DE69319954T2 - Verfahren zur Herstellung einer vorsensibilisierten Platte - Google Patents
Verfahren zur Herstellung einer vorsensibilisierten PlatteInfo
- Publication number
- DE69319954T2 DE69319954T2 DE1993619954 DE69319954T DE69319954T2 DE 69319954 T2 DE69319954 T2 DE 69319954T2 DE 1993619954 DE1993619954 DE 1993619954 DE 69319954 T DE69319954 T DE 69319954T DE 69319954 T2 DE69319954 T2 DE 69319954T2
- Authority
- DE
- Germany
- Prior art keywords
- group
- sho
- plate
- compounds
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000010410 layer Substances 0.000 claims description 71
- 229910052782 aluminium Inorganic materials 0.000 claims description 63
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 62
- 150000001875 compounds Chemical class 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 42
- 239000000243 solution Substances 0.000 claims description 41
- 229920005989 resin Polymers 0.000 claims description 36
- 239000011347 resin Substances 0.000 claims description 36
- 238000011282 treatment Methods 0.000 claims description 35
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 32
- 239000007864 aqueous solution Substances 0.000 claims description 27
- -1 alkoxy-1 Chemical group 0.000 claims description 23
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 16
- 150000003839 salts Chemical class 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 11
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 5
- 150000001491 aromatic compounds Chemical class 0.000 claims description 5
- 229910017604 nitric acid Inorganic materials 0.000 claims description 5
- 150000007824 aliphatic compounds Chemical class 0.000 claims description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 125000004423 acyloxy group Chemical group 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000000732 arylene group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 229940114081 cinnamate Drugs 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- 239000012044 organic layer Substances 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims description 2
- 239000011260 aqueous acid Substances 0.000 claims 2
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical class CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 claims 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 17
- 239000000758 substrate Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 238000007788 roughening Methods 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000000975 dye Substances 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000003792 electrolyte Substances 0.000 description 9
- 239000003921 oil Substances 0.000 description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 239000003513 alkali Substances 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 239000004115 Sodium Silicate Substances 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229910052911 sodium silicate Inorganic materials 0.000 description 6
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 6
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000010802 sludge Substances 0.000 description 5
- 239000011573 trace mineral Substances 0.000 description 5
- 235000013619 trace mineral Nutrition 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001241 acetals Chemical class 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000004185 ester group Chemical group 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 235000011167 hydrochloric acid Nutrition 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical group OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- HSJKGGMUJITCBW-UHFFFAOYSA-N 3-hydroxybutanal Chemical compound CC(O)CC=O HSJKGGMUJITCBW-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 2
- 239000001117 sulphuric acid Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- TZTBGPOKQFYJOV-UHFFFAOYSA-N (1,1-diethoxy-8-methyl-1-phenoxynonan-2-yl) hydrogen sulfate Chemical compound CCOC(C(CCCCCC(C)C)OS(=O)(=O)O)(OCC)OC1=CC=CC=C1 TZTBGPOKQFYJOV-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- CQGBQHVFCCEEPW-UHFFFAOYSA-N (4-nonylphenyl) hydrogen sulfate Chemical compound CCCCCCCCCC1=CC=C(OS(O)(=O)=O)C=C1 CQGBQHVFCCEEPW-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Polymers OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- DIYZUWALSKUDMZ-UHFFFAOYSA-N 2-phenylethyl hydrogen sulfate Chemical compound OS(=O)(=O)OCCC1=CC=CC=C1 DIYZUWALSKUDMZ-UHFFFAOYSA-N 0.000 description 1
- LBBOQIHGWMYDPM-UHFFFAOYSA-N 2-tert-butylphenol;formaldehyde Chemical compound O=C.CC(C)(C)C1=CC=CC=C1O LBBOQIHGWMYDPM-UHFFFAOYSA-N 0.000 description 1
- CXJAFLQWMOMYOW-UHFFFAOYSA-N 3-chlorofuran-2,5-dione Chemical compound ClC1=CC(=O)OC1=O CXJAFLQWMOMYOW-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 1
- WQTCZINVPXJNEL-UHFFFAOYSA-N 4-amino-3-methylbenzenesulfonic acid Chemical compound CC1=CC(S(O)(=O)=O)=CC=C1N WQTCZINVPXJNEL-UHFFFAOYSA-N 0.000 description 1
- VZLUGGCFYPMLMI-UHFFFAOYSA-N 5-(3,5-dihydroxyphenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC(C=2C=C(O)C=C(O)C=2)=C1 VZLUGGCFYPMLMI-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VKOUCJUTMGHNOR-UHFFFAOYSA-N Diphenolic acid Chemical compound C=1C=C(O)C=CC=1C(CCC(O)=O)(C)C1=CC=C(O)C=C1 VKOUCJUTMGHNOR-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052915 alkaline earth metal silicate Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- SODJJEXAWOSSON-UHFFFAOYSA-N bis(2-hydroxy-4-methoxyphenyl)methanone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1O SODJJEXAWOSSON-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- UHWHMHPXHWHWPX-UHFFFAOYSA-J dipotassium;oxalate;oxotitanium(2+) Chemical compound [K+].[K+].[Ti+2]=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O UHWHMHPXHWHWPX-UHFFFAOYSA-J 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- FCQJEPASRCXVCB-UHFFFAOYSA-N flavianic acid Chemical compound C1=C(S(O)(=O)=O)C=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FCQJEPASRCXVCB-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- USEUJPGSYMRJHM-UHFFFAOYSA-N formaldehyde;4-methylphenol Chemical compound O=C.CC1=CC=C(O)C=C1 USEUJPGSYMRJHM-UHFFFAOYSA-N 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- KVUAEFHJHLAYGM-UHFFFAOYSA-N hydroxysulfanylmethanol Chemical compound OCSO KVUAEFHJHLAYGM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 125000002092 orthoester group Chemical group 0.000 description 1
- 150000002905 orthoesters Chemical class 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000007793 ph indicator Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- SQTLECAKIMBJGK-UHFFFAOYSA-I potassium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[K+].[Ti+4] SQTLECAKIMBJGK-UHFFFAOYSA-I 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- NLLZTRMHNHVXJJ-UHFFFAOYSA-J titanium tetraiodide Chemical compound I[Ti](I)(I)I NLLZTRMHNHVXJJ-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8418192A JP2944296B2 (ja) | 1992-04-06 | 1992-04-06 | 感光性平版印刷版の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69319954D1 DE69319954D1 (de) | 1998-09-03 |
| DE69319954T2 true DE69319954T2 (de) | 1998-12-10 |
Family
ID=13823315
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1993619954 Expired - Fee Related DE69319954T2 (de) | 1992-04-06 | 1993-04-02 | Verfahren zur Herstellung einer vorsensibilisierten Platte |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0565006B1 (enrdf_load_stackoverflow) |
| JP (1) | JP2944296B2 (enrdf_load_stackoverflow) |
| DE (1) | DE69319954T2 (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997019819A1 (en) * | 1995-11-24 | 1997-06-05 | Horsell Graphic Industries Limited | Hydrophilized support for planographic printing plates and its preparation |
| GB9624224D0 (en) | 1996-11-21 | 1997-01-08 | Horsell Graphic Ind Ltd | Planographic printing |
| GB9702568D0 (en) * | 1997-02-07 | 1997-03-26 | Horsell Graphic Ind Ltd | Planographic printing |
| GB9710552D0 (en) * | 1997-05-23 | 1997-07-16 | Horsell Graphic Ind Ltd | Planographic printing |
| US6357351B1 (en) | 1997-05-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Substrate for planographic printing |
| JP3830114B2 (ja) * | 1997-09-29 | 2006-10-04 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| ATE336390T1 (de) * | 1998-12-22 | 2006-09-15 | Fuji Photo Film Co Ltd | Verfahren zur herstellung einer lichtempfindlichen flachdruckplatte |
| US6293197B1 (en) | 1999-08-17 | 2001-09-25 | Kodak Polychrome Graphics | Hydrophilized substrate for planographic printing |
| JP4268345B2 (ja) * | 2001-04-20 | 2009-05-27 | 富士フイルム株式会社 | 平版印刷版用支持体 |
| JP2004106200A (ja) | 2002-09-13 | 2004-04-08 | Fuji Photo Film Co Ltd | 平版印刷版用支持体、その製造方法および平版印刷版原版 |
| EP1974912A1 (en) * | 2007-03-30 | 2008-10-01 | Agfa Graphics N.V. | A method for making a lithographic printing plate precursor. |
Family Cites Families (142)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE596731C (de) | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| NL70798C (enrdf_load_stackoverflow) | 1948-10-15 | |||
| NL78723C (enrdf_load_stackoverflow) | 1949-07-23 | |||
| BE506677A (enrdf_load_stackoverflow) | 1950-10-31 | |||
| NL95406C (enrdf_load_stackoverflow) | 1954-08-20 | |||
| US2922715A (en) * | 1956-03-26 | 1960-01-26 | Polychrome Corp | Presensitized printing plate and method for preparing same |
| NL247405A (enrdf_load_stackoverflow) | 1959-01-15 | |||
| NL130248C (enrdf_load_stackoverflow) | 1959-01-21 | |||
| US3126281A (en) | 1959-02-04 | 1964-03-24 | Formula | |
| BE593836A (enrdf_load_stackoverflow) | 1959-08-05 | |||
| NL255348A (enrdf_load_stackoverflow) | 1959-08-29 | |||
| GB1074392A (en) | 1960-08-05 | 1967-07-05 | Kalle Ag | Planographic printing plates |
| NL273557A (enrdf_load_stackoverflow) | 1961-01-25 | |||
| NL292007A (enrdf_load_stackoverflow) | 1962-04-27 | |||
| US3181461A (en) | 1963-05-23 | 1965-05-04 | Howard A Fromson | Photographic plate |
| US3387976A (en) | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
| GB1053866A (enrdf_load_stackoverflow) | 1964-08-05 | |||
| JPS459610B1 (enrdf_load_stackoverflow) | 1965-07-19 | 1970-04-07 | ||
| NL136645C (enrdf_load_stackoverflow) | 1966-12-12 | |||
| GB1235281A (en) | 1967-02-18 | 1971-06-09 | Howson Algraphy Ltd | Improvements in or relating to lithographic printing plates |
| DE1807644A1 (de) | 1967-11-21 | 1969-08-28 | Eastman Kodak Co | Verwendung von lichtempfindlichen,filmbildenden Polymerisaten aus Aminostyrolen zur Herstellung von lichtempfindlichen Schichten lichtempfindlicher Aufzeichnungsmaterialien |
| GB1227602A (enrdf_load_stackoverflow) | 1967-11-24 | 1971-04-07 | ||
| US3573917A (en) | 1968-07-12 | 1971-04-06 | Takashi Okamoto | Light-sensitive printing plate composition |
| NL174835C (nl) | 1969-05-20 | 1984-08-16 | Hoechst Ag | Werkwijze voor het bereiden van een lichtgevoelig condensatieprodukt van een aromatische diazoniumverbinding. |
| US3679419A (en) | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| NL168631C (nl) | 1969-05-20 | 1982-04-16 | Hoechst Ag | Registreermateriaal bestaande uit een drager waarop een laag is aangebracht die een lichtgevoelig condensatieprodukt van een diazoniumverbinding bevat. |
| JPS492284B1 (enrdf_load_stackoverflow) | 1969-05-30 | 1974-01-19 | ||
| US3837860A (en) | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| BE754204A (fr) | 1969-08-01 | 1971-02-01 | Eastman Kodak Co | Nouveaux polymeres photosensibles et leur application photographique |
| US3660097A (en) | 1969-11-28 | 1972-05-02 | Polychrome Corp | Diazo-polyurethane light-sensitive compositions |
| JPS4917481B1 (enrdf_load_stackoverflow) | 1970-02-17 | 1974-05-01 | ||
| GB1341004A (en) | 1970-05-11 | 1973-12-19 | Nippon Oil Seal Ind Co Ltd | Preparation of polymeric esters |
| JPS505084B1 (enrdf_load_stackoverflow) | 1970-09-16 | 1975-02-28 | ||
| JPS505083B1 (enrdf_load_stackoverflow) | 1970-09-16 | 1975-02-28 | ||
| JPS5025841B1 (enrdf_load_stackoverflow) | 1971-03-11 | 1975-08-27 | ||
| US3751257A (en) | 1971-04-16 | 1973-08-07 | Minnesota Mining & Mfg | Polyamide-diazo resin composition |
| US3785825A (en) | 1971-07-19 | 1974-01-15 | Polychrome Corp | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate |
| DE2150691C2 (de) | 1971-10-12 | 1982-09-09 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches Gemisch und Verwendung eines lichtempfindlichen Gemisches zur Herstellung einer Flachdruckplatte |
| BE790383A (fr) | 1971-10-22 | 1973-02-15 | Howson Algraphy Ltd | Matière sensibles à la lumière |
| JPS5429922B2 (enrdf_load_stackoverflow) | 1971-12-13 | 1979-09-27 | ||
| JPS5423571B2 (enrdf_load_stackoverflow) | 1971-12-13 | 1979-08-15 | ||
| US3779778A (en) | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
| BE795809A (fr) | 1972-02-22 | 1973-08-22 | Eastman Kodak Co | Nouveaux polymeres photosensibles a groupes o-quinone diazide |
| JPS51483B2 (enrdf_load_stackoverflow) | 1972-08-18 | 1976-01-08 | ||
| US4072527A (en) | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
| US4072528A (en) | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
| GB1412004A (en) * | 1972-10-05 | 1975-10-29 | Oce Van Der Grinten Nv | Process for preparing presensitised printing plates and printing plates obtained thereby |
| JPS514121B2 (enrdf_load_stackoverflow) | 1973-04-23 | 1976-02-09 | ||
| JPS5012580A (enrdf_load_stackoverflow) | 1973-05-31 | 1975-02-08 | ||
| DE2329918A1 (de) | 1973-06-12 | 1975-01-09 | Bbc Brown Boveri & Cie | Zuendsystem fuer brennkraftmaschinen |
| DE2331377C2 (de) | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| JPS5116802B2 (enrdf_load_stackoverflow) | 1973-11-28 | 1976-05-27 | ||
| JPS5084303A (enrdf_load_stackoverflow) | 1973-11-28 | 1975-07-08 | ||
| JPS50113303A (enrdf_load_stackoverflow) | 1974-02-22 | 1975-09-05 | ||
| US4123276A (en) | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| US4123279A (en) | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
| GB1513368A (en) | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
| JPS5132331A (en) | 1974-09-11 | 1976-03-18 | Konishiroku Photo Ind | Kankoseisoseibutsu |
| JPS5134711A (en) | 1974-09-18 | 1976-03-24 | Konishiroku Photo Ind | Kankoseisoseibutsu |
| JPS5136128A (en) | 1974-09-20 | 1976-03-26 | Konishiroku Photo Ind | Kankoseisoseibutsu |
| JPS51111102A (en) | 1975-03-24 | 1976-10-01 | Fuji Photo Film Co Ltd | Photosensitive printing plates |
| CH621416A5 (enrdf_load_stackoverflow) | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
| JPS51139402A (en) | 1975-05-24 | 1976-12-01 | Tokyo Ouka Kougiyou Kk | Positive photooresist composition |
| JPS51143409A (en) | 1975-06-04 | 1976-12-09 | Fuji Photo Film Co Ltd | Method of making lithographic press plate |
| JPS5280022A (en) | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
| US4101326A (en) | 1976-02-09 | 1978-07-18 | Eastman Kodak Company | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters |
| JPS5312984A (en) | 1976-07-21 | 1978-02-06 | Konishiroku Photo Ind | Photosensitive composition |
| DE2641100C2 (de) | 1976-09-13 | 1987-02-26 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
| JPS5344202A (en) | 1976-10-01 | 1978-04-20 | Fuji Photo Film Co Ltd | Developer composition and developing method |
| DE2718254C3 (de) | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
| JPS548002A (en) | 1977-06-17 | 1979-01-22 | Fuji Photo Film Co Ltd | Method of developing flat printing plate |
| JPS5462004A (en) | 1977-10-24 | 1979-05-18 | Fuji Photo Film Co Ltd | Method of developing flat positive printing plate |
| US4259434A (en) | 1977-10-24 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for developing positive acting light-sensitive planographic printing plate |
| JPS5474728A (en) | 1977-11-28 | 1979-06-15 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS5936259B2 (ja) | 1978-04-11 | 1984-09-03 | コニカ株式会社 | 印刷版の形成方法 |
| JPS55105581A (en) | 1979-02-09 | 1980-08-13 | Fuji Photo Film Co Ltd | Protecting agent for surface of form for lithographic printing |
| JPS5573590A (en) | 1978-11-29 | 1980-06-03 | Fuji Photo Film Co Ltd | Protective agent for planographic printing plate |
| DE2829512A1 (de) | 1978-07-05 | 1980-01-17 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
| DE2829511A1 (de) | 1978-07-05 | 1980-01-24 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
| JPS5512974A (en) | 1978-07-15 | 1980-01-29 | Konishiroku Photo Ind Co Ltd | Photosensitive printing plate |
| JPS5925217B2 (ja) | 1979-02-08 | 1984-06-15 | コニカ株式会社 | 印刷版の形成方法 |
| JPS55115045A (en) | 1979-02-27 | 1980-09-04 | Fuji Photo Film Co Ltd | Printing plate preparation |
| JPS55121447A (en) | 1979-03-15 | 1980-09-18 | Fuji Photo Film Co Ltd | Lithographic printing plate correcting agent |
| DE2928636A1 (de) | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
| DE2949826A1 (de) | 1979-12-12 | 1981-06-19 | Hoechst Ag, 6230 Frankfurt | Material fuer elektrophotographische reproduktion |
| JPS56121031A (en) | 1980-02-28 | 1981-09-22 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS56146145A (en) | 1980-04-15 | 1981-11-13 | Dainippon Ink & Chem Inc | Material for lithographic plate |
| JPS5734558A (en) | 1980-08-11 | 1982-02-24 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| DE3040156A1 (de) | 1980-10-24 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| JPS57147656A (en) | 1981-03-09 | 1982-09-11 | Fuji Photo Film Co Ltd | Electrophotographic sensitive printing plate material |
| JPS57161863A (en) | 1981-03-31 | 1982-10-05 | Mitsubishi Paper Mills Ltd | Manufacture of printing plate |
| JPS58100862A (ja) | 1981-12-11 | 1983-06-15 | Fuji Photo Film Co Ltd | 電子写真印刷版材料およびそれを用いる印刷版の製造方法 |
| JPS58150948A (ja) | 1982-03-03 | 1983-09-07 | Dainippon Ink & Chem Inc | 感光性組成物 |
| US4376814A (en) * | 1982-03-18 | 1983-03-15 | American Hoechst Corporation | Ceramic deposition on aluminum |
| JPS58175695A (ja) | 1982-03-29 | 1983-10-14 | Konishiroku Photo Ind Co Ltd | 製版方法 |
| JPS59165053A (ja) | 1983-03-11 | 1984-09-18 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| JPS58203434A (ja) | 1982-05-24 | 1983-11-26 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
| JPS5958431A (ja) | 1982-09-29 | 1984-04-04 | Konishiroku Photo Ind Co Ltd | 平版印刷版の製版方法 |
| JPS59101651A (ja) * | 1982-12-02 | 1984-06-12 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS603626A (ja) | 1983-06-22 | 1985-01-10 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS6037549A (ja) | 1983-08-10 | 1985-02-26 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS60121446A (ja) | 1983-12-06 | 1985-06-28 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS6010247A (ja) | 1983-06-29 | 1985-01-19 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
| JPS60121445A (ja) | 1983-12-06 | 1985-06-28 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感光性樹脂組成物 |
| JPS60134235A (ja) | 1983-12-23 | 1985-07-17 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| JPS60163043A (ja) | 1984-02-06 | 1985-08-24 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| DE3569703D1 (en) * | 1984-01-17 | 1989-06-01 | Fuji Photo Film Co Ltd | Presensitized plate having an anodized aluminum base with an improved hydrophilic layer |
| JPS60232998A (ja) | 1984-05-04 | 1985-11-19 | Fuji Photo Film Co Ltd | 平版印刷版用支持体 |
| DE3417951A1 (de) | 1984-05-15 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Elektrophotographisches aufzeichnungsmaterial |
| JPS61118744A (ja) | 1984-11-15 | 1986-06-06 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
| JPS61143748A (ja) | 1984-12-17 | 1986-07-01 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS61151644A (ja) | 1984-12-26 | 1986-07-10 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS61159655A (ja) | 1985-01-07 | 1986-07-19 | Fuji Photo Film Co Ltd | 製版方法 |
| JPS61243446A (ja) | 1985-04-19 | 1986-10-29 | Konishiroku Photo Ind Co Ltd | 感光性組成物及びポジ型感光性平版印刷版 |
| JPS627595A (ja) | 1985-07-04 | 1987-01-14 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| JPS6210646A (ja) | 1985-07-09 | 1987-01-19 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
| JPS6210645A (ja) | 1985-07-09 | 1987-01-19 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
| JPS6211693A (ja) | 1985-07-10 | 1987-01-20 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| JPS6219494A (ja) | 1985-07-18 | 1987-01-28 | Fuji Photo Film Co Ltd | 平版印刷版用支持体 |
| JPS6231859A (ja) | 1985-08-01 | 1987-02-10 | Fuji Photo Film Co Ltd | 製版方法 |
| JPS6283194A (ja) | 1985-10-09 | 1987-04-16 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| JPS62153950A (ja) | 1985-12-27 | 1987-07-08 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
| JPH083630B2 (ja) | 1986-01-23 | 1996-01-17 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPS62178562A (ja) | 1986-01-30 | 1987-08-05 | Japan Synthetic Rubber Co Ltd | １，２−キノンジアジド化合物の製造方法 |
| JPS62194257A (ja) | 1986-02-20 | 1987-08-26 | Dainippon Ink & Chem Inc | 電子写真用感光体 |
| JPH065384B2 (ja) | 1986-06-12 | 1994-01-19 | 富士写真フイルム株式会社 | 感光性印刷版 |
| JPS6358440A (ja) | 1986-08-29 | 1988-03-14 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JP2516022B2 (ja) | 1987-07-17 | 1996-07-10 | 富士写真フイルム株式会社 | 感光性平版印刷版自動現像装置の現像補充液補充方法 |
| JPH0814696B2 (ja) | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
| JPH0769605B2 (ja) | 1988-02-25 | 1995-07-31 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH027054A (ja) | 1988-06-27 | 1990-01-11 | Fuji Photo Film Co Ltd | 感光性平版印刷自動現像機 |
| JPH0232357A (ja) | 1988-07-21 | 1990-02-02 | Konica Corp | 感光性平版印刷版の処理方法及び処理装置 |
| JP2587695B2 (ja) * | 1989-01-12 | 1997-03-05 | 富士写真フイルム株式会社 | 平版印刷版用支持体の製造方法 |
| JP2607168B2 (ja) | 1989-05-24 | 1997-05-07 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH0390388A (ja) | 1989-09-01 | 1991-04-16 | Konica Corp | 感光性平版印刷版の処理方法 |
| JP2681418B2 (ja) | 1990-02-21 | 1997-11-26 | 富士写真フイルム株式会社 | 平版印刷版の製造方法 |
| JPH03253857A (ja) | 1990-03-05 | 1991-11-12 | Fuji Photo Film Co Ltd | 感光性組成物 |
| US5254430A (en) * | 1991-01-31 | 1993-10-19 | Fuji Photo Film Co., Ltd. | Presensitized plate having anodized aluminum substrate, hydrophilic layer containing phosphonic or phosphinic compound and photosensitive layer containing O-quinone diazide compound |
| US5230988A (en) | 1991-03-12 | 1993-07-27 | Fuji Photo Film Co., Ltd. | Method of making lithographic printing plate |
| JP3718015B2 (ja) | 1996-11-19 | 2005-11-16 | 株式会社ルネサステクノロジ | メモリモジュールおよびプリント基板 |
| JP3717162B2 (ja) | 2002-11-13 | 2005-11-16 | 三興繊維協同組合 | 引き上げ式カーテン装置 |
| US8059420B2 (en) | 2003-07-22 | 2011-11-15 | Murata Manufacturing Co., Ltd. | Surface mountable device |
-
1992
- 1992-04-06 JP JP8418192A patent/JP2944296B2/ja not_active Expired - Fee Related
-
1993
- 1993-04-02 DE DE1993619954 patent/DE69319954T2/de not_active Expired - Fee Related
- 1993-04-02 EP EP19930105536 patent/EP0565006B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0565006A3 (enrdf_load_stackoverflow) | 1994-02-23 |
| DE69319954D1 (de) | 1998-09-03 |
| EP0565006A2 (en) | 1993-10-13 |
| JPH05278362A (ja) | 1993-10-26 |
| JP2944296B2 (ja) | 1999-08-30 |
| EP0565006B1 (en) | 1998-07-29 |
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Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
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