JP2009539252A5 - - Google Patents

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Publication number
JP2009539252A5
JP2009539252A5 JP2009513174A JP2009513174A JP2009539252A5 JP 2009539252 A5 JP2009539252 A5 JP 2009539252A5 JP 2009513174 A JP2009513174 A JP 2009513174A JP 2009513174 A JP2009513174 A JP 2009513174A JP 2009539252 A5 JP2009539252 A5 JP 2009539252A5
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JP
Japan
Prior art keywords
pattern
photoresist
metal
layer
nanoparticles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009513174A
Other languages
English (en)
Japanese (ja)
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JP2009539252A (ja
Filing date
Publication date
Priority claimed from US11/421,894 external-priority patent/US7745101B2/en
Application filed filed Critical
Publication of JP2009539252A publication Critical patent/JP2009539252A/ja
Publication of JP2009539252A5 publication Critical patent/JP2009539252A5/ja
Pending legal-status Critical Current

Links

JP2009513174A 2006-06-02 2007-05-18 ナノ粒子パターニングプロセス Pending JP2009539252A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/421,894 US7745101B2 (en) 2006-06-02 2006-06-02 Nanoparticle patterning process
PCT/US2007/012099 WO2007142809A2 (en) 2006-06-02 2007-05-18 Nanoparticle patterning process

Publications (2)

Publication Number Publication Date
JP2009539252A JP2009539252A (ja) 2009-11-12
JP2009539252A5 true JP2009539252A5 (enExample) 2010-07-08

Family

ID=38790662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009513174A Pending JP2009539252A (ja) 2006-06-02 2007-05-18 ナノ粒子パターニングプロセス

Country Status (5)

Country Link
US (1) US7745101B2 (enExample)
EP (1) EP2024790B1 (enExample)
JP (1) JP2009539252A (enExample)
TW (1) TW200809427A (enExample)
WO (1) WO2007142809A2 (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4972728B2 (ja) * 2005-08-30 2012-07-11 日本電信電話株式会社 有機材料層形成方法
US9156004B2 (en) * 2005-10-17 2015-10-13 Stc.Unm Fabrication of enclosed nanochannels using silica nanoparticles
US10060904B1 (en) 2005-10-17 2018-08-28 Stc.Unm Fabrication of enclosed nanochannels using silica nanoparticles
US10231344B2 (en) 2007-05-18 2019-03-12 Applied Nanotech Holdings, Inc. Metallic ink
US8404160B2 (en) 2007-05-18 2013-03-26 Applied Nanotech Holdings, Inc. Metallic ink
US8506849B2 (en) 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US20090236317A1 (en) * 2008-03-21 2009-09-24 Midwest Research Institute Anti-reflection etching of silicon surfaces catalyzed with ionic metal solutions
US8075792B1 (en) 2008-03-21 2011-12-13 Alliance For Sustainable Energy, Llc Nanoparticle-based etching of silicon surfaces
US8815104B2 (en) 2008-03-21 2014-08-26 Alliance For Sustainable Energy, Llc Copper-assisted, anti-reflection etching of silicon surfaces
US8729798B2 (en) 2008-03-21 2014-05-20 Alliance For Sustainable Energy, Llc Anti-reflective nanoporous silicon for efficient hydrogen production
US9730333B2 (en) 2008-05-15 2017-08-08 Applied Nanotech Holdings, Inc. Photo-curing process for metallic inks
JP2010103345A (ja) * 2008-10-24 2010-05-06 Konica Minolta Holdings Inc 機能性層の製造方法及び電子デバイス
JP5435699B2 (ja) * 2009-03-06 2014-03-05 ナミックス株式会社 配線基板の製造方法、配線基板および半導体装置
JP5740389B2 (ja) 2009-03-27 2015-06-24 アプライド・ナノテック・ホールディングス・インコーポレーテッド 光焼結及び／またはレーザー焼結を強化するためのバッファ層
US8422197B2 (en) 2009-07-15 2013-04-16 Applied Nanotech Holdings, Inc. Applying optical energy to nanoparticles to produce a specified nanostructure
US20110027719A1 (en) * 2009-07-31 2011-02-03 Pei-Chang Wang Photomask etching method for chemical vapor deposition film
WO2011060193A1 (en) 2009-11-11 2011-05-19 Alliance For Sustainable Energy, Llc Wet-chemical systems and methods for producing black silicon substrates
US8349547B1 (en) * 2009-12-22 2013-01-08 Sandia Corporation Lithographically defined microporous carbon structures
US8828765B2 (en) 2010-06-09 2014-09-09 Alliance For Sustainable Energy, Llc Forming high efficiency silicon solar cells using density-graded anti-reflection surfaces
CN103283001A (zh) 2011-03-08 2013-09-04 可持续能源联盟有限责任公司 蓝光响应增强的高效黑硅光伏器件
ITMI20110363A1 (it) * 2011-03-09 2012-09-10 Cretec Co Ltd Metodo per ricavare un percorso conduttivo mediante irradiazione laser
US20130036925A1 (en) * 2011-08-09 2013-02-14 Moshe Nakash Offset imaging system
GB201114048D0 (en) * 2011-08-16 2011-09-28 Intrinsiq Materials Ltd Curing system
US11133118B2 (en) 2012-05-22 2021-09-28 University Of Massachusetts Patterned nanoparticle structures
TW201419315A (zh) 2012-07-09 2014-05-16 Applied Nanotech Holdings Inc 微米尺寸銅粒子的光燒結法
US20150223345A1 (en) * 2012-09-25 2015-08-06 Toray Industries, Inc. Method of forming wiring pattern, and wiring pattern formation
KR101665037B1 (ko) * 2015-02-10 2016-10-12 인하대학교 산학협력단 스트레인 게이지의 제조방법 및 이에 따라 제조된 스트레인 게이지
CA2990283C (en) 2015-07-03 2023-02-28 National Research Council Of Canada Self-aligning metal patterning based on photonic sintering of metal nanoparticles
US11396610B2 (en) 2015-07-03 2022-07-26 National Research Council Of Canada Method of printing ultranarrow line
CN107852821A (zh) 2015-07-03 2018-03-27 加拿大国家研究委员会 印刷超窄间隙线的方法
WO2017091802A1 (en) * 2015-11-27 2017-06-01 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Pattern definition of nanocellulose sheets through selective ashing via lithographic masking
JP7291727B2 (ja) * 2018-12-27 2023-06-15 株式会社カネカ レジストパターンの形成に用いられる樹脂組成物、及び半導体製品の製造方法
US20210325777A1 (en) 2020-04-20 2021-10-21 Applied Materials, Inc. Methods for increasing the refractive index of high-index nanoimprint lithography films
WO2022165276A1 (en) 2021-01-29 2022-08-04 Armonica Technologies, Inc. Enhancement structures for surface-enhanced raman scattering
WO2023043140A1 (ko) * 2021-09-14 2023-03-23 한국화학연구원 동박 적층판용 적층체, 이의 제조방법 및 미세 패턴 형성방법

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1943972A1 (de) 1968-09-11 1970-09-03 Rca Corp Photographisches Verfahren zur Herstellung eines metallischen Musters auf einer Oberflaeche
US3775117A (en) 1971-07-13 1973-11-27 Siemens Ag Process for selective metallization of insulating material bodies
US4539250A (en) 1981-12-19 1985-09-03 Daikin Kogyo Co. Ltd. Resist material and process for forming fine resist pattern
JPS604879A (ja) 1983-06-23 1985-01-11 Seiko Instr & Electronics Ltd 腕時計用飾り板の製造方法
JPS60141644A (ja) 1983-12-28 1985-07-26 Seiko Instr & Electronics Ltd カバ−ガラスの加飾方法
JPS60176949A (ja) 1984-02-21 1985-09-11 Seiko Instr & Electronics Ltd カバ−ガラスの加飾方法
US4973572A (en) 1987-12-21 1990-11-27 Eastman Kodak Company Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer
KR900018743A (ko) 1988-05-24 1990-12-22 스즈끼 가즈오 포지티브(positive)형 전자선 레지스트 및 이를 이용한 레지스트 패턴 형성방법
CA2019669A1 (en) 1989-11-21 1991-05-21 John Woods Anionically polymerizable monomers, polymers thereof, and use of such polymers in photoresists
US5891602A (en) 1992-05-29 1999-04-06 Eastman Kodak Company Dye donor binder for laser-induced thermal dye transfer
JP3057402B2 (ja) 1993-08-20 2000-06-26 東亞合成株式会社 ポジ型電子線レジスト
JPH07336020A (ja) * 1994-06-10 1995-12-22 Sumitomo Metal Ind Ltd 導体パターンの形成方法
US5468591A (en) 1994-06-14 1995-11-21 Eastman Kodak Company Barrier layer for laser ablative imaging
US5578416A (en) 1995-11-20 1996-11-26 Eastman Kodak Company Cinnamal-nitrile dyes for laser recording element
US5858607A (en) 1996-11-21 1999-01-12 Kodak Polychrome Graphics Laser-induced material transfer digital lithographic printing plates
JPH10301153A (ja) * 1997-04-23 1998-11-13 Sony Corp 光源装置とこれを用いた光学測定装置および露光装置
US6787283B1 (en) 1999-07-22 2004-09-07 Fuji Photo Film Co., Ltd. Positive photoresist composition for far ultraviolet exposure
US6165671A (en) 1999-12-30 2000-12-26 Eastman Kodak Company Laser donor element
WO2002048432A2 (en) 2000-12-15 2002-06-20 The Arizona Board Of Regents Method for patterning metal using nanoparticle containing precursors
JP2002184802A (ja) * 2000-12-15 2002-06-28 Pioneer Electronic Corp 微小バンプの製造方法
US20030119282A1 (en) * 2001-09-20 2003-06-26 Takayasu Yamazaki Method for producing semiconductor fine particles
IL161622A0 (en) 2001-11-01 2004-09-27 Yissum Res Dev Co Ink jet inks containing metal nanoparticles
US6695029B2 (en) 2001-12-12 2004-02-24 Eastman Kodak Company Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device
EP1510861A1 (en) 2003-08-26 2005-03-02 Sony International (Europe) GmbH Method for patterning organic materials or combinations of organic and inorganic materials
EP1735663A1 (fr) 2004-04-08 2006-12-27 Université Louis Pasteur, (Etablissement public à caractère scientifique, culturel et professionnel) Procede de lithographie, produits obtenus et utilisation dudit procede
US7291365B2 (en) 2004-05-27 2007-11-06 Eastman Kodak Company Linear laser light beam for making OLEDS
JP2006019478A (ja) * 2004-07-01 2006-01-19 Pentax Corp 描画システム
JP2006120888A (ja) * 2004-10-22 2006-05-11 Seiko Epson Corp 電子部品の製造方法

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