KR100541904B1 - 미세 구조화된 부재의 제조 방법, 미세 중공 구조화된부재의 제조 방법 및 액체 토출 헤드의 제조 방법 - Google Patents

미세 구조화된 부재의 제조 방법, 미세 중공 구조화된부재의 제조 방법 및 액체 토출 헤드의 제조 방법 Download PDF

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Publication number
KR100541904B1
KR100541904B1 KR1020030046777A KR20030046777A KR100541904B1 KR 100541904 B1 KR100541904 B1 KR 100541904B1 KR 1020030046777 A KR1020030046777 A KR 1020030046777A KR 20030046777 A KR20030046777 A KR 20030046777A KR 100541904 B1 KR100541904 B1 KR 100541904B1
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KR
South Korea
Prior art keywords
photosensitive material
positive photosensitive
producing
formula
terpolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020030046777A
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English (en)
Korean (ko)
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KR20040005699A (ko
Inventor
마사히꼬 구보따
요시노리 다가와
와따루 히야마
다쯔야 마스까와
쇼지 시바
요시아끼 구리하라
히로에 이시꾸라
아끼히꼬 오까노
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20040005699A publication Critical patent/KR20040005699A/ko
Application granted granted Critical
Publication of KR100541904B1 publication Critical patent/KR100541904B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B41J2/1629—Manufacturing processes etching wet etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1637—Manufacturing processes molding
    • B41J2/1639—Manufacturing processes molding sacrificial molding

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020030046777A 2002-07-10 2003-07-10 미세 구조화된 부재의 제조 방법, 미세 중공 구조화된부재의 제조 방법 및 액체 토출 헤드의 제조 방법 Expired - Fee Related KR100541904B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002201894 2002-07-10
JPJP-P-2002-00201894 2002-07-10
JPJP-P-2003-00271624 2003-07-07
JP2003271624A JP4298414B2 (ja) 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法

Publications (2)

Publication Number Publication Date
KR20040005699A KR20040005699A (ko) 2004-01-16
KR100541904B1 true KR100541904B1 (ko) 2006-01-10

Family

ID=29738475

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030046777A Expired - Fee Related KR100541904B1 (ko) 2002-07-10 2003-07-10 미세 구조화된 부재의 제조 방법, 미세 중공 구조화된부재의 제조 방법 및 액체 토출 헤드의 제조 방법

Country Status (7)

Country Link
US (1) US7592131B2 (enExample)
EP (1) EP1380423B1 (enExample)
JP (1) JP4298414B2 (enExample)
KR (1) KR100541904B1 (enExample)
CN (1) CN1229228C (enExample)
DE (1) DE60327133D1 (enExample)
TW (1) TWI225448B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7629111B2 (en) 2004-06-28 2009-12-08 Canon Kabushiki Kaisha Liquid discharge head manufacturing method, and liquid discharge head obtained using this method
JP4447974B2 (ja) * 2004-06-28 2010-04-07 キヤノン株式会社 インクジェットヘッドの製造方法
EP1763706B1 (en) * 2004-06-28 2013-12-11 Canon Kabushiki Kaisha Method for manufacturing liquid discharge head
JP4484774B2 (ja) * 2004-06-28 2010-06-16 キヤノン株式会社 液体吐出ヘッドの製造方法
JP4761498B2 (ja) 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
CN1968815B (zh) * 2004-06-28 2013-05-01 佳能株式会社 排液头制造方法，和使用该方法得到的排液头
JP4480141B2 (ja) 2004-06-28 2010-06-16 キヤノン株式会社 インクジェット記録ヘッドの製造方法
JP4533256B2 (ja) * 2004-06-28 2010-09-01 キヤノン株式会社 微細構造体の製造方法および液体吐出ヘッドの製造方法
JP2006126116A (ja) * 2004-11-01 2006-05-18 Canon Inc フィルター用基板の製造方法、インクジェット記録ヘッドおよびその製造方法
US7824560B2 (en) * 2006-03-07 2010-11-02 Canon Kabushiki Kaisha Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head
US8376525B2 (en) 2006-09-08 2013-02-19 Canon Kabushiki Kaisha Liquid discharge head and method of manufacturing the same
US7550252B2 (en) * 2006-09-21 2009-06-23 Canon Kabushiki Kaisha Ink-jet recording head and method for producing same
US8499453B2 (en) * 2009-11-26 2013-08-06 Canon Kabushiki Kaisha Method of manufacturing liquid discharge head, and method of manufacturing discharge port member
JP5473645B2 (ja) 2010-02-05 2014-04-16 キヤノン株式会社 感光性樹脂組成物及び液体吐出ヘッド
US8434229B2 (en) * 2010-11-24 2013-05-07 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
KR101249723B1 (ko) * 2011-10-28 2013-04-02 전자부품연구원 액적 토출용 노즐 제조 방법 및 이를 이용해 제조된 노즐을 이용한 정전식 액적 토출 장치
CN103935127B (zh) * 2014-04-24 2017-01-11 珠海赛纳打印科技股份有限公司 液体喷头制造方法、液体喷头和打印装置
JP6217711B2 (ja) * 2015-08-21 2017-10-25 日亜化学工業株式会社 発光装置の製造方法
WO2025182421A1 (ja) * 2024-02-27 2025-09-04 日産化学株式会社 発光表示デバイスの製造方法

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US4087569A (en) * 1976-12-20 1978-05-02 International Business Machines Corporation Prebaking treatment for resist mask composition and mask making process using same
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
JPH0645242B2 (ja) 1984-12-28 1994-06-15 キヤノン株式会社 液体噴射記録ヘツドの製造方法
DE3764702D1 (de) 1986-04-24 1990-10-11 Ibm Zwei-schichten-photolack-verfahren mit deckschicht.
US5264874A (en) * 1990-02-09 1993-11-23 Canon Kabushiki Kaisha Ink jet recording system
JP2925816B2 (ja) 1991-10-31 1999-07-28 キヤノン株式会社 液体噴射記録ヘッド、その製造方法、及び同ヘッドを具備した記録装置
DE69127801T2 (de) 1990-12-19 1998-02-05 Canon Kk Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf
CA2075097C (en) * 1991-08-02 2000-03-28 Hiroyuki Ishinaga Recording apparatus, recording head and substrate therefor
ATE196199T1 (de) 1992-06-01 2000-09-15 Canon Kk Verfahren zur herstellung eines tintenstrahlaufzeichnungskopfes
JP2960608B2 (ja) 1992-06-04 1999-10-12 キヤノン株式会社 液体噴射記録ヘッドの製造方法
JP3305415B2 (ja) * 1992-06-18 2002-07-22 キヤノン株式会社 半導体装置、インクジェットヘッド、および画像形成装置
JPH0645242A (ja) 1992-07-24 1994-02-18 Hitachi Ltd レジスト塗布方法及びその装置
JP3143307B2 (ja) 1993-02-03 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
DE69603639T2 (de) 1995-03-31 2000-04-13 Canon K.K., Tokio/Tokyo Verfahren zum Herstellen eines Tintenstrahlkopfes
JP3347530B2 (ja) 1995-06-27 2002-11-20 富士通株式会社 レジスト組成物及びレジストパターンの形成方法
US5861657A (en) * 1996-01-18 1999-01-19 International Rectifier Corporation Graded concentration epitaxial substrate for semiconductor device having resurf diffusion
US6302504B1 (en) * 1996-06-26 2001-10-16 Canon Kabushiki Kaisha Recording head and recording apparatus using the same
JP4497633B2 (ja) 1999-03-15 2010-07-07 キヤノン株式会社 撥液体層の形成方法及び液体吐出ヘッドの製造方法

Also Published As

Publication number Publication date
JP2004042650A (ja) 2004-02-12
TWI225448B (en) 2004-12-21
KR20040005699A (ko) 2004-01-16
TW200410831A (en) 2004-07-01
CN1475352A (zh) 2004-02-18
DE60327133D1 (de) 2009-05-28
EP1380423B1 (en) 2009-04-15
US7592131B2 (en) 2009-09-22
CN1229228C (zh) 2005-11-30
JP4298414B2 (ja) 2009-07-22
US20040072107A1 (en) 2004-04-15
EP1380423A1 (en) 2004-01-14

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