JP2002524852A5 - - Google Patents

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Publication number
JP2002524852A5
JP2002524852A5 JP2000568118A JP2000568118A JP2002524852A5 JP 2002524852 A5 JP2002524852 A5 JP 2002524852A5 JP 2000568118 A JP2000568118 A JP 2000568118A JP 2000568118 A JP2000568118 A JP 2000568118A JP 2002524852 A5 JP2002524852 A5 JP 2002524852A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2000568118A
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Japanese (ja)
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JP2002524852A (ja
JP4405083B2 (ja
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Priority claimed from PCT/US1999/019842 external-priority patent/WO2000013226A1/en
Publication of JP2002524852A publication Critical patent/JP2002524852A/ja
Publication of JP2002524852A5 publication Critical patent/JP2002524852A5/ja
Application granted granted Critical
Publication of JP4405083B2 publication Critical patent/JP4405083B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000568118A 1998-09-02 1999-08-27 理想的な酸素析出シリコンウエハの製造方法 Expired - Fee Related JP4405083B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9886198P 1998-09-02 1998-09-02
US60/098,861 1998-09-02
PCT/US1999/019842 WO2000013226A1 (en) 1998-09-02 1999-08-27 Process for preparing an ideal oxygen precipitating silicon wafer

Publications (3)

Publication Number Publication Date
JP2002524852A JP2002524852A (ja) 2002-08-06
JP2002524852A5 true JP2002524852A5 (enExample) 2009-09-03
JP4405083B2 JP4405083B2 (ja) 2010-01-27

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ID=22271299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000568118A Expired - Fee Related JP4405083B2 (ja) 1998-09-02 1999-08-27 理想的な酸素析出シリコンウエハの製造方法

Country Status (8)

Country Link
US (3) US6191010B1 (enExample)
EP (1) EP1110240B1 (enExample)
JP (1) JP4405083B2 (enExample)
KR (1) KR100957729B1 (enExample)
CN (1) CN1155064C (enExample)
DE (1) DE69933777T2 (enExample)
TW (1) TW425636B (enExample)
WO (1) WO2000013226A1 (enExample)

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JP4617751B2 (ja) * 2004-07-22 2011-01-26 株式会社Sumco シリコンウェーハおよびその製造方法
US7846822B2 (en) * 2004-07-30 2010-12-07 The Board Of Trustees Of The University Of Illinois Methods for controlling dopant concentration and activation in semiconductor structures
JP5117671B2 (ja) * 2004-10-19 2013-01-16 シルトロン インク 高品質単結晶及びその成長方法
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US7485928B2 (en) * 2005-11-09 2009-02-03 Memc Electronic Materials, Inc. Arsenic and phosphorus doped silicon wafer substrates having intrinsic gettering
US20090004426A1 (en) * 2007-06-29 2009-01-01 Memc Electronic Materials, Inc. Suppression of Oxygen Precipitation in Heavily Doped Single Crystal Silicon Substrates
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US7968440B2 (en) * 2008-03-19 2011-06-28 The Board Of Trustees Of The University Of Illinois Preparation of ultra-shallow semiconductor junctions using intermediate temperature ramp rates and solid interfaces for defect engineering
JP2009231429A (ja) * 2008-03-21 2009-10-08 Covalent Materials Corp シリコンウェーハの製造方法
US8476149B2 (en) * 2008-07-31 2013-07-02 Global Wafers Japan Co., Ltd. Method of manufacturing single crystal silicon wafer from ingot grown by Czocharlski process with rapid heating/cooling process
JP5561918B2 (ja) * 2008-07-31 2014-07-30 グローバルウェーハズ・ジャパン株式会社 シリコンウェーハの製造方法
US7939432B2 (en) * 2008-12-15 2011-05-10 Macronix International Co., Ltd. Method of improving intrinsic gettering ability of wafer
JP5062217B2 (ja) * 2009-04-30 2012-10-31 株式会社Ｓｕｍｃｏ 半導体ウェーハの製造方法
US8871670B2 (en) 2011-01-05 2014-10-28 The Board Of Trustees Of The University Of Illinois Defect engineering in metal oxides via surfaces
WO2014078847A1 (en) 2012-11-19 2014-05-22 Sunedison, Inc. Production of high precipitate density wafers by activation of inactive oxygen precipitate nuclei by heat treatment
CN105316767B (zh) * 2015-06-04 2019-09-24 上海超硅半导体有限公司 超大规模集成电路用硅片及其制造方法、应用
KR102453743B1 (ko) 2016-12-28 2022-10-11 썬에디슨 세미컨덕터 리미티드 고유 게터링 및 게이트 산화물 무결성 수율을 갖도록 규소 웨이퍼들을 처리하는 방법
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