JP1731877S - - Google Patents

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Publication number
JP1731877S
JP1731877S JP2022004139F JP2022004139F JP1731877S JP 1731877 S JP1731877 S JP 1731877S JP 2022004139 F JP2022004139 F JP 2022004139F JP 2022004139 F JP2022004139 F JP 2022004139F JP 1731877 S JP1731877 S JP 1731877S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022004139F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022004139F priority Critical patent/JP1731877S/ja
Priority to TW111302868F priority patent/TWD230585S/zh
Priority to US29/843,542 priority patent/USD1022906S1/en
Application granted granted Critical
Publication of JP1731877S publication Critical patent/JP1731877S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022004139F 2022-03-01 2022-03-01 Active JP1731877S (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022004139F JP1731877S (ja) 2022-03-01 2022-03-01
TW111302868F TWD230585S (zh) 2022-03-01 2022-06-15 反應管
US29/843,542 USD1022906S1 (en) 2022-03-01 2022-06-22 Tubular reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022004139F JP1731877S (ja) 2022-03-01 2022-03-01

Publications (1)

Publication Number Publication Date
JP1731877S true JP1731877S (ja) 2022-12-09

Family

ID=84322401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022004139F Active JP1731877S (ja) 2022-03-01 2022-03-01

Country Status (3)

Country Link
US (1) USD1022906S1 (ja)
JP (1) JP1731877S (ja)
TW (1) TWD230585S (ja)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
USD590359S1 (en) * 2006-02-20 2009-04-14 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD594488S1 (en) * 2007-04-20 2009-06-16 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD618638S1 (en) 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
TWD166710S (zh) 2013-07-08 2015-03-21 日立國際電氣股份有限公司 反應管
USD742339S1 (en) 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
JP1534828S (ja) * 2015-02-23 2015-10-13
JP1535455S (ja) * 2015-02-25 2015-10-19
JP1546345S (ja) * 2015-09-04 2016-03-22
JP1546512S (ja) * 2015-09-04 2016-03-22

Also Published As

Publication number Publication date
USD1022906S1 (en) 2024-04-16
TWD230585S (zh) 2024-04-01

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