CN1229228C - 微细空洞结构体的制备方法和液体喷出头的制备方法 - Google Patents

微细空洞结构体的制备方法和液体喷出头的制备方法 Download PDF

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Publication number
CN1229228C
CN1229228C CNB031467873A CN03146787A CN1229228C CN 1229228 C CN1229228 C CN 1229228C CN B031467873 A CNB031467873 A CN B031467873A CN 03146787 A CN03146787 A CN 03146787A CN 1229228 C CN1229228 C CN 1229228C
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CN
China
Prior art keywords
producing
cavity structure
photosensitive material
structure according
fine cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB031467873A
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English (en)
Chinese (zh)
Other versions
CN1475352A (zh
Inventor
久保田雅彦
田川义则
桧山亘
益川龙也
芝昭二
栗原香晓
石仓宏惠
冈野明彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1475352A publication Critical patent/CN1475352A/zh
Application granted granted Critical
Publication of CN1229228C publication Critical patent/CN1229228C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1603Production of bubble jet print heads of the front shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1637Manufacturing processes molding
    • B41J2/1639Manufacturing processes molding sacrificial molding

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CNB031467873A 2002-07-10 2003-07-10 微细空洞结构体的制备方法和液体喷出头的制备方法 Expired - Fee Related CN1229228C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002201894 2002-07-10
JP201894/2002 2002-07-10
JP2003271624A JP4298414B2 (ja) 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法
JP271624/2003 2003-07-07

Publications (2)

Publication Number Publication Date
CN1475352A CN1475352A (zh) 2004-02-18
CN1229228C true CN1229228C (zh) 2005-11-30

Family

ID=29738475

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031467873A Expired - Fee Related CN1229228C (zh) 2002-07-10 2003-07-10 微细空洞结构体的制备方法和液体喷出头的制备方法

Country Status (7)

Country Link
US (1) US7592131B2 (enExample)
EP (1) EP1380423B1 (enExample)
JP (1) JP4298414B2 (enExample)
KR (1) KR100541904B1 (enExample)
CN (1) CN1229228C (enExample)
DE (1) DE60327133D1 (enExample)
TW (1) TWI225448B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7629111B2 (en) 2004-06-28 2009-12-08 Canon Kabushiki Kaisha Liquid discharge head manufacturing method, and liquid discharge head obtained using this method
JP4447974B2 (ja) * 2004-06-28 2010-04-07 キヤノン株式会社 インクジェットヘッドの製造方法
EP1763706B1 (en) * 2004-06-28 2013-12-11 Canon Kabushiki Kaisha Method for manufacturing liquid discharge head
JP4484774B2 (ja) * 2004-06-28 2010-06-16 キヤノン株式会社 液体吐出ヘッドの製造方法
JP4761498B2 (ja) 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
CN1968815B (zh) * 2004-06-28 2013-05-01 佳能株式会社 排液头制造方法,和使用该方法得到的排液头
JP4480141B2 (ja) 2004-06-28 2010-06-16 キヤノン株式会社 インクジェット記録ヘッドの製造方法
JP4533256B2 (ja) * 2004-06-28 2010-09-01 キヤノン株式会社 微細構造体の製造方法および液体吐出ヘッドの製造方法
JP2006126116A (ja) * 2004-11-01 2006-05-18 Canon Inc フィルター用基板の製造方法、インクジェット記録ヘッドおよびその製造方法
US7824560B2 (en) * 2006-03-07 2010-11-02 Canon Kabushiki Kaisha Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head
US8376525B2 (en) 2006-09-08 2013-02-19 Canon Kabushiki Kaisha Liquid discharge head and method of manufacturing the same
US7550252B2 (en) * 2006-09-21 2009-06-23 Canon Kabushiki Kaisha Ink-jet recording head and method for producing same
US8499453B2 (en) * 2009-11-26 2013-08-06 Canon Kabushiki Kaisha Method of manufacturing liquid discharge head, and method of manufacturing discharge port member
JP5473645B2 (ja) 2010-02-05 2014-04-16 キヤノン株式会社 感光性樹脂組成物及び液体吐出ヘッド
US8434229B2 (en) * 2010-11-24 2013-05-07 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
KR101249723B1 (ko) * 2011-10-28 2013-04-02 전자부품연구원 액적 토출용 노즐 제조 방법 및 이를 이용해 제조된 노즐을 이용한 정전식 액적 토출 장치
CN103935127B (zh) * 2014-04-24 2017-01-11 珠海赛纳打印科技股份有限公司 液体喷头制造方法、液体喷头和打印装置
JP6217711B2 (ja) * 2015-08-21 2017-10-25 日亜化学工業株式会社 発光装置の製造方法
WO2025182421A1 (ja) * 2024-02-27 2025-09-04 日産化学株式会社 発光表示デバイスの製造方法

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US4087569A (en) * 1976-12-20 1978-05-02 International Business Machines Corporation Prebaking treatment for resist mask composition and mask making process using same
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
JPH0645242B2 (ja) 1984-12-28 1994-06-15 キヤノン株式会社 液体噴射記録ヘツドの製造方法
DE3764702D1 (de) 1986-04-24 1990-10-11 Ibm Zwei-schichten-photolack-verfahren mit deckschicht.
US5264874A (en) * 1990-02-09 1993-11-23 Canon Kabushiki Kaisha Ink jet recording system
JP2925816B2 (ja) 1991-10-31 1999-07-28 キヤノン株式会社 液体噴射記録ヘッド、その製造方法、及び同ヘッドを具備した記録装置
DE69127801T2 (de) 1990-12-19 1998-02-05 Canon Kk Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf
CA2075097C (en) * 1991-08-02 2000-03-28 Hiroyuki Ishinaga Recording apparatus, recording head and substrate therefor
ATE196199T1 (de) 1992-06-01 2000-09-15 Canon Kk Verfahren zur herstellung eines tintenstrahlaufzeichnungskopfes
JP2960608B2 (ja) 1992-06-04 1999-10-12 キヤノン株式会社 液体噴射記録ヘッドの製造方法
JP3305415B2 (ja) * 1992-06-18 2002-07-22 キヤノン株式会社 半導体装置、インクジェットヘッド、および画像形成装置
JPH0645242A (ja) 1992-07-24 1994-02-18 Hitachi Ltd レジスト塗布方法及びその装置
JP3143307B2 (ja) 1993-02-03 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
DE69603639T2 (de) 1995-03-31 2000-04-13 Canon K.K., Tokio/Tokyo Verfahren zum Herstellen eines Tintenstrahlkopfes
JP3347530B2 (ja) 1995-06-27 2002-11-20 富士通株式会社 レジスト組成物及びレジストパターンの形成方法
US5861657A (en) * 1996-01-18 1999-01-19 International Rectifier Corporation Graded concentration epitaxial substrate for semiconductor device having resurf diffusion
US6302504B1 (en) * 1996-06-26 2001-10-16 Canon Kabushiki Kaisha Recording head and recording apparatus using the same
JP4497633B2 (ja) 1999-03-15 2010-07-07 キヤノン株式会社 撥液体層の形成方法及び液体吐出ヘッドの製造方法

Also Published As

Publication number Publication date
JP2004042650A (ja) 2004-02-12
KR100541904B1 (ko) 2006-01-10
TWI225448B (en) 2004-12-21
KR20040005699A (ko) 2004-01-16
TW200410831A (en) 2004-07-01
CN1475352A (zh) 2004-02-18
DE60327133D1 (de) 2009-05-28
EP1380423B1 (en) 2009-04-15
US7592131B2 (en) 2009-09-22
JP4298414B2 (ja) 2009-07-22
US20040072107A1 (en) 2004-04-15
EP1380423A1 (en) 2004-01-14

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20051130

Termination date: 20160710

CF01 Termination of patent right due to non-payment of annual fee