CN1257059C - 微细结构体的制造方法、液体喷出头的制造方法和液体喷出头 - Google Patents
微细结构体的制造方法、液体喷出头的制造方法和液体喷出头 Download PDFInfo
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- CN1257059C CN1257059C CNB031467830A CN03146783A CN1257059C CN 1257059 C CN1257059 C CN 1257059C CN B031467830 A CNB031467830 A CN B031467830A CN 03146783 A CN03146783 A CN 03146783A CN 1257059 C CN1257059 C CN 1257059C
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- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP201971/2002 | 2002-07-10 | ||
| JP2002201971 | 2002-07-10 | ||
| JP2003271623A JP4280574B2 (ja) | 2002-07-10 | 2003-07-07 | 液体吐出ヘッドの製造方法 |
| JP271623/2003 | 2003-07-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1475350A CN1475350A (zh) | 2004-02-18 |
| CN1257059C true CN1257059C (zh) | 2006-05-24 |
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| CNB031467830A Expired - Fee Related CN1257059C (zh) | 2002-07-10 | 2003-07-10 | 微细结构体的制造方法、液体喷出头的制造方法和液体喷出头 |
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| Country | Link |
|---|---|
| US (1) | US6986980B2 (enExample) |
| EP (1) | EP1380425B1 (enExample) |
| JP (1) | JP4280574B2 (enExample) |
| KR (1) | KR100591654B1 (enExample) |
| CN (1) | CN1257059C (enExample) |
| DE (1) | DE60335931D1 (enExample) |
| TW (1) | TWI221122B (enExample) |
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| FR2849222B1 (fr) * | 2002-12-20 | 2005-10-21 | Commissariat Energie Atomique | Microstructure comportant une couche d'adherence et procede de fabrication d'une telle microstructure |
| DE10353767B4 (de) * | 2003-11-17 | 2005-09-29 | Infineon Technologies Ag | Vorrichtung zur Häusung einer mikromechanischen Struktur und Verfahren zur Herstellung derselben |
| DE10361075A1 (de) * | 2003-12-22 | 2005-07-28 | Pac Tech - Packaging Technologies Gmbh | Verfahren und Vorichtung zur Trocknung von Schaltungssubstraten |
| JP4447974B2 (ja) | 2004-06-28 | 2010-04-07 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
| EP1763706B1 (en) * | 2004-06-28 | 2013-12-11 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
| JP4761498B2 (ja) * | 2004-06-28 | 2011-08-31 | キヤノン株式会社 | 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法 |
| CN1968815B (zh) * | 2004-06-28 | 2013-05-01 | 佳能株式会社 | 排液头制造方法,和使用该方法得到的排液头 |
| JP4484774B2 (ja) * | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP4533256B2 (ja) * | 2004-06-28 | 2010-09-01 | キヤノン株式会社 | 微細構造体の製造方法および液体吐出ヘッドの製造方法 |
| US7629111B2 (en) | 2004-06-28 | 2009-12-08 | Canon Kabushiki Kaisha | Liquid discharge head manufacturing method, and liquid discharge head obtained using this method |
| JP5027991B2 (ja) * | 2004-12-03 | 2012-09-19 | キヤノン株式会社 | インクジェットヘッドおよびその製造方法 |
| KR101012898B1 (ko) | 2005-12-02 | 2011-02-08 | 캐논 가부시끼가이샤 | 액체 토출 헤드 제조 방법 |
| US8438729B2 (en) * | 2006-03-09 | 2013-05-14 | Canon Kabushiki Kaisha | Method of producing liquid discharge head |
| US8376525B2 (en) | 2006-09-08 | 2013-02-19 | Canon Kabushiki Kaisha | Liquid discharge head and method of manufacturing the same |
| JP2008290413A (ja) * | 2007-05-28 | 2008-12-04 | Canon Inc | 液体吐出ヘッドの製造方法 |
| US8039195B2 (en) * | 2008-02-08 | 2011-10-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Si device making method by using a novel material for packing and unpacking process |
| US8137573B2 (en) * | 2008-06-19 | 2012-03-20 | Canon Kabushiki Kaisha | Liquid ejection head, method for manufacturing liquid ejection head, and method for manufacturing structure |
| JP5069186B2 (ja) * | 2008-07-29 | 2012-11-07 | ソニー株式会社 | 液滴吐出ヘッド及び液滴吐出装置 |
| KR20100060423A (ko) * | 2008-11-27 | 2010-06-07 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| US8499453B2 (en) * | 2009-11-26 | 2013-08-06 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head, and method of manufacturing discharge port member |
| FR2953991B1 (fr) * | 2009-12-10 | 2012-01-06 | Commissariat Energie Atomique | Procede de realisation d'un revetement de surface controle tridimensionnellement dans une cavite |
| US11175279B2 (en) | 2010-05-03 | 2021-11-16 | Creatv Microtech, Inc. | Polymer microfilters, devices comprising the same, methods of manufacturing the same, and uses thereof |
| JP5837574B2 (ja) * | 2010-05-03 | 2015-12-24 | クリーティービー マイクロテック, インク.Creatv Microtech, Inc. | 高分子マイクロフィルタおよびその製造方法 |
| US8434229B2 (en) * | 2010-11-24 | 2013-05-07 | Canon Kabushiki Kaisha | Liquid ejection head manufacturing method |
| CN103252997B (zh) * | 2012-02-16 | 2015-12-16 | 珠海纳思达珠海赛纳打印科技股份有限公司 | 一种液体喷头及其制造方法 |
| US9308726B2 (en) * | 2012-02-16 | 2016-04-12 | Xerox Corporation | Printhead fluid paths formed with sacrificial material patterned using additive manufacturing processes |
| US9599852B1 (en) * | 2013-08-05 | 2017-03-21 | Lensvector, Inc. | Manufacturing of liquid crystal lenses using carrier substrate |
| KR101982556B1 (ko) | 2014-09-30 | 2019-05-27 | 후지필름 가부시키가이샤 | 패턴 형성 방법, 레지스트 패턴, 및 전자 디바이스의 제조 방법 |
| JPWO2022050041A1 (enExample) * | 2020-09-07 | 2022-03-10 |
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| DE3540480A1 (de) * | 1985-11-15 | 1987-05-21 | Hoechst Ag | Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
| US4882595A (en) * | 1987-10-30 | 1989-11-21 | Hewlett-Packard Company | Hydraulically tuned channel architecture |
| US4835086A (en) * | 1988-02-12 | 1989-05-30 | Hoechst Celanese Corporation | Polysulfone barrier layer for bi-level photoresists |
| US4906552A (en) * | 1988-02-22 | 1990-03-06 | Hughes Aircraft Company | Two layer dye photoresist process for sub-half micrometer resolution photolithography |
| JPH0631444B2 (ja) | 1989-06-07 | 1994-04-27 | 東洋鋼板株式会社 | 半田用複層めっき鋼板 |
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| JPH0645242A (ja) | 1992-07-24 | 1994-02-18 | Hitachi Ltd | レジスト塗布方法及びその装置 |
| JP3143307B2 (ja) * | 1993-02-03 | 2001-03-07 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
| DE69509862T2 (de) | 1994-12-05 | 2000-03-09 | Canon K.K. | Verfahren zur Herstellung eines Tintenstrahlkopfes |
| DE69603639T2 (de) | 1995-03-31 | 2000-04-13 | Canon K.K., Tokio/Tokyo | Verfahren zum Herstellen eines Tintenstrahlkopfes |
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| JP2003300323A (ja) * | 2002-04-11 | 2003-10-21 | Canon Inc | インクジェットヘッド及びその製造方法 |
| JP2004042389A (ja) * | 2002-07-10 | 2004-02-12 | Canon Inc | 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド |
-
2003
- 2003-07-07 JP JP2003271623A patent/JP4280574B2/ja not_active Expired - Fee Related
- 2003-07-09 US US10/615,302 patent/US6986980B2/en not_active Expired - Fee Related
- 2003-07-10 KR KR1020030046719A patent/KR100591654B1/ko not_active Expired - Fee Related
- 2003-07-10 EP EP03015760A patent/EP1380425B1/en not_active Expired - Lifetime
- 2003-07-10 DE DE60335931T patent/DE60335931D1/de not_active Expired - Lifetime
- 2003-07-10 CN CNB031467830A patent/CN1257059C/zh not_active Expired - Fee Related
- 2003-07-10 TW TW092118905A patent/TWI221122B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US20040131957A1 (en) | 2004-07-08 |
| TWI221122B (en) | 2004-09-21 |
| US6986980B2 (en) | 2006-01-17 |
| EP1380425A1 (en) | 2004-01-14 |
| KR100591654B1 (ko) | 2006-06-20 |
| EP1380425B1 (en) | 2011-02-02 |
| CN1475350A (zh) | 2004-02-18 |
| JP4280574B2 (ja) | 2009-06-17 |
| KR20040005695A (ko) | 2004-01-16 |
| JP2004046217A (ja) | 2004-02-12 |
| TW200401714A (en) | 2004-02-01 |
| DE60335931D1 (de) | 2011-03-17 |
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