JP2004042650A5 - - Google Patents
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- Publication number
- JP2004042650A5 JP2004042650A5 JP2003271624A JP2003271624A JP2004042650A5 JP 2004042650 A5 JP2004042650 A5 JP 2004042650A5 JP 2003271624 A JP2003271624 A JP 2003271624A JP 2003271624 A JP2003271624 A JP 2003271624A JP 2004042650 A5 JP2004042650 A5 JP 2004042650A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive material
- positive photosensitive
- material layer
- substrate
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 36
- 238000004519 manufacturing process Methods 0.000 claims 29
- 239000011347 resin Substances 0.000 claims 20
- 229920005989 resin Polymers 0.000 claims 20
- 239000000758 substrate Substances 0.000 claims 20
- 230000035945 sensitivity Effects 0.000 claims 12
- 239000007788 liquid Substances 0.000 claims 9
- 230000005865 ionizing radiation Effects 0.000 claims 8
- 230000005855 radiation Effects 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- 230000001678 irradiating effect Effects 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 claims 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 2
- LBTXDQOSJLEDQM-UHFFFAOYSA-N 3-methoxyiminobutan-2-one Chemical compound CON=C(C)C(C)=O LBTXDQOSJLEDQM-UHFFFAOYSA-N 0.000 claims 2
- 239000004925 Acrylic resin Substances 0.000 claims 2
- 229920000178 Acrylic resin Polymers 0.000 claims 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 claims 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 claims 2
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 claims 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 229920006027 ternary co-polymer Polymers 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical group CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims 1
- 150000008064 anhydrides Chemical group 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 claims 1
- 239000003822 epoxy resin Substances 0.000 claims 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 claims 1
- 229920001897 terpolymer Polymers 0.000 claims 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003271624A JP4298414B2 (ja) | 2002-07-10 | 2003-07-07 | 液体吐出ヘッドの製造方法 |
| US10/615,289 US7592131B2 (en) | 2002-07-10 | 2003-07-09 | Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head |
| DE60327133T DE60327133D1 (de) | 2002-07-10 | 2003-07-10 | Herstellungsverfahren für einen Feinstrukturkörper, Herstellungsverfahren für einen Hohlstrukturkörper und Herstellungsverfahren für einen Flüssigkeitsausstosskopf |
| EP03015757A EP1380423B1 (en) | 2002-07-10 | 2003-07-10 | Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head |
| KR1020030046777A KR100541904B1 (ko) | 2002-07-10 | 2003-07-10 | 미세 구조화된 부재의 제조 방법, 미세 중공 구조화된부재의 제조 방법 및 액체 토출 헤드의 제조 방법 |
| CNB031467873A CN1229228C (zh) | 2002-07-10 | 2003-07-10 | 微细空洞结构体的制备方法和液体喷出头的制备方法 |
| TW092118893A TWI225448B (en) | 2002-07-10 | 2003-07-10 | Method for producing fine structured member, method for producing fine hollow structured member and method for producing liquid discharge head |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002201894 | 2002-07-10 | ||
| JP2003271624A JP4298414B2 (ja) | 2002-07-10 | 2003-07-07 | 液体吐出ヘッドの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004042650A JP2004042650A (ja) | 2004-02-12 |
| JP2004042650A5 true JP2004042650A5 (enExample) | 2006-08-17 |
| JP4298414B2 JP4298414B2 (ja) | 2009-07-22 |
Family
ID=29738475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003271624A Expired - Fee Related JP4298414B2 (ja) | 2002-07-10 | 2003-07-07 | 液体吐出ヘッドの製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7592131B2 (enExample) |
| EP (1) | EP1380423B1 (enExample) |
| JP (1) | JP4298414B2 (enExample) |
| KR (1) | KR100541904B1 (enExample) |
| CN (1) | CN1229228C (enExample) |
| DE (1) | DE60327133D1 (enExample) |
| TW (1) | TWI225448B (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7629111B2 (en) | 2004-06-28 | 2009-12-08 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
| JP4447974B2 (ja) * | 2004-06-28 | 2010-04-07 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
| EP1763706B1 (en) * | 2004-06-28 | 2013-12-11 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
| JP4484774B2 (ja) * | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP4761498B2 (ja) | 2004-06-28 | 2011-08-31 | キヤノン株式会社 | 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法 |
| CN1968815B (zh) * | 2004-06-28 | 2013-05-01 | 佳能株式会社 | 排液头制造方法，和使用该方法得到的排液头 |
| JP4480141B2 (ja) | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| JP4533256B2 (ja) * | 2004-06-28 | 2010-09-01 | キヤノン株式会社 | 微細構造体の製造方法および液体吐出ヘッドの製造方法 |
| JP2006126116A (ja) * | 2004-11-01 | 2006-05-18 | Canon Inc | フィルター用基板の製造方法、インクジェット記録ヘッドおよびその製造方法 |
| US7824560B2 (en) * | 2006-03-07 | 2010-11-02 | Canon Kabushiki Kaisha | Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head |
| US8376525B2 (en) | 2006-09-08 | 2013-02-19 | Canon Kabushiki Kaisha | Liquid discharge head and method of manufacturing the same |
| US7550252B2 (en) * | 2006-09-21 | 2009-06-23 | Canon Kabushiki Kaisha | Ink-jet recording head and method for producing same |
| US8499453B2 (en) * | 2009-11-26 | 2013-08-06 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head, and method of manufacturing discharge port member |
| JP5473645B2 (ja) | 2010-02-05 | 2014-04-16 | キヤノン株式会社 | 感光性樹脂組成物及び液体吐出ヘッド |
| US8434229B2 (en) * | 2010-11-24 | 2013-05-07 | Canon Kabushiki Kaisha | Liquid ejection head manufacturing method |
| KR101249723B1 (ko) * | 2011-10-28 | 2013-04-02 | 전자부품연구원 | 액적 토출용 노즐 제조 방법 및 이를 이용해 제조된 노즐을 이용한 정전식 액적 토출 장치 |
| CN103935127B (zh) * | 2014-04-24 | 2017-01-11 | 珠海赛纳打印科技股份有限公司 | 液体喷头制造方法、液体喷头和打印装置 |
| JP6217711B2 (ja) * | 2015-08-21 | 2017-10-25 | 日亜化学工業株式会社 | 発光装置の製造方法 |
| WO2025182421A1 (ja) * | 2024-02-27 | 2025-09-04 | 日産化学株式会社 | 発光表示デバイスの製造方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4087569A (en) * | 1976-12-20 | 1978-05-02 | International Business Machines Corporation | Prebaking treatment for resist mask composition and mask making process using same |
| US4330614A (en) * | 1980-10-14 | 1982-05-18 | International Business Machines Corporation | Process for forming a patterned resist mask |
| JPH0645242B2 (ja) | 1984-12-28 | 1994-06-15 | キヤノン株式会社 | 液体噴射記録ヘツドの製造方法 |
| DE3764702D1 (de) | 1986-04-24 | 1990-10-11 | Ibm | Zwei-schichten-photolack-verfahren mit deckschicht. |
| US5264874A (en) * | 1990-02-09 | 1993-11-23 | Canon Kabushiki Kaisha | Ink jet recording system |
| JP2925816B2 (ja) | 1991-10-31 | 1999-07-28 | キヤノン株式会社 | 液体噴射記録ヘッド、その製造方法、及び同ヘッドを具備した記録装置 |
| DE69127801T2 (de) | 1990-12-19 | 1998-02-05 | Canon Kk | Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf |
| CA2075097C (en) * | 1991-08-02 | 2000-03-28 | Hiroyuki Ishinaga | Recording apparatus, recording head and substrate therefor |
| ATE196199T1 (de) | 1992-06-01 | 2000-09-15 | Canon Kk | Verfahren zur herstellung eines tintenstrahlaufzeichnungskopfes |
| JP2960608B2 (ja) | 1992-06-04 | 1999-10-12 | キヤノン株式会社 | 液体噴射記録ヘッドの製造方法 |
| JP3305415B2 (ja) * | 1992-06-18 | 2002-07-22 | キヤノン株式会社 | 半導体装置、インクジェットヘッド、および画像形成装置 |
| JPH0645242A (ja) | 1992-07-24 | 1994-02-18 | Hitachi Ltd | レジスト塗布方法及びその装置 |
| JP3143307B2 (ja) | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| DE69603639T2 (de) | 1995-03-31 | 2000-04-13 | Canon K.K., Tokio/Tokyo | Verfahren zum Herstellen eines Tintenstrahlkopfes |
| JP3347530B2 (ja) | 1995-06-27 | 2002-11-20 | 富士通株式会社 | レジスト組成物及びレジストパターンの形成方法 |
| US5861657A (en) * | 1996-01-18 | 1999-01-19 | International Rectifier Corporation | Graded concentration epitaxial substrate for semiconductor device having resurf diffusion |
| US6302504B1 (en) * | 1996-06-26 | 2001-10-16 | Canon Kabushiki Kaisha | Recording head and recording apparatus using the same |
| JP4497633B2 (ja) | 1999-03-15 | 2010-07-07 | キヤノン株式会社 | 撥液体層の形成方法及び液体吐出ヘッドの製造方法 |
-
2003
- 2003-07-07 JP JP2003271624A patent/JP4298414B2/ja not_active Expired - Fee Related
- 2003-07-09 US US10/615,289 patent/US7592131B2/en not_active Expired - Fee Related
- 2003-07-10 DE DE60327133T patent/DE60327133D1/de not_active Expired - Lifetime
- 2003-07-10 CN CNB031467873A patent/CN1229228C/zh not_active Expired - Fee Related
- 2003-07-10 EP EP03015757A patent/EP1380423B1/en not_active Expired - Lifetime
- 2003-07-10 TW TW092118893A patent/TWI225448B/zh not_active IP Right Cessation
- 2003-07-10 KR KR1020030046777A patent/KR100541904B1/ko not_active Expired - Fee Related
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