DK106257C - Diazo-sensitized, light-sensitive foil material. - Google Patents

Diazo-sensitized, light-sensitive foil material.

Info

Publication number
DK106257C
DK106257C DK184063A DK184063A DK106257C DK 106257 C DK106257 C DK 106257C DK 184063 A DK184063 A DK 184063A DK 184063 A DK184063 A DK 184063A DK 106257 C DK106257 C DK 106257C
Authority
DK
Denmark
Prior art keywords
diazo
sensitized
light
foil material
sensitive foil
Prior art date
Application number
DK184063A
Other languages
Danish (da)
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Application granted granted Critical
Publication of DK106257C publication Critical patent/DK106257C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DK184063A 1962-04-27 1963-04-19 Diazo-sensitized, light-sensitive foil material. DK106257C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27

Publications (1)

Publication Number Publication Date
DK106257C true DK106257C (en) 1967-01-09

Family

ID=22702786

Family Applications (1)

Application Number Title Priority Date Filing Date
DK184063A DK106257C (en) 1962-04-27 1963-04-19 Diazo-sensitized, light-sensitive foil material.

Country Status (7)

Country Link
CH (1) CH439959A (en)
DE (1) DE1447022B2 (en)
DK (1) DK106257C (en)
ES (1) ES286983A1 (en)
GB (1) GB1041463A (en)
NL (1) NL292007A (en)
SE (1) SE306233B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
DE3069247D1 (en) * 1979-12-07 1984-10-25 Minnesota Mining & Mfg Diazonium imaging system
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
ZA821588B (en) * 1981-03-24 1983-02-23 Sensitisers Ltd Photosensitive relief image-forming materials
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
DE3144499A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3144480A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JPH0642071B2 (en) * 1985-11-09 1994-06-01 コニカ株式会社 Photosensitive composition and photosensitive lithographic printing plate
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
CN101813888B (en) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists

Also Published As

Publication number Publication date
CH439959A (en) 1967-07-15
ES286983A1 (en) 1963-12-01
SE306233B (en) 1968-11-18
NL292007A (en)
DE1447022A1 (en) 1968-11-28
DE1447022B2 (en) 1971-11-25
GB1041463A (en) 1966-09-07

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