GB1041463A - Light-sensitive diazo material - Google Patents

Light-sensitive diazo material

Info

Publication number
GB1041463A
GB1041463A GB1677063A GB1677063A GB1041463A GB 1041463 A GB1041463 A GB 1041463A GB 1677063 A GB1677063 A GB 1677063A GB 1677063 A GB1677063 A GB 1677063A GB 1041463 A GB1041463 A GB 1041463A
Authority
GB
United Kingdom
Prior art keywords
diazo
yellow
light
compound
april
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1677063A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of GB1041463A publication Critical patent/GB1041463A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

1,041,463. Photographic diazo materials. MINNESOTA MINING & MANUFACTURING CO. April 29, 1963 [April 27, 1962], No. 16770/63. Heading G2C. Photographic material comprises a base sheet carrying a light-sensitive composition comprising a diazo compound and an acid-base indicator. Alternatively, the diazo compound and indicator may be combined in a single compound. The material gives a visible image directly on exposure to light. The diazo compound may be a diazonium salt, a diazo resin (e.g. the condensation product of p-diazo-diphenylamine and formaldehyde) or a diazo oxide. Indicators specified are metanil yellow, 4-phenylazodiphenylamine, resazurin, quinaldine Red, Methyl Orange, Bromophenol Blue, alizarin, Cresol Red, Phenol Red, Methyl Yellow, Orange IV: Easin Yellow and phenolphthalein. Alternatively, the metanil yellow salt of a diazo resin may be used. The support may be a lithographic plate of aluminium which may be surface treated, e.g. by cleaning in aqueous trisodium phosphate followed by treatment with phosphotungstic acid, or as described in Specification 815,471.
GB1677063A 1962-04-27 1963-04-29 Light-sensitive diazo material Expired GB1041463A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27

Publications (1)

Publication Number Publication Date
GB1041463A true GB1041463A (en) 1966-09-07

Family

ID=22702786

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1677063A Expired GB1041463A (en) 1962-04-27 1963-04-29 Light-sensitive diazo material

Country Status (7)

Country Link
CH (1) CH439959A (en)
DE (1) DE1447022B2 (en)
DK (1) DK106257C (en)
ES (1) ES286983A1 (en)
GB (1) GB1041463A (en)
NL (1) NL292007A (en)
SE (1) SE306233B (en)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3969118A (en) * 1973-06-20 1976-07-13 Hoechst Aktiengesellschaft Light-sensitive o-quinone diazide containing copying layer
WO1981001756A1 (en) * 1979-12-07 1981-06-25 Minnesota Mining & Mfg Diazonium imaging system
US4296194A (en) * 1977-04-12 1981-10-20 Vickers Limited Positive-working light sensitive diazo materials with azo dye
EP0061319A1 (en) * 1981-03-24 1982-09-29 Sensitisers (Research) Limited Photosensitive relief image-forming materials and method of forming relief images using same
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4457999A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light
US4458000A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US4912013A (en) * 1985-11-09 1990-03-27 Konishiroku Photo Industry Co., Ltd. Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
CN101813888A (en) * 2010-04-14 2010-08-25 东莞市三联科技实业有限公司 Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3969118A (en) * 1973-06-20 1976-07-13 Hoechst Aktiengesellschaft Light-sensitive o-quinone diazide containing copying layer
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
US4296194A (en) * 1977-04-12 1981-10-20 Vickers Limited Positive-working light sensitive diazo materials with azo dye
WO1981001756A1 (en) * 1979-12-07 1981-06-25 Minnesota Mining & Mfg Diazonium imaging system
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
EP0061319A1 (en) * 1981-03-24 1982-09-29 Sensitisers (Research) Limited Photosensitive relief image-forming materials and method of forming relief images using same
US4578341A (en) * 1981-03-24 1986-03-25 Sensitisers (Research) Ltd. Acidic photosensitive relief image-forming materials with indicator pigment or dye
US4564581A (en) * 1981-06-19 1986-01-14 Sericol Group Limited Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator
US4457999A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light
US4458000A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
JPH0431380B2 (en) * 1984-10-31 1992-05-26
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US5399463A (en) * 1985-05-02 1995-03-21 Ciba-Geigy Corporation Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer
WO1986007473A1 (en) * 1985-06-03 1986-12-18 Fairmount Chemical Co., Inc. Contrast enhancement layer
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US4912013A (en) * 1985-11-09 1990-03-27 Konishiroku Photo Industry Co., Ltd. Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
CN101813888A (en) * 2010-04-14 2010-08-25 东莞市三联科技实业有限公司 Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists
CN101813888B (en) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists

Also Published As

Publication number Publication date
NL292007A (en)
DE1447022A1 (en) 1968-11-28
DK106257C (en) 1967-01-09
DE1447022B2 (en) 1971-11-25
SE306233B (en) 1968-11-18
CH439959A (en) 1967-07-15
ES286983A1 (en) 1963-12-01

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