DE69841238D1 - Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen - Google Patents

Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen

Info

Publication number
DE69841238D1
DE69841238D1 DE69841238T DE69841238T DE69841238D1 DE 69841238 D1 DE69841238 D1 DE 69841238D1 DE 69841238 T DE69841238 T DE 69841238T DE 69841238 T DE69841238 T DE 69841238T DE 69841238 D1 DE69841238 D1 DE 69841238D1
Authority
DE
Germany
Prior art keywords
patterns
production
applications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69841238T
Other languages
English (en)
Inventor
Hironori Kobayashi
Manabu Yamamoto
Daigo Aoki
Hironori Kamiyama
Shinichi Hikosaka
Mitsuhiro Kashiwabara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP16539298A external-priority patent/JP3384544B2/ja
Priority claimed from JP16731698A external-priority patent/JP3920461B2/ja
Priority claimed from JP18337098A external-priority patent/JP3343811B2/ja
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE69841238D1 publication Critical patent/DE69841238D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/006—Printing plates or foils; Materials therefor made entirely of inorganic materials other than natural stone or metals, e.g. ceramics, carbide materials, ferroelectric materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE69841238T 1997-08-08 1998-08-10 Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen Expired - Lifetime DE69841238D1 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP21484597 1997-08-08
JP30029597 1997-10-31
JP31304197 1997-11-14
JP10036998 1998-03-27
JP8629398 1998-03-31
JP8595598 1998-03-31
JP16539298A JP3384544B2 (ja) 1997-08-08 1998-06-12 パターン形成体およびパターン形成方法
JP16731698A JP3920461B2 (ja) 1998-06-15 1998-06-15 レンズおよびその製造方法
JP18337098A JP3343811B2 (ja) 1997-10-31 1998-06-15 カラーフィルタの製造方法
PCT/JP1998/003547 WO1999008158A1 (fr) 1997-08-08 1998-08-10 Corps de formation de motifs, procede de formation de motifs et leurs applications

Publications (1)

Publication Number Publication Date
DE69841238D1 true DE69841238D1 (de) 2009-11-26

Family

ID=27577233

Family Applications (6)

Application Number Title Priority Date Filing Date
DE69841944T Expired - Lifetime DE69841944D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung
DE69841948T Expired - Lifetime DE69841948D1 (de) 1997-08-08 1998-08-10 Lithographieplatte und Verfahren zu derer Herstellung
DE69841945T Expired - Lifetime DE69841945D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung
DE69841946T Expired - Lifetime DE69841946D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung, und deren Anwendung
DE69841947T Expired - Lifetime DE69841947D1 (de) 1997-08-08 1998-08-10 Verfahren zur Herstellung einer Linse
DE69841238T Expired - Lifetime DE69841238D1 (de) 1997-08-08 1998-08-10 Objekt zur erzeugung von mustern, methode zur erzeugung von mustern, sowie deren anwendungen

Family Applications Before (5)

Application Number Title Priority Date Filing Date
DE69841944T Expired - Lifetime DE69841944D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung
DE69841948T Expired - Lifetime DE69841948D1 (de) 1997-08-08 1998-08-10 Lithographieplatte und Verfahren zu derer Herstellung
DE69841945T Expired - Lifetime DE69841945D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung und deren Anwendung
DE69841946T Expired - Lifetime DE69841946D1 (de) 1997-08-08 1998-08-10 Struktur zur Musterbildung, Verfahren zur Musterbildung, und deren Anwendung
DE69841947T Expired - Lifetime DE69841947D1 (de) 1997-08-08 1998-08-10 Verfahren zur Herstellung einer Linse

Country Status (4)

Country Link
US (11) US6294313B1 (de)
EP (7) EP1376224B1 (de)
DE (6) DE69841944D1 (de)
WO (1) WO1999008158A1 (de)

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EP0932081B1 (de) 2009-10-14
EP1376229A1 (de) 2004-01-02
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US20080085478A1 (en) 2008-04-10
US20080043337A1 (en) 2008-02-21
US20080070156A1 (en) 2008-03-20
WO1999008158A1 (fr) 1999-02-18
EP0932081A4 (de) 2001-09-05
EP1376229B1 (de) 2010-10-13
US20080026304A1 (en) 2008-01-31
US20090233243A1 (en) 2009-09-17
EP1376226A1 (de) 2004-01-02
EP1376228B1 (de) 2010-10-13
DE69841948D1 (de) 2010-11-25
US7998662B2 (en) 2011-08-16
DE69841945D1 (de) 2010-11-25
EP1376225B1 (de) 2010-10-13
US20100112311A1 (en) 2010-05-06
US7965446B2 (en) 2011-06-21
EP1376225A1 (de) 2004-01-02
EP1376224B1 (de) 2010-10-13
DE69841944D1 (de) 2010-11-25
EP0932081A1 (de) 1999-07-28
US6294313B1 (en) 2001-09-25
US8785108B2 (en) 2014-07-22
US7943275B2 (en) 2011-05-17
EP1376224A1 (de) 2004-01-02
US20080023858A1 (en) 2008-01-31
US20080081283A1 (en) 2008-04-03
US20080254394A1 (en) 2008-10-16
US20020006558A1 (en) 2002-01-17
DE69841947D1 (de) 2010-11-25
EP1376226B1 (de) 2010-10-13
US8815130B2 (en) 2014-08-26
US8268546B2 (en) 2012-09-18
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