JP2004006620A5 - - Google Patents

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Publication number
JP2004006620A5
JP2004006620A5 JP2002366250A JP2002366250A JP2004006620A5 JP 2004006620 A5 JP2004006620 A5 JP 2004006620A5 JP 2002366250 A JP2002366250 A JP 2002366250A JP 2002366250 A JP2002366250 A JP 2002366250A JP 2004006620 A5 JP2004006620 A5 JP 2004006620A5
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JP
Japan
Prior art keywords
gas
reaction tube
cleaning gas
pipe
substrate processing
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JP2002366250A
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English (en)
Japanese (ja)
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JP3985899B2 (ja
JP2004006620A (ja
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Priority claimed from JP2002366250A external-priority patent/JP3985899B2/ja
Priority to JP2002366250A priority Critical patent/JP3985899B2/ja
Application filed filed Critical
Priority to TW092106861A priority patent/TW591690B/zh
Priority to KR1020030019041A priority patent/KR100802212B1/ko
Priority to US10/400,577 priority patent/US20030221779A1/en
Publication of JP2004006620A publication Critical patent/JP2004006620A/ja
Publication of JP2004006620A5 publication Critical patent/JP2004006620A5/ja
Priority to US11/271,900 priority patent/US20060060142A1/en
Publication of JP3985899B2 publication Critical patent/JP3985899B2/ja
Application granted granted Critical
Priority to US12/404,932 priority patent/US20090178694A1/en
Priority to US12/954,369 priority patent/US8211802B2/en
Priority to US13/489,018 priority patent/US8366868B2/en
Priority to US13/750,745 priority patent/US20130133696A1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002366250A 2002-03-28 2002-12-18 基板処理装置 Expired - Lifetime JP3985899B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2002366250A JP3985899B2 (ja) 2002-03-28 2002-12-18 基板処理装置
TW092106861A TW591690B (en) 2002-03-28 2003-03-27 Substrate processing apparatus
KR1020030019041A KR100802212B1 (ko) 2002-03-28 2003-03-27 기판 처리 장치
US10/400,577 US20030221779A1 (en) 2002-03-28 2003-03-28 Substrate processing apparatus
US11/271,900 US20060060142A1 (en) 2002-03-28 2005-11-14 Substrate processing apparatus
US12/404,932 US20090178694A1 (en) 2002-03-28 2009-03-16 Substrate processing apparatus
US12/954,369 US8211802B2 (en) 2002-03-28 2010-11-24 Substrate processing apparatus
US13/489,018 US8366868B2 (en) 2002-03-28 2012-06-05 Substrate processing apparatus
US13/750,745 US20130133696A1 (en) 2002-03-28 2013-01-25 Substrate processing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002092733 2002-03-28
JP2002366250A JP3985899B2 (ja) 2002-03-28 2002-12-18 基板処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004128145A Division JP4253612B2 (ja) 2002-03-28 2004-04-23 基板処理装置

Publications (3)

Publication Number Publication Date
JP2004006620A JP2004006620A (ja) 2004-01-08
JP2004006620A5 true JP2004006620A5 (enExample) 2005-03-03
JP3985899B2 JP3985899B2 (ja) 2007-10-03

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Family Applications (1)

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JP2002366250A Expired - Lifetime JP3985899B2 (ja) 2002-03-28 2002-12-18 基板処理装置

Country Status (4)

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US (6) US20030221779A1 (enExample)
JP (1) JP3985899B2 (enExample)
KR (1) KR100802212B1 (enExample)
TW (1) TW591690B (enExample)

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