TW200736821A - Pattern forming method and method of producing a gray tone mask - Google Patents

Pattern forming method and method of producing a gray tone mask

Info

Publication number
TW200736821A
TW200736821A TW096106956A TW96106956A TW200736821A TW 200736821 A TW200736821 A TW 200736821A TW 096106956 A TW096106956 A TW 096106956A TW 96106956 A TW96106956 A TW 96106956A TW 200736821 A TW200736821 A TW 200736821A
Authority
TW
Taiwan
Prior art keywords
producing
alignment mark
pattern forming
tone mask
gray tone
Prior art date
Application number
TW096106956A
Other languages
Chinese (zh)
Inventor
Michiaki Sano
Shuho Motomura
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200736821A publication Critical patent/TW200736821A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A pattern forming method includes a step of forming a pattern on a substrate by the use of a plurality of patterning steps using the photolithography. The method at least includes a step of forming an alignment mark for use in alignment of writing positions, and a step of writing a pattern after alignment using the alignment mark. The alignment mark includes a light-shielding portion and a light-transmitting portion. The alignment mark has an antireflection film as an uppermost layer. Prior to the writing step, the antireflection film in the light-shielding portion of the alignment mark is removed.
TW096106956A 2006-03-16 2007-03-01 Pattern forming method and method of producing a gray tone mask TW200736821A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006072705 2006-03-16

Publications (1)

Publication Number Publication Date
TW200736821A true TW200736821A (en) 2007-10-01

Family

ID=38688350

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096106956A TW200736821A (en) 2006-03-16 2007-03-01 Pattern forming method and method of producing a gray tone mask

Country Status (3)

Country Link
KR (1) KR20070094478A (en)
CN (1) CN101038445A (en)
TW (1) TW200736821A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101661145A (en) 2008-08-27 2010-03-03 鸿富锦精密工业（深圳）有限公司 Distance piece array and manufacturing method thereof
JP5479074B2 (en) * 2009-12-21 2014-04-23 Ｈｏｙａ株式会社 Optical element manufacturing method, optical element
KR20140093215A (en) * 2011-10-21 2014-07-25 다이니폰 인사츠 가부시키가이샤 Large-sized phase-shift mask, and method for producing large-sized phase-shift mask
CN108020990A (en) * 2016-10-31 2018-05-11 无锡中微掩模电子有限公司 Mask plate for integrated circuit re-expose method
CN113169045A (en) * 2018-10-16 2021-07-23 Ｓｃｉｖａｘ株式会社 Method for forming fine pattern, method for manufacturing imprint mold, and optical device
CN113448162A (en) * 2021-06-18 2021-09-28 广州仕元光电有限公司 Glass photomask and method for manufacturing the same

Also Published As

Publication number Publication date
KR20070094478A (en) 2007-09-20
CN101038445A (en) 2007-09-19

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