NL292007A - - Google Patents

Info

Publication number
NL292007A
NL292007A NL292007DA NL292007A NL 292007 A NL292007 A NL 292007A NL 292007D A NL292007D A NL 292007DA NL 292007 A NL292007 A NL 292007A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL292007A publication Critical patent/NL292007A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL292007D 1962-04-27 NL292007A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27

Publications (1)

Publication Number Publication Date
NL292007A true NL292007A (enrdf_load_stackoverflow)

Family

ID=22702786

Family Applications (1)

Application Number Title Priority Date Filing Date
NL292007D NL292007A (enrdf_load_stackoverflow) 1962-04-27

Country Status (7)

Country Link
CH (1) CH439959A (enrdf_load_stackoverflow)
DE (1) DE1447022B2 (enrdf_load_stackoverflow)
DK (1) DK106257C (enrdf_load_stackoverflow)
ES (1) ES286983A1 (enrdf_load_stackoverflow)
GB (1) GB1041463A (enrdf_load_stackoverflow)
NL (1) NL292007A (enrdf_load_stackoverflow)
SE (1) SE306233B (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
EP0041984B1 (en) * 1979-12-07 1984-09-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
ZA821588B (en) * 1981-03-24 1983-02-23 Sensitisers Ltd Photosensitive relief image-forming materials
DE3222684A1 (de) * 1981-06-19 1983-05-05 Sericol Group Ltd., London Lichtempfindliche zubereitung und deren verwendung
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61107352A (ja) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd ポジ型平版印刷版材料
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
JPH0642071B2 (ja) * 1985-11-09 1994-06-01 コニカ株式会社 感光性組成物および感光性平版印刷版
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
CN101813888B (zh) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 一种重氮感光胶热稳定性和光化学活性的调控方法

Also Published As

Publication number Publication date
SE306233B (enrdf_load_stackoverflow) 1968-11-18
CH439959A (de) 1967-07-15
DE1447022A1 (de) 1968-11-28
DK106257C (da) 1967-01-09
GB1041463A (en) 1966-09-07
DE1447022B2 (de) 1971-11-25
ES286983A1 (es) 1963-12-01

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