoundries Inc. | Tin-based solder composition with low void characteristic |
| CN104593835B (zh) * | 2015-02-04 | 2017-10-24 | 广东羚光新材料股份有限公司 | 用于片式元器件端电极电镀的中性镀锡液 |
| CN105401177A (zh) * | 2015-12-14 | 2016-03-16 | 广东美的暖通设备有限公司 | 换热器的防腐处理方法、换热器和空调器 |
| GB2569466B (en) * | 2016-10-24 | 2021-06-30 | Jaguar Land Rover Ltd | Apparatus and method relating to electrochemical migration |
| US10147697B1 (en) | 2017-12-15 | 2018-12-04 | Nxp Usa, Inc. | Bond pad structure for semiconductor device packaging |
| JP7070360B2 (ja) * | 2018-11-16 | 2022-05-18 | トヨタ自動車株式会社 | スズ膜形成用のスズ溶液、及びそれを用いたスズ膜の形成方法 |
| CN111188069A (zh) * | 2019-12-31 | 2020-05-22 | 大连长丰实业总公司 | 一种镀锡铋合金溶液及其制备方法 |
| CN111458328B (zh) * | 2020-04-26 | 2021-03-19 | 电子科技大学 | 一种检测印制电路板残留铜层分布的方法 |
| CN112342584A (zh) * | 2020-09-29 | 2021-02-09 | 扬州市景杨表面工程有限公司 | 一种心脏起搏器电容器件无磁化铜锡电镀工艺 |
| CN112517859B (zh) * | 2020-11-24 | 2022-07-19 | 太仓史密斯理查森精密制造有限公司 | 一种用于芯撑的环保抗变色耐腐蚀镀锡制备工艺 |
| PE20240150A1 (es) * | 2021-05-20 | 2024-02-08 | Basf Se | Bano de galvanizacion de sulfonato, proceso de refinado de metal mediante deposicion electrolitica y proceso para controlar la morfologia de metales en el refinado electroolitico |
| CN114990651A (zh) * | 2022-04-29 | 2022-09-02 | 沈阳飞机工业(集团)有限公司 | 一种镀铜镀镉镀锡的多重电镀工艺方法 |
| CN115948775B (zh) * | 2022-11-22 | 2025-04-01 | 广州三孚新材料科技股份有限公司 | 一种用于高速镀锡的甲磺酸高速镀锡液及其制备方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1817434C3 (de) * | 1967-12-30 | 1980-05-14 | Sony Corp., Tokio | Verfahren zur Herstellung einer elektrischen Leitungsanordnung |
| JPS582598B2 (ja) * | 1980-10-13 | 1983-01-17 | 古河電気工業株式会社 | Cu−Sn系複合材の製造方法 |
| JPS61284593A (ja) * | 1985-06-12 | 1986-12-15 | Mitsubishi Electric Corp | 接触子用銅合金条の製造方法 |
| US4959278A (en) * | 1988-06-16 | 1990-09-25 | Nippon Mining Co., Ltd. | Tin whisker-free tin or tin alloy plated article and coating technique thereof |
| JP2797542B2 (ja) * | 1989-11-06 | 1998-09-17 | ソニー株式会社 | リードフレームの製造方法 |
| JPH046293A (ja) * | 1990-04-25 | 1992-01-10 | Kobe Steel Ltd | 錫めっき亜鉛含有銅合金材 |
| JP3014814B2 (ja) * | 1991-07-25 | 2000-02-28 | 三井金属鉱業株式会社 | スズメッキホイスカーの抑制方法 |
| US5294291A (en) * | 1991-09-20 | 1994-03-15 | Hitachi, Ltd. | Process for the formation of a conductive circuit pattern |
| JPH05148658A (ja) * | 1991-11-22 | 1993-06-15 | Sumitomo Metal Mining Co Ltd | 無電解錫めつき方法 |
| JPH05183016A (ja) * | 1991-12-26 | 1993-07-23 | Hitachi Cable Ltd | Tab用テープキャリア |
| JPH0613435A (ja) * | 1992-06-24 | 1994-01-21 | Hitachi Cable Ltd | キャリアテープ及びその製造方法 |
| KR970009271B1 (en) * | 1992-08-08 | 1997-06-09 | Shinko Electric Ind Kk | Tab tape and method for producing it |
| JP3458023B2 (ja) * | 1995-08-01 | 2003-10-20 | メック株式会社 | 銅および銅合金のマイクロエッチング剤 |
| JP3403299B2 (ja) * | 1996-11-15 | 2003-05-06 | 古河電気工業株式会社 | 半導体素子用リードフレームのメッキ方法 |
| AU8670798A (en) * | 1997-07-30 | 1999-02-22 | Whitaker Corporation, The | Two layer solderable tin coating |
| US6087714A (en) * | 1998-04-27 | 2000-07-11 | Matsushita Electric Industrial Co., Ltd. | Semiconductor devices having tin-based solder film containing no lead and process for producing the devices |
| JP4186029B2 (ja) * | 1998-10-05 | 2008-11-26 | 石原薬品株式会社 | 銅箔基材上のスズ又はスズ合金メッキ皮膜における異常結晶析出防止剤並びに当該防止方法 |
| EP1241281A1 (en) * | 2001-03-16 | 2002-09-18 | Shipley Co. L.L.C. | Tin plating |
| US20030025182A1 (en) * | 2001-06-22 | 2003-02-06 | Abys Joseph A. | Metal article coated with tin or tin alloy under tensile stress to inhibit whisker growth |
| JP2003023123A (ja) * | 2001-07-09 | 2003-01-24 | Shindo Denshi Kogyo Kk | 回路基板および回路基板の製造方法 |
| JP3551168B2 (ja) * | 2001-08-23 | 2004-08-04 | 株式会社日立製作所 | Pbフリーはんだ接続構造体および電子機器 |
| JP4016637B2 (ja) * | 2001-10-24 | 2007-12-05 | 松下電器産業株式会社 | 錫−銀合金めっき皮膜を有する電子部品用リードフレーム及びその製造方法 |
| US6860981B2 (en) * | 2002-04-30 | 2005-03-01 | Technic, Inc. | Minimizing whisker growth in tin electrodeposits |
-
2004
- 2004-03-29 JP JP2004094941A patent/JP4603812B2/ja not_active Expired - Fee Related
- 2004-04-30 EP EP04252548A patent/EP1477587A3/en not_active Withdrawn
- 2004-05-07 KR KR1020040032095A patent/KR20040097895A/ko not_active Withdrawn
- 2004-05-10 TW TW093113045A patent/TW200506105A/zh unknown
- 2004-05-11 CN CNA2004100445177A patent/CN1550577A/zh active Pending
- 2004-05-12 US US10/843,984 patent/US7695605B2/en not_active Expired - Fee Related
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