JPS5312984A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5312984A
JPS5312984A JP8687576A JP8687576A JPS5312984A JP S5312984 A JPS5312984 A JP S5312984A JP 8687576 A JP8687576 A JP 8687576A JP 8687576 A JP8687576 A JP 8687576A JP S5312984 A JPS5312984 A JP S5312984A
Authority
JP
Japan
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8687576A
Other languages
Japanese (ja)
Other versions
JPS565983B2 (en
Inventor
Yoshio Kurita
Akio Iwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP8687576A priority Critical patent/JPS5312984A/en
Priority to DE19772733005 priority patent/DE2733005C3/en
Priority to GB3074577A priority patent/GB1580959A/en
Publication of JPS5312984A publication Critical patent/JPS5312984A/en
Publication of JPS565983B2 publication Critical patent/JPS565983B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
JP8687576A 1976-07-21 1976-07-21 Photosensitive composition Granted JPS5312984A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8687576A JPS5312984A (en) 1976-07-21 1976-07-21 Photosensitive composition
DE19772733005 DE2733005C3 (en) 1976-07-21 1977-07-21 Photosensitive mass
GB3074577A GB1580959A (en) 1976-07-21 1977-07-21 Substituted acrylamide and polymers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8687576A JPS5312984A (en) 1976-07-21 1976-07-21 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5312984A true JPS5312984A (en) 1978-02-06
JPS565983B2 JPS565983B2 (en) 1981-02-07

Family

ID=13898990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8687576A Granted JPS5312984A (en) 1976-07-21 1976-07-21 Photosensitive composition

Country Status (3)

Country Link
JP (1) JPS5312984A (en)
DE (1) DE2733005C3 (en)
GB (1) GB1580959A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4981555A (en) * 1972-12-09 1974-08-06
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
WO2006106629A1 (en) * 2005-03-31 2006-10-12 Toyo Gosei Co., Ltd. Photosensitive resin, photosensitive composition and photocrosslinked item
WO2009119430A1 (en) 2008-03-25 2009-10-01 富士フイルム株式会社 Process for producing lithographic printing plate
WO2009119687A1 (en) 2008-03-25 2009-10-01 富士フイルム株式会社 Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3541534A1 (en) * 1985-11-25 1987-05-27 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
JP4036440B2 (en) * 2002-03-29 2008-01-23 東洋合成工業株式会社 Novel photosensitive compound, photosensitive resin and photosensitive composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5084206A (en) * 1973-11-24 1975-07-08
JPS5146204A (en) * 1974-10-14 1976-04-20 Konishiroku Photo Ind KANKOSEISOSEIBUTSU

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2134333A1 (en) * 1970-07-10 1972-01-20 Agency Of Industrial Science And Technology, Tokio Light sensitive compsn with azido substd polymeric structure
BE790383A (en) * 1971-10-22 1973-02-15 Howson Algraphy Ltd Light sensitive material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5084206A (en) * 1973-11-24 1975-07-08
JPS5146204A (en) * 1974-10-14 1976-04-20 Konishiroku Photo Ind KANKOSEISOSEIBUTSU

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4981555A (en) * 1972-12-09 1974-08-06
JPS5412544B2 (en) * 1972-12-09 1979-05-23
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
WO2006106629A1 (en) * 2005-03-31 2006-10-12 Toyo Gosei Co., Ltd. Photosensitive resin, photosensitive composition and photocrosslinked item
KR100817619B1 (en) 2005-03-31 2008-03-31 도요 고세이 고교 가부시키가이샤 Photosensitive resin, photosensitive composition and photocrosslinked item
WO2009119430A1 (en) 2008-03-25 2009-10-01 富士フイルム株式会社 Process for producing lithographic printing plate
WO2009119687A1 (en) 2008-03-25 2009-10-01 富士フイルム株式会社 Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate

Also Published As

Publication number Publication date
GB1580959A (en) 1980-12-10
DE2733005B2 (en) 1981-01-29
JPS565983B2 (en) 1981-02-07
DE2733005C3 (en) 1981-11-05
DE2733005A1 (en) 1978-01-26

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