CN101813888B - Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists - Google Patents
Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists Download PDFInfo
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- CN101813888B CN101813888B CN2010101521169A CN201010152116A CN101813888B CN 101813888 B CN101813888 B CN 101813888B CN 2010101521169 A CN2010101521169 A CN 2010101521169A CN 201010152116 A CN201010152116 A CN 201010152116A CN 101813888 B CN101813888 B CN 101813888B
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- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000012954 diazonium Substances 0.000 title claims abstract description 14
- 230000000694 effects Effects 0.000 title abstract description 39
- 229920002120 photoresistant polymer Polymers 0.000 title abstract description 23
- 230000001105 regulatory effect Effects 0.000 title abstract description 9
- 230000001276 controlling effect Effects 0.000 title abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 title abstract 4
- 239000000839 emulsion Substances 0.000 claims abstract description 94
- 239000000084 colloidal system Substances 0.000 claims abstract description 56
- 239000011347 resin Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 10
- 239000003513 alkali Substances 0.000 claims abstract description 10
- 238000007650 screen-printing Methods 0.000 claims abstract description 6
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 74
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 26
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 26
- 238000005950 photosensitized reaction Methods 0.000 claims description 10
- 239000000243 solution Substances 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 claims description 4
- 229910000397 disodium phosphate Inorganic materials 0.000 claims description 4
- 235000019800 disodium phosphate Nutrition 0.000 claims description 4
- 239000001488 sodium phosphate Substances 0.000 claims description 4
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 235000017281 sodium acetate Nutrition 0.000 claims description 2
- 239000001632 sodium acetate Substances 0.000 claims description 2
- 229910000162 sodium phosphate Inorganic materials 0.000 claims description 2
- 235000011008 sodium phosphates Nutrition 0.000 claims description 2
- 230000002194 synthesizing effect Effects 0.000 claims description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- 238000004026 adhesive bonding Methods 0.000 description 18
- 238000011161 development Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000003860 storage Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 6
- 239000004677 Nylon Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229920001778 nylon Polymers 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000003292 glue Substances 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000001965 increasing effect Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N N-phenyl aniline Natural products C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- -1 diphenylamine diazonium salt Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Abstract
The invention relates to a method for regulating and controlling the heat stability and photochemical activity of diazonium photoresists, which is characterized in that: in colloid emulsion which is used for manufacturing screen printing halftone and takes polyving akohol as a photosensitive reaction component, before diazonium resin photosensitizer is added into the colloid emulsion, acid liquor or alkali liquor is added into the colloid emulsion first, so that the pH value of the colloid emulsion is adjusted between 3.0 and 5.0; and by the regulation and control, the diazonium photoresists with different degrees of heat stability and photochemical activity can be obtained according to requirements, and have the advantages of low cost and easy implementation.
Description
Technical field
The present invention relates to a kind of thermal stability of diazo photosensitive emulsion and photochemically reactive regulate and control method, belong to the screen printing technique field.
Background technology
Diazo photosensitive emulsion is easy to use, and price is suitable, and than environmental protection, is widely used in the production of plate-making, metal etch and printed circuit board (PCB) in the silk-screen printing technique etc.The diazo photosensitive emulsion preparation method of prior art generally is to be that the colloid emulsion of photosensitized reaction component adds a certain proportion of diazo resin photosensitizer with the polyvinyl alcohol (PVA).But general diazo resin is stable inadequately to heat, and after colloid emulsion added diazo resin, even under no optical condition, preserve, the performance owing to the effect of dark reaction to photoresists produced adverse influence.The dark reaction essence of diazo photosensitive emulsion is that wherein diazo resin decomposes because of the effect of heat; Producing in diazo resin free radical and the photoresists polyvinyl alcohol (PVA) reacts and makes it crosslinked; Therefore, the diazo photosensitive emulsion storage temperature is high more, and the time of placement is long more; Serious more to the diazo photosensitive emulsion Effect on Performance, cause finally that its viscosity increases, photochemical activity descends, water development fastness difference and can not using.
At present; Improve or prolong the diazo photosensitive emulsion holding time and keep its photochemically reactive method and mainly contain: after (1) colloid emulsion adds the diazo resin photosensitizer; Under lower temperature, preserve, this method can make the storage life of photoresists prolong, but fails to tackle the problem at its root; (2) in diazo photosensitive emulsion, add stabilizing agent such as polyvinylpyridine, do not see practicality but cost is higher; (3) synthetic low molecule diazo salt with special molecular structure such as substituted diphenylamine diazonium salt 3-methoxyl-to diphenylamine-4-diazonium salt etc., further synthetic again its polymeric diazo resin.Some research structures show that this type of diazo resin has stability preferably to heat; Be overcome diazo photosensitive emulsion to thermally labile with keep it stronger photochemically reactive better approach arranged; But because synthetic starting material and the method for using, cost is higher, also is difficult to apply.
Summary of the invention
The object of the present invention is to provide a kind of thermal stability of diazo photosensitive emulsion and photochemically reactive regulate and control method, this method can make diazo photosensitive emulsion have thermal stability and photochemical activity preferably, can obtain desirable effect as required.
For achieving the above object; Thermal stability of diazo photosensitive emulsion provided by the invention and photochemically reactive regulate and control method are: to make that screen printing screens uses with the colloid emulsion of polyvinyl alcohol (PVA) as the photosensitized reaction component; Before adding the diazo resin photosensitizer, the pH that adds acid solution or alkali lye adjusting colloid emulsion earlier is 3.0～5.0.
When the pH that regulates colloid emulsion is 3.5～4.2, when preferably pH is 3.8～4.0, can makes the diazo salt aqueous sensitizing glue of acquisition have thermal stability and stronger photochemical activity preferably, and there is long storage period.
When the pH that regulates colloid emulsion is 3.0～3.5, preferably pH is 3.2～3.4, can make diazo salt aqueous sensitizing glue have better thermal stability and more weak photochemical activity.
When the pH of alkali lye adjusting colloid emulsion is 4.3～5.0, preferably pH is 4.4～4.6, can make the diazo salt aqueous sensitizing glue of acquisition have general thermal stability and stronger photochemical activity.
The acid solution that the present invention adopts is the acid solution of broad sense, promptly shows the acid WS, and preferred, described acid solution is one or more in sulfuric acid, hydrochloric acid and the phosphate aqueous solution.
The alkali lye that the present invention adopts is the alkali lye of broad sense, promptly shows the WS of alkalescence, and is preferred, and described alkali lye is one or more in the WS of sodium acetate, sodium phosphate, sodium hydrogen phosphate.
The diazo resin photosensitizer of diazo resin photosensitizer of the present invention for synthesizing with right-diphenylamine-4-diazonium salt.
The thermal stability of diazo resin in the medium of different pH values is different with photochemical activity.PH value one timing of medium, temperature is high more, the easy more decomposition of diazo resin photosensitizer, the photochemical activity of diazo photosensitive emulsion prolongs with period of storage and weakens.And temperature one is regularly, the pH value of medium within the specific limits, the decomposition rate of diazo resin photosensitizer strengthens with the rising of pH value, the photochemical activity of diazo photosensitive emulsion also can weaken with the period of storage prolongation.Therefore, through being the regulation and control of pH value of colloid emulsion of the component of photosensitized reaction with the polyvinyl alcohol (PVA), can reach the thermal stability and the photochemically reactive purpose of regulation and control diazo photosensitive emulsion to what be used to make the silk-screen half tone.Because after colloid emulsion adds the diazo resin photosensitizer; They can decompose generation diazo resin free radical under the effect of heat; The diazo resin free radical that produces can with the hydroxyl reaction of polyvinyl alcohol (PVA) in the colloid emulsion, the viscosity of colloid emulsion is increased, photochemical reaction weakens.Therefore, generally all require diazo photosensitive emulsion that thermal stability and stronger photochemical activity are preferably arranged.
The present invention has the following advantages:
(1) through to make that screen printing screens uses with the regulation and control of polyvinyl alcohol (PVA) as the pH value of the colloid emulsion of the component of photosensitized reaction, can regulate and control the thermal stability and the photochemical activity of diazo photosensitive emulsion as required;
(2) the pH value of adjusting colloid emulsion is 3.5～4.2; Preferably 3.8～4.0; In such cases, it is long and performance is kept well that colloid emulsion adds storage period behind the diazo resin, and bake out temperature can improve after the half tone gluing; Drying time can prolong, and half tone oven dry back taking-up can be placed the long period and do not influenced exposure and water developable profermance;
(3) in some occasion, require adding diazo photosensitive emulsion has better thermal stability and more weak photochemical activity, and this moment, scalable colloid emulsion pH was 3.0～3.5, and preferably 3.2～3.4;
(4) if after hope adding the diazo resin photosensitizer general thermal stability and stronger photochemical activity are arranged, normally pH is 4.3～5.0, preferably 4.4～4.6.
Embodiment
Following examples only are used to set forth the present invention, and protection scope of the present invention is not only to be confined to following examples.Content disclosed by the invention and scope that each parameter is got more than the those of ordinary skill foundation of said technical field all can realize the object of the invention.
Embodiment 1
Get 950g what be used to prepare diazo photosensitive emulsion is the colloid emulsion of the component of photosensitized reaction with the polyvinyl alcohol (PVA), measure its pH value with pH meter or precision test paper, be higher than 3.9 as if the pH value, then carefully regulate its pH value most 3.9 with dilute sulfuric acid; If the pH value is lower than 3.9, using weight percentage is that 20% SAS is regulated its pH value to 3.9.Add the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance then; Stir 15min; Lucifuge is placed 30～60min to froth breaking in room temperature, pours out part in the gluing tank, operates in 100 order nylon mesh gluings by common gluing; The dry 30min of convection oven that puts into then under the uniform temperature takes out; With identical film pattern, the time post-flush identical in the vacuum exposure machine exposure of the uviol lamp that is equipped with 3000kw develops, with the integrality of water development fastness and developing pattern estimate photoresists to thermal stability and photochemical activity.With the pH value is that 4.5 colloid emulsion is that control samples is done contrast test by same procedure.The result sees table 1.
Table 1 is with the thermal stability and the photochemical activity of the diazo photosensitive emulsion of the colloid emulsion preparation of different pH values
The result shows: pH is colloid emulsion baking 30min under 40 ℃, 45 ℃, 50 ℃ of 3.9; Its water development fastness and developing pattern are all normal; And control samples except that the genus still of 40 ℃ of oven dry normally, the oven dry difficulty that occurred developing under higher temperature, the resolution of developing pattern descends.Explain that colloid emulsion is that 3.9 photoresists have thermal stability and photochemical activity preferably; And that the pH value is the thermal stability of 4.5 colloid emulsion is poorer than the former, in the drying course owing to diazo resin decompose comparatively seriously cause with colloid in the polyvinyl alcohol (PVA) generation cross-linking reaction difficulty of developing.
Embodiment 2
Get 950g what be used to prepare diazo photosensitive emulsion is two parts of the colloid emulsions of the component of photosensitized reaction with the polyvinyl alcohol (PVA); Using pH meter or precision test paper to measure its pH value is 2.4, and the use weight percentage is that 20% SAS is regulated its pH value to 3.9 with a copy of it.Add the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance respectively at two parts of colloid emulsions then; Stir 15min; Lucifuge is placed 30～60min to froth breaking in room temperature, pours out part in the gluing tank, operates in 100 order nylon mesh gluings by common gluing; The dry 30min of convection oven that puts into then under 45 ℃ takes out; With identical film pattern, the time post-flush identical in the vacuum exposure machine exposure of the uviol lamp that is equipped with 3000kw develops, with water development fastness and the integrality of coming developing pattern estimate photoresists to thermal stability and photochemical activity.The result sees table 2.
Table 2 is with the thermal stability and the photochemical activity of the diazo photosensitive emulsion of the colloid emulsion preparation of different pH values
Using pH is the photoresists of 3.9 colloid emulsion allotment, exposure 20～40s, and the water development fastness is normal, and developing pattern is complete, and it is clear, respond well to differentiate, but behind the exposure 65s, apparent over-exposed, the fine structure of developing pattern can not be differentiated.With the photoresists that the colloid emulsion of pH=2.4 is prepared, exposure 20～30s, glued membrane is almost dashed fully and is taken off during development; Behind exposure 65s, the water development fastness is still only inadequate, and pattern is prone to by the water shock wave.These are more weak performances of photochemical activity of photoresists.These presentation of results can be regulated and control the photochemical activity of diazo salt photoresists through the pH value of adjustment colloid emulsion.
Embodiment 3
Get 950g what be used to prepare diazo photosensitive emulsion is two parts of the colloid emulsions of the component of photosensitized reaction with the polyvinyl alcohol (PVA); Using pH meter or precision test paper to measure its pH value is 2.4; Using weight percentage is that 5% disodium phosphate soln is regulated its pH value to 3.9 with a copy of it, a its pH value to 4.6 of adjusting.In two parts of colloid emulsions, add the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance then respectively; Stir 15min, lucifuge is placed 30～60min to froth breaking in room temperature, pours out part in the gluing tank; Operate in 100 order nylon mesh gluings by common gluing; The dry 30min of convection oven that puts into then under 45 ℃ takes out, after lucifuge is placed certain hour under the room temperature, with identical film pattern; The time post-flush identical in the vacuum exposure machine exposure of the uviol lamp that is equipped with 3000kw develops, with water development fastness and the integrality of coming developing pattern estimate photoresists to thermal stability and photochemical activity.The result sees table 3.
Table 3 is with the thermal stability of the diazo salt aqueous sensitizing glue of the colloid emulsion preparation of different pH values
The result shows: with the photoresists of the colloid emulsion of pH=3.9 allotment; Silk screen gluing oven dry back is placed 24h and is still had normal developing performance and development effect; And with the photoresists of the colloid emulsion of pH=4.6 allotment, promptly can not normal development after 8h is placed in silk screen gluing oven dry back.Show that at a certain temperature the former has bin stability preferably, thereby the stronger photochemical activity of its standing time of long still maintenance; And the latter's bin stability is relatively poor, because photosensitizer decomposes the dark reaction enhancing that causes, glued membrane takes place crosslinked and shows the increase of water development fastness, has influenced the resolution of developing pattern between storage period.Essence is the pH value of colloid emulsion when high (pH=4.6), and the thermal stability variation of photoresists, the photochemical activity of photoresists prolong with period of storage and weaken.Therefore, pH value adjustable its stability and photochemical activity of adjustment colloid emulsion to heat.
Embodiment 4
Being used to of 950g prepares 3 parts of the colloid emulsions of diazo photosensitive emulsion; Using pH meter or precision test paper to measure its pH value is 2.4; Using weight percentage is that 5% disodium phosphate soln is regulated its pH value to 3.4 with a copy of it, a its pH value to 4.0 of regulating, its pH value to 4.6 of portion adjusting.In 3 parts of colloid emulsions, add the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance then respectively; Stir 15min; Lucifuge is measured their viscosity after room temperature is placed certain hour, estimate the regulating and controlling effect of colloid emulsion pH value to the thermal stability of photoresists with viscosity change (increase) amplitude.
Table 4 is with the thermal stability of the diazo photosensitive emulsion of the colloid emulsion preparation of different pH values
The result shows: during pH value high (4.6); The viscosity of photoresists is with increasing the fastest standing time; And the pH value be the viscosity of photoresists of 3.5～4.0 colloid emulsion with having basically no variation standing time, explain that the colloid emulsion in this pH value scope has thermal stability preferably.
Embodiment 5
Get 950g what be used to prepare diazo photosensitive emulsion is 2 parts of the colloid emulsions of the component of photosensitized reaction with the polyvinyl alcohol (PVA); Using acid solution or alkali lye to regulate a pH value is 3.0, and another part pH value is 4.4, adds the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance then; Stir 15min; Lucifuge is placed 30～60min to froth breaking in room temperature, pours out part in the gluing tank, operates in 100 order nylon mesh gluings by common gluing; The dry 30min of convection oven that puts into then under the uniform temperature takes out; With identical film pattern, the time post-flush identical in the vacuum exposure machine exposure of the uviol lamp that is equipped with 3000kw develops, with water development fastness and the integrality of coming developing pattern estimate photoresists to thermal stability and photochemical activity.
The result shows, the pH value is that the thermal stability of 3.0 diazo photosensitive emulsion is better, photochemical activity a little less than, though and the pH value to be the thermal stability of 4.4 diazo photosensitive emulsion general, but photochemical activity is stronger.
Embodiment 6
Get 950g what be used to prepare diazo photosensitive emulsion is 2 parts of the colloid emulsions of the component of photosensitized reaction with the polyvinyl alcohol (PVA); Using acid solution or alkali lye to regulate a pH value is 3.5, and another part pH value is 5.0, adds the diazo resin that synthesizes with right-diphenylamine-4-diazonium salt with a small amount of water-soluble 6g in advance then; Stir 15min; Lucifuge is placed 30～60min to froth breaking in room temperature, pours out part in the gluing tank, operates in 100 order nylon mesh gluings by common gluing; The dry 30min of convection oven that puts into then under the uniform temperature takes out; With identical film pattern, the time post-flush identical in the vacuum exposure machine exposure of the uviol lamp that is equipped with 3000kw develops, with water development fastness and the integrality of coming developing pattern estimate photoresists to thermal stability and photochemical activity.
The result shows; The pH value is that 3.5 diazo photosensitive emulsion has better thermal stability; But photochemical activity is general; And that the pH value is the thermal stability of 5.0 diazo photosensitive emulsion is relatively poor, and to prolong decay with period of storage very fast for photochemical activity at a certain temperature, then shows stronger photochemical activity but use at a lower temperature after the impregnation.
Claims (7)
1. a thermal stability of diazo photosensitive emulsion and photochemically reactive regulate and control method; It is characterized in that: to make that screen printing screens uses with the colloid emulsion of polyvinyl alcohol (PVA) as the photosensitized reaction component; Before adding the diazo resin photosensitizer; The pH that adds acid solution or alkali lye adjusting colloid emulsion earlier is 3.0～5.0; The diazo resin photosensitizer of described diazo resin photosensitizer for synthesizing with right-diphenylamine-4-diazonium salt, described acid solution is one or more in sulfuric acid, hydrochloric acid and the phosphate aqueous solution, described alkali lye is one or more in the WS of sodium acetate, sodium phosphate, sodium hydrogen phosphate.
2. thermal stability of diazo photosensitive emulsion according to claim 1 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 3.5～4.2.
3. thermal stability of diazo photosensitive emulsion according to claim 2 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 3.8～4.0.
4. thermal stability of diazo photosensitive emulsion according to claim 1 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 3.0～3.5.
5. thermal stability of diazo photosensitive emulsion according to claim 4 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 3.2～3.4.
6. thermal stability of diazo photosensitive emulsion according to claim 1 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 4.3～5.0.
7. thermal stability of diazo photosensitive emulsion according to claim 6 and photochemically reactive regulate and control method is characterized in that: the pH that regulates colloid emulsion is 4.4～4.6.
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| CN103048877B (en) * | 2011-10-14 | 2014-06-18 | 武汉海蓝生物技术有限公司 | Ink-jet printing silk screen plate making method and photo-sensitive resist ink thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1041463A (en) * | 1962-04-27 | 1966-09-07 | Minnesota Mining & Mfg | Light-sensitive diazo material |
| US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| US5700619A (en) * | 1995-07-07 | 1997-12-23 | Sun Chemical Corporation | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| CN1651527A (en) * | 2003-12-13 | 2005-08-10 | 曼·罗兰·德鲁克马辛伦公司 | Gumming medium |
| CN101281366A (en) * | 2007-04-06 | 2008-10-08 | 村上精密制版（昆山）有限公司 | Light-sensitive polymer composition not easy to change color and application thereof |
| CN101512436A (en) * | 2007-09-07 | 2009-08-19 | 凯昂公司 | Photosensitive composition containing polyvinyl alcohol and purpose thereof for dye printing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1783552B1 (en) * | 2005-11-03 | 2015-10-07 | Kissel & Wolf GmbH | Photopolymerizable composition for producing printing forms |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1041463A (en) * | 1962-04-27 | 1966-09-07 | Minnesota Mining & Mfg | Light-sensitive diazo material |
| US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| US5700619A (en) * | 1995-07-07 | 1997-12-23 | Sun Chemical Corporation | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| CN1651527A (en) * | 2003-12-13 | 2005-08-10 | 曼·罗兰·德鲁克马辛伦公司 | Gumming medium |
| CN101281366A (en) * | 2007-04-06 | 2008-10-08 | 村上精密制版（昆山）有限公司 | Light-sensitive polymer composition not easy to change color and application thereof |
| CN101512436A (en) * | 2007-09-07 | 2009-08-19 | 凯昂公司 | Photosensitive composition containing polyvinyl alcohol and purpose thereof for dye printing method |
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