JP2004046217A5 - - Google Patents

Download PDF

Info

Publication number
JP2004046217A5
JP2004046217A5 JP2003271623A JP2003271623A JP2004046217A5 JP 2004046217 A5 JP2004046217 A5 JP 2004046217A5 JP 2003271623 A JP2003271623 A JP 2003271623A JP 2003271623 A JP2003271623 A JP 2003271623A JP 2004046217 A5 JP2004046217 A5 JP 2004046217A5
Authority
JP
Japan
Prior art keywords
layer
photosensitive material
positive photosensitive
ionizing radiation
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003271623A
Other languages
English (en)
Japanese (ja)
Other versions
JP4280574B2 (ja
JP2004046217A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2003271623A external-priority patent/JP4280574B2/ja
Priority to JP2003271623A priority Critical patent/JP4280574B2/ja
Priority to US10/615,302 priority patent/US6986980B2/en
Priority to KR1020030046719A priority patent/KR100591654B1/ko
Priority to EP03015760A priority patent/EP1380425B1/en
Priority to CNB031467830A priority patent/CN1257059C/zh
Priority to DE60335931T priority patent/DE60335931D1/de
Priority to TW092118905A priority patent/TWI221122B/zh
Publication of JP2004046217A publication Critical patent/JP2004046217A/ja
Publication of JP2004046217A5 publication Critical patent/JP2004046217A5/ja
Publication of JP4280574B2 publication Critical patent/JP4280574B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003271623A 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法 Expired - Fee Related JP4280574B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2003271623A JP4280574B2 (ja) 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法
US10/615,302 US6986980B2 (en) 2002-07-10 2003-07-09 Method of producing micro structure, method of producing liquid discharge head, and liquid discharge head by the same
CNB031467830A CN1257059C (zh) 2002-07-10 2003-07-10 微细结构体的制造方法、液体喷出头的制造方法和液体喷出头
EP03015760A EP1380425B1 (en) 2002-07-10 2003-07-10 Method of producing microstructure, and method of producing liquid discharge head
KR1020030046719A KR100591654B1 (ko) 2002-07-10 2003-07-10 미세 구조체의 제조 방법, 액체 토출 헤드의 제조 방법,및 이 제조 방법으로 제조된 액체 토출 헤드
DE60335931T DE60335931D1 (de) 2002-07-10 2003-07-10 Verfahren zur Herstellung einer Mikrostruktur, und Verfahren zur Herstellung eines Flüssigkeitsausstosskopfes
TW092118905A TWI221122B (en) 2002-07-10 2003-07-10 Method of producing micro structure, method of producing liquid discharge head, and liquid discharge head by the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002201971 2002-07-10
JP2003271623A JP4280574B2 (ja) 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法

Publications (3)

Publication Number Publication Date
JP2004046217A JP2004046217A (ja) 2004-02-12
JP2004046217A5 true JP2004046217A5 (enExample) 2006-08-17
JP4280574B2 JP4280574B2 (ja) 2009-06-17

Family

ID=29738476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003271623A Expired - Fee Related JP4280574B2 (ja) 2002-07-10 2003-07-07 液体吐出ヘッドの製造方法

Country Status (7)

Country Link
US (1) US6986980B2 (enExample)
EP (1) EP1380425B1 (enExample)
JP (1) JP4280574B2 (enExample)
KR (1) KR100591654B1 (enExample)
CN (1) CN1257059C (enExample)
DE (1) DE60335931D1 (enExample)
TW (1) TWI221122B (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2849222B1 (fr) * 2002-12-20 2005-10-21 Commissariat Energie Atomique Microstructure comportant une couche d'adherence et procede de fabrication d'une telle microstructure
DE10353767B4 (de) * 2003-11-17 2005-09-29 Infineon Technologies Ag Vorrichtung zur Häusung einer mikromechanischen Struktur und Verfahren zur Herstellung derselben
DE10361075A1 (de) * 2003-12-22 2005-07-28 Pac Tech - Packaging Technologies Gmbh Verfahren und Vorichtung zur Trocknung von Schaltungssubstraten
JP4447974B2 (ja) 2004-06-28 2010-04-07 キヤノン株式会社 インクジェットヘッドの製造方法
EP1763706B1 (en) * 2004-06-28 2013-12-11 Canon Kabushiki Kaisha Method for manufacturing liquid discharge head
JP4761498B2 (ja) * 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
CN1968815B (zh) * 2004-06-28 2013-05-01 佳能株式会社 排液头制造方法，和使用该方法得到的排液头
JP4484774B2 (ja) * 2004-06-28 2010-06-16 キヤノン株式会社 液体吐出ヘッドの製造方法
JP4533256B2 (ja) * 2004-06-28 2010-09-01 キヤノン株式会社 微細構造体の製造方法および液体吐出ヘッドの製造方法
US7629111B2 (en) 2004-06-28 2009-12-08 Canon Kabushiki Kaisha Liquid discharge head manufacturing method, and liquid discharge head obtained using this method
JP5027991B2 (ja) * 2004-12-03 2012-09-19 キヤノン株式会社 インクジェットヘッドおよびその製造方法
KR101012898B1 (ko) 2005-12-02 2011-02-08 캐논 가부시끼가이샤 액체 토출 헤드 제조 방법
US8438729B2 (en) * 2006-03-09 2013-05-14 Canon Kabushiki Kaisha Method of producing liquid discharge head
US8376525B2 (en) 2006-09-08 2013-02-19 Canon Kabushiki Kaisha Liquid discharge head and method of manufacturing the same
JP2008290413A (ja) * 2007-05-28 2008-12-04 Canon Inc 液体吐出ヘッドの製造方法
US8039195B2 (en) * 2008-02-08 2011-10-18 Taiwan Semiconductor Manufacturing Company, Ltd. Si device making method by using a novel material for packing and unpacking process
US8137573B2 (en) * 2008-06-19 2012-03-20 Canon Kabushiki Kaisha Liquid ejection head, method for manufacturing liquid ejection head, and method for manufacturing structure
JP5069186B2 (ja) * 2008-07-29 2012-11-07 ソニー株式会社 液滴吐出ヘッド及び液滴吐出装置
KR20100060423A (ko) * 2008-11-27 2010-06-07 삼성전자주식회사 잉크젯 프린트헤드 및 그 제조방법
US8499453B2 (en) * 2009-11-26 2013-08-06 Canon Kabushiki Kaisha Method of manufacturing liquid discharge head, and method of manufacturing discharge port member
FR2953991B1 (fr) * 2009-12-10 2012-01-06 Commissariat Energie Atomique Procede de realisation d'un revetement de surface controle tridimensionnellement dans une cavite
US11175279B2 (en) 2010-05-03 2021-11-16 Creatv Microtech, Inc. Polymer microfilters, devices comprising the same, methods of manufacturing the same, and uses thereof
JP5837574B2 (ja) * 2010-05-03 2015-12-24 クリーティービー マイクロテック， インク．Ｃｒｅａｔｖ Ｍｉｃｒｏｔｅｃｈ， Ｉｎｃ． 高分子マイクロフィルタおよびその製造方法
US8434229B2 (en) * 2010-11-24 2013-05-07 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
CN103252997B (zh) * 2012-02-16 2015-12-16 珠海纳思达珠海赛纳打印科技股份有限公司 一种液体喷头及其制造方法
US9308726B2 (en) * 2012-02-16 2016-04-12 Xerox Corporation Printhead fluid paths formed with sacrificial material patterned using additive manufacturing processes
US9599852B1 (en) * 2013-08-05 2017-03-21 Lensvector, Inc. Manufacturing of liquid crystal lenses using carrier substrate
KR101982556B1 (ko) 2014-09-30 2019-05-27 후지필름 가부시키가이샤 패턴 형성 방법, 레지스트 패턴, 및 전자 디바이스의 제조 방법
JPWO2022050041A1 (enExample) * 2020-09-07 2022-03-10

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA969692A (en) 1969-09-15 1975-06-17 Richard A. Jones Catalysed thermosetting polymeric coatings and inks
DE3540480A1 (de) * 1985-11-15 1987-05-21 Hoechst Ag Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
US4882595A (en) * 1987-10-30 1989-11-21 Hewlett-Packard Company Hydraulically tuned channel architecture
US4835086A (en) * 1988-02-12 1989-05-30 Hoechst Celanese Corporation Polysulfone barrier layer for bi-level photoresists
US4906552A (en) * 1988-02-22 1990-03-06 Hughes Aircraft Company Two layer dye photoresist process for sub-half micrometer resolution photolithography
JPH0631444B2 (ja) 1989-06-07 1994-04-27 東洋鋼板株式会社 半田用複層めっき鋼板
JPH0740808B2 (ja) 1990-10-17 1995-05-10 井関農機株式会社 トラクターの油圧昇降制御装置
DE69127801T2 (de) * 1990-12-19 1998-02-05 Canon Kk Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf
JP2694054B2 (ja) 1990-12-19 1997-12-24 キヤノン株式会社 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置
JPH0645242A (ja) 1992-07-24 1994-02-18 Hitachi Ltd レジスト塗布方法及びその装置
JP3143307B2 (ja) * 1993-02-03 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
DE69509862T2 (de) 1994-12-05 2000-03-09 Canon K.K. Verfahren zur Herstellung eines Tintenstrahlkopfes
DE69603639T2 (de) 1995-03-31 2000-04-13 Canon K.K., Tokio/Tokyo Verfahren zum Herstellen eines Tintenstrahlkopfes
JPH0952365A (ja) * 1995-06-08 1997-02-25 Canon Inc インクジェット記録ヘッド及びその製造方法、並びにインクジェット記録装置
US6158843A (en) 1997-03-28 2000-12-12 Lexmark International, Inc. Ink jet printer nozzle plates with ink filtering projections
JP3373147B2 (ja) * 1998-02-23 2003-02-04 シャープ株式会社 フォトレジスト膜及びそのパターン形成方法
JP4497633B2 (ja) 1999-03-15 2010-07-07 キヤノン株式会社 撥液体層の形成方法及び液体吐出ヘッドの製造方法
US6582890B2 (en) * 2001-03-05 2003-06-24 Sandia Corporation Multiple wavelength photolithography for preparing multilayer microstructures
JP4532785B2 (ja) 2001-07-11 2010-08-25 キヤノン株式会社 構造体の製造方法、および液体吐出ヘッドの製造方法
JP2003300323A (ja) * 2002-04-11 2003-10-21 Canon Inc インクジェットヘッド及びその製造方法
JP2004042389A (ja) * 2002-07-10 2004-02-12 Canon Inc 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド

Similar Documents

Publication Publication Date Title
JP2004046217A5 (enExample)
KR102098530B1 (ko) 블록 코폴리머 함유 조성물 및 패턴의 축소 방법
JP5979660B2 (ja) コンタクトホールパターンの形成方法
TWI585532B (zh) 負性厚膜光阻
EP3362404B1 (en) Compositions and processes for self-assembly of block copolymers
Carbaugh et al. Photolithography with polymethyl methacrylate (PMMA)
US4405708A (en) Method of applying a resist pattern on a substrate, and resist material mixture
KR101824285B1 (ko) 패턴 형성 방법, 레지스트 하층막 및 레지스트 하층막 형성용 조성물
JP2004042650A5 (enExample)
CN109679020B (zh) 含立方烷的丙烯酸酯系成膜树脂和ArF光刻胶及其制备方法和光刻方法
WO2021002351A1 (ja) パターン形成方法、レジスト材料及びパターン形成装置
TW200421028A (en) Method of forming resist pattern, positive resist composition, and layered product
CN106233204A (zh) 感光性树脂组合物、感光性元件、抗蚀图案的形成方法和印刷配线板的制造方法
JPH0119135B2 (enExample)
JP2006011181A5 (enExample)
CN101957559A (zh) 光可逆的纳米压印光刻胶及其制备和应用方法
JP3249598B2 (ja) ボトムレジストの製造方法
CN103809378A (zh) 一种负性光刻胶及其制备方法、使用方法
JP4811594B2 (ja) スチレン系誘導体、スチレン系重合体、感光性樹脂組成物、及びパターン形成方法
CN103941544A (zh) 一种光刻胶及其制作方法、使用方法
WO2023246243A1 (zh) 一种紫外光刻胶、紫外光刻胶图案化的方法及用途
CN116462795A (zh) 一种成膜树脂、化学增幅型紫外正性光刻胶及其使用方法
JPH03223862A (ja) レジスト材料
CN107870525A (zh) 控制基板的表面物性的方法
TW200933295A (en) Resin composition for optical waveguide and optical waveguide