CN1229228C - 微细空洞结构体的制备方法和液体喷出头的制备方法 - Google Patents
微细空洞结构体的制备方法和液体喷出头的制备方法 Download PDFInfo
- Publication number
- CN1229228C CN1229228C CNB031467873A CN03146787A CN1229228C CN 1229228 C CN1229228 C CN 1229228C CN B031467873 A CNB031467873 A CN B031467873A CN 03146787 A CN03146787 A CN 03146787A CN 1229228 C CN1229228 C CN 1229228C
- Authority
- CN
- China
- Prior art keywords
- producing
- cavity structure
- photosensitive material
- structure according
- fine cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002201894 | 2002-07-10 | ||
| JP201894/2002 | 2002-07-10 | ||
| JP2003271624A JP4298414B2 (ja) | 2002-07-10 | 2003-07-07 | 液体吐出ヘッドの製造方法 |
| JP271624/2003 | 2003-07-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1475352A CN1475352A (zh) | 2004-02-18 |
| CN1229228C true CN1229228C (zh) | 2005-11-30 |
Family
ID=29738475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031467873A Expired - Fee Related CN1229228C (zh) | 2002-07-10 | 2003-07-10 | 微细空洞结构体的制备方法和液体喷出头的制备方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7592131B2 (enExample) |
| EP (1) | EP1380423B1 (enExample) |
| JP (1) | JP4298414B2 (enExample) |
| KR (1) | KR100541904B1 (enExample) |
| CN (1) | CN1229228C (enExample) |
| DE (1) | DE60327133D1 (enExample) |
| TW (1) | TWI225448B (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7629111B2 (en) | 2004-06-28 | 2009-12-08 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
| JP4447974B2 (ja) * | 2004-06-28 | 2010-04-07 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
| EP1763706B1 (en) * | 2004-06-28 | 2013-12-11 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
| JP4484774B2 (ja) * | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP4761498B2 (ja) | 2004-06-28 | 2011-08-31 | キヤノン株式会社 | 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法 |
| CN1968815B (zh) * | 2004-06-28 | 2013-05-01 | 佳能株式会社 | 排液头制造方法,和使用该方法得到的排液头 |
| JP4480141B2 (ja) | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| JP4533256B2 (ja) * | 2004-06-28 | 2010-09-01 | キヤノン株式会社 | 微細構造体の製造方法および液体吐出ヘッドの製造方法 |
| JP2006126116A (ja) * | 2004-11-01 | 2006-05-18 | Canon Inc | フィルター用基板の製造方法、インクジェット記録ヘッドおよびその製造方法 |
| US7824560B2 (en) * | 2006-03-07 | 2010-11-02 | Canon Kabushiki Kaisha | Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head |
| US8376525B2 (en) | 2006-09-08 | 2013-02-19 | Canon Kabushiki Kaisha | Liquid discharge head and method of manufacturing the same |
| US7550252B2 (en) * | 2006-09-21 | 2009-06-23 | Canon Kabushiki Kaisha | Ink-jet recording head and method for producing same |
| US8499453B2 (en) * | 2009-11-26 | 2013-08-06 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head, and method of manufacturing discharge port member |
| JP5473645B2 (ja) | 2010-02-05 | 2014-04-16 | キヤノン株式会社 | 感光性樹脂組成物及び液体吐出ヘッド |
| US8434229B2 (en) * | 2010-11-24 | 2013-05-07 | Canon Kabushiki Kaisha | Liquid ejection head manufacturing method |
| KR101249723B1 (ko) * | 2011-10-28 | 2013-04-02 | 전자부품연구원 | 액적 토출용 노즐 제조 방법 및 이를 이용해 제조된 노즐을 이용한 정전식 액적 토출 장치 |
| CN103935127B (zh) * | 2014-04-24 | 2017-01-11 | 珠海赛纳打印科技股份有限公司 | 液体喷头制造方法、液体喷头和打印装置 |
| JP6217711B2 (ja) * | 2015-08-21 | 2017-10-25 | 日亜化学工業株式会社 | 発光装置の製造方法 |
| WO2025182421A1 (ja) * | 2024-02-27 | 2025-09-04 | 日産化学株式会社 | 発光表示デバイスの製造方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4087569A (en) * | 1976-12-20 | 1978-05-02 | International Business Machines Corporation | Prebaking treatment for resist mask composition and mask making process using same |
| US4330614A (en) * | 1980-10-14 | 1982-05-18 | International Business Machines Corporation | Process for forming a patterned resist mask |
| JPH0645242B2 (ja) | 1984-12-28 | 1994-06-15 | キヤノン株式会社 | 液体噴射記録ヘツドの製造方法 |
| DE3764702D1 (de) | 1986-04-24 | 1990-10-11 | Ibm | Zwei-schichten-photolack-verfahren mit deckschicht. |
| US5264874A (en) * | 1990-02-09 | 1993-11-23 | Canon Kabushiki Kaisha | Ink jet recording system |
| JP2925816B2 (ja) | 1991-10-31 | 1999-07-28 | キヤノン株式会社 | 液体噴射記録ヘッド、その製造方法、及び同ヘッドを具備した記録装置 |
| DE69127801T2 (de) | 1990-12-19 | 1998-02-05 | Canon Kk | Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf |
| CA2075097C (en) * | 1991-08-02 | 2000-03-28 | Hiroyuki Ishinaga | Recording apparatus, recording head and substrate therefor |
| ATE196199T1 (de) | 1992-06-01 | 2000-09-15 | Canon Kk | Verfahren zur herstellung eines tintenstrahlaufzeichnungskopfes |
| JP2960608B2 (ja) | 1992-06-04 | 1999-10-12 | キヤノン株式会社 | 液体噴射記録ヘッドの製造方法 |
| JP3305415B2 (ja) * | 1992-06-18 | 2002-07-22 | キヤノン株式会社 | 半導体装置、インクジェットヘッド、および画像形成装置 |
| JPH0645242A (ja) | 1992-07-24 | 1994-02-18 | Hitachi Ltd | レジスト塗布方法及びその装置 |
| JP3143307B2 (ja) | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| DE69603639T2 (de) | 1995-03-31 | 2000-04-13 | Canon K.K., Tokio/Tokyo | Verfahren zum Herstellen eines Tintenstrahlkopfes |
| JP3347530B2 (ja) | 1995-06-27 | 2002-11-20 | 富士通株式会社 | レジスト組成物及びレジストパターンの形成方法 |
| US5861657A (en) * | 1996-01-18 | 1999-01-19 | International Rectifier Corporation | Graded concentration epitaxial substrate for semiconductor device having resurf diffusion |
| US6302504B1 (en) * | 1996-06-26 | 2001-10-16 | Canon Kabushiki Kaisha | Recording head and recording apparatus using the same |
| JP4497633B2 (ja) | 1999-03-15 | 2010-07-07 | キヤノン株式会社 | 撥液体層の形成方法及び液体吐出ヘッドの製造方法 |
-
2003
- 2003-07-07 JP JP2003271624A patent/JP4298414B2/ja not_active Expired - Fee Related
- 2003-07-09 US US10/615,289 patent/US7592131B2/en not_active Expired - Fee Related
- 2003-07-10 DE DE60327133T patent/DE60327133D1/de not_active Expired - Lifetime
- 2003-07-10 CN CNB031467873A patent/CN1229228C/zh not_active Expired - Fee Related
- 2003-07-10 EP EP03015757A patent/EP1380423B1/en not_active Expired - Lifetime
- 2003-07-10 TW TW092118893A patent/TWI225448B/zh not_active IP Right Cessation
- 2003-07-10 KR KR1020030046777A patent/KR100541904B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004042650A (ja) | 2004-02-12 |
| KR100541904B1 (ko) | 2006-01-10 |
| TWI225448B (en) | 2004-12-21 |
| KR20040005699A (ko) | 2004-01-16 |
| TW200410831A (en) | 2004-07-01 |
| CN1475352A (zh) | 2004-02-18 |
| DE60327133D1 (de) | 2009-05-28 |
| EP1380423B1 (en) | 2009-04-15 |
| US7592131B2 (en) | 2009-09-22 |
| JP4298414B2 (ja) | 2009-07-22 |
| US20040072107A1 (en) | 2004-04-15 |
| EP1380423A1 (en) | 2004-01-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20051130 Termination date: 20160710 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |