JP2008516418A5 - - Google Patents
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- Publication number
- JP2008516418A5 JP2008516418A5 JP2007532378A JP2007532378A JP2008516418A5 JP 2008516418 A5 JP2008516418 A5 JP 2008516418A5 JP 2007532378 A JP2007532378 A JP 2007532378A JP 2007532378 A JP2007532378 A JP 2007532378A JP 2008516418 A5 JP2008516418 A5 JP 2008516418A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- removable
- radiation
- sensitive coating
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims 13
- 238000000576 coating method Methods 0.000 claims 13
- 230000005855 radiation Effects 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 10
- 238000000034 method Methods 0.000 claims 6
- 238000000926 separation method Methods 0.000 claims 6
- 230000009969 flowable effect Effects 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 238000000059 patterning Methods 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/944,586 | 2004-09-17 | ||
| US10/944,586 US8796583B2 (en) | 2004-09-17 | 2004-09-17 | Method of forming a structured surface using ablatable radiation sensitive material |
| PCT/US2005/032101 WO2006033852A2 (en) | 2004-09-17 | 2005-09-09 | Structured surface using ablatable radiation sensitive material |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008516418A JP2008516418A (ja) | 2008-05-15 |
| JP2008516418A5 true JP2008516418A5 (enExample) | 2008-09-11 |
| JP4977610B2 JP4977610B2 (ja) | 2012-07-18 |
Family
ID=35478754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007532378A Expired - Fee Related JP4977610B2 (ja) | 2004-09-17 | 2005-09-09 | 除去可能な放射線感光材料を用いた構造化表面 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8796583B2 (enExample) |
| JP (1) | JP4977610B2 (enExample) |
| KR (1) | KR101087924B1 (enExample) |
| CN (1) | CN101019474B (enExample) |
| WO (1) | WO2006033852A2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3874003B2 (ja) * | 2004-10-27 | 2007-01-31 | セイコーエプソン株式会社 | 配線パターン形成方法、及び膜パターン形成方法 |
| KR100690929B1 (ko) * | 2006-05-03 | 2007-03-09 | 한국기계연구원 | 건식필름레지스트를 이용하여 원하는 패턴두께 또는 높은종횡비를 가지는 고해상도패턴 형성 방법 |
| KR100690930B1 (ko) * | 2006-05-03 | 2007-03-09 | 한국기계연구원 | 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법 |
| DE102006026981A1 (de) * | 2006-06-10 | 2007-12-13 | Leonhard Kurz Gmbh & Co. Kg | Verfahren zur Herstellung einer strukturierten Schicht auf einem Trägersubstrat |
| JP5459949B2 (ja) * | 2007-11-21 | 2014-04-02 | 凸版印刷株式会社 | 着色組成物、カラーフィルタ及びその製造方法 |
| US7696013B2 (en) * | 2007-04-19 | 2010-04-13 | Eastman Kodak Company | Connecting microsized devices using ablative films |
| KR100922810B1 (ko) * | 2007-12-11 | 2009-10-21 | 주식회사 잉크테크 | 흑화 전도성 패턴의 제조방법 |
| US20090155963A1 (en) * | 2007-12-12 | 2009-06-18 | Hawkins Gilbert A | Forming thin film transistors using ablative films |
| CN102385083B (zh) * | 2010-09-03 | 2014-09-03 | 株式会社Lg化学 | 毯及其制造方法、和滤色器衬底及其制造装置和方法 |
| US20130036929A1 (en) * | 2011-08-09 | 2013-02-14 | Moshe Nakash | Method for offset media system |
| EP2955981A1 (en) * | 2014-06-13 | 2015-12-16 | Irepa Laser | Method for manufacturing selective surface deposition using a pulsed radiation treatment |
| TWI619557B (zh) * | 2015-05-12 | 2018-04-01 | Valspar Sourcing Inc | Coated product and method of manufacturing same |
| CN107835974B (zh) * | 2015-06-30 | 2021-07-16 | 3M创新有限公司 | 包括通孔的电子设备以及形成此类电子设备的方法 |
| DE102023127411B3 (de) | 2023-10-09 | 2025-03-27 | Petra Blohm | Verfahren zum Gravieren eines Erzeugnisses, insbesondere eines Druckerzeugnisses |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE505655A (enExample) * | 1950-10-31 | |||
| US3769019A (en) * | 1968-05-29 | 1973-10-30 | Minnesota Mining & Mfg | Light and heat sensitive sheet material |
| US4081278A (en) * | 1977-05-23 | 1978-03-28 | Eastman Kodak Company | Heat sensitive dye layers comprising a benzopinacol |
| JPS61256686A (ja) * | 1985-05-09 | 1986-11-14 | 東レ株式会社 | 導電性回路基板およびその製造方法 |
| US4857503A (en) | 1988-05-13 | 1989-08-15 | Minnesota Mining And Manufacturing Company | Thermal dye transfer materials |
| DK0465562T4 (da) | 1989-03-30 | 2000-04-17 | Polaroid Corp | Nær infrarødt laserabsorberende overtræk og fremgangsmåde til anvendelse deraf i farvebilleddannelse og aftrykning |
| US4977134A (en) * | 1989-07-21 | 1990-12-11 | Minnesota Mining And Manufacturing Company | Thermal transfer imaging using sulfonylaminoanthraquinone dyes |
| JPH05198948A (ja) * | 1992-01-21 | 1993-08-06 | Hitachi Ltd | 厚膜と薄膜の混成多層回路基板 |
| GB9225724D0 (en) | 1992-12-09 | 1993-02-03 | Minnesota Mining & Mfg | Transfer imaging elements |
| US5380644A (en) * | 1993-08-10 | 1995-01-10 | Minnesota Mining And Manufacturing Company | Additive for the reduction of mottle in photothermographic and thermographic elements |
| US5460921A (en) * | 1993-09-08 | 1995-10-24 | International Business Machines Corporation | High density pattern template: materials and processes for the application of conductive pastes |
| US6074893A (en) * | 1993-09-27 | 2000-06-13 | Sumitomo Metal Industries, Ltd. | Process for forming fine thick-film conductor patterns |
| US5399459A (en) * | 1993-10-26 | 1995-03-21 | Eastman Kodak Company | Thermally bleachable dyes for laser ablative imaging |
| DE4417245A1 (de) | 1994-04-23 | 1995-10-26 | Lpkf Cad Cam Systeme Gmbh | Verfahren zur strukturierten Metallisierung der Oberfläche von Substraten |
| US5935758A (en) * | 1995-04-20 | 1999-08-10 | Imation Corp. | Laser induced film transfer system |
| GB9508028D0 (en) | 1995-04-20 | 1995-06-07 | Minnesota Mining & Mfg | Laser addressable direct-write media |
| EP0745490B1 (en) * | 1995-05-31 | 2000-10-11 | Kodak Polychrome Graphics LLC | Method for preparation of an imaging element |
| US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| JPH09123606A (ja) * | 1995-11-02 | 1997-05-13 | Dainippon Printing Co Ltd | レーザー印字用積層体およびその印字体 |
| US5575016A (en) * | 1995-12-22 | 1996-11-19 | Bailey; James J. | Kiltie weight |
| WO1997044203A1 (en) | 1996-05-21 | 1997-11-27 | Empak, Inc. | Fluoropolymer marking system |
| JPH1075038A (ja) * | 1996-06-28 | 1998-03-17 | Ngk Spark Plug Co Ltd | 配線基板とその製造方法 |
| CN1205051C (zh) * | 1997-07-16 | 2005-06-08 | 奥蒂斯电梯公司 | 用于激光标刻的方法和组合物,以及用此方法和组合物标刻的物件 |
| US6375871B1 (en) * | 1998-06-18 | 2002-04-23 | 3M Innovative Properties Company | Methods of manufacturing microfluidic articles |
| EP1061383B1 (en) | 1998-12-21 | 2006-05-17 | Seiko Epson Corporation | Color filter and method of manufacture thereof |
| IL129076A (en) * | 1999-03-21 | 2002-02-10 | Creoscitex Corp Ltd | A printing plate with a socket method for short runs and a method for using it |
| JP3972554B2 (ja) * | 1999-08-31 | 2007-09-05 | コニカミノルタホールディングス株式会社 | カラーフィルターの作製方法 |
| JP4590663B2 (ja) | 1999-10-29 | 2010-12-01 | セイコーエプソン株式会社 | カラーフィルタの製造方法 |
| CN100375310C (zh) * | 1999-12-21 | 2008-03-12 | 造型逻辑有限公司 | 喷墨制作的集成电路 |
| TW490997B (en) * | 2000-03-31 | 2002-06-11 | Seiko Epson Corp | Method of manufacturing organic EL element, and organic EL element |
| AU2002234587A1 (en) | 2000-12-19 | 2002-07-01 | Basf Drucksysteme Gmbh | Method for producing flexographic printing forms by means of laser gravure |
| WO2002070257A1 (en) * | 2001-03-01 | 2002-09-12 | Creo Il. Ltd. | Process and material for producing ir imaged gravure cylinders |
| JP2003264361A (ja) * | 2002-03-08 | 2003-09-19 | Murata Mfg Co Ltd | 回路基板の製造方法 |
| AU2003250865A1 (en) * | 2002-07-10 | 2004-02-02 | Ciba Specialty Chemicals Holding Inc. | Heat stable photocurable resin composition for dry film resist |
| JP4175079B2 (ja) * | 2002-10-17 | 2008-11-05 | 日立化成工業株式会社 | 感光性樹脂組成物およびこれを用いた感光性エレメント |
-
2004
- 2004-09-17 US US10/944,586 patent/US8796583B2/en not_active Expired - Fee Related
-
2005
- 2005-09-09 JP JP2007532378A patent/JP4977610B2/ja not_active Expired - Fee Related
- 2005-09-09 CN CN2005800308007A patent/CN101019474B/zh not_active Expired - Fee Related
- 2005-09-09 KR KR1020077006050A patent/KR101087924B1/ko not_active Expired - Fee Related
- 2005-09-09 WO PCT/US2005/032101 patent/WO2006033852A2/en not_active Ceased