EE200100059A - Leeliseline tsink-nikkel galvaanimisvann - Google Patents

Leeliseline tsink-nikkel galvaanimisvann

Info

Publication number
EE200100059A
EE200100059A EEP200100059A EEP200100059A EE200100059A EE 200100059 A EE200100059 A EE 200100059A EE P200100059 A EEP200100059 A EE P200100059A EE P200100059 A EEP200100059 A EE P200100059A EE 200100059 A EE200100059 A EE 200100059A
Authority
EE
Estonia
Prior art keywords
plating bath
nickel plating
alkaline zinc
alkaline
zinc
Prior art date
Application number
EEP200100059A
Other languages
English (en)
Estonian (et)
Inventor
Hillebrand Ernst-Walter
Original Assignee
Walter Hillebrand Gmbh & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EE200100059(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Walter Hillebrand Gmbh & Co filed Critical Walter Hillebrand Gmbh & Co
Publication of EE200100059A publication Critical patent/EE200100059A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
EEP200100059A 1998-07-30 1999-07-29 Leeliseline tsink-nikkel galvaanimisvann EE200100059A (et)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19834353A DE19834353C2 (de) 1998-07-30 1998-07-30 Alkalisches Zink-Nickelbad
PCT/EP1999/005443 WO2000006807A2 (fr) 1998-07-30 1999-07-29 Bain alcalin de zinc-nickel

Publications (1)

Publication Number Publication Date
EE200100059A true EE200100059A (et) 2002-10-15

Family

ID=7875843

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200100059A EE200100059A (et) 1998-07-30 1999-07-29 Leeliseline tsink-nikkel galvaanimisvann

Country Status (22)

Country Link
US (4) US6602394B1 (fr)
EP (2) EP1102875B1 (fr)
JP (2) JP4716568B2 (fr)
KR (1) KR20010071074A (fr)
CN (1) CN1311830A (fr)
AT (2) ATE242821T1 (fr)
AU (1) AU5415299A (fr)
BG (1) BG105184A (fr)
BR (1) BR9912589A (fr)
CA (1) CA2339144A1 (fr)
CZ (1) CZ298904B6 (fr)
DE (3) DE19834353C2 (fr)
EE (1) EE200100059A (fr)
ES (2) ES2277624T3 (fr)
HR (1) HRP20010044B1 (fr)
HU (1) HUP0103951A3 (fr)
IL (1) IL141086A0 (fr)
MX (1) MXPA01000932A (fr)
PL (1) PL198149B1 (fr)
SK (1) SK285453B6 (fr)
TR (1) TR200100232T2 (fr)
WO (1) WO2000006807A2 (fr)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US8236159B2 (en) * 1999-04-13 2012-08-07 Applied Materials Inc. Electrolytic process using cation permeable barrier
US20060157355A1 (en) * 2000-03-21 2006-07-20 Semitool, Inc. Electrolytic process using anion permeable barrier
US8852417B2 (en) 1999-04-13 2014-10-07 Applied Materials, Inc. Electrolytic process using anion permeable barrier
US20060189129A1 (en) * 2000-03-21 2006-08-24 Semitool, Inc. Method for applying metal features onto barrier layers using ion permeable barriers
DE10026956A1 (de) * 2000-05-30 2001-12-13 Walter Hillebrand Galvanotechn Zink-Legierungsbad
ATE306572T1 (de) † 2000-06-15 2005-10-15 Taskem Inc Zink-nickel-elektroplattierung
US6755960B1 (en) 2000-06-15 2004-06-29 Taskem Inc. Zinc-nickel electroplating
US7628898B2 (en) * 2001-03-12 2009-12-08 Semitool, Inc. Method and system for idle state operation
DE10223622B4 (de) * 2002-05-28 2005-12-08 Walter Hillebrand Gmbh & Co. Kg Galvanotechnik Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute
US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10261493A1 (de) * 2002-12-23 2004-07-08 METAKEM Gesellschaft für Schichtchemie der Metalle mbH Anode zur Galvanisierung
ES2609080T3 (es) * 2003-06-03 2017-04-18 Coventya, Inc. Revestimiento electrolítico de cinc y aleaciones de cinc
US20050121332A1 (en) * 2003-10-03 2005-06-09 Kochilla John R. Apparatus and method for treatment of metal surfaces by inorganic electrophoretic passivation
US20050133376A1 (en) * 2003-12-19 2005-06-23 Opaskar Vincent C. Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
FR2864553B1 (fr) * 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE102004061255B4 (de) 2004-12-20 2007-10-31 Atotech Deutschland Gmbh Verfahren für den kontinuierlichen Betrieb von sauren oder alkalischen Zink- oder Zinklegierungsbädern und Vorrichtung zur Durchführung desselben
EP1712660A1 (fr) 2005-04-12 2006-10-18 Enthone Inc. Anode insoluble
EP1717353B1 (fr) * 2005-04-26 2009-04-22 ATOTECH Deutschland GmbH Bain galvanique contenant une membrane de filtration
EP1717351A1 (fr) * 2005-04-27 2006-11-02 Enthone Inc. Bain de galvanisation
JP4738910B2 (ja) * 2005-06-21 2011-08-03 日本表面化学株式会社 亜鉛−ニッケル合金めっき方法
US20070043474A1 (en) * 2005-08-17 2007-02-22 Semitool, Inc. Systems and methods for predicting process characteristics of an electrochemical treatment process
DE102005051632B4 (de) * 2005-10-28 2009-02-19 Enthone Inc., West Haven Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
JP4819612B2 (ja) * 2006-08-07 2011-11-24 ルネサスエレクトロニクス株式会社 めっき処理装置および半導体装置の製造方法
DE102007040005A1 (de) 2007-08-23 2009-02-26 Ewh Industrieanlagen Gmbh & Co. Kg Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad
DE102007060200A1 (de) 2007-12-14 2009-06-18 Coventya Gmbh Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
TWI384094B (zh) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
EP2096193B1 (fr) 2008-02-21 2013-04-03 Atotech Deutschland GmbH Procédé de préparation de pièces linéaires ou complexes, résistantes à la corrosion plaquées en zinc et en zinc-nickel
DE102008058086B4 (de) 2008-11-18 2013-05-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
KR100977068B1 (ko) * 2010-01-25 2010-08-19 한용순 비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
EP2384800B1 (fr) 2010-05-07 2013-02-13 Dr.Ing. Max Schlötter GmbH & Co. KG Régénération d'électrolytes zinc-nickel alcalins par la suppression d'ions de cyanure
DE102010044551A1 (de) 2010-09-07 2012-03-08 Coventya Gmbh Anode sowie deren Verwendung in einem alkalischen Galvanikbad
EP2738290A1 (fr) 2011-08-30 2014-06-04 Rohm and Haas Electronic Materials LLC Promotion de l'adhérence de bronze blanc exempt de cyanure
CN103849915B (zh) * 2012-12-06 2016-08-31 北大方正集团有限公司 电镀装置和pcb板导通孔镀铜的方法
CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
BR112015028629A2 (pt) 2015-07-22 2017-07-25 Dipsol Chem método de eletrogalvanização de liga de zinco
EP3042985B1 (fr) 2015-07-22 2019-04-10 Dipsol Chemicals Co., Ltd. Procédé de placage d'un alliage de zinc
WO2017171113A1 (fr) * 2016-03-29 2017-10-05 (주) 테크윈 Bain électrolytique et procédé d'électrolyse
CN106987879A (zh) * 2016-11-23 2017-07-28 瑞尔太阳能投资有限公司 电沉积装置及其电沉积方法
EP3358045A1 (fr) 2017-02-07 2018-08-08 Dr.Ing. Max Schlötter GmbH & Co. KG Procédé de dépôt par placage de revêtements en zinc et en alliage de zinc à partir d'un bain de revêtement alcalin à élimination réduite des additifs de bain organiques
HUE065554T2 (hu) 2017-06-14 2024-06-28 Dr Ing Max Schloetter Gmbh & Co Kg Eljárás cink-nikkel ötvözet rétegek elektrolitikus lecsapására egy alkálikus cink-nikkel ötvözet fürdõbõl adalékok korlátozott lebomlása mellett
TWI841670B (zh) * 2019-01-24 2024-05-11 德商德國艾托特克公司 用於電解鋅-鎳合金沉積之膜陽極系統
JP6582353B1 (ja) 2019-02-15 2019-10-02 ディップソール株式会社 亜鉛又は亜鉛合金電気めっき方法及びシステム
JP6750186B1 (ja) 2019-11-28 2020-09-02 ユケン工業株式会社 めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
WO2021123129A1 (fr) 2019-12-20 2021-06-24 Atotech Deutschland Gmbh Procédé et système de dépôt d'un alliage zinc-nickel sur un substrat
EP4273303A1 (fr) 2022-05-05 2023-11-08 Atotech Deutschland GmbH & Co. KG Procédé de dépôt d'un alliage zinc-nickel sur un substrat, bain de dépôt zinc-nickel aqueux, agent d'éclaircissement et son utilisation
CN115821346A (zh) * 2022-11-16 2023-03-21 广州超邦化工有限公司 一种中碳钢机加件镀碱性锌镍合金的方法

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE925264C (de) 1952-11-15 1955-03-17 Hesse & Co Dr Verfahren zum Vernickeln ohne Nickelanoden
GB1349735A (en) 1969-11-20 1974-04-10 Fulmer Res Inst Ltd Electrodeposited metal coatings
US3660170A (en) * 1970-04-08 1972-05-02 Gen Electric Dendrite-inhibiting additive for battery cell having zinc electrode
US3718549A (en) 1971-06-14 1973-02-27 Kewanee Oil Co Alkaline nickel plating solutions
JPS5128533A (en) * 1974-09-04 1976-03-10 Matsushita Electric Ind Co Ltd Aen nitsukerugokin metsukyodenkaieki
GB1602404A (en) 1978-04-06 1981-11-11 Ibm Electroplating of chromium
US4192908A (en) * 1979-06-15 1980-03-11 The United States Of America As Represented By The Secretary Of The Navy Mass-transport separator for alkaline nickel-zinc cells and cell
JPS5893886A (ja) 1981-11-30 1983-06-03 Tokuyama Soda Co Ltd 電気メツキ方法
JPS5893899A (ja) 1981-11-30 1983-06-03 Sumitomo Metal Ind Ltd 電気メツキの浴管理方法
US4469564A (en) * 1982-08-11 1984-09-04 At&T Bell Laboratories Copper electroplating process
DE3310730A1 (de) 1983-03-24 1984-03-29 Daimler-Benz Ag, 7000 Stuttgart Verfahren zum entfernen ueberschuessiger metall-ionen aus sauren chloridhaltigen galvanischen baeder
JPS59193295A (ja) 1983-04-15 1984-11-01 Hitachi Ltd ニツケルめつき方法及び装置
DE3712511C3 (de) * 1986-04-14 1995-06-29 Dipsol Chem Alkalisches cyanidfreies Elektroplattierungsbad und Verwendung dieses Bades
US4889602B1 (en) 1986-04-14 1995-11-14 Dipsol Chem Electroplating bath and method for forming zinc-nickel alloy coating
US4832812A (en) * 1987-09-08 1989-05-23 Eco-Tec Limited Apparatus for electroplating metals
JPH02175894A (ja) * 1988-12-28 1990-07-09 Kosaku:Kk スズ、スズ合金電気めっき方法及び同電気めっき装置
FR2650304B1 (fr) 1989-07-25 1991-10-04 Siderurgie Fse Inst Rech Procede de revetement electrolytique d'une surface metallique, et cellule d'electrolyse pour sa mise en oeuvre
JPH049493A (ja) * 1990-04-27 1992-01-14 Permelec Electrode Ltd 鋼板の電気錫メッキ方法
JP2764337B2 (ja) * 1990-05-10 1998-06-11 新日本製鐵株式会社 Ｎｉ又はＮｉ―Ｚｎ合金又はＮｉ―Ｚｎ―Ｃｏ合金メッキ方法
JPH0444374A (ja) 1990-06-12 1992-02-14 Matsushita Electric Ind Co Ltd エキシマレーザ装置
US5310465A (en) * 1990-06-14 1994-05-10 Vaughan Daniel J Electrodialytic oxydation-reduction of metals
JPH0452296A (ja) * 1990-06-20 1992-02-20 Permelec Electrode Ltd 銅めっき方法
JPH08375Y2 (ja) * 1990-08-15 1996-01-10 株式会社アルメックス メッキ装置の陽極構造
EP0483937A1 (fr) 1990-10-24 1992-05-06 ATOTECH Deutschland GmbH Procédé et cellule électrolytique et son utilisation
DE4035316C2 (de) 1990-11-07 1993-11-04 Daimler Benz Ag Verfahren zur elektrolytischen rueckgewinnung von nickel aus chloridhaltigen elektrolytischen baedern
JPH04176893A (ja) 1990-11-08 1992-06-24 Kawasaki Steel Corp Ｓｎ―Ｎｉ合金めっき方法
US5162079A (en) 1991-01-28 1992-11-10 Eco-Tec Limited Process and apparatus for control of electroplating bath composition
JP2997072B2 (ja) * 1991-02-13 2000-01-11 ディップソール株式会社 亜鉛−ニッケル合金めっき浴及び被めっき物上の黒色析出を防止する方法
JPH059776A (ja) * 1991-07-01 1993-01-19 Fujitsu Ltd プリント配線板のめつき方法
JPH059799A (ja) 1991-07-05 1993-01-19 Kawasaki Steel Corp 硫酸浴Ｚｎ−Ｎｉ電気めつきにおける金属イオンの供給方法及び装置
JPH05128533A (ja) 1991-11-05 1993-05-25 Nec Eng Ltd 光デイスク再生装置
FR2686352B1 (fr) 1992-01-16 1995-06-16 Framatome Sa Appareil et procede de revetement electrolytique de nickel.
US5417840A (en) * 1993-10-21 1995-05-23 Mcgean-Rohco, Inc. Alkaline zinc-nickel alloy plating baths
US5405523A (en) * 1993-12-15 1995-04-11 Taskem Inc. Zinc alloy plating with quaternary ammonium polymer
JPH10130878A (ja) 1996-11-01 1998-05-19 Asahi Glass Co Ltd 電解ニッケルめっき方法
US5883762A (en) 1997-03-13 1999-03-16 Calhoun; Robert B. Electroplating apparatus and process for reducing oxidation of oxidizable plating anions and cations
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad

Also Published As

Publication number Publication date
WO2000006807A3 (fr) 2000-05-04
HUP0103951A3 (en) 2003-05-28
US20110031127A1 (en) 2011-02-10
BR9912589A (pt) 2001-05-02
US20080164150A1 (en) 2008-07-10
EP1102875A2 (fr) 2001-05-30
US20040104123A1 (en) 2004-06-03
AU5415299A (en) 2000-02-21
SK285453B6 (sk) 2007-01-04
US8486235B2 (en) 2013-07-16
CN1311830A (zh) 2001-09-05
HRP20010044B1 (en) 2005-06-30
HUP0103951A2 (hu) 2002-02-28
SK892001A3 (en) 2001-10-08
IL141086A0 (en) 2002-02-10
TR200100232T2 (tr) 2001-06-21
JP4716568B2 (ja) 2011-07-06
EP1344850A1 (fr) 2003-09-17
DE19834353A1 (de) 2000-02-03
CZ2001189A3 (cs) 2001-08-15
PL345970A1 (en) 2002-01-14
HRP20010044A2 (en) 2001-12-31
EP1344850B1 (fr) 2006-11-22
WO2000006807A2 (fr) 2000-02-10
DE59914011D1 (de) 2007-01-04
EP1102875B1 (fr) 2003-06-11
DE59905937D1 (de) 2003-07-17
KR20010071074A (ko) 2001-07-28
ES2277624T3 (es) 2007-07-16
US7807035B2 (en) 2010-10-05
JP2008150713A (ja) 2008-07-03
PL198149B1 (pl) 2008-05-30
US6602394B1 (en) 2003-08-05
BG105184A (en) 2001-10-31
DE19834353C2 (de) 2000-08-17
ATE346180T1 (de) 2006-12-15
CA2339144A1 (fr) 2000-02-10
JP2002521572A (ja) 2002-07-16
MXPA01000932A (es) 2002-06-04
CZ298904B6 (cs) 2008-03-05
ATE242821T1 (de) 2003-06-15
ES2201759T3 (es) 2004-03-16

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